{"title":"Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors","authors":"T. Toriyama, S. Sugiyama","doi":"10.1109/SENSOR.2003.1215584","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1215584","url":null,"abstract":"Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"163 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124574608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Fabrication of high aspect ratio through-wafer vias in CMOS wafers for 3-D packaging applications","authors":"F. E. Rasmussen, J. Frech, M. Heschel, O. Hansen","doi":"10.1109/SENSOR.2003.1217101","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1217101","url":null,"abstract":"A process for fabrication of through-wafer vias in CMOS wafers is presented. The process presented offers simple and well controlled fabrication of through-wafer vias using DRIE formation of wafer through-holes, low temperature deposition of through-hole insulation, doubled sided sputtering of Cr/Au, and electroless deposition of Cu. A novel characteristic of the process is the use of a metal etch stop layer providing perfect control of the etch profile of the wafer through-holes in combination with a remarkably improved etch uniformity across the wafer. Excellent through-hole insulation is provided through the use of a CVD deposited polymer, Parylene C, whereas electroless deposition of Cu ensures even distribution of the via metallization.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114579890","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Simulating nonlinear dynamics and chaos in a MEMS cantilever using poincare mapping","authors":"S. Liu, A. Davidson, Q. Lin","doi":"10.1109/SENSOR.2003.1216959","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1216959","url":null,"abstract":"We have used Poincare mapping to find and characterize nonlinear dynamics and chaos in a periodically forced, electrostatically actuated MEMS cantilever intended for a probe-based data storage chip. The results show significant chaotic regions in the excitation parameter space that would not be found with standard Simulink-type simulations for both open and closed loop control of the cantilever. For one case the stable operation range is reduced by 25% because of a chaotic response. We have also found a region of bi-stability for the closed loop at low gain.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114877893","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Metal to glass anodic bonding for microsystems packaging","authors":"D. Briand, P. Weber, N. D. de Rooij","doi":"10.1109/SENSOR.2003.1217142","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1217142","url":null,"abstract":"In this communication, we report on metal to glass anodic bonding for Microsystems packaging. Bonded Pyrex-Foturan/Metal double stack and Silicon/Pyrex/Metal triple stack were investigated for applications in the sensor encapsulation field. Anodic bonding of metals, sheets of Invar, Kovar, Alloy 42 and Titanium, and thin films of Titanium, to Ion-containing glasses with two different thermal expansion coefficients, Pyrex and Foturan, was evaluated in terms of samples preparation, bonding parameters, and bonding characteristics. Selected metals anodically bonded to glass exhibited levels of residual stress, strength and tightness that make this technique suitable for packaging Microsystems, silicon piezoresistive sensors and micro-fluidic systems, among others.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114623743","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Nanopore transducers: prospects for single molecule electrophoresis","authors":"D. Branton","doi":"10.1109/SENSOR.2003.1215290","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1215290","url":null,"abstract":"In this paper, the prospects for single molecule electrophoresis was investigated. During the electrophoresis of a polymer through a nanopore, the ionic current that can flow through the open pore was blocked.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114968444","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
X.J. Zhang, S. Zappe, R. W. Bernstein, O. Sahin, C.C. Chen, M. Fish, M. Scott, O. Solgaard
{"title":"Integrated optical diffractive micrograting-based injection force sensor","authors":"X.J. Zhang, S. Zappe, R. W. Bernstein, O. Sahin, C.C. Chen, M. Fish, M. Scott, O. Solgaard","doi":"10.1109/SENSOR.2003.1216949","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1216949","url":null,"abstract":"We present a micrograting-based injection force sensor integrated with a surface micromachined silicon-nitride injector. The injector is supported by springs of known spring constant, and the injection force is determined from displacement measurements using a high-resolution, miniaturized optical encoder. The sensor exhibits configurable sensitivity and dynamic range, allowing monitoring over a wide range of forces. The periodicity of the encoder response can be used for calibration and to obtain information about the deformation of the target. We used an injector with a measured spring constant of 1.85 N/m for penetration experiments on Drosophila embryos, and found a penetration force of 52.5/spl plusmn/13.2% /spl mu/N and a membrane displacement of 58/spl plusmn/5.2% /spl mu/m.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114976100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Piezoactuator-integrated monolithic microstage with six degrees of freedom","authors":"Deyuan Zhang, T. Ono, M. Esashi","doi":"10.1109/SENSOR.2003.1217066","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1217066","url":null,"abstract":"In comparison with miniature XY-stage in terms of driving methods: electrostatic, electromagnetic and piezoelectric actuators, the piezoelectric actuators have high area efficiency but no machinability by conventional microfabrication techniques. In this paper we have proposed the novel fabrication method of a double-layered piezo-stack actuator made from a monolithic PZT plate based on a planer fabrication method, and integrated the actuators into a XYZ-stage with six degrees of freedom, i.e., X, Y, X, /spl theta//sub x/, /spl theta//sub y/ and /spl theta//sub z/ directions. The stacked piezoactuators were formed on the both side of the PZT plate. The double stacked-piezoactuators, which are arranged around the stage, can stretch in plane or bend to Z-direction. The fabrication method includes dicing, electroplating, and laser machining. After making grooves by dicing, metal electroplating was performed and buried Ni into the grooves, which was done on both side of the PZT plate. After polishing the surface, metal electrodes were formed on an insulating photosensitive polyimide layer. Finally, the complete structure was defined by laser machining. The test results show that the X direction displacement of the actuation arms was about 2 /spl mu/m when 40 V was applied to both of double-layered piezo-stacked actuators. The Z direction displacement of the actuation beam was about 2 /spl mu/m when 40 V was only applied to one stacked actuator. These results show the possibility of the microstage with six degrees of freedom.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117048054","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Diamond AFM probe with piezoelectric sensor and actuator","authors":"T. Shibata, K. Unno, E. Makino","doi":"10.1109/SENSOR.2003.1215363","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1215363","url":null,"abstract":"In order to develop a diamond AFM probe with a piezoelectric sensor and actuator, we fabricated lead zirconate titanate (PZT) thin film on a diamond thin film substrate and examined its piezoelectric properties. The PZT thin film was sputtered at room temperature and then annealed in a nitrogen (N/sub 2/) ambient to obtain a perovskite structure. On diamond thin film substrates, the value of piezoelectric constant, d/sub 31/, was as low as about -20 pC/N due to rough surface of the diamond film. After a poling treatment, however, its piezoelectric constant improved to about -65 pC/N. For realization of a PZT sensor and actuator on a diamond cantilever, the PZT thin film was also successfully patterned by reactive ion etching (RIE) in SF/sub 6/ plasma using a Pt upper electrode layer as an etching mask without any damage on a diamond layer. Based on the fabrication and patterning of PZT thin film together with microfabrication techniques of CVD diamond film, we demonstrate the diamond AFM probe of 150 /spl mu/m in length, 50 /spl mu/m in width and 5 /spl mu/m in thickness with a PZT sensor and actuator of 1 /spl mu/m in thickness. The resolution of image sensing and actuation force were estimated to be about 0.4 nm at a resolution of charge measurement of 1/spl times/10/sup -15/ C and 12 /spl mu/N at an applied voltage of 8 V, respectively.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117339391","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Finite element analysis of the thermal characteristics of MEMS switches","authors":"Xinxin Yan, N. McGruer, G. G. Adams, S. Majumder","doi":"10.1109/SENSOR.2003.1215341","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1215341","url":null,"abstract":"Electrostatically actuated microswitches and relays have been developed at Northeastern University and Analog Devices, Inc. Here, we report a steady-state thermal-electrical finite element model of microswitches with gold-gold contacts. The modeling results show that in a microswitch with a typical geometry, the thermal constriction occurs in the thin film trace leading up to the contact, and not at the contact interface. The model correctly predicts the switch voltage at which the drain trace melts, but underestimates the switch resistance, and therefore overestimates the failure current. SEM images indicate that the contact area increases significantly with current.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"60 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115998605","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Philippe Robert, Daniel Saias, C. Billard, S. Boret, N. Sillon, Catherine Maeder-Pachurka, P. L. Charvet, Guillaume Bouche, Pascal Ancey, P. Berruyer
{"title":"Integrated RF-MEMS switch based on a combination of thermal and electrostatic actuation","authors":"Philippe Robert, Daniel Saias, C. Billard, S. Boret, N. Sillon, Catherine Maeder-Pachurka, P. L. Charvet, Guillaume Bouche, Pascal Ancey, P. Berruyer","doi":"10.1109/SENSOR.2003.1217115","DOIUrl":"https://doi.org/10.1109/SENSOR.2003.1217115","url":null,"abstract":"We have demonstrated the feasibility of a fully integrated RF microswitch. It is based on a combination of thermal actuation and electrostatic latching hold. This method enables to combine the advantages of both actuation modes : the low voltage power supply and high reliability of the thermal actuation, and the low power consumption of the electrostatic latching. An analytical model was developed in order to predict the shape of the beam versus the temperature. An algorithm was also developed in order to evaluate the damping behavior of the switch taking the beam shape deflection into account. A design composed of a 400/spl times/50 /spl mu/m silicon nitride clamped beam was selected. The beam includes titanium nitride heating resistors, and aluminum blocks for bimorph actuation. The RF lines and the contacts are made of a 1 /spl mu/m thick gold layer. The 3 /spl mu/m air gap is fabricated using a polymer sacrificial layer. The driver of the switch, for the thermal actuation and the electrostatic latching, was manufactured in a 0.25 /spl mu/m BiCMOS technology. For each activation, the switch requires a 20 mA current under 2 V during /spl sim/200 /spl mu/s. For the electrostatic hold, the MEMS was designed for less than 10 volts. Due to residual stress in the beam material, a 5 V shift of the hold voltage has been experimentally observed on first prototypes. Reliability of thermal actuation has been tested with more than 10/sup 9/ cycles without any failure or contact degradation. Very interesting RF performances were measured, even with standard wafer (15/spl Omega/.cm) : -57 dB isolation and 0.18 dB insertion loss at 2 GHz.","PeriodicalId":196104,"journal":{"name":"TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123213154","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}