Numerical Study on Kr/Cl2 DBD Excilamp with Forward Reactions of Higher Excited KrCl

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2024-12-17 DOI:10.1007/s11090-024-10535-y

Jiaqi Shi, Xueqing Yan, Wei Hua, Ying Chang, Guang Chang

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引用次数: 0

Abstract

We establish an excilamp model of the Kr/Cl₂ Dielectric Barrier Discharge (DBD) and prove the rationality of the model by the experiment. It includes forward reactions of higher excited KrCl, such as the harpooning reaction, quenching reaction, and discharge radiation. Based on the forward reaction system, we present an energy level diagram of the reaction path, which serves as a foundation for deeper comprehension of the impact of the activated KrCl and Kr₂Cl chemical processes on the production and intensification of radiation at 222 nm. The microdischarge amplitude appears to be reduced due to the quenching equilibrium effect which is enhanced when the KrCl excited state converts to Kr₂Cl and the discharge current appears to lag due to the figinternal field resistance. The density of excited KrCl particles decreases by 7.6% and power efficiency rises by 1.7% lift with every 20 mbar increment for a higher probability of inelastic collision. A greater proportion of chlorine increases the probability of a reaction with chlorine, inhibiting the creation of radiation particles and enhancing the quenching of radiation reactions. The action balances the numerical concentrations of Kr and Cl and strongly suppresses the excited Kr₂Cl particles. The simulation demonstrates that there are negligible disturbance on power supply efficiency as the proportion of 325 nm radiation in the spectrum decreases from 6 to 1%. The change of discharge gap will cause the change of discharge mode, and higher discharge gap will cause more intense glow discharge.

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.