利用脉冲直流磁控溅射等离子体制备Ti|TiOx|TiO2纳米膜，提高光伏太阳能电池板的自清洁效率

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-02-28 DOI:10.1016/j.tsf.2025.140641

Maurício Marlon Mazur , Emerson Luís Alberti , Kleber Franke Portella , Mariana D'Orey Gaivão Portella Bragança , Viviane Teleginski Mazur , Sidnei Antônio Pianaro

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引用次数: 0

摘要

采用脉冲直流磁控溅射等离子体在钠石灰玻璃表面制备了400℃热退火的自清洁Ti|TiOx|TiO2纳米膜，并将其应用于光伏太阳能电池板玻璃表面。对沉积时间、气氛、靶材类型和与基体的距离等参数进行了优化。沉积时间（10 ~ 300 s）不同，其平均生长速率为（0.46±0.05）nm/s。片材电阻率从107降低Ω。□-1为10年代，至25 Ω。由于在化学计量氧化物和非化学计量氧化物之间存在金属界面，因此在300s中为□-1。纳米膜具有亲水性，接触角为<；45°。对于长达120秒的沉积，纳米膜不会干扰直接透光率，并产生自清洁效果，在巴西帕拉paran的浮动太阳能光伏岛FPV-SC上，经过1年的现场暴露，其平均透光率为（92±1）%，而参考样品的平均透光率为（79±7）%。

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Enhanced self-cleaning efficiency of photovoltaic solar panels using Ti|TiOx|TiO2 nanofilms from pulsed direct current magnetron sputtering plasma

Self-cleaning Ti|TiO_x|TiO₂ nanofilms thermally annealed at 400 °C were generated on soda-lime glass for application on photovoltaic solar panel glass surfaces using the pulsed direc current magnetron sputtering plasma. Parameters such as deposition time, atmosphere, target type and distance from substrate were optimized. The properties depended on the deposition time (10 to 300 s), with average growth rates of (0.46 ± 0.05) nm/s. Sheet resistivity decreased from 10⁷ Ω.□^-1 for the 10 s, to 25 Ω.□ ^-1 for the 300 s, due to a metallic interface between stoichiometric and non-stoichiometric oxides. The nanofilms were hydrophilic, with contact angles< 45°. For depositions up to 120 s, the nanofilms did not interfere with direct light transmittance and produced a self-cleaning effect, resulting in an average transmittance of (92 ± 1)% after 1 year of field exposure on the floating solar photovoltaic island FPV-SC, Paraná, Brazil, compared to (79 ± 7)% for the reference sample.

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.