蓝宝石-硅界面瞬态电流分析研究

K. Lehovec, R. Miller
{"title":"蓝宝石-硅界面瞬态电流分析研究","authors":"K. Lehovec, R. Miller","doi":"10.1109/IEDM.1976.189039","DOIUrl":null,"url":null,"abstract":"Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.","PeriodicalId":106190,"journal":{"name":"1976 International Electron Devices Meeting","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Investigation of the sapphire-silicon interface by transient current analysis\",\"authors\":\"K. Lehovec, R. Miller\",\"doi\":\"10.1109/IEDM.1976.189039\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.\",\"PeriodicalId\":106190,\"journal\":{\"name\":\"1976 International Electron Devices Meeting\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1976 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1976.189039\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1976 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1976.189039","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

对蓝宝石衬底上的mos电容器施加的偏置电压的突然切换引起的瞬态电流进行了测量和分析,以获得反转电荷积累中涉及的肖克利-里德-霍尔中心的信息。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of the sapphire-silicon interface by transient current analysis
Transient currents caused by an abrupt switch of the bias voltage applied to an MOS-capacitor on sapphire substrate are measured and analysed to obtain information on the Shockley-Read-Hall centers involved in the inversion charge build-up.
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