温度低于300k时gfet器件参数的估计

Leslie M. Valdez-Sandoval, E. Ramírez-García, N. Mavredakis, D. Jiménez, A. Pacheco-Sánchez
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摘要

本文通过器件传输参数(如内在和外在迁移率退化系数和接触电阻)研究了先前文献中报道的四种不同的石墨烯场效应晶体管(GFET)技术的低温性能。采用基于模型的提取方法获取参数值。基于迁移率退化的输运模型准确地描述了不同栅极长度和低于300 K温度下器件的实验双极性I-V数据。基于验证参数计算的低场和有效迁移率的温度依赖关系,使我们能够深入了解不同器件条件下的相关散射机制,例如温度和偏置。从提取的数据可以看出,在一定的阈值温度下,在室温下具有低散射机制的器件的外在迁移率退化,即通道上的栅极控制,比在300 K时具有显著迁移率退化的器件有所改善。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Device parameters estimation of GFETs at temperatures below 300 K
Low-temperature performance of four different graphene field-effect transistor (GFET) technologies previously reported in the literature is studied here by means of device transport parameters such as the intrinsic and extrinsic mobility degradation coefficients and the contact resistance. Model-based extraction methodologies are used for obtaining the parameter values. A mobility degradation-based transport model describes accurately the experimental ambipolar I-V data of devices with different gate lengths and at temperatures below 300 K with the extracted parameters. The temperature dependence of both the low-field and effective mobility, calculated based on the validated parameters, enables to obtain an insight on relevant scattering mechanisms at different device conditions, e.g., temperature and bias. From the extracted data it is suggested that, below a certain threshold temperature, the extrinsic mobility degradation improves, i.e., the gate control over the channel, for devices with low scattering mechanisms at room temperature than the ones with significant values of mobility degradation at 300 K.
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