Plasma Chemistry and Plasma Processing最新文献

{"title":"Low-Pressure Plasma-Assisted CO2 Decomposition: A Comparative Study Under Dry and Wet Conditions","authors":"Pankaj Attri,&nbsp;Hibiki Otobe,&nbsp;Takamasa Okumura,&nbsp;Kazunori Koga,&nbsp;Masaharu Shiratani","doi":"10.1007/s11090-026-10678-0","DOIUrl":"10.1007/s11090-026-10678-0","url":null,"abstract":"<div><p>In this study, we used a low-pressure radio-frequency plasma operating at a frequency of 145 MHz to dissociate the CO₂. It examines the effects of pressure (60, 100, and 150 Pa) and humidity (&lt; 1%) on plasma assisted CO₂ products. Optical emission spectroscopy analyzed the different dissociation products of CO₂ under all treatment conditions. Additionally, SPECAIR software was used to calculate electronic, rotational and vibrational temperatures at different treatment conditions. Electronic, rotational, and vibrational temperature measurements of the CO₂ plasma with or without humidity reveal in the range of 0.93–1.40 eV, 943–1168 K, and 4611–7890 K, respectively, at various pressure conditions. This information was subsequently used to perform a 0D simulation using COMSOL Multiphysics to study changes in the density of reactive species produced after CO₂ dissociation. Analysis of experimental and simulation data suggests that the reaction between atomic oxygen (O) and carbon monoxide ions (CO⁺) may play an important role in the formation of carbon monoxide (CO).</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148172739","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Experimental Verification of Laminar Gas Flows and Localized Plasma-Induced Perturbations in a Microcavity Plasma Array","authors":"David Steuer,&nbsp;Alexander Böddecker,&nbsp;Felix Awakowicz,&nbsp;Henrik van Impel,&nbsp;Ihor Korolov,&nbsp;Thomas Mussenbrock,&nbsp;Volker Schulz-von der Gathen,&nbsp;Marc Böke,&nbsp;Judith Golda","doi":"10.1007/s11090-026-10677-1","DOIUrl":"10.1007/s11090-026-10677-1","url":null,"abstract":"<div><p>Dielectric barrier discharges (DBDs), and in particular microcavity plasma arrays (MCPAs), represent a promising reactor platform for plasma-catalytic studies, as they allow plasma generation directly at catalytic surfaces, thereby providing direct access to the investigation of plasma–surface interactions. In addition to fundamental plasma parameters such as electric fields and species densities, the gas flow through the reactor plays a crucial role in the process. It directly determines the effective treatment time and volume, while the underlying flow dynamics govern the transport of plasma-generated species such as reactive molecules and atoms. Besides the reactor geometry, the discharge itself may influence the flow through induced forces, potentially generating vortices and enhancing mixing, which could improve conversion efficiency. While complex flow fields may be desirable for maximizing process efficiency, research reactors such as the MCPA benefit from predictable transport conditions when the primary objective is the study of plasma–surface interactions. In this study, the flow dynamics within an MCPA reactor are investigated using particle image velocimetry (PIV) in helium. Spatially and temporally resolved measurements are used to analyze the influence of the plasma discharge on the gas flow. The results show that the discharge can exert a measurable influence on the flow field; however, this effect is spatially confined to a region within approximately 0.5 mm distance from the electrode and is most pronounced during the ignition phase of the discharge. During steady-state operation, the plasma has no significant impact on the overall flow behavior. Under these conditions, the velocity field can be described by a classical laminar Poiseuille profile.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10677-1.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148009562","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Liquid-Phase Composition Modulates Reactive Oxygen and Nitrogen Species Formation During Nonthermal Dielectric Barrier Discharge Plasma Treatment","authors":"Kyoung Lee,&nbsp;Munkhtsatsral Ganzorig,&nbsp;Chuhyun Cho,&nbsp;Yun-Sik Jin","doi":"10.1007/s11090-026-10675-3","DOIUrl":"10.1007/s11090-026-10675-3","url":null,"abstract":"<div><p>The accumulation of nitrification products, specifically nitric acid (HNO₃) and nitrous acid (HNO₂), along with reactive oxygen species (ROS) such as H₂O₂, was investigated following cold atmospheric-pressure dielectric barrier discharge (DBD) plasma treatment of various liquid phases. Plasma generated by a planar DBD with a mesh electrode positioned above deionized water produced nitrification products without detectable accumulation of H₂O₂. In contrast, methanol and ethanol promoted H₂O₂ accumulation. Other organic solvents, including ethyl acetate, <i>t</i>-butanol, hexane, acetonitrile, dichloromethane and acetone, also yielded nitrification products, with most solvents exhibiting concurrent H₂O₂ formation, except acetonitrile. To further elucidate the role of liquid-phase composition, selected additives, including ROS quenchers, were introduced into aqueous systems to probe specific reaction pathways, and their effects on pH, oxidation–reduction potential, and nitrification were examined. Notably, hydroxyl radical scavengers showed negligible effects on nitrification in deionized water. In acidic aqueous solutions, L-glutathione (GSH) underwent S-nitrosylation to form GS-NO, whereas in 10% methanol-water mixtures, GSH was additionally converted into oxidized products, including GS-CH₂OH, GSO₃H, and GSSG. Phenol in deionized water was primarily converted into 4-nitrosophenol, 2-nitrophenol, and 4-nitrophenol, without detectable oxygenated products. Overall, these results indicate that liquid-phase composition modifies plasma–liquid chemistry and stable product distributions.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10675-3.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148009238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Application of ICP Plasma for Obtaining Chemically and Isotopically Pure Silicon","authors":"Kornev Roman,&nbsp;Bulanov Andrey","doi":"10.1007/s11090-026-10671-7","DOIUrl":"10.1007/s11090-026-10671-7","url":null,"abstract":"<div><p>Using low-pressure ICP discharge, isotopically pure ²⁸Si was obtained from ²⁸SiF₄. The dependence of the ²⁸SiF₄ conversion degree and the yield of the main reaction products on the composition of the initial mixture and the reagent ratio were studied. Optimum conditions providing a high conversion degree of SiF₄ were found. It was shown that along with the formation of silicon with a degree of conversion of SiF₄ into silicon equal to 85%, an insignificant formation (no more than 5% conversion of SiF₄ into SiHF₃) of SiHF₃ is observed. The physical parameters of the T_e, N_e plasma and the composition of active particles in it depend on the H₂/Ar/SiF₄ gas mixture ratio. Under optimal conditions, a sample of polycrystalline isotopically enriched ²⁸Si with an enrichment degree of 99.76% was obtained. Its impurity, isotopic and phase composition, as well as surface morphology and Raman spectra were studied. The obtained high-purity and isotopically pure silicon can be used as a material for creating a quantum computer and highly sensitive detectors of ionizing radiation.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148009239","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"One-Step Deposition of Doped Graphene-Based Diamond Hybrid Using PECVD","authors":"Diaa Ibrahim,&nbsp;Farouk Elakshar,&nbsp;Ashraf F. El-Sherif,&nbsp;Mansour ElSabbagh,&nbsp;Wafaa Soliman","doi":"10.1007/s11090-026-10673-5","DOIUrl":"10.1007/s11090-026-10673-5","url":null,"abstract":"<div><p>A homemade plasma-enhanced chemical vapor deposition (PECVD) system was built and used to deposit a doped graphene-based diamond hybrid. The PECVD system was based on asymmetric capacitively coupled RF configuration. The deposition was carried out under a wide pressure range of argon-acetylene mixtures (25 mbar − 700 mabr) and the discharge RF power was kept at 100 watts. The deposited material was examined using XRD, TEM, Raman, FTIR and SAED characterization techniques. The characterization techniques revealed that the deposited material was a doped graphene-based diamond hybrid which is the first time to our knowledge, no prior report has demonstrated of a single-step synthesis of an N-doped graphene–diamond hybrid using an Ar/C₂H₂ RF-CCP system without introducing any nitrogen-containing precursor, external heating, or using any catalyst, accompanied by the formation of an interfacial CuCN phase.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148009371","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Diagnostic Study of Plasma Parameters with Spatial Distribution for the Non-thermal arc at Atmospheric Pressure","authors":"Xianhui Chen,&nbsp;Defu Kong,&nbsp;Cheng Zhu,&nbsp;Haoxin Hu,&nbsp;Fangquan Wang,&nbsp;Weidong Xia","doi":"10.1007/s11090-026-10654-8","DOIUrl":"10.1007/s11090-026-10654-8","url":null,"abstract":"<div><p>Important basic parameters for the study of non-equilibrium plasmas are the electron number density <i>N</i>_<i>e</i>, electron temperature <i>T</i>_<i>e</i> and heavy particle temperature <i>T</i>_<i>h</i> of non-thermal arc plasmas at atmospheric pressure. In this study, based on electrical diagnosis, array fiber-emission spectroscopy, and M-Z holographic interferometric optical diagnosis, non-thermal arc spatial parameters were diagnosed, particularly the large parameter gradient distribution due to the interaction between the non-thermal arc and cold air. The results show that the non-thermal arc plasma is in a partial LTE state when the current is less than 1 A and the electron number density reaches 10¹⁶cm^− 3. For Ar/N₂ arc discharge in pLTE state, the volt-ampere characteristics are decreased, and the arc column cooling is strengthened after the increase of gas flow rate, resulting in the increase of discharge voltage and electric field strength in the arc column region, and the pLTE plasma deviates from the local thermodynamic equilibrium. The maximum values of electron temperature and heavy particle temperature are concentrated in the near cathode region of the arc column, and the radial distribution is Gaussian. The number density of electrons in the core region of the non-thermal arc is ~ 10¹⁶cm^− 3, and its maximum value is distributed near the cathode region and decreases along the axis, while radial distribution is in line with the bell-like distribution. When the distance from the axis to ~1 mm, electron density rapidly decreases to the center range of 1 ~ 2 orders of magnitude.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147937981","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Dissociative Metal Oxide Reduction using an Ar/H2Plasma: Influence of Thermodynamic Stability of Oxides","authors":"Sachin Kumar,&nbsp;Mohammad Kazemi,&nbsp;Julian Held,&nbsp;Himashi Andaraarachchi,&nbsp;Peter Bruggeman,&nbsp;Uwe Kortshagen","doi":"10.1007/s11090-026-10672-6","DOIUrl":"10.1007/s11090-026-10672-6","url":null,"abstract":"<div><p>Metals and alloy production contribute ~ 10% of the global greenhouse gas emissions, largely due to the carbon-based reduction of mineral oxides. This significant environmental impact has driven a global search for carbon-free alternatives to conventional reduction processes. Among the emerging technologies, hydrogen plasma-based reduction processes are promising candidates. Here, we assess the applicable range of dissociative metal oxide reduction with argon-hydrogen plasmas through experiments, conducted in a microwave plasma reactor with a residence time on the order of 10 ms, and thermodynamic calculations. Metal oxides with increasing thermodynamic resistance to reduction by hydrogen are explored: NiO, Fe₃O₄, ZnO, Cr₂O₃, MnO₂, and SiO₂. Experiments reveal the successful reduction of NiO, Fe₃O₄, and ZnO to their respective metals. Cr₂O₃ is found to reduce to a mix of metallic Cr, Cr₂O₃, and an unidentified CrO_x phase. MnO₂ and SiO₂ are only partially reduced to MnO and SiO_x&lt;2 with embedded Si nanocrystals, respectively. Thermodynamic calculations, along with the experimental results, elucidate the respective pathways for dissociative reduction and the key steps limiting the process.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147937979","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Copper Thin Film–Assisted LIBS Analysis of Glass Using the Fundamental Wavelength (1064 nm) of the Nd: YAG Laser","authors":"Aleksandra Šajić,&nbsp;Dragan Ranković,&nbsp;Miroslav Ristić,&nbsp;Milica Marković,&nbsp;Miroslav Kuzmanović","doi":"10.1007/s11090-026-10674-4","DOIUrl":"10.1007/s11090-026-10674-4","url":null,"abstract":"<div><p>Laser-induced breakdown spectroscopy (LIBS) analysis of glass at 1064 nm is challenging due to the high transparency of glass, which leads to weak plasma emission, surface damage, and unstable ablation behavior. In this work, a thin copper layer was applied to glass samples to address these limitations. The copper layer acts as an absorptive intermediate layer enabling reliable plasma formation and signal detection, allowing improved detectability and reproducibility of elemental analysis. Detection limits (LODs) for Fe, Ti, Ba, Co, and Cr were determined, ranging from 4 to 13 ppm depending on the element. Cobalt and chromium concentrations were quantified using calibration curves, showing good linearity (R² = 0.994 for Cr, 0.975 for Co) over 0.01–0.25% analyte concentration. Plasma diagnostics were performed using selected spectral lines to determine excitation temperature and electron density, confirming stable plasma conditions and supporting the observed signal intensities. Overall, the application of a thin copper layer enables effective and reproducible Nd: YAG LIBS analysis of glass at 1064 nm. This approach provides a practical solution for quantitative LIBS analysis of transparent materials.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147937980","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Efficient Degradation of PFOA by Dielectric Barrier Discharge: Interfacial Enrichment, Parameters Optimization, and Synergetic System","authors":"Shaohua Sun,&nbsp;Hui Liu,&nbsp;Yu Zhang,&nbsp;Jinglin Liu,&nbsp;Xiaomei Zhu,&nbsp;Ziwei Yao,&nbsp;Bing Sun","doi":"10.1007/s11090-026-10668-2","DOIUrl":"10.1007/s11090-026-10668-2","url":null,"abstract":"<div><p>Perfluorooctanoic acid (PFOA) is a persistent organic pollutant ubiquitous in aquatic environment, which poses a major threat to ecosystem and human health. In this work, the dielectric barrier discharge (DBD) system degraded PFOA effectively, and the removal rate of PFOA with initial concentration of 10 mg/L and 2 mg/L was 100% within 15 min of discharge. The enhanced degradation effect was observed at higher initial concentration and lower pH value, which was attributed to the enrichment of surfactant-driven PFOA at the gas-liquid interface. Mechanistic investigations based on radical diagnosis and organofluorine intermediate analysis revealed that the degradation proceeds via a synergistic action of electrons and ·OH, with electron-induced defluorination being the dominant pathway. In addition, the degradation efficiency can be further improved by optimizing discharge parameters or adding Fe²⁺, persulfate or choloride. This study supports a micro-reaction mechanism for the degradation of PFOA by DBD plasma, and provides a reference for improving the degradation efficiency of perfluorinated compounds.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture><span>The alternative text for this image may have been generated using AI.</span></div></div></figure></div></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147937974","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Comparative Efficacy of In-Situ Solution Plasma versus Plasma-Activated Water Soaking in Controlling Bacterial Fruit Blotch of Melon Seeds","authors":"Shan-Shan Peng,&nbsp;Yu-He Chen,&nbsp;Na-Na Zhang,&nbsp;Shan-Teng Zhang,&nbsp;Ting Fan,&nbsp;Xiao-Dong Wang","doi":"10.1007/s11090-026-10669-1","DOIUrl":"10.1007/s11090-026-10669-1","url":null,"abstract":"<div><p>Plasma-based seed treatment has attracted growing interest for its potential in sustainable agriculture, yet the distinction between in-situ solution plasma (IS-SP) and plasma-activated water soaking (PAW-SS) approaches in efficacy and mechanism remains unclear. This study employs an underwater array gas-liquid discharge system to compare their effects on melon seeds infected with <i>Acidovorax citrulli</i> (Ac). Both treatments achieved effective pathogen inactivation, improved germination, reduced disease incidence, and enhanced seedling physiology—but with distinct temporal advantages. IS-SP significantly accelerated early germination, showing a 14.9% higher germination potential than PAW-SS. In contrast, PAW-SS excelled in sustained pathogen suppression and subsequent growth promotion, resulting in 93.1% higher catalase activity and 9.8% greater soluble protein content, along with superior root length (5.1%), leaf area (6.9%), stem diameter (8.6%), and plant height (9.6%) by day 30. Mechanistic studies revealed that both approaches caused visible seed coat etching. Optical emission spectroscopy indicated substantial consumption of reactive species (NO, •OH, N₂, N₂⁺, Hα, and O) in the presence of seeds. XPS analysis further demonstrated that IS-SP more effectively cleaved C-C/C-H bonds and promoted the formation of oxygen-containing functional groups (C-O, C = O), thereby facilitating rapid physicochemical modification of the seed coat. PAW-SS, however, relied on long-lived chemical species (NO₂⁻, NO₃⁻, H₂O₂) and an acidic environment to provide continuous disinfection and nitrogen nutrition, supporting prolonged seedling development. These results demonstrate the complementary roles of IS-SP and PAW-SS: IS-SP is superior at rapid germination activation, whereas PAW-SS is effective for sustained microbial control and growth promotion, providing a strategy for precision prevention and control of bacterial diseases in cucurbit crops.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 4","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147797050","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}