Thin Solid Films最新文献

{"title":"Structural characteristics and thermal properties of gadolinium zirconate thin films processed by Direct Liquid Injection Chemical Vapor Deposition","authors":"Alexandre Jaud ,&nbsp;Diane Samélor ,&nbsp;Hugues Vergnes ,&nbsp;Andrzej Kusiak ,&nbsp;Jean-Luc Battaglia ,&nbsp;Constantin Vahlas ,&nbsp;Brigitte Caussat","doi":"10.1016/j.tsf.2025.140735","DOIUrl":"10.1016/j.tsf.2025.140735","url":null,"abstract":"<div><div>Gadolinium zirconate Gd₂Zr₂O₇ coatings were deposited by an original route based on Direct Liquid Injection Metal Organic Chemical Vapor Deposition (DLI-MOCVD) at the relatively low temperature of 550 °C. By using the heteroleptic precursor [Zr(OiPr)₂(tbaoac)₂] combined with tris(2,2,6,6-tetramethyl-3,5-heptanedionato) gadolinium(III) [Gd(thd)₃] and O₂, polycrystalline coatings of Gd₂Zr₂O₇ of columnar structure composed of the pyrochlore and fluorite phases were deposited on silicon and steel substrates. Deposition rates as high as 1 μm/h were obtained, allowing to produce coatings reaching 25 μm in thickness, with mean roughness lower than 1 μm. Their thermal characterization was performed using modulated photothermal radiometry (MPTR). The coating thermal resistances appeared to be influenced by several factors, in particular the crystalline quality related with the presence of the pyrochlore and fluorite phases and the Gd/Zr ratio. The most crystallized coatings presenting the smallest column width and the highest Gd/Zr ratio provided the lowest apparent thermal conductivities, competing with the best results of the literature. This DLI-MOCVD route was developed with the objective to coat the internal surface of thermosensitive steel substrates of interest for plastic injection molding. By delaying heat transfer at the molten polymer/mold interface, such ceramic coatings could prevent premature solidification of the polymer melt, contributing to reduce part rejection. They could also be of interest for other applications needing efficient thermal barrier coatings for mild temperature use (energy, electronics, automotive, …).</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140735"},"PeriodicalIF":2.0,"publicationDate":"2025-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144522826","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Physical-chemical properties of zirconia thin films deposited by electron beam on Ti6Al4V alloy for biomedical applications","authors":"Alana Paula Bonkevich ,&nbsp;Ana Elisa Dotta Maddalozzo ,&nbsp;Amanda Poletto Santi ,&nbsp;Mariana Roesch Ely ,&nbsp;Cesar Aguzzoli ,&nbsp;Janete Eunice Zorzi","doi":"10.1016/j.tsf.2025.140733","DOIUrl":"10.1016/j.tsf.2025.140733","url":null,"abstract":"<div><div>The growing need for safer and more effective biomaterials aligns with advancements in medicine, where surface properties are crucial. Surface modifications are key to developing advanced materials, and depositing thin films presents significant advantages for biomedical uses. This study applied a 470 nm thick yttria-stabilized zirconia film to titanium alloy discs through electron beam deposition. The film was found to be amorphous and stoichiometric. Both the microhardness and Reduced Young's modulus of the substrate and film were measured using instrumented microhardness testing with a Berkovich tip, and Vickers hardness was estimated using established mathematical formulas. The results showed an increase in microhardness compared to the substrate, though small cracks did form in the film under a high load (2000 mN). Microabrasive wear resistance was evaluated with a rotating ball test using Calotest equipment with a load cell. The contact angle was tested according to ASTM (American Society for Testing and Materials) D7334–08 to assess the film wettability. The study revealed a 44 % improvement in microabrasive wear resistance, and the contact angle data indicated better osteointegration potential. These improvements indicate that the electron beam deposition technique is highly effective for applying yttria-stabilized zirconia thin films to biomaterials. Biological assays also demonstrated increased biocompatibility of the coated material, as evidenced by the indirect viability test, and showed that L929 fibroblast cells did not adhere to the film surface—an advantageous feature for preventing fibrotic tissue formation in implants.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140733"},"PeriodicalIF":2.0,"publicationDate":"2025-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144518131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Polymorph modulation of sexithiophene crystals in sexithiophene and pentacene mixed thin films prepared by codeposition","authors":"Tomo Horota ,&nbsp;Yuga Takeuchi ,&nbsp;Takeshi Watanabe ,&nbsp;Satomi Fujisaki ,&nbsp;Haruki Kudo ,&nbsp;Ryuto Sato ,&nbsp;Noriyuki Yoshimoto ,&nbsp;Toshiyuki Kakudate","doi":"10.1016/j.tsf.2025.140732","DOIUrl":"10.1016/j.tsf.2025.140732","url":null,"abstract":"<div><div>The polymorphism of α-sexithiophene (6T) crystals in mixed thin films prepared by the codeposition of the 6T and pentacene (PEN) molecules on a SiO₂ substrate was investigated by X-ray diffraction (XRD). We found that the fractions of different types of 6T crystal polymorphs in the mixed thin films can be tuned by changing the 6T:PEN molecular ratio in these films. When the 6T:PEN molecular ratio was adjusted from 5:1 to 2:1, several 6T crystal polymorphs of different types appeared. A detailed analysis of out-of-plane and in-plane XRD patterns, along with two-dimensional grazing incidence XRD images, revealed that the fraction of the β phase in 6T decreases as the proportion of PEN increases in the mixed thin films. Atomic force and optical microscopy images also indicated that 6T and PEN molecules primarily aggregated and crystallized in spatially distinct regions in the mixed thin films.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140732"},"PeriodicalIF":2.0,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144501378","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effect of coating thickness on the growth rates, optical properties and microstructure of TiO2 thin films grown via thermal and plasma enhanced atomic layer deposition","authors":"M.G. Ambartsumov,&nbsp;V.А. Tarala,&nbsp;О.M. Chapura","doi":"10.1016/j.tsf.2025.140730","DOIUrl":"10.1016/j.tsf.2025.140730","url":null,"abstract":"<div><div>Titanium dioxide (TiO₂) thin films were synthesized on single-crystalline silicon (111) substrates using thermal (TALD) and plasma-enhanced atomic layer deposition (PEALD) methods in a self-limited growth regime with different numbers of deposition cycles (250, 500, 750, 1000, 1500 and 2000). The synthesized TiO₂ layers were studied by ellipsometry, X-ray diffraction analysis, Raman spectroscopy, scanning electron microscopy and atomic force microscopy. The findings of the study indicated that during the initial stages of growth, the silicon substrate exerted an inhibitory effect on the degree of nucleation of crystalline titanium dioxide films, resulting in the formation of coatings consisting of nanocrystallites in an amorphous matrix. Moreover, for titanium dioxide coatings synthesized by the PEALD method, compared to TiO₂ films obtained by the TALD method, this effect was more pronounced. As the thickness of the titanium dioxide films increased, an increase in the nanocrystallite sizes, the crystallization of the amorphous regions and the formation of a continuous polycrystalline coating were observed. Moreover, upon reaching the critical layer thickness, a transformation in the type of internal mechanical stress of the structure was identified, shifting from negative compressive to positive tensile stress, associated with an increased influence of the substrate on the structure of the titanium dioxide coating. It was observed that an increase in the thickness of the coating, at a number of cycles exceeding 1000, resulted in the stabilization of the internal mechanical stress and the cessation of the inhibition process.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140730"},"PeriodicalIF":2.0,"publicationDate":"2025-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144471897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Determination of biaxial stress and strain states of fibre-textured thin films by X-ray diffraction measurements","authors":"Satyajit Sarkar ,&nbsp;Fakhrodin Motazedian ,&nbsp;Bashir Samsam Shariat ,&nbsp;Dilusha Silva ,&nbsp;Hong Yang ,&nbsp;Yinong Liu","doi":"10.1016/j.tsf.2025.140728","DOIUrl":"10.1016/j.tsf.2025.140728","url":null,"abstract":"<div><div>This paper reports a study on the determination of the internal stresses and elastic strains in thin films. The determination of these stresses and strains in thin films, especially those with strong fibre textures, is challenging. The method used is a combined technique of Bragg-Brentano and Asymmetric X-ray diffraction (XRD) configurations referred to as BBA-XRD. This method allows the use of conventional powder X-ray diffractometers to determine isotropic and anisotropic in-plane and out-of-plane strains of textured thin films. In this study, the internal stress and lattice strains of niobium (Nb) thin films deposited on nickel-titanium (NiTi) substrates in both as-deposited condition and after in-plane uniaxial tension were analysed using this method. The results obtained were verified by comparing with synchrotron grazing angle XRD measurements. The isotropic in-plane strains of the deposited Nb thin films were determined to be <span><math><mrow><msub><mrow><mi>ε</mi></mrow><mi>x</mi></msub><mo>=</mo><msub><mrow><mi>ε</mi></mrow><mi>y</mi></msub><mo>=</mo><mo>−</mo><mn>1.73</mn><mo>%</mo></mrow></math></span> and the out-of-plane strain was <span><math><mrow><msub><mrow><mi>ε</mi></mrow><mi>z</mi></msub><mo>=</mo><mo>+</mo><mn>2.28</mn><mo>%</mo></mrow></math></span>. After a uniaxial tensile in-plane deformation of the NiTi substrate by 6.1 % in the <em>y</em> direction, the anisotropic strain state of the film changed to <span><math><mrow><msub><mrow><mi>ε</mi></mrow><mi>x</mi></msub><mo>=</mo><mo>−</mo><mn>2.03</mn><mo>%</mo></mrow></math></span>, <span><math><mrow><msub><mrow><mi>ε</mi></mrow><mi>y</mi></msub><mo>=</mo><mo>+</mo><mn>0.80</mn><mo>%</mo></mrow></math></span> and <span><math><mrow><msub><mrow><mi>ε</mi></mrow><mi>z</mi></msub><mo>=</mo><mo>+</mo><mn>0.80</mn><mo>%</mo></mrow></math></span>. This paper also presents the specific conditions required for the BBA-XRD method to be applied to hexagonal, tetragonal, and rhombohedral crystal systems.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140728"},"PeriodicalIF":2.0,"publicationDate":"2025-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144656537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Corrigendum to “Amorphous TiNiSn thin films for mechanical flexibility in thermoelectric applications” [Thin Solid Films 807 (2024) 140534]","authors":"Sana Khayyamifar ,&nbsp;Grzegorz Sadowski ,&nbsp;Johan Hektor ,&nbsp;Denis Music","doi":"10.1016/j.tsf.2025.140724","DOIUrl":"10.1016/j.tsf.2025.140724","url":null,"abstract":"","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"827 ","pages":"Article 140724"},"PeriodicalIF":2.0,"publicationDate":"2025-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145096362","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Stress modulation in silicon nitride layers grown by plasma-enhanced chemical vapor deposition","authors":"Ali Koyucuoglu,&nbsp;Ina Ostermay,&nbsp;Olaf Krüger","doi":"10.1016/j.tsf.2025.140729","DOIUrl":"10.1016/j.tsf.2025.140729","url":null,"abstract":"<div><div>In this work, plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (SiN_x) layers deposited at up to 600 °C are investigated in terms of the influence of different deposition parameters on the mechanical stress. Elastic recoil detection analysis (ERDA) is used to determine the absolute elemental concentration distribution and Fourier-transform infrared spectroscopy (FTIR) is used to identify the bonding configuration between the different elements. The combination of ERDA and FTIR analyses provides an understanding of the nitrogen- and hydrogen-induced influence on film stress of the SiN_x layers. Increased temperature and the use of a low frequency excitation result in a higher nitrogen (N) and a lower hydrogen (H) content. This also correlates with changes in the stress of the films. Higher nitrogen and lower hydrogen values are associated with increased compressive stress. The FTIR analyses display absorption bands that indicate Si-N, Si-H and N<img>H bonds. Although both the increase in the Si-N absorption band peak and the decrease in the Si-H peak are associated with greater compressive stress, the measurements indicate that Si-N has the largest influence on the stress. These results illustrate the role of nitrogen in modulating the stress properties of PECVD SiN_x layers providing an understanding for optimized deposition parameters to achieve desired stress characteristics.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140729"},"PeriodicalIF":2.0,"publicationDate":"2025-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144471898","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Modification of surface conduction band minimum in Cu(In1-x,Gax)Se2 photoelectrodes under CO2-saturated conditions","authors":"Kazuma Okada,&nbsp;Mutsumi Sugiyama","doi":"10.1016/j.tsf.2025.140721","DOIUrl":"10.1016/j.tsf.2025.140721","url":null,"abstract":"<div><div>In this study, two strategies to modulate the conduction band minimum (CBM) of Cu(In,Ga)Se₂ (CIGS) photoelectrodes were investigated to enhance their photoelectrochemical (PEC) performance for CO₂ reduction. First, the surface Ga composition of CIGS film was systematically varied, demonstrating that increasing the Ga content elevates the CBM above the CO₂ reduction potential, thereby enhancing the driving force for reduction reactions and increasing photocurrent density. Second, the effect of CsF post-deposition treatment (CsF-PDT) was evaluated, revealing that CsF-PDT modifies the band structure through the formation of Cs-containing compounds (e.g., CsInSe₂), which reduce grain boundary recombination and improve carrier lifetime, as evidenced by time-resolved photoluminescence. Electrochemical impedance spectroscopy confirmed that the interfacial charge transfer resistance was reduced after CsF-PDT. These combined modifications increased the photocurrent density and onset potential, improving PEC performance. This work highlights the importance of CBM tuning and interface engineering in CIGS photoelectrodes, and will provide insights for future optimizations in solar-driven CO₂ reduction efficiency.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140721"},"PeriodicalIF":2.0,"publicationDate":"2025-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144307612","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"On measuring the temperature coefficient of resistivity and the thermal expansion coefficient of conductive thin films","authors":"Gerhard Fischerauer","doi":"10.1016/j.tsf.2025.140727","DOIUrl":"10.1016/j.tsf.2025.140727","url":null,"abstract":"<div><div>We analyze the details of extracting the temperature coefficient of resistivity and the thermal expansion coefficient of thin-film materials from the measured temperature coefficient of resistance of thin-film resistors on supporting substrates. It is shown that this requires two straining experiments, one thermal experiment, and the ability to deposit identical films on two different substrates with known properties. An analysis of experimental data from the literature, which includes the application of accepted rules from the Guide to the Expression of Uncertainty in Measurement (GUM), reveals that the violation of the stated requirements usually leads to inconsistent or arbitrary results.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140727"},"PeriodicalIF":2.0,"publicationDate":"2025-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144330348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Characterization of pulsed plasma nitriding and physical vapor deposition duplex-treated CrAlN coatings","authors":"Xiankun Lin ,&nbsp;Dongxin Fan ,&nbsp;Fuqiu Li ,&nbsp;Boying Qin ,&nbsp;Tonghan Yang ,&nbsp;Di Tan ,&nbsp;Shizhang Dai","doi":"10.1016/j.tsf.2025.140726","DOIUrl":"10.1016/j.tsf.2025.140726","url":null,"abstract":"<div><div>To enhance the adhesion, hardness, and wear resistance of CrAlN coatings deposited via physical vapor deposition, this paper proposes a method involving stepwise and in-situ nitriding and coating composite treatment using pulsed plasma nitriding and multi-arc ion plating technology to prepare a nitrided-coated CrAlN layer on AISI D2 steel. The microstructural and mechanical properties of the coatings are investigated. The results indicate that the CrAlN coating exhibits a (111) texture orientation, with the diffraction intensity weakened in the stepwise processed coating, while the in-situ processed coating shows a (200) texture orientation. The adhesion strength of the in-situ processed coating reaches 66.32 N, achieving an adhesion level of HF1, with a surface hardness of 3279 HV0.025 and a wear rate of 1.85 × 10^-15 m³/N·mm. The in-situ processed coating demonstrates superior resistance to crack propagation and exhibits excellent wear resistance.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"825 ","pages":"Article 140726"},"PeriodicalIF":2.0,"publicationDate":"2025-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144296802","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}