Advanced Materials Interfaces最新文献_第5页

Stimuli-Responsive Nanocarriers as Active Enhancers of Antitumoral Immunotherapy 作为抗肿瘤免疫疗法活性增强剂的刺激响应型纳米载体

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-10 DOI: 10.1002/admi.202400343

Jorge Parra-Nieto, Iñigo Aguirre de Carcer, María Amor García del Cid, Sandra Jimenez-Falcao, Javier Gónzalez-Larre, Alejandro Baeza

引用次数: 0

Effect of Nanoscale Surface Modification on the Interfacial Mechanics of Carbon Fibers 纳米级表面改性对碳纤维界面力学的影响

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400092

Sriraj Srihari, Rahul Sathyanath, Sreeram K. Kalpathy, Marwan Al-Haik, Sirish Namilae

{"title":"Effect of Nanoscale Surface Modification on the Interfacial Mechanics of Carbon Fibers","authors":"Sriraj Srihari, Rahul Sathyanath, Sreeram K. Kalpathy, Marwan Al-Haik, Sirish Namilae","doi":"10.1002/admi.202400092","DOIUrl":"10.1002/admi.202400092","url":null,"abstract":"Enhancing fiber surfaces through in situ growth of nanomaterials is known to improve fiber composite properties by enhancing the interface between the fiber and matrix. In this study, hydrothermal processes are used to achieve two types of interfacial modification for carbon fiber: zinc oxide nanowires (ZnO NWs) and nickel-based metal–organic frameworks (MOF). The interfacial strengths are evaluated using single fiber push-in tests via nanoindentation and the interfaces are analyzed through dynamic modulus-mapping. It is found that ZnO modification increases the interface strength by 9.40%, while MOF modification yields an even higher improvement of 16.34%. The load-displacement plots exhibit distinctive inflection points, elucidated through microstructural observations. Examining the modulus map of the interface region, a transition in the storage modulus from the fiber to the matrix is identified. A capillary flow-based model is developed to explain the resin penetration through nanoscale features. The findings reported here indicate that the timescale for resin absorption is significantly shorter than the curing timescales for the surface modifications explored in this study.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 29","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400092","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142202912","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhancing Photoswitchable Wetting Properties of Hydrophobic Porous Spiropyran Copolymer Surfaces Through Surface Roughness Engineering 通过表面粗糙度工程增强疏水性多孔螺吡喃共聚物表面的光电开关润湿特性

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400396

Niloofar Nekoonam, Franziska Dreher, Fadoua Mayoussi, Pang Zhu, Ralf Thomann, Ramin Montazeri, Sagar Bhagwat, Leonhard Hambitzer, Dorothea Helmer

{"title":"Enhancing Photoswitchable Wetting Properties of Hydrophobic Porous Spiropyran Copolymer Surfaces Through Surface Roughness Engineering","authors":"Niloofar Nekoonam, Franziska Dreher, Fadoua Mayoussi, Pang Zhu, Ralf Thomann, Ramin Montazeri, Sagar Bhagwat, Leonhard Hambitzer, Dorothea Helmer","doi":"10.1002/admi.202400396","DOIUrl":"https://doi.org/10.1002/admi.202400396","url":null,"abstract":"Surfaces with photoswitchable wettability are of great interest for various applications such as smart coatings or liquid condensation. The photochromic ring opening reaction of spiropyran (SP) to merocyanine (MC) implies a high dipole moment change, making it interesting for photo‐controlled wetting properties. In addition to the material chemistry, surface wettability is influenced by the surface topography. Porous SP copolymers with various micro‐/nanostructures, that is, different submicron roughness, are fabricated via polymerization‐induced phase separation. The influence of the surface topography on the photoswitchable wetting properties is studied. Surfaces with arithmetic mean roughness (Sa) below 150 nm exhibited a maximum static contact angle (SCA) photoswitch up to 16° from 124 ± 6° to 108 ± 4° upon UV exposure. While superhydrophobic surfaces with higher Sa (157 – 608 nm) showed an insignificant SCA switch. The latter surfaces have a SCA above 150° and low CA hysteresis indicating small and insufficient contact with SP/MC surface asperities for the switch. With the optimized surfaces, photo‐controlled water condensation is studied on microscale and showed that the condensate droplets merged faster, and formed larger droplets pinned to the original contact lines on surfaces switched to the less hydrophobic state.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"3 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226111","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Responsive Soft Interface Liquid Crystal Microfluidics 响应式软界面液晶微流控技术

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400334

Ayşe Nurcan Özşahin, Emre Bukusoglu

{"title":"Responsive Soft Interface Liquid Crystal Microfluidics","authors":"Ayşe Nurcan Özşahin, Emre Bukusoglu","doi":"10.1002/admi.202400334","DOIUrl":"10.1002/admi.202400334","url":null,"abstract":"The multifunctional responsive interfaces of liquid crystal (LC) and water are employed in fundamental research (colloidal assembly) and promising applications (sensing, release, and material synthesis). The stagnant LC systems, however, limit their use in continuous, automated applications. A microfluidic platform is reported where stable LC flow is maintained between aqueous interfaces. The LC-water soft interface is defined by the preferential wetting of the two phases at the chemically heterogeneous microchannel interfaces. It is shown that the LC-water interfaces are stable up to significant pressure differences across the interfaces and maintain responsive characteristics. The stability is in a range to cover the perpendicular and flow-aligned regimes at low and high flow velocities, respectively, in co-current or counter-current flow configurations. The LC configuration at the vicinity of the aqueous interfaces is influenced by the shear induced by the bulk LC flow and by the contacting aqueous phases allowing modulation of the LC strain at the responsive interfaces. The simplicity of the construction and operation of the soft-interface LC flow platform shows promise and meets the fundamental requirements for their integration into next-generation autonomous platforms.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 29","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400334","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142202915","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Importance of Electrostatic Effects for Interpretation of X‐ray Photoemission Spectra of Self‐Assembled Monolayers 静电效应对解读自组装单层膜 X 射线光发射光谱的重要性

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400595

Michael Zharnikov

{"title":"Importance of Electrostatic Effects for Interpretation of X‐ray Photoemission Spectra of Self‐Assembled Monolayers","authors":"Michael Zharnikov","doi":"10.1002/admi.202400595","DOIUrl":"https://doi.org/10.1002/admi.202400595","url":null,"abstract":"This paper reviews the relevant work regarding electrostatic effects in X‐ray photoemission from self‐assembled monolayers (SAMs) which are application‐relevant ultrathin molecular films, coupled over a suitable anchoring group to the substrate. Whereas, in most cases, the standard concept of chemical shift is fully sufficient to describe X‐ray photoelectron spectra of these systems, consideration of electrostatic effects is frequently necessary for their proper interpretation. Due to the insulator character of the SAM matrix, decoupled electronically from the substrate, the introduction of a dipolar ´sheet´ at the SAM‐substrate interface or within this matrix creates a potential discontinuity shifting the energy levels above the ´sheet´ with respect to those below it. This shift is reflected then in the matrix‐related spectra, resulting in shifts and splitting of the characteristic photoemission peaks. Several representative examples in this context are provided and discussed in detail. These examples and other relevant literature data underline the importance of electrostatic effects in photoemission and suggest that they should be considered on the equal footing as the chemical shift ones.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"7 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226112","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Plasma Polymerization of Vegetable Oils onto Paper Substrates of Varying Porosity for Improved Hydrophobicity 将植物油等离子聚合到不同孔隙率的纸基材上以提高疏水性

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400507

Amelia Loesch‐Zhang, Martin Bellmann, Kristina Lachmann, Markus Biesalski, Andreas Geissler

{"title":"Plasma Polymerization of Vegetable Oils onto Paper Substrates of Varying Porosity for Improved Hydrophobicity","authors":"Amelia Loesch‐Zhang, Martin Bellmann, Kristina Lachmann, Markus Biesalski, Andreas Geissler","doi":"10.1002/admi.202400507","DOIUrl":"https://doi.org/10.1002/admi.202400507","url":null,"abstract":"Paper finishing, in particular, coating paper with desired barrier functions is well‐developed as of today. However, due to large amounts of material and process energy as well as the use of non‐renewable resources for such coatings, common technologies are not sustainable. Given the increasing importance of paper in manifold applications, more sustainable routes with low‐energy processes as well as biogenic material alternatives are highly needed. To address this challenge, a solvent‐free and material‐efficient approach is proposed to bio‐based paper coatings by depositing chia oil‐based plasma polymers using a jet‐induced sliding discharge concept at atmospheric pressure. Depending on the amount of coating and the paper porosity, this treatment retards water absorption. Coating visualization is enabled through confocal laser scanning microscopy (CLSM) and scanning electron microscopy (SEM). Like chia oil, safflower oil, and olive oil show the ability to hydrophobize paper and the great potential within plasma polymerized vegetable oils to make the paper coating more sustainable.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"20 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142202910","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Omniphobic Photoresist‐Assisted Patterning of Porous Polymethacrylate Films 多孔聚甲基丙烯酸酯薄膜的全疏性光阻辅助图案化

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-09 DOI: 10.1002/admi.202400569

Dmitrii D. Kartsev, Ilia M. Lukianov, Eduard G. Sharapenkov, Artur Yu. Prilepskii, Pavel A. Levkin

{"title":"Omniphobic Photoresist‐Assisted Patterning of Porous Polymethacrylate Films","authors":"Dmitrii D. Kartsev, Ilia M. Lukianov, Eduard G. Sharapenkov, Artur Yu. Prilepskii, Pavel A. Levkin","doi":"10.1002/admi.202400569","DOIUrl":"https://doi.org/10.1002/admi.202400569","url":null,"abstract":"Patterning of various surface properties, including roughness, wettability, adhesiveness, and mechanical properties, can markedly enhance the functionality of test systems. Thus, porous polymethacrylates prepared by polymerization‐induced phase separation (PIPS) represent a promising class of functional materials for the construction of miniaturized test systems. Different porosity, surface chemistry, and wettability are achieved in porous polymethacrylates with different precursor compositions. Nevertheless, only wettability microstructuring has been highlighted for these materials thus far. Here, the study presents a novel method for the direct and selective deposition of porous polymethacrylate films with different surface chemistry and porosity. The selective adhesion of omniphobic–omniphilic wettability patterns is used to facilitate the polymer pattern formation. The feasibility of patterning with different monomers and porogenic solvents is demonstrated. The topological study confirms the selective application of polymer structures with different thickness and roughness. The wettability characterization of the omniphobic material shows no significant changes caused by the operations performed. Thus, a new pattern with a greater difference in the wettability of the areas is produced in the process. Discontinuous dewetting of different liquids is performed. The use of poly(2‐hydroxyethyl methacrylate‐co‐ethylene dimethacrylate) (HEMA‐EDMA) modified patterns for precise living cell patterning is also demonstrated.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"5 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142202913","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Strong, Reversible, Heat‐Activated Adhesion from Liquid Crystal Polymer Networks 液晶聚合物网络的强力、可逆、热激活粘合力

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-06 DOI: 10.1002/admi.202400488

Hongye Gou, Shenghui Hou, Mohand O. Saed

{"title":"Strong, Reversible, Heat‐Activated Adhesion from Liquid Crystal Polymer Networks","authors":"Hongye Gou, Shenghui Hou, Mohand O. Saed","doi":"10.1002/admi.202400488","DOIUrl":"https://doi.org/10.1002/admi.202400488","url":null,"abstract":"Smart adhesives that undergo reversible detachment in response to external stimuli can be utilized for clean debonding on demand or for multi‐use purposes. Herein, robust and multi‐use adhesives are developed based on liquid crystal polymer networks. By controlling the glass transition temperatures (Tg), dry liquid crystal adhesives are fabricated with Tg ranging from 14 to 28 °C. These adhesives exhibit low tackiness at room temperature; however, upon heating and annealing, they can be activated, enabling effective deployment. The adhesion tack force increased after annealing from 1 to 7 N for liquid crystal network formulation with a high Tg (28 °C). At the same time, there is no noticeable change for formulations with Tg lower than room temperature. All formulations exhibit high adhesion strength (peel force) in the nematic region (1.0 to 1.6 Nmm−1) and low peel force in the isotropic region. Furthermore, the adhesives demonstrate the capability for reuse in more than five heating and cooling peeling cycles and have shown remarkable contamination tolerance to sand, oil, and dirt. Moreover, these adhesives display lap shear strengths comparable to those of traditional PSAs, reaching up to 3 MPa, with clean detachment except for the formulation with low Tg, which exhibited cohesive failure.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"44 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226129","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effect of Mesa Sidewall Angle on 4H-Silicon Carbide Trench Filling Epitaxy Using Trichlorosilane and Hydrogen Chloride 使用三氯硅烷和氯化氢的 Mesa 侧壁角度对 4H 碳化硅沟槽填充外延的影响

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-06 DOI: 10.1002/admi.202400466

Kelly Turner, Gerard Colston, Katarzyna Stokeley, Andrew Newton, Arne Renz, Marina Antoniou, Peter Gammon, Philip Mawby, Vishal Shah

{"title":"Effect of Mesa Sidewall Angle on 4H-Silicon Carbide Trench Filling Epitaxy Using Trichlorosilane and Hydrogen Chloride","authors":"Kelly Turner, Gerard Colston, Katarzyna Stokeley, Andrew Newton, Arne Renz, Marina Antoniou, Peter Gammon, Philip Mawby, Vishal Shah","doi":"10.1002/admi.202400466","DOIUrl":"10.1002/admi.202400466","url":null,"abstract":"In this report, the advanced manufacturing advantages of using supersaturated chlorinated chemistry are demonstrated at 1550 °C in 4H-silicon carbide (4H-SiC) epitaxy on trenches with different geometric profiles. Sloped mesa sidewalls (8°) show improved filling behavior compared with vertical sidewalls (2°) and lower the optimum chlorine/silicon ratio (Si:Cl) required to complete filling. Both the optimum Cl:Si ratio (10) and sidewall angle are lower for wider trench openings, allowing complete fill of 3 µm wide trenches (8 µm pitch, 5 µm depth) at a filling rate of 19 µm h−1. Excessive hydrogen chloride (HCl) diminishes filling by reducing sidewall growth and can also produce an end surface with very rough topography. This work demonstrates the importance of trench geometry on both the filling behavior and process optimization in chlorinated trench filling epitaxy for the manufacture of 4H-SiC superjunction power electronics.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 33","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400466","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142202914","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Synthesis and Photothermal Processing of Silicon‐Based Nanoconfined MXenes 硅基纳米封闭 MXenes 的合成与光热处理

IF 5.4 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-09-05 DOI: 10.1002/admi.202400447

Najma Khatoon, Binod Subedi, Ahmad Majed, Shiping Wang, Jibao He, Julie N.L. Albert, Michael Naguib, Douglas B Chrisey

{"title":"Synthesis and Photothermal Processing of Silicon‐Based Nanoconfined MXenes","authors":"Najma Khatoon, Binod Subedi, Ahmad Majed, Shiping Wang, Jibao He, Julie N.L. Albert, Michael Naguib, Douglas B Chrisey","doi":"10.1002/admi.202400447","DOIUrl":"https://doi.org/10.1002/admi.202400447","url":null,"abstract":"Intercalation is a powerful approach to customize the properties of layered materials such as titanium carbide (Ti3C2Tx) MXenes. Photonic curing, a novel technique employing intense pulsed light from a xenon flashlamp (≈280–1100 nm wavelength range), offers significant advantages over conventional annealing methods. The pulsed nature of photonic curing enables rapid quenching, which allows trapping of metastable states and the formation of unique nanostructures. Herein, this work reports on the ion exchange intercalation of Ti3C2Tx MXenes with aminopropyl terminated polydimethylsiloxane (amino‐PDMS) and the subsequent application of photonic curing to study pyrolysis of intercalated PDMS. The results showed an increase in the interlayer spacing (d‐spacing) of Ti3C2Tx from 1 to 13.5 nm for the 5 kg mol−1 amino‐PDMS (5K‐PDMS) intercalant. After photonic curing, the intercalated PDMS is converted into SiOx or silicon oxycarbide, and the d‐spacing decreased from 13.5 to 11 nm. Furthermore, curing the intercalated MXenes under controlled pressure in different gas environments, this work observes the conversion of PDMS to silicon carbide on the surface of MXenes layers. This study demonstrates the potential of photonic curing as a promising approach for cost‐effective, instantaneous, and scalable synthesis of customizable layered materials with precise control over the nanostructure within the layers.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"33 1","pages":""},"PeriodicalIF":5.4,"publicationDate":"2024-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226130","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0