{"title":"Improving the wear resistance and scratch adhesion strength of TiAlN coatings via Al incorporation","authors":"Rumana Akhter , Avi Bendavid , Paul Munroe","doi":"10.1016/j.tsf.2025.140650","DOIUrl":null,"url":null,"abstract":"<div><div>The inclusion of Al into the binary TiN crystal structure may impose a significant influence on the tribological properties of titanium aluminium nitride (TiAlN) coatings. In this study, a suite of TiAlN coatings, with different Al concentrations, were deposited onto tool steel substrates through variation in the composition of the Ti-Al cathode using the cathodic arc evaporation process. The primary objective of this investigation was to explore the wear and scratch response of TiAlN coatings, in particular, the underlying deformation mechanisms of these coatings under cyclical or progressive loading. The maximum nanohardness (∼ 34.5 GPa) was realised in the film containing the lowest Al concentration (∼ 20 at. %), which was attributed to Hall-Petch effects, as well as the effects of solid solution hardening. The wear resistance of these coatings exhibits an inverse relationship with the Al content and was noted to be consistent with the hardness and modulus of these coatings. Enhanced scratch adhesion strength, as defined by higher L<sub>C1</sub>, L<sub>C2</sub> and CPR values, was also observed for the TiAlN coating with the lowest Al concentration (∼ 20 at. %), consistent with its higher H/E<sub>r</sub> and H<sup>3</sup>/E<sub>r</sub><sup>2</sup> ratios, promoting good resistance against adhesive and cohesive failures. In addition, the failure modes under progressive loading were found to be influenced by the geometry and density of macroparticles, arising from the deposition process, accompanied by the residual stresses of the coatings and the hierarchical architecture of these thin film systems.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"816 ","pages":"Article 140650"},"PeriodicalIF":2.0000,"publicationDate":"2025-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609025000513","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
The inclusion of Al into the binary TiN crystal structure may impose a significant influence on the tribological properties of titanium aluminium nitride (TiAlN) coatings. In this study, a suite of TiAlN coatings, with different Al concentrations, were deposited onto tool steel substrates through variation in the composition of the Ti-Al cathode using the cathodic arc evaporation process. The primary objective of this investigation was to explore the wear and scratch response of TiAlN coatings, in particular, the underlying deformation mechanisms of these coatings under cyclical or progressive loading. The maximum nanohardness (∼ 34.5 GPa) was realised in the film containing the lowest Al concentration (∼ 20 at. %), which was attributed to Hall-Petch effects, as well as the effects of solid solution hardening. The wear resistance of these coatings exhibits an inverse relationship with the Al content and was noted to be consistent with the hardness and modulus of these coatings. Enhanced scratch adhesion strength, as defined by higher LC1, LC2 and CPR values, was also observed for the TiAlN coating with the lowest Al concentration (∼ 20 at. %), consistent with its higher H/Er and H3/Er2 ratios, promoting good resistance against adhesive and cohesive failures. In addition, the failure modes under progressive loading were found to be influenced by the geometry and density of macroparticles, arising from the deposition process, accompanied by the residual stresses of the coatings and the hierarchical architecture of these thin film systems.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.