{"title":"Alx(CrFeCoCuNi) 100-x组分扩散薄膜的微观结构和氧化行为","authors":"Xiaoyi Liu, Pei Yuwen, Ruixin Pan, Chungen Zhou","doi":"10.1016/j.tsf.2025.140645","DOIUrl":null,"url":null,"abstract":"<div><div>Al<sub>x</sub>(CrFeCoCuNi)<sub>100–x</sub> thin film was fabricated by the magnetron co-sputtering. The microstructures of the high entropy alloy (HEA) film before and after the high temperature oxidation at 950 °C for 1.5 h were investigated. A combinatorial library of the film with the concentration of Al ranging from 10 to 40 at % is achieved. The structure of the film transforms from face-centered cubic (FCC) to body-centered cubic (BCC) with the increasing Al content. Three distinct regions of oxides are identified across the oxidized film from the low to high Al content regions. The critical Al concentration for the establishment of a passivating Al<sub>2</sub>O<sub>3</sub> scale is determined.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140645"},"PeriodicalIF":2.0000,"publicationDate":"2025-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Microstructure and oxidation behavior of Alx(CrFeCoCuNi)100–x composition spread thin film\",\"authors\":\"Xiaoyi Liu, Pei Yuwen, Ruixin Pan, Chungen Zhou\",\"doi\":\"10.1016/j.tsf.2025.140645\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Al<sub>x</sub>(CrFeCoCuNi)<sub>100–x</sub> thin film was fabricated by the magnetron co-sputtering. The microstructures of the high entropy alloy (HEA) film before and after the high temperature oxidation at 950 °C for 1.5 h were investigated. A combinatorial library of the film with the concentration of Al ranging from 10 to 40 at % is achieved. The structure of the film transforms from face-centered cubic (FCC) to body-centered cubic (BCC) with the increasing Al content. Three distinct regions of oxides are identified across the oxidized film from the low to high Al content regions. The critical Al concentration for the establishment of a passivating Al<sub>2</sub>O<sub>3</sub> scale is determined.</div></div>\",\"PeriodicalId\":23182,\"journal\":{\"name\":\"Thin Solid Films\",\"volume\":\"815 \",\"pages\":\"Article 140645\"},\"PeriodicalIF\":2.0000,\"publicationDate\":\"2025-02-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thin Solid Films\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S004060902500046X\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S004060902500046X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
摘要
采用磁控共溅射法制备了Alx(CrFeCoCuNi) 100-x薄膜。研究了950℃高温氧化1.5 h前后高熵合金(HEA)薄膜的显微组织。得到了Al浓度为10% ~ 40% at %的复合薄膜库。随着Al含量的增加,膜的结构由面心立方(FCC)转变为体心立方(BCC)。从低到高铝含量区域,在氧化膜上识别出三个不同的氧化物区域。确定了建立钝化Al2O3垢的临界铝浓度。
Microstructure and oxidation behavior of Alx(CrFeCoCuNi)100–x composition spread thin film
Alx(CrFeCoCuNi)100–x thin film was fabricated by the magnetron co-sputtering. The microstructures of the high entropy alloy (HEA) film before and after the high temperature oxidation at 950 °C for 1.5 h were investigated. A combinatorial library of the film with the concentration of Al ranging from 10 to 40 at % is achieved. The structure of the film transforms from face-centered cubic (FCC) to body-centered cubic (BCC) with the increasing Al content. Three distinct regions of oxides are identified across the oxidized film from the low to high Al content regions. The critical Al concentration for the establishment of a passivating Al2O3 scale is determined.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.