InAs/GaAs量子点垂直腔面发射激光器的热效应

Y. S. Fatt
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引用次数: 0

摘要

只提供摘要形式。1.3 μm InAs/GaAs量子点(QD)垂直腔面发射激光器(VCSELs)的性能受到自热效应的不利影响。在本讲座中,我们将提出一个包含速率方程和热传导方程的自一致模型来分析自加热对量子点VCSELs载流子动力学和输出功率的影响。模拟结果表明,低输出功率是由于湿层薄导致的孔热化和逸出造成的。通过增加QD层数和表面密度,以及采用p型调制掺杂,可以改善空穴约束。制备的p掺杂QD VCSELs在阈值电流下具有较高的温度稳定性。在单模工作下,最高输出功率为0.435 mW,最低阈值电流为1.2 mA,室温下侧模抑制比(SMSR)为34 dB。然而,输出功率受到小尺寸氧化孔的限制。为了实现高输出功率和增强基模发射,我们在器件制造中应用了一种无介电(DF)方法和表面浮雕(SR)技术。与传统的介电相关(DD)方法相比,DF方法潜在地降低了制造成本和复杂性。在相同的氧化孔径面积下,连续波工作时差分电阻降低了36.47%,输出功率提高了78.32%。当氧化物孔径为~15 μm时,脉冲工作时输出功率可达3.42 mW。表面缓释技术有效地增强了量子点VCSEL的基模发射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal effects in InAs/GaAs quantum dot vertical cavity surface emitting lasers
Summary form only given. The performance of 1.3-μm InAs/GaAs quantum dot (QD) vertical cavity surface emitting lasers (VCSELs) is adversely affected by self-heating effect. In this talk, a self-consistent model comprising rate equations and thermal conduction equation will be presented to analyze the influence of self-heating on the carrier dynamics and output power of QD VCSELs. The simulation results indicate that the low output power is attributed to hole thermalization and escape due to the thin wetting layer. The hole confinement can be improved by increasing the number of QD layers and surface density, as well as adopting p-type modulation doping. The fabricated p-doped QD VCSELs exhibit high temperature stability in the threshold current. The highest output power of 0.435 mW and lowest threshold current of 1.2 mA under single-mode operation were achieved, with side mode suppression ratio (SMSR) of 34 dB at room temperature (RT). However, the output power is limited by the small-sized oxide apertures. To achieve both high output power and enhancement of the fundamental mode emission, a dielectric-free (DF) approach with surface-relief (SR) technique is applied in our device fabrication. Compared with the conventional dielectric-dependent (DD) method, the DF approach potentially reduces the fabrication cost and complexity. Moreover, with the same oxide aperture area, the differential resistance is reduced by 36.47% and output power is improved by 78.32% under continuous-wave (CW) operation. The output power increases up to 3.42 mW under pulsed operation with oxide aperture diameter of ~15 μm. The surface-relief technique effectively enhances the fundamental mode emission of the QD VCSEL.
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