2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)最新文献

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Methodology To execute SPARC binary of Silterra memory compiler 0.18um process technology on x86 Architecture 在x86架构上执行0.18um进程技术的Silterra内存编译器的SPARC二进制文件
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417189
R. Aziz, R. Baharim, M. H. M. Nasir, R. A. Wahab, N. Othman, N. Razali, S. Saleh
{"title":"Methodology To execute SPARC binary of Silterra memory compiler 0.18um process technology on x86 Architecture","authors":"R. Aziz, R. Baharim, M. H. M. Nasir, R. A. Wahab, N. Othman, N. Razali, S. Saleh","doi":"10.1109/SMELEC.2012.6417189","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417189","url":null,"abstract":"This paper addresses the issue of Silterra memory compiler 0.18 micrometer (um) technology that can only be run with Solaris operating system with Scalable Processor Architecture (SPARC). However, a lot of technologies in software applications had moved to x86 platforms. SUN, which produced SPARC machines, also had merged into ORACLE, a database expert company. Today it is hard to find support for SPARC machines, as most developers now are moving to x86 operating system with Intel architecture. This paper proposes a solution by using QEMU approach. QEMU stands for “Quick Emulator” which emulates the role of SPARC machines that installs Solaris operating system with SPARC architecture on Linux machines. Now, the Silterra memory compiler 0.18um process can be executed on the virtual machine, as it recognizes the platform as Solaris SPARC architecture. This methodology not only for memory compiler of 0.18um Silterra but also can be use for others SPARC binaries.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129695297","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of low power, low jitter DLL tested at all five corners to avoid false locking 设计低功耗、低抖动的DLL,在所有五个角进行测试,避免误锁
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417201
H. S. Raghav, S. Maheshwari, M. Srinivasarao, B. P. Singh
{"title":"Design of low power, low jitter DLL tested at all five corners to avoid false locking","authors":"H. S. Raghav, S. Maheshwari, M. Srinivasarao, B. P. Singh","doi":"10.1109/SMELEC.2012.6417201","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417201","url":null,"abstract":"A modified Phase Selection Circuit, a modified Phase Frequency Detector and a modified Voltage Controlled Delay Line is proposed to improve the Delay Locked Loops (DLL) locking time, lock range and the jitter performance. Also the DLL presented in this paper has a wide-range frequency operation. A modified Phase Selection circuit is designed in order to operate DLL over wide frequency range and completely solve the false locking problem. Also a Modified Phase Frequency detector circuit has been designed to reduce the phase error as well as dead-zone situation. The proposed DLL design is simulated in Cadence Spectre using TSMC 180nm CMOS Technology and 1.8V power supply voltage operate correctly when the input clock frequency is changed from 84 to 800MHz and generate ten-phase clocks within just one clock cycle. The simulation is performed for all five process corners. The DLL consumes maximum power of 6.85mW at 800MHz working at FF corner, whereas, the maximum peak-to-peak jitter is 4ps at 84MHz working at FS corner. Both maximum power and jitter is measured at temperature and voltage of -40°C and 1.98V.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128868179","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Organic field-effect transistors for nonvolatile memory devices using charge-acceptor layers 使用电荷受体层的非易失性存储器器件用有机场效应晶体管
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417252
K. A. Mohamad, A. Alias, Ismail Saad, B. Gosh, Katsuhiro Uesugi, Hisashi Fukuda
{"title":"Organic field-effect transistors for nonvolatile memory devices using charge-acceptor layers","authors":"K. A. Mohamad, A. Alias, Ismail Saad, B. Gosh, Katsuhiro Uesugi, Hisashi Fukuda","doi":"10.1109/SMELEC.2012.6417252","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417252","url":null,"abstract":"We introduce a charge-accepting layer on a gate dielectric to investigate the reversible threshold voltage (Vth) shifts in both p-channel and n-channel organic field-effect transistors (OFETs) using organic semiconductors of pentacene and poly-naphthalene dicarboximide [P(NDI2OD-T2)], respectively. Bottom gate with top drain-source contact structure of both devices exhibited a unipolar property of field-effect transistor behavior. Furthermore, the existence of fullerene (PCBM) and poly(3-hexylthiophene) (P3HT) films as a charge-accepting-like storage layers in p-channel and n-channel devices, respectively, resulted in a reversible Vth shifts upon the application of external gate bias (Vbias). Hence, p-channel OFETs exhibited a memory window of 2.4 V and n-channel OFETs exhibited a memory window of 10.7 V for program and erase electrically upon application of gate bias.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"87 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128967353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thermal effects in InAs/GaAs quantum dot vertical cavity surface emitting lasers InAs/GaAs量子点垂直腔面发射激光器的热效应
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417075
Y. S. Fatt
{"title":"Thermal effects in InAs/GaAs quantum dot vertical cavity surface emitting lasers","authors":"Y. S. Fatt","doi":"10.1109/SMELEC.2012.6417075","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417075","url":null,"abstract":"Summary form only given. The performance of 1.3-μm InAs/GaAs quantum dot (QD) vertical cavity surface emitting lasers (VCSELs) is adversely affected by self-heating effect. In this talk, a self-consistent model comprising rate equations and thermal conduction equation will be presented to analyze the influence of self-heating on the carrier dynamics and output power of QD VCSELs. The simulation results indicate that the low output power is attributed to hole thermalization and escape due to the thin wetting layer. The hole confinement can be improved by increasing the number of QD layers and surface density, as well as adopting p-type modulation doping. The fabricated p-doped QD VCSELs exhibit high temperature stability in the threshold current. The highest output power of 0.435 mW and lowest threshold current of 1.2 mA under single-mode operation were achieved, with side mode suppression ratio (SMSR) of 34 dB at room temperature (RT). However, the output power is limited by the small-sized oxide apertures. To achieve both high output power and enhancement of the fundamental mode emission, a dielectric-free (DF) approach with surface-relief (SR) technique is applied in our device fabrication. Compared with the conventional dielectric-dependent (DD) method, the DF approach potentially reduces the fabrication cost and complexity. Moreover, with the same oxide aperture area, the differential resistance is reduced by 36.47% and output power is improved by 78.32% under continuous-wave (CW) operation. The output power increases up to 3.42 mW under pulsed operation with oxide aperture diameter of ~15 μm. The surface-relief technique effectively enhances the fundamental mode emission of the QD VCSEL.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128764810","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Calibration parameters in TCAD for predictive MOSFET device simulations TCAD中用于预测MOSFET器件仿真的校准参数
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417137
M. A. Ismail, M. H. A. Bakar, I. M. Nasir
{"title":"Calibration parameters in TCAD for predictive MOSFET device simulations","authors":"M. A. Ismail, M. H. A. Bakar, I. M. Nasir","doi":"10.1109/SMELEC.2012.6417137","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417137","url":null,"abstract":"Predictive TCAD tool is crucial for several reasons such as to provide pre-silicon data, shorten the technology development cycle and reduce the fabrication cost. This paper presents a methodology for TCAD advanced calibration of MOSFET particularly on critical electrical parameters during device simulations. A few physical device model parameters have been experimented to solve the inaccuracy issues due to the default values. The comparisons between measured and simulated data of electrical parameters are presented for the verification purpose. It is proven that modifying the surface mobility, high-field saturation and band-to-band models had been successful in significantly improved the TCAD accuracy.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128366542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An improved P+/N diode leakage current in BiCMOS technologies with fluorine co-implant 氟共植入提高了BiCMOS技术中P+/N二极管漏电流
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417237
S. Z. M. Saad, T. C. Lik, M. A. Othman, P. Holger, S. H. Herman
{"title":"An improved P+/N diode leakage current in BiCMOS technologies with fluorine co-implant","authors":"S. Z. M. Saad, T. C. Lik, M. A. Othman, P. Holger, S. H. Herman","doi":"10.1109/SMELEC.2012.6417237","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417237","url":null,"abstract":"Fluorine (F) is a co-implant species known to have numbers of beneficial effects to the semiconductor device. In this study, we demonstrate the effect of fluorine to the p+/n-junction leakage current improvement in BiCMOS technologies. In which, fluorine and boron fluoride (BF<sub>2</sub>) were used instead of fluorine-boron (F-B) or BF<sub>2</sub> only. By changing the implant sequence at P+ region from F followed by BF<sub>2</sub> to BF<sub>2</sub> followed by fluorine (BF<sub>2</sub>-F), the leakage current improved by one decade with a higher breakdown voltage also observed in the reverse sequence, BF<sub>2</sub>-F.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127801529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Modulus and thermal properties of free standing PMMA/TiO2 nanocomposite films 独立PMMA/TiO2纳米复合膜的模量和热性能
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417119
N. N. Hafizah, L. N. Ismail, M. Rusop
{"title":"Modulus and thermal properties of free standing PMMA/TiO2 nanocomposite films","authors":"N. N. Hafizah, L. N. Ismail, M. Rusop","doi":"10.1109/SMELEC.2012.6417119","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417119","url":null,"abstract":"TiO2 nanopowder (0-20 w%) has been introduced in the PMMA matrix using the single step of sonication method to produce the PMMA/TiO2 nanocomposite films in the free standing form. The PMMA and TiO2 solution were mixed in the sonication bath. The effects on Tg, thermal degradation and also modulus of the PMMA/TiO2 nanocomposites films were investigated. The properties of the nanocomposite films were depending on the dispersion of TiO2 nanopowder in the PMMA matrix. The results of differential scanning calorimetry (DSC), thermo gravimetric analysis (TGA), and dynamic mechanical analysis (DMTA) were discussed in this paper.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"87 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127873068","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and simulation of high magnetic gradient device for effective bioparticles trapping 高效捕获生物微粒的高磁梯度装置的设计与仿真
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417122
U. Abidin, B. Majlis, J. Yunas
{"title":"Design and simulation of high magnetic gradient device for effective bioparticles trapping","authors":"U. Abidin, B. Majlis, J. Yunas","doi":"10.1109/SMELEC.2012.6417122","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417122","url":null,"abstract":"In this work, a design and simulation of high magnetic gradient device for effective bioparticles trapping is reported. The planar square-shaped microcoil and a V-shaped nickel iron (NiFe) alloy core is designed to guide and confine the magnetic flux lines through its small tip area and thus enhance the magnetic flux density and its gradient. The effects of core structure and coil parameters are analyzed using Finite element analysis (FEA) of two dimensional axial symmetry modeling. The simulation results revealed that the V-shaped magnetic core has significantly increased the magnetic flux density, its gradient and the magnetic force affecting on the beads sample. The highest magnetic flux density value, Bnorm is 66 mT is achieved for microcoil turns of N = 20, thickness of h = 5 μm, width and spacing of w = s = 50 μm and on tip surface area of 1 μm2. Furthermore, a maximum magnetic force value of Fm = 1700 pN which is much higher than the drag force experienced by the magnetic beads in the microchannel has also been observed. Therefore, a promising effective trapping of the magnetic beads in the microfluidic channel is enable with this high magnetic gradient device design.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120918903","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Fabrication and characterization of Pb1−xYbxTe based alloy thin film thermoelectric generators using thermal evaporation method 采用热蒸发法制备Pb1−xYbxTe基合金薄膜热电发生器并进行表征
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417245
A. Kadhim, A. Abbas, H. A. Hassan
{"title":"Fabrication and characterization of Pb1−xYbxTe based alloy thin film thermoelectric generators using thermal evaporation method","authors":"A. Kadhim, A. Abbas, H. A. Hassan","doi":"10.1109/SMELEC.2012.6417245","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417245","url":null,"abstract":"In this work fabricated p-Pb<sub>0.925</sub>Yb<sub>0.075</sub>Te:Te and n-Pb<sub>0.925</sub>Yb<sub>0.075</sub>Te thin films thermoelectric devices are composed of 20-pair and 10-pair deposited on a glass substrate using simple thermal evaporation method. Overall size of thin films thermoelectric generators which consist of 20-pairs and 10-pair of legs connected by aluminum electrodes (Al-electrode) was 23 mm×20 mm and 12 mm×10 mm, respectively. The 20-pair p-n thermocouples in series device generated output maximum open-circuit voltage of 742.7 mV and a maximum output power up to 0.657 μW at temperature difference ΔT = 162 K, and 467.9 mV and 0.346 μW at ΔT = 162 K, for 10-pair, respectively.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115822307","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study of ZnO micro-gap on SiO2/Si substrate by conventional lithography method for pH measurement 用常规光刻法测量pH值在SiO2/Si衬底上ZnO微间隙的研究
2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Pub Date : 2012-09-01 DOI: 10.1109/SMELEC.2012.6417121
K. L. Foo, U. Hashim, H. Prasad, M. Kashif
{"title":"Study of ZnO micro-gap on SiO2/Si substrate by conventional lithography method for pH measurement","authors":"K. L. Foo, U. Hashim, H. Prasad, M. Kashif","doi":"10.1109/SMELEC.2012.6417121","DOIUrl":"https://doi.org/10.1109/SMELEC.2012.6417121","url":null,"abstract":"ZnO films, type of the metal-oxide semiconductor promised a wide range of application. ZnO prepared from zinc acetate dehydrate acted as a precursor and IPA acted as a solvent exhibit high crytallinity with the hexagonal wurzite structure. The ZnO films with the grains uniformly distributed on the substrate was deposited using low-cost sol-gel technique. In this paper, the zinc oxide thin films are further used for the formation of micro gap device using conventional fabrication process. The influence of surface morphologies and uniformity distribution of ZnO nanoparticles on the substrate had been investigated using FESEM, whereby the crystallization and structure types of ZnO was determined using XRD. FTIR study was used to determine the chemical compound existed on the ZnO films with the SiO2/Si acted as a substrate. The electrical characteristic of the ZnO microp gap with different pH had been tested using source meter.","PeriodicalId":210558,"journal":{"name":"2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126884706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
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