高激发KrCl正向反应Kr/Cl2 DBD激光剂的数值研究

IF 2.5 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Jiaqi Shi, Xueqing Yan, Wei Hua, Ying Chang, Guang Chang
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引用次数: 0

摘要

建立了Kr/Cl2介质阻挡放电(DBD)的激电模型,并通过实验证明了模型的合理性。它包括高激发KrCl的正向反应,如鱼叉反应、猝灭反应和放电辐射。基于正反应体系,我们绘制了反应路径的能级图,为深入理解活化的KrCl和Kr2Cl化学过程对222 nm辐射产生和增强的影响奠定了基础。当KrCl激发态转变为Kr2Cl时,猝灭平衡效应增强,微放电幅度减小,放电电流由于内部场阻而出现滞后。每增加20毫巴,激发的KrCl粒子密度降低7.6%,功率效率提高1.7%,非弹性碰撞的可能性更高。更大比例的氯增加了与氯反应的可能性,抑制了辐射粒子的产生并增强了辐射反应的猝灭。该作用平衡了Kr和Cl的数值浓度,并强烈抑制了激发的Kr2Cl粒子。仿真结果表明,当325 nm辐射在光谱中的比例从6%下降到1%时,对电源效率的干扰可以忽略不计。放电间隙的变化会引起放电方式的变化,放电间隙越大,辉光放电越强烈。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Numerical Study on Kr/Cl2 DBD Excilamp with Forward Reactions of Higher Excited KrCl

We establish an excilamp model of the Kr/Cl2 Dielectric Barrier Discharge (DBD) and prove the rationality of the model by the experiment. It includes forward reactions of higher excited KrCl, such as the harpooning reaction, quenching reaction, and discharge radiation. Based on the forward reaction system, we present an energy level diagram of the reaction path, which serves as a foundation for deeper comprehension of the impact of the activated KrCl and Kr2Cl chemical processes on the production and intensification of radiation at 222 nm. The microdischarge amplitude appears to be reduced due to the quenching equilibrium effect which is enhanced when the KrCl excited state converts to Kr2Cl and the discharge current appears to lag due to the figinternal field resistance. The density of excited KrCl particles decreases by 7.6% and power efficiency rises by 1.7% lift with every 20 mbar increment for a higher probability of inelastic collision. A greater proportion of chlorine increases the probability of a reaction with chlorine, inhibiting the creation of radiation particles and enhancing the quenching of radiation reactions. The action balances the numerical concentrations of Kr and Cl and strongly suppresses the excited Kr2Cl particles. The simulation demonstrates that there are negligible disturbance on power supply efficiency as the proportion of 325 nm radiation in the spectrum decreases from 6 to 1%. The change of discharge gap will cause the change of discharge mode, and higher discharge gap will cause more intense glow discharge.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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