Plasma Chemistry and Plasma Processing最新文献

{"title":"Production of Alkaline Plasma Activated Tap Water Using Different Plasma Forming Gas at Sub-Atmospheric Pressure","authors":"Vikas Rathore,&nbsp;Karaket Watanasit,&nbsp;Suttirak Kaewpawong,&nbsp;Dhammanoon Srinoumm,&nbsp;Arlee Tamman,&nbsp;Dheerawan Boonyawan,&nbsp;Mudtorlep Nisoa","doi":"10.1007/s11090-024-10464-w","DOIUrl":"10.1007/s11090-024-10464-w","url":null,"abstract":"<div><p>The present study demonstrates the successful production of alkaline plasma-activated tap water (PATW), effectively addressing the challenge of acidity in traditional PATW for a range of applications. Through precise control of plasma-forming gases (oxygen, air, argon) and process parameters, particularly by producing PATW under sub-atmospheric pressure conditions, it becomes possible to shift the pH of acidic PATW towards the alkaline range. This transformation enhances its suitability for applications like agriculture, aquaculture, sterilization, wound healing, disinfection, and food preservation, etc.</p><p>The investigation encompassed the characterization of plasma and the identification of various plasma species/radicals. The impact of different plasma-forming gases on the pH of PATW and the concentration of reactive species in PATW was thoroughly analyzed. Plasma generated using oxygen and argon resulted in the production of reducing or alkaline PATW, while the use of air and air-argon mixtures led to an acidic or oxidizing nature.</p><p>The study also discussed the stability of nitrate ions, nitrite ions, and hydrogen peroxide in PATW, shedding light on their behavior over varying plasma treatment times and plasma-forming gas. Finally, the investigation explored the effects of gas flow rates, gas pressures, water volume, and plasma discharge powers on the concentration of H₂O₂ in PATW, providing valuable insights into optimizing the production process.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140927028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Critical Considerations in Power Measurements for the Precise Estimation of Energy Costs in Plasma NOx Synthesis","authors":"Ayman A. Abdelaziz,&nbsp;Yoshiyuki Teramoto,&nbsp;Dae-Yeong Kim,&nbsp;Tomohiro Nozaki,&nbsp;Hyun-Ha Kim","doi":"10.1007/s11090-024-10472-w","DOIUrl":"10.1007/s11090-024-10472-w","url":null,"abstract":"<div><p>The great advantage of plasma technology in harnessing abundant clean energy for electrifying and decentralizing the chemical industry holds the promise of attaining carbon neutrality. Therefore, recent research efforts have been dedicated to reducing the energy costs of plasma processes to facilitate the commercialization of this technology. However, it has been noted an inconsistency in reporting energy costs across the literature resulted from inaccurate estimation of power consumption within the system, leading to the misevaluation of the process, its underlying mechanism, and the significance of critical factors. This study comprehensively addresses these challenges by discussing and refining methods for estimating power consumption in a plasma system. Insights are drawn from our ongoing research in plasma NO_<i>x</i> synthesis, specifically a thorough analysis of the discharge dynamics in a recently developed reactor “high-frequency spark discharge” using a high-speed camera, ICCD camera, and high-performance oscilloscope at various pulse widths of the applied voltage. The investigation revealed the importance of accounting for the post-spark period in the voltage cycle during power estimation, as it demonstrates an influence on NO_<i>x</i> synthesis. Furthermore, the study highlighted and addressed critical errors in power measurement and energy cost estimation in the literature. It is found that a significant error, exceeding ± 70%, arises from overlooking signals delay in the setup and improper adjustment of oscilloscope functions, particularly channel impedance, data averaging, bandwidth, and sampling rate. This paper serves as a valuable guide towards establishing standardized measurements toward the precise estimation of energy costs in plasma processes.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140926954","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Diverse Texturing Characteristics Through Metal-Assisted Plasma Etching with Silver Nanowires","authors":"Dong-Geon Lee,&nbsp;Hyun-Seung Ryu,&nbsp;Mi-Jin Jin,&nbsp;Doo-Seung Um,&nbsp;Chang-Il Kim","doi":"10.1007/s11090-024-10469-5","DOIUrl":"10.1007/s11090-024-10469-5","url":null,"abstract":"<div><p>The process of texturing silicon surfaces is critical for enhancing the performance of complementary metal–oxide–semiconductor image sensors that utilize silicon-based photodetectors. Traditional wet etching methods using strong acids or alkaline solutions have been commonly used but present challenges in precision, particularly for microscopic devices. As a viable alternative, dry etching processes using patterned metals and plasma are being explored. However, extensive studies across various metals are necessary. This study introduces a silicon nanotexturing process using silver nanowires and Cl₂-based plasma. The etching mechanism involves accelerated etching through eddy currents and hole injection coupled with a diffusion phenomenon of silver. In this study, we examined variations in the etching profile with respect to etching time, upper and bottom radio-frequency powers, and process pressure. Additionally, we analyzed the effects of ion bombardment, enhanced by the introduction of Ar gas. The findings are expected to significantly contribute to the improvement of micro-optoelectronic devices.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140670106","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"One-Stage Method for Removing Dyes under the Action of Underwater Plasma and Ferrites of Cobalt, Nickel, and Titanium","authors":"Anna Khlyustova,&nbsp;Nikolay Sirotkin","doi":"10.1007/s11090-024-10471-x","DOIUrl":"10.1007/s11090-024-10471-x","url":null,"abstract":"<div><p>Pulsed underwater direct current discharge is considered as a tool for a one-step process for ferrite synthesis and organic dye removal. The formation of cobalt, nickel and titanium ferrites during the discharge firing process was confirmed by methods of dynamic light scattering and X-ray phase analysis. The transformation of dye molecules (fluorescein, methylene green) during the combined action of plasma and ferrites was detected by UV absorption spectroscopy. The contributions of the separate action of plasma and ferrites to the process of dye removal from the solution were investigated. It was found that the synthesized structures have a high sorption capacity. It was found that fluorescein can be used as an indicator for the presence of nickel ferrites.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140671575","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Plasma Bubble Column Reactor: A High Throughput Reactor Design for Water Treatment","authors":"Mikhail Vasilev,&nbsp;Robert Stephens,&nbsp;Meredith Muller,&nbsp;Selma Mededovic Thagard","doi":"10.1007/s11090-024-10470-y","DOIUrl":"10.1007/s11090-024-10470-y","url":null,"abstract":"<div><p>Plasma-based water treatment (PWT) is a promising technology that can degrade various emerging contaminants. However, PWT application on an industrially viable scale is hindered by the lack of an efficient reactor design that combines enhanced plasma-liquid contact with high liquid throughput. This work investigates the applicability of a bubble column gas–liquid contactor to PWT. A pulsed plasma bubble column reactor with a concentric rod-cylinder electrode configuration was used to correlate contaminant removal performance with the gas–liquid contact parameters of the bubble column. A surfactant, rhodamine B dye, and a nonsurfactant, caffeine, were used as model contaminants at µM concentration levels. The bubble column characteristics, i.e., gas holdup, bubble size distribution, and gas–liquid area, were measured as a function of superficial gas velocity using image-based methods. Degradation rates of both contaminants increased with gas flowrate. For caffeine, the increase was attributed to intensified bulk liquid mixing, while dye degradation increased due to the increased gas–liquid area. Ultimately, we show that bubble column contactors significantly improve the utilization of plasma-generated reactive species toward contaminant degradation by distributing them over a large contact area. As a result, a better match between the plasma species interfacial flux and the interfacial contaminant concentration leads to improved treatment energy efficiency. Typical degradation energy efficiencies were ~ 10 g/kWh for caffeine and ~ 60 g/kWh for rhodamine B.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140677189","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Degradation of Methylene Blue by Pulsed Nanosecond Discharge in Water with Ar-O2 Gaseous Bubbles","authors":"Nadir Aloui,&nbsp;Julien Pregent,&nbsp;Camille Gouze,&nbsp;Ibtissem Belgacem,&nbsp;Ahmad Hamdan","doi":"10.1007/s11090-024-10468-6","DOIUrl":"10.1007/s11090-024-10468-6","url":null,"abstract":"<div><p>The rise of water effluents containing emerging contaminants that resist conventional chemical and physical treatments makes the treatment of wastewater more complex. Plasma-based treatment methods have great potential to degrade many of the emerging contaminants, including dyes. In this study, using pulsed nanosecond discharges, we investigate the degradation of methylene blue (MB) dye in water by generating plasma in Ar-O₂ gas bubbles in water. The scalability of the setup is studied by producing discharges in a one electrode setup (a needle-to-plate configuration) and in a four electrodes setup (four needles-to-wire configuration). The discharge was characterized by electrical measurements (current and voltage waveforms) and optical emission spectroscopy. We find that the discharge properties are stable during the 30 min of processing, with and without the presence of MB in solution at low electrical conductivity. The production rate of H₂O₂ in the one electrode setup was measured in 0% and 70% O₂, and it was found to be ∼2.3 and 2.9 mg/Lmin, respectively. In the four electrodes setup, H₂O₂ production rate was lower: ∼1.2 and 1.9 mg/Lmin in 0% and 100% O₂. Degradation of MB was assessed in both setups for (i) different % of O₂ in the gas mixture, (ii) different MB initial concentration, and (iii) different initial water conductivity. In the one electrode setup, a high MB degradation (&gt; 85%) was generally achieved in all conditions, but a better performance is noted in high O₂ percentage (&gt; 50%) at low initial water conductivity. At low MB concentration and low electrical conductivity, the performance of the four electrodes setup was better than the one electrode setup.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-04-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140593725","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure","authors":"Raphaël Robert,&nbsp;Françoise Massines,&nbsp;Luc Stafford","doi":"10.1007/s11090-024-10459-7","DOIUrl":"10.1007/s11090-024-10459-7","url":null,"abstract":"<div><p>Time-resolved optical emission and absorption spectroscopy was used to analyze a 50 kHz Ar-NH₃ dielectric barrier discharge operated in a homogeneous glow discharge regime at atmospheric pressure. In addition to the typical NH(A-X), N₂(C-B), and Ar(2p-1s) transitions, a continuum emission linked to de-excitation of <span>({{text{H}}}_{2}left({{text{a}}}^{3}{Sigma }_{{text{g}}}^{+}right))</span> states was detected between 180 and 250 nm and lasted for a long time after discharge extinction. Over the range of experimental conditions investigated, the emitting <span>({{text{H}}}_{2}left({{text{a}}}^{3}{Sigma }_{{text{g}}}^{+}right))</span> states are proposed to be populated by collisions of <span>({{text{H}}}_{2}left({{text{X}}}^{1}{Sigma }_{{text{g}}}^{+}right))</span> with Ar(1s) states during discharge, and by dissociative recombination of the vibrationally-excited ammonia ion (NH₃⁺(v)) after the discharge. NH₃⁺(v) is produced by charge transfer from Ar₂⁺ to NH₃, and it breaks into <span>({{text{H}}}_{2}left({{text{a}}}^{3}{Sigma }_{{text{g}}}^{+}right))</span> (or <span>({{text{H}}}_{2}left({{text{c}}}^{3}{Pi }_{u}right))</span> or <span>({{text{H}}}_{2}left({{text{d}}}^{3}{Pi }_{u}right))</span>) and NH upon gas phase recombination with a low-energy electron. Based on this proposed mechanism, a 1D fluid model was refined to include these reactions and used to simulate the emission intensity from <span>({{text{H}}}_{2}left({{text{a}}}^{3}{Sigma }_{{text{g}}}^{+}right))</span> and revealed good agreement with experimental data.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-03-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140324966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Destruction of 2,4-Dichlorophenol Vapor in a Process Involving the Combined Action of DBD in Oxygen and a Catalyst","authors":"K. A. Lapshova,&nbsp;N. E. Gordina,&nbsp;E. Yu. Kvitkova,&nbsp;T. V. Izvekova,&nbsp;V. I. Grinevich,&nbsp;G. I. Gusev,&nbsp;V. V. Rybkin,&nbsp;A. A. Gushchin","doi":"10.1007/s11090-024-10462-y","DOIUrl":"10.1007/s11090-024-10462-y","url":null,"abstract":"<div><p>In this work, the process of decomposition of 2,4-dichlorophenol (2,4-DCP) vapor under the influence of atmospheric pressure DBD in oxygen was studied. The studies were carried out in two modes: with a catalyst (natural vermiculite doped with zirconium) and without it. A number of basic characteristics of the catalyst were assessed. The rates and effective rate constants of sorption processes, as well as decomposition processes in plasma and plasma-catalytic systems, were determined. Based on these data, the energy efficiency of the decomposition process was calculated. The data obtained suggested that the initial stage of decomposition is the reaction of interaction of electrons with pollutant molecules. The catalyst has been shown to speed up the decomposition process, increase energy efficiency and the conversion of 2,4-DCP to CO₂ molecules, and prevent the formation of condensed products on the reactor walls. The work estimates the carbon and chlorine balances before and after treatment, which reach a maximum of 99 and 60%, respectively. It was also shown that the catalyst retains its activity for at least 7 h of continuous operation.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140155031","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition","authors":"","doi":"10.1007/s11090-024-10455-x","DOIUrl":"https://doi.org/10.1007/s11090-024-10455-x","url":null,"abstract":"<h3>Abstract</h3> <p>Plasma-enhanced chemical vapor deposition is a well-developed technique that is commonly applied in the preparation of thin films. However, this technique is limited to thermodynamically stable and chemically inert precursor gases or vapors. Recently, pulsed aerosol-assisted plasma processes have emerged as an advantageous alternative that allows for the injection of various liquid solutions in the plasma, regardless of their properties. This study examines the production of thin films by pulsed injection of pentane aerosols into a low-pressure RF capacitively coupled plasma. This technique produces thin films with high material balance and a high degree of control by adjusting the pulsed injection parameters. At the pulse scale, pulsed injection induces a temporary increase in the working pressure, resulting in time-dependent mechanisms that can affect the dynamics of thin-film deposition at the process scale. Overall, the results show a key role of droplets and their kinetics (ballistic transport, vaporization kinetics, electrostatic confinement). Hence, to efficiently apply this method in the preparation of (multi-)functional coatings, the aerosol must be carefully characterized.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":3.6,"publicationDate":"2024-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140127702","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Pearl Millet Seed Surface Modification and Improved Germination by Non-thermal Plasma Discharge: Understanding the Role of Reactive Species","authors":"Subash Mohandoss,&nbsp;Harshini Mohan,&nbsp;Natarajan Balasubramaniyan,&nbsp;Amine Aymen Assadi,&nbsp;Sivachandiran Loganathan","doi":"10.1007/s11090-024-10460-0","DOIUrl":"10.1007/s11090-024-10460-0","url":null,"abstract":"<div><p>In this work, we investigated the impacts of atmospheric pressure dielectric barrier discharge (DBD), i.e., plasma treatment, on pearl millet seeds germination and plant growth. The effect of plasma discharge on water activation, by introducing the reactive species, was explored. We evidenced that about 30 min plasma treated pearl millet seeds exhibited 20% higher germination rate than the control seed watered with tap water. The HR-SEM study revealed that the plasma treatment increased the roughness and FTIR study showed that new oxygen functional groups were introduced on the seed surface. Moreover, it was observed that the water contact angle decreased for plasma treated seeds (50%) and the water uptake also increased considerably as compared to control seeds. These findings indicate that the seed surface has turned more hydrophilic after plasma treatment. A cylindrical double dielectric barrier discharge (D-DBD) reactor was employed for water activation, and 30 min of treatment under air has decreased the pH of deionized water from 7.4 to 4.5 and produced about 1.78 ppm of nitrate (NO₃⁻) and 4.2 ppm of hydrogen peroxide (H₂O₂). Interestingly, the plasma activated water (PAW) improved the pearl millet seed germination by 30% (after 24 h of sowing) and plant growth as compared to tap water and deionized water. Remarkably, when PAW and plasma-treated seeds were combined, a beneficial impact in seed germination (95 ± 2%) and seedling growth have been evidenced owing to synergistic effect. We evidenced that among the long-lived species in PAW, NO₃⁻ enhanced the seed germination and plant growth under similar conditions. These findings demonstrate that the proposed cold plasma reactors could be utilized to boost seed germination and plant growth.Please confirm if the author names are presented accurately and in the correct sequence (given name, middle name/initial, family name). Author 4 Given name: [Amine Aymen] Last name [Assadi]. Also, kindly confirm the details in the metadata are correct.Yes, all author names are correctly editted. </p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":null,"pages":null},"PeriodicalIF":2.6,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140070922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}