2023 IEEE Latin American Electron Devices Conference (LAEDC)最新文献

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Long-Term Potentiation and Depression with Vertically Stacked Nanosheet FET 垂直堆叠纳米片场效应管的长期增强和抑制
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209120
Nupur Navlakha, Md. Hasan Raza Ansari
{"title":"Long-Term Potentiation and Depression with Vertically Stacked Nanosheet FET","authors":"Nupur Navlakha, Md. Hasan Raza Ansari","doi":"10.1109/LAEDC58183.2023.10209120","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209120","url":null,"abstract":"This work showcases the feasibility of vertically stacked nanosheet FET (NSFET) for charge trapping-based synapse for neuromorphic applications. The calibrated simulation models mimic the long-term potentiation (LTP) and depression (LTD) of biological synapses. Use of stacked nanosheet device facilitates a dense memory with high current. The work also evaluates the effect of number of pulses for LTP and LTD on the image classification accuracy of the MNIST dataset. The neural network results show high linearity, conductance, and symmetric behavior between LTP and LTD that aids achieves $sim94.75$ % accuracy in image classification.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126710726","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multi-level Operation in Ultra-scaled MRAM 超大规模MRAM的多级运行
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209117
V. Sverdlov, M. Bendra, W. Goes, S. Fiorentini, A. García-Barrientos, S. Selberherr
{"title":"Multi-level Operation in Ultra-scaled MRAM","authors":"V. Sverdlov, M. Bendra, W. Goes, S. Fiorentini, A. García-Barrientos, S. Selberherr","doi":"10.1109/LAEDC58183.2023.10209117","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209117","url":null,"abstract":"Magnetoresistive random access memory (MRAM) prototypes demonstrate fast operation and are suitable for the last level caches. MRAM possesses high endurance, long retention, and requires less masks for fabrication than its competitor flash memory. MRAM is nonvolatile and scalable. Strong perpendicular magnetic anisotropy in most advanced single-digit nanoscale footprint devices is enhanced by elongating the magnetic layers. To facilitate the switching and to increase the interface-induced magnetic anisotropy even further, the free magnetic layers are made of several elongated pieces separated by tunnel barriers with multiple interfaces. To properly model such devices, accurate evaluation of the spin-transfer torques is required. The interfacial and bulk-torques are not independent, and the use of a spin-charge transport approach coupled to the magnetization dynamics allowing to treat the torques on equal footing in magnetic tunnel junctions with elongated layers becomes mandatory. By employing this advanced modeling approach a multi-level memory operation in an ultra-scaled MRAM cell with a composite free layer is demonstrated.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"113 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121528670","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Device parameters estimation of GFETs at temperatures below 300 K 温度低于300k时gfet器件参数的估计
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209110
Leslie M. Valdez-Sandoval, E. Ramírez-García, N. Mavredakis, D. Jiménez, A. Pacheco-Sánchez
{"title":"Device parameters estimation of GFETs at temperatures below 300 K","authors":"Leslie M. Valdez-Sandoval, E. Ramírez-García, N. Mavredakis, D. Jiménez, A. Pacheco-Sánchez","doi":"10.1109/LAEDC58183.2023.10209110","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209110","url":null,"abstract":"Low-temperature performance of four different graphene field-effect transistor (GFET) technologies previously reported in the literature is studied here by means of device transport parameters such as the intrinsic and extrinsic mobility degradation coefficients and the contact resistance. Model-based extraction methodologies are used for obtaining the parameter values. A mobility degradation-based transport model describes accurately the experimental ambipolar I-V data of devices with different gate lengths and at temperatures below 300 K with the extracted parameters. The temperature dependence of both the low-field and effective mobility, calculated based on the validated parameters, enables to obtain an insight on relevant scattering mechanisms at different device conditions, e.g., temperature and bias. From the extracted data it is suggested that, below a certain threshold temperature, the extrinsic mobility degradation improves, i.e., the gate control over the channel, for devices with low scattering mechanisms at room temperature than the ones with significant values of mobility degradation at 300 K.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"72 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125086558","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thermal Evaluation of 28-nm p-type FD-SOI MOSFETs 28nm p型FD-SOI mosfet的热评价
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209116
A. Rossetto, Caroline S. Soares, G. Wirth, M. Pavanello, Ziyi Wang, D. Vasileska
{"title":"Thermal Evaluation of 28-nm p-type FD-SOI MOSFETs","authors":"A. Rossetto, Caroline S. Soares, G. Wirth, M. Pavanello, Ziyi Wang, D. Vasileska","doi":"10.1109/LAEDC58183.2023.10209116","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209116","url":null,"abstract":"With the advent of quantum computing, MOSFET operation in cryogenic environments is of particular interest. Moreover, the full understanding of the thermal dynamic under these circumstances is key for proper modeling and design of circuits for low-temperature applications. In this work we present the partial results for the ongoing investigation of self-heating effects in 28-nm p-type FD-SOI devices aiming cryogenic operation. The simulation framework proved to deliver consistent results for room temperature data, and it is being extended to incorporate ultra-low temperature capabilities.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132184264","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of a Biosensor for the Detection of Glucose Levels in Saliva Based on the Oxidation and Detection of Hydrogen Peroxide 基于过氧化氢氧化和检测唾液中葡萄糖水平的生物传感器的研制
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209133
Fernando Sánchez-Hernández, E. Martínez-Guerrero, E. Araujo-Palomo, Cuauhtémoc R. Aguilera-Galicia, J. Chávez-Hurtado, P. G. López-Cárdenas, Jaime Ramírez-Angulo
{"title":"Development of a Biosensor for the Detection of Glucose Levels in Saliva Based on the Oxidation and Detection of Hydrogen Peroxide","authors":"Fernando Sánchez-Hernández, E. Martínez-Guerrero, E. Araujo-Palomo, Cuauhtémoc R. Aguilera-Galicia, J. Chávez-Hurtado, P. G. López-Cárdenas, Jaime Ramírez-Angulo","doi":"10.1109/LAEDC58183.2023.10209133","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209133","url":null,"abstract":"This work presents the experimental results of cyclic voltammetry tests that correlate an electric current and the concentration of hydrogen peroxide within a controlled solution. As the concentration of hydrogen peroxide increases in the managed solution, so does the electric intensity. The goal of this data allows us to corroborate that the proposed biosensor is a reproducible and potential alternative, painless, and non-invasive method for monitoring glucose levels in patients who have diabetes. The transducer is a novel Ni Polycarbonate Track Etch nanowire sensor with a high sensitivity to detect low hydrogen peroxide in human fluids.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"126 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134538320","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Perylenediimide-based Acceptors for OPV Applications OPV应用中基于苝酰亚胺的受体
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209118
M. Ramírez-Como, Desiré Molina, M. Estrada, L. Reséndiz, J. Pallarès, Á. Sastre‐Santos, L. Marsal
{"title":"Perylenediimide-based Acceptors for OPV Applications","authors":"M. Ramírez-Como, Desiré Molina, M. Estrada, L. Reséndiz, J. Pallarès, Á. Sastre‐Santos, L. Marsal","doi":"10.1109/LAEDC58183.2023.10209118","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209118","url":null,"abstract":"Four new perylenediimides (PDIs) have been used as non-fullerene (NF) acceptors in solution-processed bulk heterojunction organic solar cells (OSC). Photovoltaic devices were fabricated using PTB7-Th as donor material. We investigated the effect of solvent vapor annealing (SVA) and thermal annealing on the performance of the fabricated inverted NF-OSCs. We found that solvent vapor annealing and thermal annealing of the active layer reduced the current density and therefore did not improve the performance of the fabricated solar cells. The highest performing cells are achieved using PTB7-Th:PDI-3 as an active blend with ZnO as the electron transport layer and $mathrm{M}mathrm{o}mathrm{O}_{3}$ as the hole transport layer. Most solar cells based in PDIs produced open circuit voltages in the same range as those typical solar cells made from PC70.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132752813","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Precession motion of a CanSat Rover-Back prototype during its fall-to-earth descent 坎萨特漫游者- back原型机在落地过程中的岁差运动
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209111
Luis Aiquipa Moreno, Roxana Pastrana Alta, Walter Estrada Lopez
{"title":"Precession motion of a CanSat Rover-Back prototype during its fall-to-earth descent","authors":"Luis Aiquipa Moreno, Roxana Pastrana Alta, Walter Estrada Lopez","doi":"10.1109/LAEDC58183.2023.10209111","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209111","url":null,"abstract":"This work presents the generation of the precession motion of a CanSat Rover-Back educational picosatellite falling to earth for future space exploration missions using the conventional design of reaction wheels, together with the basic concepts of electronics, mechanics, physical sciences and mathematics, being a technological innovation (STEM). For the modeling and operating parameters, are presented mainly the mass, the distance difference between the point where the structure hangs or pivots and the center of mass, the control of the angular velocity in the motors performing a change of direction of rotation. The results show the generation of a sinusoidal signal of the precession speed in revolutions per minute (RPM) of the prototype, demonstrating its validity, and the variation of its speeds in RPM of the two motors.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127349423","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Increasing the doping efficiency by post-deposition annealing in a-SiGe: H films synthesized by PECVD PECVD制备的a-SiGe: H薄膜沉积后退火提高掺杂效率
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209126
Ernesto Franco, A. Torres, M. Moreno
{"title":"Increasing the doping efficiency by post-deposition annealing in a-SiGe: H films synthesized by PECVD","authors":"Ernesto Franco, A. Torres, M. Moreno","doi":"10.1109/LAEDC58183.2023.10209126","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209126","url":null,"abstract":"An acceptable thermoelectric efficiency is related to a figure of merit ZT $geq 1$, its value increases with a high value of Seebeck coefficient and electrical conductivity, and with a low thermal conductivity. The amorphous SiGe:H has a high Seebeck coefficient and low thermal conductivity, the only thing that they need to become a good thermoelectric material is a high electrical conductivity, for this reason the present work demonstrates the increase of the electrical conductivity of highly doped films of a- SiGe:H types P and N by annealing. The highest electrical conductivity value of the films was found in 4% of doping in gas phase. The P and N type samples were doped in the range from 4% to 16% with Boron and Phosphorus. After thermal treatment, both had an increase in their electrical conductivity value of three and two order of magnitude respectively. Also, the explanation of the activation mechanism of both impurities is given.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130221701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
“Accelerating Engineering Education and Workforce Development in Automation & Control for the Semiconductor Industry Based on Cognitive Neuroscience” “基于认知神经科学的半导体工业自动化控制工程教育与劳动力发展”
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209137
L. Cruz, Luis Miguel Quevedo, Wilfrido Alejandro, Moreno
{"title":"“Accelerating Engineering Education and Workforce Development in Automation & Control for the Semiconductor Industry Based on Cognitive Neuroscience”","authors":"L. Cruz, Luis Miguel Quevedo, Wilfrido Alejandro, Moreno","doi":"10.1109/LAEDC58183.2023.10209137","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209137","url":null,"abstract":"The rapid development of the semiconductor industry represents a global challenge to meet the needs of Science, Technology, and Innovation in the 21st century. Advancements in semiconductors optimize computer technology with innovations, among others, in nanotechnology, quantum technology, cognitive computing, Cyber-Physical Human Systems, Artificial Intelligence, and Robotics. The rapid development of semiconductors demands an imperative acceleration of training and the development of a highly skilled workforce. There is a gap between the knowledge and skills of students in the current education system and the fast development of new knowledge. To accelerate comprehensive training in the semiconductor workforce we must start at an early stage, this paper proposes that STEM education must be pedagogically grounded in the advances of cognitive neuroscience and learning. By understanding how the brain functions and how it learns, the process can be enhanced, the education of an Integral Engineer needs to be addressed by forming professionals equipped with adaptability, complex problem-solving, assertive communication, emotional intelligence, interdisciplinary teamwork skills, systems, analytical and critical thinking.This paper proposes curricular transformation processes, ethical formation, pedagogical foundations of interdisciplinary research laboratories, enhanced by an international network of remote laboratories, and a TRUE system of cultural transformation.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126764896","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimization of the electrical conductivity and thermal coefficient of temperature (TCR) on hydrogenated amorphous silicon-germanium films doped with nitrogen (a-SiGe:H,N) for applications on high performance infrared detectors 优化掺氮(a-SiGe:H,N)氢化非晶硅锗薄膜的电导率和温度热系数(TCR),用于高性能红外探测器
2023 IEEE Latin American Electron Devices Conference (LAEDC) Pub Date : 2023-07-03 DOI: 10.1109/LAEDC58183.2023.10209128
Oscar Velandia, M. Moreno, Ricardo Zavala, A. Morales, A. Torres, Luis Hernández
{"title":"Optimization of the electrical conductivity and thermal coefficient of temperature (TCR) on hydrogenated amorphous silicon-germanium films doped with nitrogen (a-SiGe:H,N) for applications on high performance infrared detectors","authors":"Oscar Velandia, M. Moreno, Ricardo Zavala, A. Morales, A. Torres, Luis Hernández","doi":"10.1109/LAEDC58183.2023.10209128","DOIUrl":"https://doi.org/10.1109/LAEDC58183.2023.10209128","url":null,"abstract":"Uncooled microbolometers are infrared detectors used for imaging applications in the long-wave IR spectra, made of semiconductor materials, such as vanadium oxide (VOx), boron doped amorphous silicon (a-Si:H,B) or amorphous silicon germanium (a-SiGe:H), the last two are usually deposited by plasma-enhanced chemical vapor deposition (PECVD). When infrared radiation falls on the thermos-sensor films, they experience changes in their electrical resistance, generating an electrical signal proportional to the amount of incident radiation. In this work, we optimized the absorption of infrared radiation in the long-wave IR range (8-14 um) with amorphous silicon germanium films doped with nitrogen (a-SiGe:H,N). Several flow rates of nitrogen N2) and different $mathrm{S}mathrm{i}mathrm{H}_{4}$ and $mathrm{G}mathrm{e}mathrm{H}_{4}$ flow rate ratios have been used for the deposition of two a-SiGe:H,N film series. We have characterized the films electrical and optically, and we have studied the electrical conductivity at room temperature $(sigma_{RT})$, which is in the range of (1.2E-8 to 6.45E-2) $(Omega.mathrm{c}mathrm{m})^{-1}$ and the Temperature Coefficient of Resistance (TCR), which is in the range (2.67 to 6.23) (%/K). Those $sigma_{RT}$ and TCR values of the a-SiGe:H,N films are very attractive for being used in high performance infrared detectors.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131589317","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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