Advanced Materials Interfaces最新文献

{"title":"Charge Transfer-Driven Conversion of Molecular Oxygen to Doublet State on Vanadium Diselenide (VSe2) Surface at Room Temperature","authors":"Danil W. Boukhvalov,&nbsp;Mariana Stefan,&nbsp;Alexandra C. Joita,&nbsp;Chia-Nung Kuo,&nbsp;Chin Shan Lue,&nbsp;Antonio Politano","doi":"10.1002/admi.202400656","DOIUrl":"https://doi.org/10.1002/admi.202400656","url":null,"abstract":"<p>Oxygen in the excited state is essential for organic synthesis and medical treatment. Herein, a novel phenomenon is reported in which the magnetic ground state of molecular oxygen undergoes a transition at room temperature from S = 1 to S = 1/2, corresponding to the transition of O₂ from a triplet to a doublet state after stable physical adsorption on the defect-free surface of bulk VSe₂. This density functional theory (DFT) calculations demonstrate the stable physical adsorption of O₂ on both <i>1T-</i> and <i>2H-</i>VSe₂ surfaces without further decomposition. Electron spin resonance (ESR) measurements confirm the spin state transition. Theoretical simulations reveal the charge transfer from entangled V-3<i>d</i> and Se-4<i>p</i> bands to oxygen as the leading cause of the spin state transition. This mechanism has not been previously proposed and offers multiple potential applications, from organic synthesis to medicine. Moreover, this approach can be extended to reveal new aspects of known catalytic materials and to design novel catalysts.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 6","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400656","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143646166","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Electron-Beam-Induced Adatom-Vacancy-Complexes in Mono- and Bilayer Phosphorene","authors":"Carsten Speckmann,&nbsp;Andrea Angeletti,&nbsp;Lukáš Kývala,&nbsp;David Lamprecht,&nbsp;Felix Herterich,&nbsp;Clemens Mangler,&nbsp;Lado Filipovic,&nbsp;Christoph Dellago,&nbsp;Cesare Franchini,&nbsp;Jani Kotakoski","doi":"10.1002/admi.202400784","DOIUrl":"https://doi.org/10.1002/admi.202400784","url":null,"abstract":"<p>Phosphorene, a puckered 2D allotrope of phosphorus, has sparked considerable interest in recent years due to its potential especially for optoelectronic applications with its layer-number-dependant direct band gap and strongly bound excitons. However, detailed experimentalcharacterization of its intrinsic defects as well as its defect creation characteristics under electron irradiation are scarce. Here, the creation and stability of a variety of defect configurations under 60 kV electron irradiation in mono- and bilayer phosphorene are reported including the first experimental reports of stable adatom-vacancy-complexes. Displacement cross section measurements in bilayer phosphorene yield a value of 7.7 ± 1.4 barn with an estimated lifetime of adatom-vacancy-complexes of 19.9 ± 0.7 s, while some are stable for up to 68 s under continuous electron irradiation. Surprisingly, ab initio-based simulations indicate that the complexes should readily recombine, even in structures strained by up to 3%. The presented results will help to improve the understanding of the wide variety of defects in phosphorene, their creation, and their stability, which may enable new pathways for defect engineered phosphorene devices.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 9","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400784","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143914635","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Impact Driven Liquid Encapsulation: Promises, Development, and Future Prospects","authors":"Sirshendu Misra,&nbsp;Sushanta K. Mitra","doi":"10.1002/admi.202400402","DOIUrl":"https://doi.org/10.1002/admi.202400402","url":null,"abstract":"<p>Encapsulation creates a protective outer layer(s) around a core cargo, which safeguards the cargo in aggressive surroundings. It also serves as a platform to impart various desired characteristics to the core cargo, including shell-functionalization and targeted release characteristics. Encapsulation can be broadly classified into three categories: physical, chemical, and physicochemical techniques. This perspective focuses on an emerging class of impact-driven physical encapsulation techniques, which offers several lucrative prospects compared to conventional encapsulation methods, including straightforward execution and ultrafast yet controlled wrapping. Two different categories of impact-driven methods for achieving stable, ultrafast encapsulation of various core liquid analytes with one or more wrapping layers are discussed, namely, elastocapillary wrapping with ultrathin sheet(s) and a liquid–liquid encapsulation framework, where thin liquid film(s) are used to wrap liquid analytes, with an emphasis on the latter. The promising prospects of both approaches are discussed, recent developments are outlined, and areas of future research that can lead to a truly versatile and comprehensive encapsulation platform applicable to a broad range of practical applications are highlighted.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 7","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400402","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143787282","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Beyond Fertilizers: NH4ZnPO4 for the Reversible Chemical Storage of Ammonia","authors":"Takahiro Kozawa,&nbsp;Tai Hashiba,&nbsp;Kayo Fukuyama,&nbsp;Hiroya Abe,&nbsp;Shu Morita,&nbsp;Minoru Osada,&nbsp;Makio Naito","doi":"10.1002/admi.202400729","DOIUrl":"https://doi.org/10.1002/admi.202400729","url":null,"abstract":"<p>Enhancing NH₃ as a carbon-free energy carrier of H₂ and next-generation fuel is a promising approach for a sustainable society. Chemically storing NH₃ molecules in crystal structures offers better selectivity and reusability than storage in traditional porous materials based on physicochemical adsorption; however, designing materials that can be reversibly stored in structural gaps is still a significant challenge. Herein, the use of NH₄ZnPO₄, which is previously used as a fertilizer, is proposed as an NH₃ uptake material through a chemical storage mechanism. The NH₄ZnPO₄ particles synthesized by a wet mechanochemical method with monoclinic and hexagonal crystal structures can incorporate NH₃ molecules and directly transform them into NH₄Zn(NH₃)PO₄ without producing byproducts. The chemical storage mechanism depends on the particle morphology; therefore, the uptake amount per surface area surpasses that of porous materials. NH₄ZnPO₄ exhibited excellent cycling performance due to its reusability, which is regenerated by releasing NH₃ from NH₄Zn(NH₃)PO₄ when heated in air at ≈100 °C. Taking inspiration from previously used and familiar fertilizers further extends this new area of innovative materials that can be used for the reversible storage of low-molecular-weight gases.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 8","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400729","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143852618","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Correction to “Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography”","authors":"Eun-Seok Choe,&nbsp;Seungwook Choi,&nbsp;Ansoon Kim,&nbsp;Kwan-Yong Kim,&nbsp;Hee-Jung Yeom,&nbsp;Min Young Yoon,&nbsp;Seongwan Hong,&nbsp;Dong-Wook Kim,&nbsp;Jung-Hyung Kim,&nbsp;Hyo-Chang Lee","doi":"10.1002/admi.202400943","DOIUrl":"https://doi.org/10.1002/admi.202400943","url":null,"abstract":"&lt;p&gt;&lt;i&gt;Adv. Mater. Interfaces&lt;/i&gt; &lt;b&gt;2024&lt;/b&gt;, &lt;i&gt;11&lt;/i&gt;, 2300867&lt;/p&gt;&lt;p&gt;DOI: 10.1002/admi.202300867&lt;/p&gt;&lt;p&gt;We found that the damages of material we had seen in the published paper were greatly influenced by the base material rather than damage to the EUV material itself. Therefore, the content related to the material evaluation results in the paper should be excluded. The following contents should be corrected.&lt;/p&gt;&lt;p&gt;The last sentence in the abstract section, “The damage to Mo&lt;sub&gt;2&lt;/sub&gt;C …,” should be removed.&lt;/p&gt;&lt;p&gt;In paragraph 3 of the “Introduction” section, the last 2 sentences “To observe the effect of the …,” should be removed. This should have been written as “In addition, the radical density which can represent the value in an actual mass production process environment, was measured using a quadrupole mass spectrometer (QMS).”&lt;/p&gt;&lt;p&gt;The content in Section 2.2 “Surface damage analysis” is incorrect and should be excluded. It should have been written in the “Discussion” section below.&lt;/p&gt;&lt;p&gt;: ″Inside EUV lithography equipment, the EUV beam is reflected off (or passes through) various EUV optical components such as multilayer mirrors, reticles, and pellicles before reaching the photoresist (see Figure 9). As the process cycle is repeated, surface of the components can be damaged by EUV-induced H&lt;sub&gt;2&lt;/sub&gt; plasma, potentially reducing the overall process reliability. This suggests that H&lt;sub&gt;2&lt;/sub&gt; plasma durability evaluations are needed for all EUV components within the EUV lithography equipment. Nevertheless, several factors make it challenging to conduct such damage evaluation:&lt;/p&gt;&lt;p&gt;1. It is difficult to use actual mass-production equipment for damage evaluation,&lt;/p&gt;&lt;p&gt;2. The cost of using high power EUV sources comparable to mass-production equipment for setting up evaluation systems is very high,&lt;/p&gt;&lt;p&gt;3. Using low-power EUV sources cannot generate a suitable density of H&lt;sub&gt;2&lt;/sub&gt; plasma for evaluation.&lt;/p&gt;&lt;p&gt;The evaluation system in this study uses ICP to generate a H&lt;sub&gt;2&lt;/sub&gt; plasma environment similar to EUV lithography at relatively low cost. Additionally, it enables accelerated life testing (ALT) with electron density control, making it a valuable option for addressing the previously mentioned issues.&lt;/p&gt;&lt;p&gt;Damage to samples can be examined using various methods. For relatively large surface damages such as blisters, identification with a microscope or even with the naked eye may be sufficient. The extent of surface etching on EUV components caused by H&lt;sub&gt;2&lt;/sub&gt; plasma can be measured by a change in weight using a calibrated scale. However, the weight differences before and after H&lt;sub&gt;2&lt;/sub&gt; plasma exposure are often smaller than the measurement uncertainty of the scale. Therefore, field-emission scanning electron microscopy (FE-SEM) is generally more suitable for damage analysis. Vertical imaging can quantify layer thickness changes or pore area fractions in porous structures. Surface deformation can also be a signi","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 7","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400943","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143787010","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Single-Crystal and Polycrystal SiC Bonding for Cost-effective Chip Fabrication","authors":"Szuyu Huang,&nbsp;Fachen Liu,&nbsp;Jiaxin Liu,&nbsp;Xiaoyue Gao,&nbsp;Zhenzhong Wang,&nbsp;Peng Gao","doi":"10.1002/admi.202400816","DOIUrl":"https://doi.org/10.1002/admi.202400816","url":null,"abstract":"<p>High-quantity single-crystal silicon carbide (SiC) is widely used in power electronics due to its excellent breakdown electric field strength and high thermal conductivity. However, back grinding during the chip fabrication generally results in ≈70% of single-crystal SiC being wasted, leading to the high cost of SiC chips. In order to improve the utilization, single-crystal SiC on polycrystal SiC (SoP-SiC) is bonded. The challenge to achieve excellent bonding interfaces for such a system is the heterogeneous surface of polycrystals in which those grains with different orientations usually have different physical and chemical properties, making it difficult to achieve sufficiently smooth surfaces for bonding. Here, ion beam etching (IBE) is employed to activate the surface of polycrystal and single-crystal SiC and achieve high bonding strength (up to ≈20 MPa) after annealing in the atmosphere. Sub-nanometer-scale electron microscopy and energy spectroscopy analysis showing the IBE method can effectively inhibit the formation of silicon oxide at the bonding interface, which is expected to reduce the interface thermal resistance according to the phonon spectrum analysis. This study provides a novel method to fabricate single-polycrystal SiC junctions with high bonding strength and high thermal conductivity, which is valuable for the SiC industry.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 6","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400816","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143646162","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"FACS-Sortable Triple Emulsion Picoreactors for Screening Reactions in Biphasic Environments","authors":"Samuel Thompson,&nbsp;Yanrong Zhang,&nbsp;Zijian Yang,&nbsp;Lisa Nichols,&nbsp;Polly M. Fordyce","doi":"10.1002/admi.202400403","DOIUrl":"https://doi.org/10.1002/admi.202400403","url":null,"abstract":"<p>Biphasic environments can enable successful chemical reactions where any single solvent results in poor substrate solubility or poor catalyst reactivity. For screening biphasic reactions at high throughput, a platform based on microfluidic double emulsions can use widely available FACS (Fluorescence Activated Cell Sorting) machines to screen millions of picoliter reactors in a few hours. However, encapsulating biphasic reactions within double emulsions to form FACS-sortable droplet picoreactors requires optimized solvent phases and surfactants to produce triple emulsion droplets that are stable over multi-hour assays and compatible with desired reaction conditions. This work demonstrates such FACS-sortable triple emulsion picoreactors with a fluorocarbon shell and biphasic octanol-in-water core. First, surfactants are screened to stabilize octanol-in-water emulsions for the picoreactor core. With these optimized conditions, stable triple emulsion picoreactors (&gt;70% of droplets survived to 24 hr), produced protein in the biphasic core via cell-free protein synthesis are generated, and sorted these triple emulsions based on fluorescence using a commercial FACS sorter at &gt;100 Hz with 75–80% of droplets recovered. Finally, an in-droplet lipase assay with a fluorogenic resorufin substrate that partitions into octanol is demonstrated. These triple emulsion picoreactors have the potential for future screening bead-encoded catalyst libraries, including enzymes such as lipases for biofuel production.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 3","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400403","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143111853","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Poly(Amino Acid) LbL Multilayers With Embedded Silver and Copper Oxide Nanoparticles as Biocompatible Antibacterial Coatings","authors":"Ana-Marija Milisav,&nbsp;Lamborghini Sotelo,&nbsp;Cristina Cantallops-Vilà,&nbsp;Tommaso Fontanot,&nbsp;Ina Erceg,&nbsp;Krunoslav Bojanić,&nbsp;Tomislav Vuletić,&nbsp;Željka Fiket,&nbsp;Maja Ivanić,&nbsp;Silke Christiansen,&nbsp;Edwige Meurice,&nbsp;Maja Dutour Sikirić","doi":"10.1002/admi.202400631","DOIUrl":"https://doi.org/10.1002/admi.202400631","url":null,"abstract":"<p>The growing concern over implant-associated infections motivates the development of novel antibacterial coatings for medical devices as an effective strategy in reducing the occurrence of IAI. Polyelectrolyte multilayers (PEMs) incorporating metal/metal oxide nanoparticles (NPs) as antimicrobial components receive special attention for their ability to coat diverse surface types and low potential to induce antimicrobial resistance. This study investigates the potential of poly(amino acid) multilayers consisting of poly-L-lysine and poly-L-glutamic acid with embedded silver (PEMAg) or copper oxide (PEMCuO) deposited on titanium surfaces for the coating of medical surfaces. The results of the quartz crystal microbalance with dissipation, scanning electron microscopy, and electron dispersive spectroscopy show that both types of NPs are successfully incorporated in the PEM and deposited over the entire coated surface. The incorporation of NPs in PEM prevents the burst release. The viability of MG-63 cells is higher than 70% on all investigated PEMs, confirming their biocompatibility. PEMCuO shows better biofilm prevention compared to PEMAg, entirely preventing <i>Pseudomonas aeruginosa</i> biofilm and allowing the formation of only weak <i>Staphylococcus aureus</i> biofilm. The results obtained confirm the high potential of poly(amino acids) multilayers with embedded metal/metal oxide NPs as biocompatible antimicrobial coatings for medical devices.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 5","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400631","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143497084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition","authors":"Chihwan An,&nbsp;Jung Woo Cho,&nbsp;Tae Yoon Lee,&nbsp;Myeong Seop Song,&nbsp;Baekjune Kang,&nbsp;Hongju Kim,&nbsp;Jun Hee Lee,&nbsp;Changhee Sohn,&nbsp;Seung Chul Chae","doi":"10.1002/admi.202400742","DOIUrl":"https://doi.org/10.1002/admi.202400742","url":null,"abstract":"<p>The selective influence of elastic strain on the formation of oxygen deficiencies in (001)-, (110)-, and (111)- epitaxial Hf_0.5Zr_0.5O₂ films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf_0.5Zr_0.5O₂ films grown on yttria-stabilized zirconia substrates, revealed a dominant shallow trap level in the (111)-oriented Hf_0.5Zr_0.5O₂ film. X-ray photoemission spectroscopy demonstrated that the strong oxygen deficiency is preferred in the (111)-oriented Hf_0.5Zr_0.5O₂ film. Density functional theory calculations of oxygen vacancy formation energy also showed a pronounced preference for oxygen deficiencies in the (111) orientation. This selective formation of oxygen vacancies in the (111)-oriented Hf_0.5Zr_0.5O₂ film suggests that the latent phenomena associated with oxygen defects in functional Hf_0.5Zr_0.5O₂ films are partly attributed to the directional strain in the (111) orientation.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 8","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400742","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143852807","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Masthead: (Adv. Mater. Interfaces 34/2024)","authors":"","doi":"10.1002/admi.202470083","DOIUrl":"https://doi.org/10.1002/admi.202470083","url":null,"abstract":"","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 34","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202470083","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142762175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}