Plasma Chemistry and Plasma Processing最新文献

{"title":"Investigation of Surface Morphology Evolution During the Borosilicate Glass Etching by Using ICP-RIE For Microfluidic Applications","authors":"Duygu Nuhoğlu,&nbsp;Meryem Sarigüzel,&nbsp;Cihat Taşaltın,&nbsp;Ilke Gurol,&nbsp;Esra Zayim","doi":"10.1007/s11090-026-10666-4","DOIUrl":"10.1007/s11090-026-10666-4","url":null,"abstract":"<div>\u0000 \u0000 <p>Dry etching techniques are extensively used in the fabrication of silicon-based electronic components; however, the increasing use of glass substrates in microfluidic applications, due to their chemical stability, biocompatibility, optical transparency, electrical insulation, and cost-effectiveness, has created a growing demand for efficient dry etching of glass. This work presents the etching of borosilicate glasses using inductively coupled plasma reactive ion etching (ICP-RIE) with fluorine-based gas chemistries for use in microfluidic applications. Microfluidic structures were patterned via photolithography technic with micropillar were patterned using a titanium/gold stack and a nickel hard mask. The effects of various gas mixtures on the etch rate and surface morphology were systematically investigated. Optical emission spectroscopy (OES) was employed to monitor plasma characteristics, while surface analyses and etch depth were carried out using scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and profilometry, respectively. The results highlight how different gas compositions influence etch behavior and surface morphology, offering valuable insight for optimizing dry etching processes in glass-based microfluidic device fabrication and emphasize the importance of selecting appropriate gas ratios to achieve uniform microstructures with minimal surface defects.</p>\u0000 </div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10666-4.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147796642","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effect of Various Plasma-activated Waters on E. faecalis and C. albicans in Relation to Endodontic Treatments","authors":"Victória Kelly Fonseca Tavares,&nbsp;Felipe de Souza Miranda,&nbsp;Diego Morais da Silva,&nbsp;Rodrigo Sávio Pessoa,&nbsp;Cristiane Yumi Koga-Ito","doi":"10.1007/s11090-026-10670-8","DOIUrl":"10.1007/s11090-026-10670-8","url":null,"abstract":"<div>\u0000 \u0000 <p>Antimicrobial activity of Plasma-Activated Water (PAW) generated using a coaxial Dielectric Barrier Discharge (DBD) reactor was investigated against <i>Enterococcus faecalis</i> and <i>Candida albicans</i>, two microorganisms frequently associated with endodontic treatment failure. PAW was produced using three different working gases such as compressed air (PAW-Ca), argon (PAW-Ar), and helium (PAW-He) resulting in distinct chemical compositions characterized by reactive oxygen and nitrogen species. Clinically applicable exposure times (45 s, 1 min, and 1.5 min) were evaluated. For <i>E. faecalis</i>, 45 s of exposure resulted in reductions of 0.32 log₁₀ for PAW-Ca, 2.92 log₁₀ for PAW-Ar, and 2.73 log₁₀ for PAW-He. At 1 min, reductions increased to 0.50 log₁₀ for PAW-Ca, 3.23 log₁₀ for PAW-Ar, and &gt; 6 log₁₀ for PAW-He. After 1.5 min, PAW-Ca achieved a 0.53 log₁₀ reduction, while PAW-Ar and PAW-He reached 2.88 log₁₀ and &gt; 6 log₁₀ reductions, respectively. In contrast, none of the PAWs exhibited inhibitory activity against planktonic <i>C. albicans</i>. Cytotoxicity assays demonstrated that all PAW groups maintained ≥ 70% fibroblast viability, indicating non-cytotoxicity, whereas the conventional endodontic irrigants sodium hypochlorite and chlorhexidine digluconate decreased cell viability. Despite these promising findings, the study was limited to planktonic models and the lack of antifungal activity indicates that alternative PAW generation and treatment protocols should be further explored. Additional studies are also required to determine the precise composition and concentrations of reactive species in PAW and their relationship with antimicrobial performance.</p>\u0000 </div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10670-8.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147796646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Cryogenic Etching of SiO₂ in an ICP System Powered by 2 MHz Bias Using C₂F₆/C₄F₈/He Gas Mixtures: Enhanced Mask Preservation and Anisotropy for HARC Applications","authors":"Jiachen Wei,&nbsp;Chen Yang,&nbsp;Gilyoung Choi,&nbsp;Kwang-Ho Kwon","doi":"10.1007/s11090-026-10657-5","DOIUrl":"10.1007/s11090-026-10657-5","url":null,"abstract":"<div><p>Achieving stable and anisotropic pattern transfer in high-aspect-ratio contact (HARC) SiO₂ etching requires careful control of sidewall passivation, mask preservation, and profile fidelity. In this study, cryogenic SiO₂ etching was examined using a C₂F₆/C₄F₈/He gas mixture in an inductively coupled plasma (ICP) system equipped with a 2 MHz low-frequency bias. Plasma diagnostics indicated that C₂F₆ generates relatively carbon-rich CFₓ species compared with CF₄ under similar discharge conditions, which influences polymer formation and mask protection. Etching experiments at − 40 °C showed that reduced surface diffusion promotes localized polymer retention and suppresses lateral redeposition, contributing to improved sidewall stability and reduced facet formation. The combined plasma, etching, and surface-analysis results provide insight into how gas chemistry, ion-energy control, and low-temperature operation jointly influence profile evolution in fluorocarbon-based ICP processing, offering a basis for further optimization of HARC SiO₂ etching in advanced patterning applications.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><img></picture><span>The alternative text for this image may have been generated using AI.</span></div></div></figure></div></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147796643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Biostimulant Effects of Plasma-Activated Water on Germination and Early Seedling Development of Tree Tomato (Solanum betaceum Cav.)","authors":"María Luisa Cid-López,&nbsp;Yadira Karina Reyes-Acosta,&nbsp;María Guadalupe Neira-Velazquez,&nbsp;María de Jesús Martínez-Hernández,&nbsp;Raúl Rodríguez-Herrera,&nbsp;Lluvia de Abril Alexandra Soriano-Melgar","doi":"10.1007/s11090-026-10665-5","DOIUrl":"10.1007/s11090-026-10665-5","url":null,"abstract":"<div>\u0000 \u0000 <p>The present study investigated the effects of plasma-activated water (PAW), generated using a cold atmospheric plasma jet, on seed germination and early biological responses in tree tomato (<i>Solanum betaceum</i>) seedlings. Seeds were subjected to imbibition in PAW produced at different activation times (0, 5, 10, and 15 min) for two exposure periods (12 and 24 h), which generated distinct physicochemical profiles characterized by acidic pH, increased oxidation–reduction potential, and elevated nitrate and nitrite concentrations. Germination and emergence, root and shoot development, leaf formation, and biochemical responses, including photosynthetic pigments, phenolic compounds, and antioxidant capacity, were evaluated. PAW treatments produced marked improvements in early seedling development compared to non-activated water, particularly at longer activation times and shorter imbibition periods. Enhanced root elongation, accelerated germination, increased leaf development, and higher levels of chlorophyll, carotenoids, phenolic compounds, and antioxidant capacity were observed in PAW-treated seedlings. These responses are consistent with the role of plasma-generated reactive oxygen and nitrogen species as chemical signaling agents during seed imbibition. Overall, the results highlight the potential of plasma–liquid interactions to modulate early biological processes, supporting the application of plasma-activated water as a plasma-based biostimulant within the context of plasma chemistry and plasma processing.</p>\u0000 </div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147737975","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"A Pulse-Modulated Microwave Atmospheric Pressure Plasma Jet and its Applications in Polymer Modifications","authors":"Dai Zhang,&nbsp;Daopeng Zou,&nbsp;Ruilin Guo,&nbsp;Yaoyao Huang,&nbsp;Xijiang Chang,&nbsp;Zhonghang Wu,&nbsp;Zilan Xiong","doi":"10.1007/s11090-026-10664-6","DOIUrl":"10.1007/s11090-026-10664-6","url":null,"abstract":"<div><p>This study presents the design and construction of a pulse-modulated microwave atmospheric pressure plasma jet (PMPJ) system and investigates its application in surface modification of polyimide (PI) films. The stable operation window of the PMPJ was determined and the jet produced reactive oxygen species while maintaining low gas temperature at ~ 450 K. After 30 s treatment, the surface wettability of PI was improved (water contact angle dropped from 69.9° to 27.7°), and the peel strength with copper increased sixfold to 1.44 N/cm. Density functional theory calculations reveal that enhanced adhesion mainly stems from improved adsorption energy endowed by introduced oxygen functional groups The study demonstrates the effectiveness of this designed PMPJ in strengthening polymer–metal interfaces for flexible electronics.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147738207","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Understanding an “In Principle Rather Old Gas Discharge”: Plasma Diagnostics on Dielectric Barrier Discharges","authors":"Ronny Brandenburg,&nbsp;Hans Höft","doi":"10.1007/s11090-026-10649-5","DOIUrl":"10.1007/s11090-026-10649-5","url":null,"abstract":"<div><p>Dielectric barrier discharges are one of the most applied and investigated atmospheric pressure plasma source, but also a challenge for plasma diagnostics. Here, a brief historical overview of diagnostics of the physical behavior and basis plasma parameters for barrier discharges is provided by mentioning selected highlights over the last about ninety years and the discussion of some developments after the first application of the diagnostic methods. Furthermore, current issues in research are addressed. Rather than focusing on the methodology of the respective diagnostics, it aims to summarize the progress made in the field on barrier discharges in particular, and to highlight the challenges posed by this type of gas discharge.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10649-5.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147738208","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Soil Nitrogen Enrichment with Atmospheric Pressure Cold Plasma for Higher Wheat Plants Growth","authors":"Sushma Jangra,&nbsp;Ritesh Mishra,&nbsp;Abhijit Mishra,&nbsp;Shikha Pandey,&nbsp;Ram Prakash","doi":"10.1007/s11090-026-10663-7","DOIUrl":"10.1007/s11090-026-10663-7","url":null,"abstract":"<div><p>This study explores the application of an Atmospheric-pressure Cold plasma-based Dielectric Barrier Discharge (ACP-DBD) reactor to enhance soil fertility by increasing concentrations of nitrite, nitrate, and ammonium. The ACP-DBD system, powered by a bipolar pulsed power supply, was optimized by adjusting applied voltage, frequency, and treatment duration, with optimal plasma conditions identified at 10 kV and 20 kHz. Reactive species were analysed using Optical Emission Spectroscopy (OES). Additionally, the study investigates the reactor’s electrical characteristics and temperature fluctuations, offering insights into its operational performance and efficiency. The optimized ACP-DBD treatment (10 kV/20 kHz, 15 min) resulted in a significant enhancement of nitrogen species in the soil, with NO₃-N concentration increasing from 678.87 to 1858 mg/kg, NO₂-N concentration increasing from 0.59 to 2.06 mg/kg, and NH₄-N concentration increasing from 1.46 to 11.64 µg/kg compared to the untreated soil. To assess the impact of ACP-DBD treatment, key soil properties were analysed, including pH, electrical conductivity (EC), moisture content, bulk density and total porosity. Furthermore, X-ray fluorescence (XRF) and ICP-MS analysis were conducted for multi-element composition evaluation. Results indicated that plasma treatment influenced the concentration of various soil elements. Additionally, the plasma-treated soil was stored for 30 days to monitor the changes in various nitrogen components over time. Wheat plants were also grown for 30 days to evaluate the growth potential of plasma-treated soil, and accordingly their germination characteristics were analysed. The results indicated that ACP-DBD plasma treatment enhanced plant-available nitrogen species (NO₃⁻-N, NO₂⁻-N, and NH₄⁺-N) in the investigated soil under the specific experimental conditions highlighting its potential for modifying soil nitrogen chemistry for future soil fertility and supporting sustainable agricultural productivity.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147667749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Advancements in Corrosion Protection for Metallic Surfaces Using Plasma: Progress, Challenges, and Opportunities","authors":"C. A. Cuao-Moreu,&nbsp;R. Jafari,&nbsp;J. Pulpytel","doi":"10.1007/s11090-026-10644-w","DOIUrl":"10.1007/s11090-026-10644-w","url":null,"abstract":"<div><p>Corrosion causes early component failure, human injury, and material losses. To address this, several corrosion protection methods are available. The plasma process has emerged as a promising solution for modifying the surface properties of metallic materials. It forms a protective layer on the surface to reduce corrosion or enhance surface reactivity for coating deposition. Moreover, plasma technology enables the deposition of polymer species onto metallic surfaces, providing enhanced corrosion resistance. Plasma can also improve coating polymerization and adhesion as a post-treatment step. This paper explores recent progress in using the plasma process to prevent corrosion on metallic surfaces. It provides an overview of corrosion fundamentals and plasma technology basics. </p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 3","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147606459","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Two-Dimensional Simulation of the Discharge Characteristics of He Atmospheric Pressure Plasma Jet Array","authors":"Lijun Wang,&nbsp;Junxian Liu,&nbsp;Qinghua Shi,&nbsp;Zhongji Han,&nbsp;Huan Zhao","doi":"10.1007/s11090-026-10662-8","DOIUrl":"10.1007/s11090-026-10662-8","url":null,"abstract":"<p>In this paper, 2D model of APPJ array is established to investigate the interaction between jets in He APPJ array and plasma parameter distribution. The effects of gas flow rate, ignition voltage amplitude, and number of dielectric tubes on discharge characteristics were simultaneously investigated. Simulation results indicate that within the mixing zone, the combined effects of gas flow distribution and spatial electric fields cause lateral jets to deflect toward central jet. The intensity and propagation velocity of jets exhibit a distribution pattern where outer regions are higher while inner regions are lower. The ionization mechanisms of side and central jet differ, resulting in higher electron temperatures and charge densities at outer edges and heads, while central jet forms ring-shaped structure.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 3","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-03-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147607384","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Separation of Plasma Agents Generated by Multi-Hollow Surface Dielectric Barrier Discharge and their Effects on Biological Samples","authors":"Martin Kuťka,&nbsp;Sára Pišteková,&nbsp;Michal Stano,&nbsp;Stanislav Kyzek,&nbsp;Eliška Gálová,&nbsp;Veronika Medvecká,&nbsp;Anna Zahoranová","doi":"10.1007/s11090-026-10661-9","DOIUrl":"10.1007/s11090-026-10661-9","url":null,"abstract":"<div><p>Cold atmospheric pressure plasma has emerged as a promising tool for various bioapplications due to its capability to generate a rich mixture of reactive agents. However, it is often unclear to what extent individual plasma agents, such as ions, reactive neutral species, and UV radiation, contribute to the observed biological effects. This study addresses this issue by using a multi-hollow surface dielectric barrier discharge in combination with an electrical grid and optical window to separate and investigate the effects of individual plasma agents. Ion current measurements, optical emission spectroscopy, and FTIR spectroscopy were employed to characterize the plasma agents formed in ambient air, nitrogen, and oxygen. Experiments on the inactivation of bacteria <i>Salmonella typhimurium</i> showed different effects of individual plasma agents depending on the working gas. The effect of UV radiation was observed only in nitrogen, supported by the results of optical emission spectroscopy. Unlike in air, where ion presence had no observable effect, distinct outcome in oxygen indicated a specific role of oxygen ions. In experiments with pBR322 plasmid DNA, the highest damage was observed in air, followed by oxygen and nitrogen, with no significant difference between treatments with and without ions. In oxygen, however, UV-induced damage was prominent, contrasting with bacteria inactivation and probably linked to the formation of reactive oxygen species, as indicated by DMSO scavenging test.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 3","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-03-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10661-9.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147606990","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}