1976 International Electron Devices Meeting最新文献_第6页

Investigation of the sapphire-silicon interface by transient current analysis 蓝宝石-硅界面瞬态电流分析研究

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189039

K. Lehovec, R. Miller

引用次数: 2

A high-throughput scanning-electron-beam lithography system, EL1, for semiconductor manufacture: General description 半导体制造用高通量扫描电子束光刻系统EL1:一般描述

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189075

H. Yourke, E. V. Weber

引用次数: 11

The utilization of charge pumping techniques to evaluate the energy and spatial distribution of interface states of an MOS transistor 利用电荷泵送技术评价MOS晶体管界面态的能量和空间分布

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189040

W. Backensto, C. Viswanathan

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引用次数: 4

Matrix display using a twisted nematic liquid crystal dynamically addressed 矩阵显示采用扭向列液晶动态寻址

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189123

M. Gościański, J. Donjon

引用次数: 0

Up-diffused I2L, a high speed bipolar LSI process 上扩散I2L，一种高速双极LSI工艺

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189044

D. McGreivy, B. B. Roesner

引用次数: 7

A junction isolation technology for integrating silicon controlled rectifiers in crosspoint switching circuits 一种在交点开关电路中集成可控硅整流器的结隔离技术

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.188984

A. Hartman, P. Shackle, R. L. Pritchett

引用次数: 3

Recent advances with high-power PPM-focused dual mode TWT's 大功率ppm双模行波管的最新进展

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189099

C. Jones, J. R. Hechtel

引用次数: 2

Electro-optical processing of signals and images using CCDs 利用ccd对信号和图像进行电光处理

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189028

D. Roy, M. Copeland

引用次数: 0

Coupling components for single optical fibers 单根光纤的耦合元件

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189024

M. Barnoski, M. D. Rourke, S. Jensen, H. R. Friedrich

引用次数: 0

Laser vaporization of metal films — Effect of optical interference in underlying dielectric layers 激光汽化金属薄膜—下介电层中光干涉的影响

1976 International Electron Devices Meeting Pub Date : 1900-01-01 DOI: 10.1109/IEDM.1976.189119

J. North

引用次数: 0