{"title":"蓝宝石-硅界面瞬态电流分析研究","authors":"K. Lehovec, R. Miller","doi":"10.1109/IEDM.1976.189039","DOIUrl":null,"url":null,"abstract":"Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.","PeriodicalId":106190,"journal":{"name":"1976 International Electron Devices Meeting","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Investigation of the sapphire-silicon interface by transient current analysis\",\"authors\":\"K. Lehovec, R. Miller\",\"doi\":\"10.1109/IEDM.1976.189039\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.\",\"PeriodicalId\":106190,\"journal\":{\"name\":\"1976 International Electron Devices Meeting\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1976 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1976.189039\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1976 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1976.189039","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Investigation of the sapphire-silicon interface by transient current analysis
Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.