Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors

T. Toriyama, S. Sugiyama
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引用次数: 6

Abstract

Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.
高温机械传感器用n型6H SiC压阻分析
基于六方多谷半导体的电子转移和迁移率转移机理,分析了n型6H碳化硅的压阻。利用带参数计算了压阻式传感器应用中的纵向、横向和剪切三个重要的测量因子。计算结果与文献中的实验结果进行了比较。结果表明,在300 ~ 523 K温度范围内,杂质浓度为n=3.3/spl次/10/sup 19/ cm/sup -3时,结合电子转移和迁移率转移机制可以合理解释n型6H SiC的压阻。/这些条件对应于高温压阻传感器的典型工作范围。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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