{"title":"Flexible fishnet metamaterial on PDMS substrate for THz frequencies","authors":"I. Khodasevych, C. Shah, W. Rowe, A. Mitchell","doi":"10.1109/COMMAD.2010.5699760","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699760","url":null,"abstract":"We present the design of a flexible fishnet metamaterial on a PDMS substrate operating at terahertz (THz) frequencies. The low-cost, flexibility and low-surface energy of PDMS enables a range of possible sensing applications.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122258748","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Martyniuk, G. Umana-Membreno, R. Sewell, R. Westerhout, C. Musca, J. Dell, J. Antoszewski, L. Faraone, D. Macintyre, S. Thoms, C. Ironside
{"title":"Nanoimprint induced electrical type conversion in HgCdTe","authors":"M. Martyniuk, G. Umana-Membreno, R. Sewell, R. Westerhout, C. Musca, J. Dell, J. Antoszewski, L. Faraone, D. Macintyre, S. Thoms, C. Ironside","doi":"10.1109/COMMAD.2010.5699723","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699723","url":null,"abstract":"We report supporting evidence that is consistent with p- to n-type conversion of HgCdTe that is induced by surface indentation, as the progress towards the fabrication of photovoltaic infrared detectors by direct imprinting.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"61 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120933118","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Design of GaN-based light-emitting diodes with enhanced lateral light extraction","authors":"Hyunsoo Kim, Seongjun Kim, Youngjun Park","doi":"10.1109/COMMAD.2010.5699780","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699780","url":null,"abstract":"We have investigated enhanced light extraction of GaN-based light-emitting diodes (LEDs) by design of mesa-holes.1 Based on Snell's law, the geometry of mesa-holes acting as lateral exits for guided mode could be optimized. The LED fabricated with mesa-holes showed a 27% enhancement in output power as compared to reference LED, which was in agreement with optical ray-tracing calculations.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129533487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Fabrication of low loss Chalcogenide glass waveguide via thermal nanoimprint lithography","authors":"T. Han, S. Madden, D. Bulla, B. Luther-Davies","doi":"10.1109/COMMAD.2010.5699775","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699775","url":null,"abstract":"We report the fabrication of Chalcogenide glass rib waveguides by thermal nano-imprint. Waveguides 2–4µm wide and 1µm high were fabricated with optical losses of 0.26dB/cm and 0.27dB/cm for TM and TE polarizations at 1550nm.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134279047","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Burke, R. Akis, T. Day, G. Speyer, B. R. Bennett, D. Ferry
{"title":"Imaging periodic scarred states in InAs open quantum dots: Evidence of quantum darwinism","authors":"A. Burke, R. Akis, T. Day, G. Speyer, B. R. Bennett, D. Ferry","doi":"10.1109/COMMAD.2010.5699681","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699681","url":null,"abstract":"Scanning gate microscopy (SGM) is used to image scar structures in an InAs open quantum dot, which is defined via electron beam lithography and wet etching. Periodicities in magnetic field are found within the scanned images and correlate to those observed in the conductance fluctuations. Simulations have shown that these magnetic transform images show striking resemblance to actual scars found in the dot that replicate through the conductance modes in direct agreement with the theory of quantum Darwinism.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"136 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127354743","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Chen, O. Klochan, A. Micolich, A. Hamilton, K. Das Gupta, F. Sfigakis, D. Ritchie, K. Trunov, D. Reuter, A. Wieck
{"title":"Fabrication and characterisation of an induced ambipolar device on AlGaAs/GaAs Heterostructures","authors":"J. Chen, O. Klochan, A. Micolich, A. Hamilton, K. Das Gupta, F. Sfigakis, D. Ritchie, K. Trunov, D. Reuter, A. Wieck","doi":"10.1109/COMMAD.2010.5699713","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699713","url":null,"abstract":"In this study a metal-insulator semiconductor field effect transistor (MISFET) was fabricated on an undoped (100)-oriented AlGaAs/GaAs heterostructure. This device has the ability to switch the charge carriers in the conduction channel between electrons and holes by switching the sign of the applied top gate voltage. The device was characterised at 0.3K and electron/hole transport measurements were conducted. In the future these devices could potentially be used as lateral p-i-n junctions for fabrication of low dimensional electroluminescent devices.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131576924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Wang, J. Yuan, P. J. van Veldhoven, P. N. T. de Vries, E. Smalbrugge, E. J. Geluk, R. Notzel
{"title":"Formation of site-controlled InAs/InP quantum dots and their integration into planar structures","authors":"H. Wang, J. Yuan, P. J. van Veldhoven, P. N. T. de Vries, E. Smalbrugge, E. J. Geluk, R. Notzel","doi":"10.1109/COMMAD.2010.5699798","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699798","url":null,"abstract":"We report the formation of site-controlled InAs quantum dots (QDs) on InP pyramids and their integration into planar structures by metalorganic vapor-phase epitaxy. The QD number is reduced by the shrinking pyramid size during growth. Finally the emission from a single QD is observed at 1.55 µm, after optimization of the growth parameters. Employing regrowth epitaxy, position-controlled InAs QDs are integrated into planar InP structures. A smooth surface morphology is obtained at 640 °C during regrowth.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121642672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Minovich, J. Farnell, D. Neshev, D. Powell, I. Shadrivov, I. Mckerracher, H. Tan, C. Jagadish, Y. Kivshar
{"title":"Infrared metamaterials tuned by liquid crystals","authors":"A. Minovich, J. Farnell, D. Neshev, D. Powell, I. Shadrivov, I. Mckerracher, H. Tan, C. Jagadish, Y. Kivshar","doi":"10.1109/COMMAD.2010.5699761","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699761","url":null,"abstract":"We demonstrate the tunability of a left-handed fishnet metamaterial at near infra-red frequencies. The structure is infiltrated by a liquid crystal and the tunability is achieved due the reorientation of liquid crystal molecules.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124346108","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Chemical control of gate length in lateral wrap-gated InAs nanowire FETs","authors":"A. Micolich, K. Storm, L. Samuelson","doi":"10.1109/COMMAD.2010.5699726","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699726","url":null,"abstract":"We present a method for attaining chemical control of the gate-length in wrap-gated InAs nanowire transistors where the nanowire is oriented horizontally rather than vertically. A key advantage of this method is its simplicity - precise gate-length control is established with a single wet etch step, and beyond the definition of the source, drain and gate leads, no further lithography is required. The method provides an effective route to producing a wrap-gate that covers the full range from just less than the source-drain contact separation to wrap-gates as small as 300 nm in length.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121036139","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Baharin, R. Pinto, U. Mishra, B. Nener, G. Parish
{"title":"Effect of very low power inductively coupled plasma etching on ohmic contacts to p-GaN","authors":"A. Baharin, R. Pinto, U. Mishra, B. Nener, G. Parish","doi":"10.1109/COMMAD.2010.5699708","DOIUrl":"https://doi.org/10.1109/COMMAD.2010.5699708","url":null,"abstract":"We report on the electrical characterisation of etched Mg-doped p-GaN layers using low power inductively coupled plasma reactive ion etching (ICP-RIE). Although the quality of ohmic contacts to p-GaN is generally degraded by plasma etching, the results, assessed by current-voltage characteristics and Transmission Line Model (TLM) analysis, indicate that the ohmic contacts improve significantly as the power is reduced from ICP/RF power of 150/75 W to very low ICP/RF power of 40/20 W.","PeriodicalId":129653,"journal":{"name":"2010 Conference on Optoelectronic and Microelectronic Materials and Devices","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116191634","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}