Advanced Materials Interfaces最新文献

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Review on Icephobicity of Materials Surface Enhanced by Interface Action Force 界面作用力增强材料表面憎冰性的研究进展
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-12-01 DOI: 10.1002/admi.202400665
Lingfeng Zhao, Yizhou Shen, Jie Tao, Weilan Liu, Ting Wang, Senyun Liu
{"title":"Review on Icephobicity of Materials Surface Enhanced by Interface Action Force","authors":"Lingfeng Zhao,&nbsp;Yizhou Shen,&nbsp;Jie Tao,&nbsp;Weilan Liu,&nbsp;Ting Wang,&nbsp;Senyun Liu","doi":"10.1002/admi.202400665","DOIUrl":"https://doi.org/10.1002/admi.202400665","url":null,"abstract":"<p>In response to the hazards of icing in the energy, transportation, and aerospace sectors, extensive research has been conducted on anti-icing materials based on the solid-liquid/ice interface theory, as well as reliable chemical and electro-thermal de-icing systems. However, there is an urgent need for modernizing anti-icing systems to address diverse application scenarios. Gaining insights into the influence of interface action forces on water droplet behavior can proactively prevent detrimental icing occurrences. Nevertheless, under severe conditions where ice formation is inevitable, leveraging interface action forces to induce cracking and expansion of ice facilitates its rapid detachment despite potential challenges associated with complete removal. A comprehensive review elucidating the mechanisms through which interface action forces impact water/ice formations encompasses various approaches toward designing mechanically-driven de-icing systems.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 6","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400665","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143645578","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigating Impacts of Local Pressure and Temperature on CVD Growth of Hexagonal Boron Nitride on Ge(001)/Si 局部压力和温度对六方氮化硼在Ge(001)/Si上CVD生长的影响
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-28 DOI: 10.1002/admi.202400467
Max Franck, Jarek Dabrowski, Markus Andreas Schubert, Dominique Vignaud, Mohamed Achehboune, Jean-François Colomer, Luc Henrard, Christian Wenger, Mindaugas Lukosius
{"title":"Investigating Impacts of Local Pressure and Temperature on CVD Growth of Hexagonal Boron Nitride on Ge(001)/Si","authors":"Max Franck,&nbsp;Jarek Dabrowski,&nbsp;Markus Andreas Schubert,&nbsp;Dominique Vignaud,&nbsp;Mohamed Achehboune,&nbsp;Jean-François Colomer,&nbsp;Luc Henrard,&nbsp;Christian Wenger,&nbsp;Mindaugas Lukosius","doi":"10.1002/admi.202400467","DOIUrl":"https://doi.org/10.1002/admi.202400467","url":null,"abstract":"<p>The chemical vapor deposition (CVD) growth of hexagonal boron nitride (hBN) on Ge substrates is a promising pathway to high-quality hBN thin films without metal contaminations for microelectronic applications, but the effect of CVD process parameters on the hBN properties is not well understood yet. The influence of local changes in pressure and temperature due to different reactor configurations on the structure and quality of hBN films grown on Ge(001)/Si is studied. Injection of the borazine precursor close to the sample surface results in an inhomogeneous film thickness, attributed to an inhomogeneous pressure distribution at the surface, as shown by computational fluid dynamics simulations. The additional formation of nanocrystalline islands is attributed to unfavorable gas phase reactions due to the radiative heating of the injector. Both issues are mitigated by increasing the injector-sample distance, leading to an 86% reduction in pressure variability on the sample surface and a 200 °C reduction in precursor temperature. The resulting hBN films exhibit no nanocrystalline islands, improved thickness homogeneity, and high crystalline quality (Raman FWHM = 23 cm<sup>−1</sup>). This is competitive with hBN films grown on other non-metal substrates but achieved at lower temperature and with a low thickness of only a few nanometers.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400467","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143120308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Your Clean Graphene is Still Not Clean 干净的石墨烯仍然不干净
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-27 DOI: 10.1002/admi.202400598
Ondrej Dyck, Aisha Okmi, Kai Xiao, Sidong Lei, Andrew R. Lupini, Stephen Jesse
{"title":"Your Clean Graphene is Still Not Clean","authors":"Ondrej Dyck,&nbsp;Aisha Okmi,&nbsp;Kai Xiao,&nbsp;Sidong Lei,&nbsp;Andrew R. Lupini,&nbsp;Stephen Jesse","doi":"10.1002/admi.202400598","DOIUrl":"https://doi.org/10.1002/admi.202400598","url":null,"abstract":"<p>Researchers working with thin samples, such as monolayer graphene, are consistently struggling against contamination. Indeed, the problem of hydrocarbon contamination is known from the earliest days of electron microscopy and efforts to reduce this problem are ubiquitous to almost all high-vacuum experiments. Accurate knowledge of the behavior of such contamination is essential for electron beam (e-beam) based atomic fabrication, where it is aspired to select and control matter on an atom-by-atom basis. Here, the vexing question of hydrocarbon contamination on graphene is taken up. Image intensity is used to directly reveal the presence of diffusing hydrocarbons on ostensibly clean graphene. These diffusing hydrocarbons are previously inferred but not directly observed. Surprising dynamic variations of the concentration of these hydrocarbons impels questions about their origin. Here, some possible explanations are presented and some tentative conclusions are drawn. This work updates the conceptual model of “clean graphene” and offers refinements to the description of e-beam induced hydrocarbon deposition.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400598","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143119710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Layer Number Controllable Molybdenum Disulfide Film Growth and Its Applications in Vertical and Planar Photodetectors 层数可控的二硫化钼薄膜生长及其在垂直和平面光电探测器中的应用
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-27 DOI: 10.1002/admi.202400641
Yu-Han Huang, Zhi-Wei Chen, Chao-Hsin Wu, Po-Tsung Lee, Shih-Yen Lin
{"title":"Layer Number Controllable Molybdenum Disulfide Film Growth and Its Applications in Vertical and Planar Photodetectors","authors":"Yu-Han Huang,&nbsp;Zhi-Wei Chen,&nbsp;Chao-Hsin Wu,&nbsp;Po-Tsung Lee,&nbsp;Shih-Yen Lin","doi":"10.1002/admi.202400641","DOIUrl":"https://doi.org/10.1002/admi.202400641","url":null,"abstract":"<p>Wafer-scale and layered MoS<sub>2</sub> films are grown by sulfurizing amorphous MoS<sub>2</sub> films deposited on sapphire substrates by using a radio-frequency sputtering system. To verify the layer numbers of the multi-layer MoS<sub>2</sub> films, atomic layer etchings are adopted. Wafer-scale MoS<sub>2</sub> film growth with good layer number uniformity up to 30 is observed. A vertical device with 20-layer MoS<sub>2</sub> embedded in between Al (bottom) and Au (top) electrodes is fabricated. With different work functions of the metal electrodes, photo-excited electrons and holes in the MoS<sub>2</sub> layer can be separated and form photovoltaic responses. With the insertion of 5 nm MoO<sub>3</sub> carrier transport layer between the MoS<sub>2</sub> layer and the top Au electrode, enhanced photovoltaic responses are observed for the device. By using graphene as the carrier transport layer and MoS<sub>2</sub> as the light absorption layer, avalanche photocurrents are observed for planar MoS<sub>2</sub>/graphene photoconductive devices. With the assist of the higher electron density in multi-layer MoS<sub>2</sub>, an easier compensation in the loss of photo-excited electrons and therefore, charge neutrality in the MoS<sub>2</sub> layer can be maintained. Significant reduction in the rise/fall times from &gt;100 ms. to &lt;10 ms. is also observed for the planar photodetector with 10-layer MoS<sub>2</sub> absorption layer.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 5","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400641","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143497411","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Scalable Processing of Glass with Multi-Functional Cu Coating 多功能铜涂层玻璃的可扩展加工
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-25 DOI: 10.1002/admi.202400387
Dan Wang, Xuelu Zhang, Yan Xing, Guanghua Liu, Hui Wu, Wei Pan
{"title":"Scalable Processing of Glass with Multi-Functional Cu Coating","authors":"Dan Wang,&nbsp;Xuelu Zhang,&nbsp;Yan Xing,&nbsp;Guanghua Liu,&nbsp;Hui Wu,&nbsp;Wei Pan","doi":"10.1002/admi.202400387","DOIUrl":"https://doi.org/10.1002/admi.202400387","url":null,"abstract":"<p>Functional glass has been intensively studied as a future material with improved comfort, safety, and practicality across a variety of settings, including industrial, and residential environments. The integration of copper coatings on glass is noteworthy for its broad-spectrum germicidal properties. When applied to frequently touched surfaces, this copper-enhanced glass plays a crucial role in controlling infections, underscoring its significance in healthcare and public health contexts. Herein, an innovative approach for processing multifunctional copper coating on glass through atmospheric plasma spraying (APS) is introduced. The Cu coating demonstrates remarkable bactericidal efficiency against both Gram-positive and Gram-negative bacteria, achieving a 99.9% inhibition rate within 5 h. Moreover, the coating maintains its biocidal effectiveness for up to 3 days against these bacterial strains. The Cu coated glass also incorporates an electrical heating function. This feature allows the glass to increase its surface temperature by ≈7 °C with a minimal power load of 2V. The coating's transparency is variable and can be adjusted through the APS parameters, depending on the desired copper surface coverage. The combination of superior antibacterial properties and electrical heating capability makes the Cu coated glass as high-performance material for medical applications, offering dual functions of infection control and temperature regulation.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 7","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400387","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143787288","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Nickel Age of High-Temperature Superconductivity 高温超导镍的年龄
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-25 DOI: 10.1002/admi.202400717
S. Lin Er Chow, A. Ariando
{"title":"Nickel Age of High-Temperature Superconductivity","authors":"S. Lin Er Chow,&nbsp;A. Ariando","doi":"10.1002/admi.202400717","DOIUrl":"https://doi.org/10.1002/admi.202400717","url":null,"abstract":"<p>Unconventional high-temperature superconductivity has long been a captivating puzzle in condensed matter physics. The 1987 Nobel Prize in Physics celebrated the discovery of high-temperature superconductivity in copper oxide ceramics. Nearly four decades later, a broad class of high-temperature superconducting oxides has yet to be demonstrated, and the fundamental understanding of the pairing mechanism remains inconclusive. Recently, nickel oxides have emerged as a new class of high-temperature superconductors, beyond copper, where correlated phases can be controlled by doping, pressure, strain, and dimensionality. In this article, we provide our perspective on the recent developments and prospects of the nickel age of high-temperature superconductivity.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 4","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400717","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143431794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced Piezoelectric Properties of Poly(L-lactide) Nanocomposite Microfiber Scaffolds Due to Polydopamine-Coating of Barium Titanate Nanoparticles 钛酸钡纳米粒子包覆聚多巴胺增强聚l -丙交酯纳米复合微纤维支架的压电性能
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-25 DOI: 10.1002/admi.202400546
Richard Schönlein, Xabier Larrañaga, Asier Panfilo, Yu Li, Aitor Larrañaga, Guoming Liu, Alejandro J. Müller, Robert Aguirresarobe, Jone M. Ugartemendia
{"title":"Enhanced Piezoelectric Properties of Poly(L-lactide) Nanocomposite Microfiber Scaffolds Due to Polydopamine-Coating of Barium Titanate Nanoparticles","authors":"Richard Schönlein,&nbsp;Xabier Larrañaga,&nbsp;Asier Panfilo,&nbsp;Yu Li,&nbsp;Aitor Larrañaga,&nbsp;Guoming Liu,&nbsp;Alejandro J. Müller,&nbsp;Robert Aguirresarobe,&nbsp;Jone M. Ugartemendia","doi":"10.1002/admi.202400546","DOIUrl":"https://doi.org/10.1002/admi.202400546","url":null,"abstract":"<p>Recent biomedical applications demand piezoelectric polylactide (PLA)-based polymers, possessing biodegradable and biocompatible properties for tissue regeneration, implantable force sensors, and energy harvesting devices. However, piezoelectric poly(L-lactide) (PLLA) possesses weak piezoelectric properties in comparison to non-biodegradable poly(vinylidene fluoride) (PVDF), limiting its application. This contribution presents, for the first time, a nanocomposite strategy to enhance the piezoelectric properties of PLLA, while maintaining cytocompatibility. Biocompatible and piezoelectric barium titanate (BTO) nanoparticles (NPs) are coated by polydopamine (PDA) (cBTO NPs) to improve the quality of the matrix-filler interface and enhanced the force transmission toward the BTO NPs. Electrospun PLLA/cBTO nanocomposite microfiber scaffolds with 5 wt% of PDA-coated BTO NPs (cBTO) exhibited an increase in piezoelectric properties of 120% in comparison to pristine PLLA microfiber scaffolds, implying a voltage output increase from 1.4 ± 0.1 to 3.2 ± 0.2 V. Furthermore, the PDA-coating of BTO (cBTO) NPs itself has an intensifying impact on the piezoelectric properties of PLLA/cBTO nanocomposite compared to non-coated BTO NPs, increasing the voltage output by 41%. This demonstrates the great potential of PDA-coating of piezoelectric NPs to enhance the piezoelectric response of PLLA.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400546","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143118859","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Masthead: (Adv. Mater. Interfaces 33/2024) 刊头:(Adv. Mater. Interfaces 33/2024)
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-24 DOI: 10.1002/admi.202470081
{"title":"Masthead: (Adv. Mater. Interfaces 33/2024)","authors":"","doi":"10.1002/admi.202470081","DOIUrl":"https://doi.org/10.1002/admi.202470081","url":null,"abstract":"","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 33","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202470081","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142708295","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Mesa Sidewall Angle on 4H-Silicon Carbide Trench Filling Epitaxy Using Trichlorosilane and Hydrogen Chloride (Adv. Mater. Interfaces 33/2024) 使用三氯硅烷和氯化氢的 Mesa 侧壁角度对 4H 碳化硅沟槽填充外延的影响(Adv.)
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-24 DOI: 10.1002/admi.202470080
Kelly Turner, Gerard Colston, Katarzyna Stokeley, Andrew Newton, Arne Renz, Marina Antoniou, Peter Gammon, Philip Mawby, Vishal Shah
{"title":"Effect of Mesa Sidewall Angle on 4H-Silicon Carbide Trench Filling Epitaxy Using Trichlorosilane and Hydrogen Chloride (Adv. Mater. Interfaces 33/2024)","authors":"Kelly Turner,&nbsp;Gerard Colston,&nbsp;Katarzyna Stokeley,&nbsp;Andrew Newton,&nbsp;Arne Renz,&nbsp;Marina Antoniou,&nbsp;Peter Gammon,&nbsp;Philip Mawby,&nbsp;Vishal Shah","doi":"10.1002/admi.202470080","DOIUrl":"https://doi.org/10.1002/admi.202470080","url":null,"abstract":"<p><b>Silicon Carbide</b></p><p>The wide bandgap semiconductor material Silicon Carbide (SiC) is an attractive proposition to replace Silicon for the development of advanced novel power electronic devices, such as superjunction devices. Trench refill epitaxy (TFE) has been developed, where semiconductor processing techniques have been used to create microstructures in SiC and refilled with single crystal SiC to fabricate these exotic superjunction structures. More details can be found in article 2400466 by Vishal Shah and co-workers.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"11 33","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202470080","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142708294","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Surface Functionalization of Si3N4 Fillers on Thermal and Mechanical Properties of TIMs 氮化硅填料表面功能化对TIMs热力学性能的影响
IF 4.3 3区 材料科学
Advanced Materials Interfaces Pub Date : 2024-11-24 DOI: 10.1002/admi.202400503
Zaifu Jin, JinHong Li, Jiaqing Zhao, Yixuan Ge
{"title":"Effect of Surface Functionalization of Si3N4 Fillers on Thermal and Mechanical Properties of TIMs","authors":"Zaifu Jin,&nbsp;JinHong Li,&nbsp;Jiaqing Zhao,&nbsp;Yixuan Ge","doi":"10.1002/admi.202400503","DOIUrl":"https://doi.org/10.1002/admi.202400503","url":null,"abstract":"<p>Thermal interface materials (TIMs), which consist of polymers and thermally conductive fillers, are crucial for improving heat dissipation. This study examines the impact of surface functionalization of Si₃N₄ thermal conductive fillers on the performance of TIMs. Si₃N₄ fillers are modified with silane coupling agents of varying alkyl chain lengths, producing fillers with contact angles ranging from 25° to 151.2°, thereby ensuring enhanced interfacial compatibility with various polymers. The modified fillers are incorporated into three common polymers—silica gel (SG), epoxy resin (EP), and polyurethane (PU)—to fabricate TIMs. When the contact angle of Si₃N₄ fillers is 73.3°, they demonstrate excellent interfacial compatibility with EP, leading to a 54.37% increase in thermal conductivity and a 162.75% enhancement in elongation at break for the TIM. At a contact angle of 132.7°, the TIMs prepared with SG exhibit an 86.36% increase in thermal conductivity and a 23.88% increase in elongation at break. Given that the original Si₃N₄ already possesses adequate interfacial compatibility with PU, no further modification is required. These findings offer valuable insights for future research aimed at optimizing Si₃N₄ fillers and TIMs to achieve enhanced thermal and mechanical properties.</p>","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400503","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143118830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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