Plasma Chemistry and Plasma Processing最新文献_第5页

Enhancement of W Nanoparticles Synthesis by Injecting H2 in a Magnetron Sputtering Gas Aggregation Cluster Source Operated in Ar 在氩气环境下运行的磁控溅射气体聚集簇源中注入 H2，提高 W 纳米粒子的合成效率

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-09-03 DOI: 10.1007/s11090-024-10499-z

Tomy Acsente, Silviu Daniel Stoica, Cristina Craciun, Bogdana Mitu, Gheorghe Dinescu

引用次数: 0

Reaction Pathways and Energy Consumption in NH3 Decomposition for H2 Production by Low Temperature, Atmospheric Pressure Plasma 低温常压等离子体分解 NH3 产生 H2 的反应途径和能耗

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-08-28 DOI: 10.1007/s11090-024-10501-8

Brian N. Bayer, Aditya Bhan, Peter J. Bruggeman

{"title":"Reaction Pathways and Energy Consumption in NH3 Decomposition for H2 Production by Low Temperature, Atmospheric Pressure Plasma","authors":"Brian N. Bayer, Aditya Bhan, Peter J. Bruggeman","doi":"10.1007/s11090-024-10501-8","DOIUrl":"10.1007/s11090-024-10501-8","url":null,"abstract":"<div>Pathways for NH3 decomposition to N2 and N2H4 by atmospheric pressure nonthermal plasma are analyzed using a combination of molecular beam mass spectrometry measurements and zero-dimensional kinetic modeling. Experimental measurements show that NH3 conversion and selectivity towards N2 formation scale monotonically with the specific energy input into the plasma with ~ 100% selectivity to N2 formation achieved at specific energy inputs above 0.12 J cm−3 (3.1 eV (molecule NH3)−1). The kinetic model recovers these trends, although it underpredicts N2 selectivity at low specific energy input. These discrepancies can be explained by the underestimation of reaction rate coefficients for reactions that consume N2Hx species in collisions with H radicals and/or radial nonuniformities in power deposition, gas temperature, and species concentrations that are not represented by the plug flow approximation used in the model. The kinetic model shows that N2 formation proceeds through N2Hx decomposition pathways rather than NHx decomposition pathways in low temperature, atmospheric pressure plasma. Higher selectivity toward N2 production can be achieved by operating at higher NH3 conversion and with a higher gas temperature. The high energy cost of NH3 decomposition by atmospheric pressure nonthermal plasma found in this work (25–50 eV (molecule NH3 converted)−1; 17–33 eV (molecule H2 formed)−1) is a result of the energy requirement for electron-impact dissociation of NH3 and the significant re-formation of NH3 by three-body recombination reactions between NH2 and H.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2101 - 2118"},"PeriodicalIF":2.6,"publicationDate":"2024-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Capture and Conversion of CO2 from Ambient Air Using Ionic Liquid-Plasma Combination 利用离子液体-等离子体组合捕获和转化环境空气中的二氧化碳

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-08-27 DOI: 10.1007/s11090-024-10500-9

Sukma Wahyu Fitriani, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Pankaj Attri

{"title":"Capture and Conversion of CO2 from Ambient Air Using Ionic Liquid-Plasma Combination","authors":"Sukma Wahyu Fitriani, Takamasa Okumura, Kunihiro Kamataki, Kazunori Koga, Masaharu Shiratani, Pankaj Attri","doi":"10.1007/s11090-024-10500-9","DOIUrl":"10.1007/s11090-024-10500-9","url":null,"abstract":"<div>Climate change is considered one of the main challenges in this century, and CO2 emissions significantly cause it. Integrating CO2 capture, storage, and conversion is proposed to solve this problem. 1-Butyl-3-methylimidazolium chloride ([Bmim]Cl) ionic liquid was employed to capture and store CO2 from the air and subsequently converted into CO using non-thermal plasma. Moreover, we also tested the CO2 capture and storage capacity of water from different sources, e.g., Milli-Q, deionized water, and tap water. [Bmim]Cl solution captured CO2 from the air and then converted to CO after 24 h using plasma. In comparison with water (Milli-Q water, deionized water, and tap water), CO production was increased by 28.31% in the presence of water (Milli-Q water, deionized water, and tap water) + [Bmim]Cl. It suggests that this method could be a promising way to capture, store, and convert CO2 from air at atmospheric pressure and room temperature as an effort to reduce carbon emission.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2153 - 2162"},"PeriodicalIF":2.6,"publicationDate":"2024-08-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor 在电感耦合等离子体反应器中使用多通道光学发射光谱和扫描浮动谐波探针监测光刻胶蚀刻的蚀刻速率均匀性

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-08-18 DOI: 10.1007/s11090-024-10498-0

Sanghun Lee, Sanghee Han, Jaehyeon Kim, Minsung Jeon, Heeyeop Chae

{"title":"Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor","authors":"Sanghun Lee, Sanghee Han, Jaehyeon Kim, Minsung Jeon, Heeyeop Chae","doi":"10.1007/s11090-024-10498-0","DOIUrl":"10.1007/s11090-024-10498-0","url":null,"abstract":"<div>The etch rate uniformity in photoresist etching was monitored using multi-channel optical emission spectroscopy (OES) and a spatially resolved etch rate model incorporating radical and ion etching characteristics. The F radical densities at various locations were estimated using 8-channel OES and applied to a radical-spontaneous etch rate model to examine the impact of radicals on the etch rate. The ion fluxes were measured using a scanning floating harmonic probe for an ion-enhanced etch rate model to investigate the effect of ions on the etch rate. A combined etch rate model was proposed to explain the effects on both radical and ion etching characteristics, and the etch rates and etch rate uniformities predicted by the model were quantitatively compared with the measured values. The calculated R-squared score (R2) and the mean absolute percentage error (MAPE) of the etch rates predicted by the model were 0.99 and 1.3%, respectively. The etch rate uniformities predicted by the model showed good accuracy with R2 of 0.99 and MAPE of 12.0% compared to the measured values, and the combined etch rate model also successfully predicted the distribution of the etch rate. This study demonstrates that multi-channel OES and the developed model can quantitatively predict the etch rate distribution of plasma etching processes.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2247 - 2262"},"PeriodicalIF":2.6,"publicationDate":"2024-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226337","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Plasma Catalytic Non-Oxidative Conversion of Methane into Hydrogen and Light Hydrocarbons 等离子体催化甲烷非氧化转化为氢和轻烃

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-08-17 DOI: 10.1007/s11090-024-10497-1

Yonggang Gang, Yanhui Long, Kaiyi Wang, Yilin Zhang, Xuping Ren, Hao Zhang, Xiaodong Li

{"title":"Plasma Catalytic Non-Oxidative Conversion of Methane into Hydrogen and Light Hydrocarbons","authors":"Yonggang Gang, Yanhui Long, Kaiyi Wang, Yilin Zhang, Xuping Ren, Hao Zhang, Xiaodong Li","doi":"10.1007/s11090-024-10497-1","DOIUrl":"10.1007/s11090-024-10497-1","url":null,"abstract":"<div>Recently, direct non-oxidative conversion of methane (NOCM) into hydrogen and light hydrocarbons has garnered considerable attention. In our work, we employed a dielectric barrier discharge (DBD) plasma over a GaN/SBA15 catalyst for NOCM. Adding catalyst to plasma remarkably promotes the conversion of CH4, resulting in a significant improvement, for instance, from 27.8 to 39.2%. A systematic investigation of plasma performance at different discharge powers with and without catalyst was conducted. In the case of plasma + 15wt% GaN/SBA15, CH4 conversion reaches an impressive 79.4%. However, it exhibits the lowest selectivity of 14.4% for C2+, while achieving the highest selectivity for hydrogen at 48.9%. Several characterization methods, including XRD, SEM, BET, XPS, and TPO-MS, were used to study the mechanism of the reaction. Plasma electrons and ions can effectively interact with activated CH3 radicals, promoting their adsorption onto Ga sites on the catalyst surface. Simultaneously, hydrogen atoms adsorb onto neighboring N atoms, rapidly delocalizing to produce H2, and the delocalization of hydrogen atoms in C species leads to the formation of species like CxHy. This study highlights the potential of plasma catalysis in significantly improving CH4 conversion at lower temperatures and atmospheric pressure.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2011 - 2029"},"PeriodicalIF":2.6,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142205543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Numerical Simulation of the Ionic Composition and Ionization Phenomena in the Positive Column of a Millisecond DC-Pulsed Glow-Type Discharge in Atmospheric Pressure Air with a Water-Cathode 带水阴极的大气压空气中毫秒直流脉冲辉光型放电正柱中离子成分和电离现象的数值模拟

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-08-11 DOI: 10.1007/s11090-024-10496-2

M. G. Ferreyra, E. Cejas, B. Santamaría, J. C. Chamorro, B. J. Goméz, L. Prevosto

{"title":"Numerical Simulation of the Ionic Composition and Ionization Phenomena in the Positive Column of a Millisecond DC-Pulsed Glow-Type Discharge in Atmospheric Pressure Air with a Water-Cathode","authors":"M. G. Ferreyra, E. Cejas, B. Santamaría, J. C. Chamorro, B. J. Goméz, L. Prevosto","doi":"10.1007/s11090-024-10496-2","DOIUrl":"10.1007/s11090-024-10496-2","url":null,"abstract":"<div>A numerical investigation of a glow-type discharge in humid air with a water-cathode is reported. A complete block of chemical reactions that self-consistently describes the ionic composition of the plasma is considered. A water molar fraction up to 20% is examined. The electric field strength, emission discharge radius, as well as the OH (A → X) band emission in the positive column was also measured for discharge currents up to 155 mA. The model shows a non-thermal plasma with lower gas temperatures (around 3500 K) than those typically obtained in similar discharges but operating with metal electrodes in dry air. The gas temperature is almost unaffected by the discharge current. The vibrational relaxation through N2–H2O collisions is the main gas heating mechanism. The thermal diffusion due to enhanced thermal conductivity by water vapor is the primary cooling mechanism. The electron temperature is around 1 eV to ensure that the electron losses (mainly by dissociative recombination of NO+) are compensated by ionization phenomena. The NO+ is the dominant ion, mainly formed by electron-impact ionization of NO molecules. An electron number density close to 1019 m−3 is obtained. For the upper water fraction, the electron-impact ionization of O2 molecules, followed by a quick conversion to NO+, also plays a role. The concentration of OH is ~ 1022 m−3. A comparison between the model results and the experimental data suggests that the molar fraction of water in the plasma is around 20% for the conditions considered.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 6","pages":"2199 - 2231"},"PeriodicalIF":2.6,"publicationDate":"2024-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141948039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Ar-O2 Plasma-Induced Grafting of Quaternary Ammonium on Polyvinyl Chloride Surface to Improve its Antimicrobial Properties Ar-O2 等离子体诱导季铵在聚氯乙烯表面接枝以改善其抗菌性能

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-07-30 DOI: 10.1007/s11090-024-10495-3

Sui Siyuan, Ni Guohua, Sun Hongmei, Kong Ling, Sun Tao

引用次数: 0

Influence of Dielectric Barrier Discharge Power on the Removal of CH4 and NO From Exhaust Emissions of LNG Engines 介质屏障放电功率对液化天然气发动机尾气中甲烷和氮氧化物去除的影响

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-07-15 DOI: 10.1007/s11090-024-10491-7

Zhengtao Zhao, Lin Lyu, Chuang Xiang, Yunkai Cai

{"title":"Influence of Dielectric Barrier Discharge Power on the Removal of CH4 and NO From Exhaust Emissions of LNG Engines","authors":"Zhengtao Zhao, Lin Lyu, Chuang Xiang, Yunkai Cai","doi":"10.1007/s11090-024-10491-7","DOIUrl":"10.1007/s11090-024-10491-7","url":null,"abstract":"<div>This study aims to explore the use of Dielectric Barrier Discharge (DBD) technology for the joint treatment of methane (CH4) and nitrogen oxide (NO) in the exhaust of Liquid Natural Gas (LNG) engines during cold starts and at mid to low loads when the exhaust temperature is below 500 °C. Through experiment and numerical simulation, the effect of discharge power on the removal efficiency of CH4 and NO in the exhaust of LNG engines was investigated under the condition of simulated flue gas temperature at 438 °C. A plasma chemical model suitable for analyzing the mixture of N2/O2/H2O/CH4/NO in the exhaust gases of LNG engines was constructed and validated. The study found that the conversion efficiency of CH4 and NO exhibits different trends with the increase of discharge power, and CH4 tends to be oxidized to CO under plasma conditions. Key reaction pathways for the DBD treatment of CH4, NO, CO, and NO2 were identified, and an important chemical reaction pathway with the potential for the joint treatment of CH4 and NO was found: CH3O2 + NO → CH3O + NO2. Additionally, the crucial pathways for the stable conversion of NO to NO2 were identified: O + NO + N2 → NO2 + N2 and NO + O3 → NO2 + O2, providing forward-looking theoretical guidance for subsequent research on plasma-facilitated selective catalytic reduction of NOx by CH4.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 5","pages":"1925 - 1949"},"PeriodicalIF":2.6,"publicationDate":"2024-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141648868","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Low-Temperature Oxidation of Diesel Particulate Matter Using Dielectric Barrier Discharge Plasma 利用介质阻挡放电等离子体低温氧化柴油微粒物质

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-07-10 DOI: 10.1007/s11090-024-10492-6

Baoyong Ren, Tiantian Zhang, Zuliang Wu, Jing Li, Erhao Gao, Wei Wang, Jiali Zhu, Shuiliang Yao

{"title":"Low-Temperature Oxidation of Diesel Particulate Matter Using Dielectric Barrier Discharge Plasma","authors":"Baoyong Ren, Tiantian Zhang, Zuliang Wu, Jing Li, Erhao Gao, Wei Wang, Jiali Zhu, Shuiliang Yao","doi":"10.1007/s11090-024-10492-6","DOIUrl":"10.1007/s11090-024-10492-6","url":null,"abstract":"<div>The oxidation behavior of actual diesel particulate matter (DPM) prepared from diesel combustion was studied using a dielectric barrier discharge (DBD) reactor. The primary oxidation temperature (T30 at which 30% of DPM was oxidized) was reduced from 524 °C (with non-discharge, NDC) to 409 °C with discharge (DC). It was found that the dry soot (DS) from DPM after dichloromethane extraction was more difficult to be oxidized than DPM due to the loss of soluble organic fraction (SOF) from DPM. The order of activation energies of DPM and DS under conditions of DC and NDC is: DPM–DC < DPM–NDC < DS–DC < DS–NDC. The intermediates of DPM oxidation at different temperatures, pulse peak voltages and reaction gas atmospheres were investigated via operando DRIFTS–MS. It is found that under DC, SOF can be oxidized to oxygen containing compounds (OCC) at low temperatures, and a higher pulse peak voltage is beneficial to DPM oxidation. The main product of 10 vol% O2/N2 discharge gas is high valence nitrogen oxides like NO2, which participates in DPM oxidation. DBD plasma enhances DPM oxidation primarily through two mechanisms: first, by ionizing O2 to produce strong oxidizing substances, and second, by inhibiting the increasing content of graphitized components. This study provides a comprehensive understanding of DPM oxidation kinetics and intermediates under DBD plasma.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 5","pages":"1905 - 1923"},"PeriodicalIF":2.6,"publicationDate":"2024-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141587286","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Degradation of Methylene Blue by Using an Argon Microwave Plasma Jet in Humid Environment 在潮湿环境中使用氩微波等离子体射流降解亚甲基蓝

IF 2.6 3区物理与天体物理

Plasma Chemistry and Plasma Processing Pub Date : 2024-07-09 DOI: 10.1007/s11090-024-10494-4

Nadir Aloui, Ibtissem Belgacem, Ahmad Hamdan

{"title":"Degradation of Methylene Blue by Using an Argon Microwave Plasma Jet in Humid Environment","authors":"Nadir Aloui, Ibtissem Belgacem, Ahmad Hamdan","doi":"10.1007/s11090-024-10494-4","DOIUrl":"10.1007/s11090-024-10494-4","url":null,"abstract":"<div>Plasma-liquid interactions yield numerous physicochemical phenomena, rendering them promising for various applications. Plasma-based technology is proposed for water treatment due to its high efficiency in removing contaminants unattainable by conventional techniques. In this study, we employ an argon microwave plasma jet (MWPJ) to investigate methylene blue (MB) degradation. We observe a significant enhancement in the MB degradation rate in a covered system, attributed to increased air humidity promoting hydroxyl radicals (OH) production, which degrade approximately 95% of MB. Furthermore, the injection of O2 gas into the solution under the plasma generates more hydrogen peroxide (H2O2), around 30 mg/L compared to approximately 20 mg/L without injection, although the MB degradation efficiency is reduced. We evaluate MB degradation under various solution properties, revealing that increasing electrical conductivity decreases the MB degradation rate until it becomes independent for conductivities > 10,000 µS/cm. In these latter conditions, a non-conventional temporal evolution of solution conductivity was observed: a decrease during the first tens of minutes followed by a continuous increase for longer treatment time. Conversely, solution acidity minimally affects the MB degradation rate. The MWPJ is characterized by optical emission spectroscopy, showing stability over time and under various solution properties. The energy yield (Y50%) consistently demonstrates superior performance of the MWPJ in a closed environment compared to an open-to-air environment. Although its efficiency is relatively low compared to other systems, we anticipate improvements through parameter adjustments.</div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 5","pages":"1971 - 1989"},"PeriodicalIF":2.6,"publicationDate":"2024-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141576558","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0