Organic field-effect transistors for nonvolatile memory devices using charge-acceptor layers

K. A. Mohamad, A. Alias, Ismail Saad, B. Gosh, Katsuhiro Uesugi, Hisashi Fukuda
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Abstract

We introduce a charge-accepting layer on a gate dielectric to investigate the reversible threshold voltage (Vth) shifts in both p-channel and n-channel organic field-effect transistors (OFETs) using organic semiconductors of pentacene and poly-naphthalene dicarboximide [P(NDI2OD-T2)], respectively. Bottom gate with top drain-source contact structure of both devices exhibited a unipolar property of field-effect transistor behavior. Furthermore, the existence of fullerene (PCBM) and poly(3-hexylthiophene) (P3HT) films as a charge-accepting-like storage layers in p-channel and n-channel devices, respectively, resulted in a reversible Vth shifts upon the application of external gate bias (Vbias). Hence, p-channel OFETs exhibited a memory window of 2.4 V and n-channel OFETs exhibited a memory window of 10.7 V for program and erase electrically upon application of gate bias.
使用电荷受体层的非易失性存储器器件用有机场效应晶体管
我们在栅极电介质上引入电荷接受层,分别研究了P沟道和n沟道有机场效应晶体管(ofet)中使用并五苯和聚萘二氧化亚胺[P(NDI2OD-T2)]有机半导体的可逆阈值电压(Vth)偏移。两种器件的下栅极与上漏源触点结构均表现出场效应晶体管的单极特性。此外,在p沟道和n沟道器件中,富勒烯(PCBM)和聚(3-己基噻吩)(P3HT)薄膜分别作为电荷接受类存储层,在施加外部栅极偏压(Vbias)时导致可逆的Vth偏移。因此,p沟道ofet表现出2.4 V的记忆窗口,n沟道ofet表现出10.7 V的记忆窗口,用于程序和应用栅极偏置时的电擦除。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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