Plasma Chemistry and Plasma Processing最新文献

{"title":"Carbon Separation During Pure Methane Plasmalysis Using a 3D-Rotating Gliding Arc Reactor","authors":"Mohamed Mokhtar Hefny,&nbsp;Jan Hummel,&nbsp;Paul Schlemminger,&nbsp;Antje Quade,&nbsp;Ronny Brandenburg,&nbsp;Dirk Uhrlandt,&nbsp;Klaus-Dieter Weltmann","doi":"10.1007/s11090-026-10695-z","DOIUrl":"10.1007/s11090-026-10695-z","url":null,"abstract":"<div><p>The methane pyrolysis in plasmas, so-called plasmalysis, was investigated using a novel design of 3D rotating gliding arc (RGA). The carbon deposition streamlines on the walls as a function of flow rate were also studied as an important step to study the gas dynamics in the system. The performance of our setup was investigated in terms of consumed power and energy cost per molecule. For the used power, it was found that the best gas condition with respect to conversion is at 10 SLM of pure <span>(hbox {CH}_4)</span>, while the best gas condition was 30 SLM of pure <span>(hbox {CH}_4)</span> with respect to the energy cost. Using our novel reactor design that is amenable to scale-up, we have achieved energy costs between 2 and 6 eV per molecule for the effective conversion of pure methane. Moreover, X-ray Photoelectron Spectroscopy was used to study the elemental composition of the produced carbon particles during the plasmalysis process. It was found that these particles consist mainly of <span>(sp^{2})</span>-hybridized carbon and that their amount depends on the flow rate.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 6","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-08-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10695-z.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148838193","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Submerged Spark Plasma Discharges for the Removal of Antibiotics, Antibiotic-Resistant Bacteria, and Resistance Genes","authors":"Jinjie He,&nbsp;Gregory Fridman,&nbsp;Charles Bailey,&nbsp;Alexander Rabinovich,&nbsp;Alexander Fridman,&nbsp;Christopher M. Sales","doi":"10.1007/s11090-026-10705-0","DOIUrl":"10.1007/s11090-026-10705-0","url":null,"abstract":"<div><p>The widespread use of antibiotics in aquaculture and livestock production has contributed to the dissemination of antibiotics, antibiotic-resistant bacteria (ARB), and antibiotic resistance genes (ARGs) in aquatic environments. In this study, submerged spark plasma systems were evaluated for the removal of rifampicin, rifampicin-resistant <i>Escherichia coli</i> O157:H7, and ARG-associated DNA in different water matrices using a 40 mL single-spark reactor and a 1000 mL multiple-spark reactor. The single-spark system achieved 99.43% removal of rifampicin within 8 min and &gt;5-log reduction of <i>E. coli</i> O157:H7 within 10 min in distilled water. The multiple-spark system achieved up to 78.46% rifampicin removal and &gt;5-log bacterial inactivation depending on power input. Plasma treatment also reduced ARG-associated DNA, including up to 4-log reduction in total DNA and rapid degradation of extracellular DNA to below detection limits within 1 min. Rifampicin degradation followed pseudo-first-order kinetics in the single-spark reactor and pseudo-second-order kinetics in the multiple-spark reactor. Saline water conditions significantly reduced antibiotic degradation, bacterial inactivation, and ARG reduction efficiencies. The lowest electrical energy per order (E_EO) for <i>E. coli</i> inactivation was 1.2 kWhr/m³ per 1-log reduction at 60 W in the multiple-spark system. Compared to sodium hypochlorite treatment, submerged spark plasma achieved greater rifampicin degradation and faster extracellular DNA reduction without chemical additives. These findings demonstrate the potential of submerged spark plasma as a multifunctional advanced oxidation and disinfection technology for mitigation of AMR-related contaminants in water treatment applications.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 6","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10705-0.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148782962","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Plasma Etching of SiO2 Using Pentafluoropropanol and Hexafluoroisopropanol as Low Global Warming Potential Alternatives to C4F8","authors":"Sanghyun You,&nbsp;Inkyoung Cho,&nbsp;Minuk Kim,&nbsp;Chaewon Song,&nbsp;Sieun Baek,&nbsp;Daeun Hong,&nbsp;Heeyeop Chae,&nbsp;Chang-Koo Kim","doi":"10.1007/s11090-026-10706-z","DOIUrl":"10.1007/s11090-026-10706-z","url":null,"abstract":"<div><p>Pentafluoropropanol (PFP; C₃H₃F₅O) and hexafluoroisopropanol (HFIP; C₃H₂F₆O) were investigated as low global warming potential (GWP) alternatives to the conventional perfluorocarbon, C₄F₈, for the plasma etching of SiO₂ using an inductively coupled plasma system. The PFP/Ar and HFIP/Ar plasmas exhibited substantially higher SiO₂ etch rates than C₄F₈/Ar plasma across all bias voltage conditions, which was attributed to the generation of O radicals that suppress fluorocarbon deposition and the higher production of F radicals. The radical generation tendencies measured using optical emission spectroscopy were consistent with the bond dissociation energy predictions. X-ray photoelectron spectroscopy indicated that the steady-state fluorocarbon film on SiO₂ was thinner in PFP/Ar and HFIP/Ar plasmas than in C₄F₈/Ar plasma, with lower fluorine-to-carbon ratios due to defluorination by H radicals. The PFP/Ar plasma demonstrated superior etch selectivity for SiO₂ with respect to the amorphous carbon layer, and the most anisotropic etch profile in 200-nm-diameter contact holes. Fourier-transform infrared analysis of exhaust gases showed that PFP/Ar and HFIP/Ar plasmas predominantly produced low-GWP byproducts, reducing the million metric tons of carbon equivalent values by approximately 72% and 69%, respectively, compared to C₄F₈/Ar plasma. These results suggest that PFP and HFIP, particularly PFP, are promising environmentally friendly replacements for PFCs in the plasma etching of SiO₂.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 6","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148782961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Synthesis of Nickel Ferrite Initiated by the Action of a DC Discharge at Atmospheric Pressure in Air","authors":"Alexander Ivanov,&nbsp;Dmitriy Shutov,&nbsp;Kristina Smirnova,&nbsp;Sergey Gavrilkin,&nbsp;Alexey Tsvetkov,&nbsp;Vladimir Rybkin","doi":"10.1007/s11090-026-10702-3","DOIUrl":"10.1007/s11090-026-10702-3","url":null,"abstract":"<div><p>It was shown that the action of a DC discharge (discharge current is 50 mA) in air at atmospheric pressure on a mixture of iron nitrate (III) and nickel nitrate (II) salts located on the cathode leads to the formation of nickel ferrite. The composition of the ferrite (Ni_1.43Fe_1.7O₄) and the size of the crystallinity region (~ 29 nm) were determined using XRD and EDX analysis. It was found that the synthesized substance is a soft magnetic material with a saturation magnetization of 27 emu/g (293 K), a BET specific surface area of 21 m²/g, and a pore volume of 0.044 cm³/g.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148750546","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Performance and Reaction Mechanisms of an Indoor Air Decontamination System Combining Non-thermal Plasma and Photocatalyst for VOC Removal","authors":"Alex Destrieux,&nbsp;Zdenko Machala","doi":"10.1007/s11090-026-10703-2","DOIUrl":"10.1007/s11090-026-10703-2","url":null,"abstract":"<div><p>An indoor air decontamination system combining a dielectric barrier discharge (DBD), UV-C lamps, and a TiO₂ photocatalyst, is investigated for the simultaneous removal of two volatile organic compounds (VOCs) — formaldehyde and methanol — at a high flow rate of 300 L·min⁻¹. The contributions of each component are evaluated independently and in combination, showing a strong synergistic effect between DBD and UV-C, particularly for formaldehyde removal, reaching up to 50% efficiency in a single pass at 60% relative humidity — even in the absence of TiO₂. The photocatalyst is found to significantly improve the removal efficiency of methanol, which is detrimental to formaldehyde removal efficiency. The effect of specific input energy (SIE) is examined, showing that combining DBD with UV-C at equivalent SIE outperforms the discharge alone by a factor of two or more. The underlying degradation mechanisms are discussed in detail, identifying oxygen atoms, OH radicals, and several indirect OH reservoirs as key contributors. A notable observation is the release of NO₂ upon UV-C ignition following the discharge operation, attributed to the photodesorption of surface nitrates accumulated on TiO₂ during plasma exposure, which temporarily scavenges OH radicals and reduces removal efficiency.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-08-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10703-2.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148750528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Evolution of Discharge Dynamics in Non-DBD Excitation Frequency Controlled Cold Atmospheric Pressure Plasma (EFCAP) Device","authors":"Nirupama Tiwari,&nbsp;Vandana Chaturvedi Misra,&nbsp;Srikumar Ghorui","doi":"10.1007/s11090-026-10699-9","DOIUrl":"10.1007/s11090-026-10699-9","url":null,"abstract":"<div><p>Real time discharge dynamics in a pulse-driven cold atmospheric pressure plasma (CAP) device has been probed directly via ultra-high-speed imaging (480000 frames per second). CAP is driven by a variable frequency power source in the kHz range.While a detailed analysis of the discharge mechanism has been presented for 17 kHz, the key features of the discharges have also been presented at higher excitation frequencies (30 kHz, and 60 kHz). Observed charge buildup forming apparently stable strange structures in the discharge zone has been probed further by numerically subtracting the intensities of the consecutive images. Some of the novel mechanisms explored include specific stepwise buildup of ion density in the discharge zone leading to massive breakdown (avalanche), increased emission of secondary electrons via auto-enhanced ion accelerating voltages, reduction in potential through depletion of the ion cloud via recombination at higher frequencies, formation of strange but apparently stable discharge structures in the discharge zone, and oscillating electron current followed by relatively prolonged steady ion current after collection of the electrons. Measured steady electron current for few microseconds, immediately after the avalanche allowed a rough estimation of the electron density and electron mobility, which corroborate fairly well with the values reported in literature.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148628428","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Mechanistic Insights into Plasma-Liquid Interfacial Degradation of Perfluorooctanoic Acid (PFOA) in an Argon RF Plasma Jet","authors":"Md Akibur Rahman,&nbsp;Thomas M. Holsen,&nbsp;Selma Mededovic Thagard","doi":"10.1007/s11090-026-10701-4","DOIUrl":"10.1007/s11090-026-10701-4","url":null,"abstract":"<div><p>Radio-frequency (RF) atmospheric-pressure plasma jets (APPJs) provide a non-equilibrium source of reactive species, electrons, and VUV/UV radiation for plasma-liquid interfacial chemistry. Here, 10 mg L⁻¹ perfluorooctanoic acid (PFOA) was treated in a 13.5 mL recirculating flow-through reactor coupled to an RF argon APPJ operating at 13.56 MHz. Langmuir surface excess data indicated significant PFOA accumulation (Γ/Γₘₐₓ &gt; 40%) at the plasma-liquid interface, such that degradation was controlled primarily by the interfacial reactive-species flux rather than bulk hydrodynamics; accordingly, a tenfold increase in liquid recirculation rate did not measurably change degradation or defluorination kinetics. In contrast, discharge power strongly affected defluorination selectivity: increasing power from 45 to 60 W only moderately increased the PFOA degradation rate constant by 35% but raised the net fluoride yield from 61 to 66% to 80–81% within 180 min, revealing that parent removal and mineralization are mechanistically decoupled. The higher-power condition is consistent with an increased flux of plasma-generated reactive species to the interface and enhanced secondary conversion of less surface-active, bulk-partitioned fluorinated intermediates. Fluorine mass balance, byproduct evolution, scavenger experiments, and gas-composition effects support three coupled pathways: direct interfacial defluorination, stepwise chain shortening, and late-stage radical-mediated mineralization of partially transformed organofluorine intermediates that accumulate in the bulk liquid phase. These results identify early interfacial energy deposition as a key determinant of the extent of defluorination and have implications for the design principles of plasma reactors intended to treat PFAS-containing waste streams across a range of concentrations and matrices.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148628427","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Plasma–Surface Interactions in KOH-Activated Carbon Foams for CO₂ Capture and Carbon-Mediated CO Formation","authors":"Varun Gopalakrishnan,&nbsp;Mark Eschbach,&nbsp;Samundra Sharma,&nbsp;Daniel Matatov,&nbsp;Chinmoy Baroi","doi":"10.1007/s11090-026-10696-y","DOIUrl":"10.1007/s11090-026-10696-y","url":null,"abstract":"<div><p>Integrating CO₂ capture and conversion within a single material platform offers an attractive route to reduce process complexity in carbon utilization technologies. Here, we investigate KOH-activated carbon foams as triple-functional electrodes that simultaneously adsorb CO₂, provide a reactive carbon surface for plasma-assisted CO formation, and serve as the discharge electrode in a DC corona reactor, enabling direct plasma–solid contact at the carbon interface. KOH-activated carbon foams were prepared across a systematic activation parameter space, with Fourier Transform Infrared Spectroscopy revealing a non-monotonic dependence of oxygen-containing surface functional groups on activation temperature and impregnation ratio. CO₂ breakthrough measurements and gas-phase mass spectrometry confirm material-dependent capture and CO conversion behavior, with the 4:1–750 °C condition exhibiting the most favorable uptake and transport kinetics. While Optical emission spectroscopy (OES) and zero-dimensional plasma chemistry modeling are individually well-established, their combined use to probe how electrode surface chemistry alone modifies plasma fragmentation pathways under otherwise identical discharge conditions has received little attention. Addressing this gap, OES is employed as a diagnostic tool, revealing condition-dependent shifts in CN, CO, CO⁺, and OH emission intensities. A custom-built zero-dimensional plasma chemistry model reproduces key qualitative features of the emission spectra and identifies the heterogeneous Boudouard reaction as the kinetically dominant CO production pathway under the experimental conditions examined. Across all diagnostics, CO formation is surface-reaction-limited rather than plasma-energy-limited, and the 4:1–750 °C condition consistently establishes the most productive plasma–surface interaction regime. These findings demonstrate that electrode surface chemistry is an active and tunable variable in plasma-driven CO₂ conversion.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10696-y.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148628430","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Nanocomposite Layers Synthesized by Atmospheric-pressure Plasma Combined with an Aerosolized Gold Salt Solution: Influence of the Solution Concentration","authors":"Elène Bizeray,&nbsp;Antoine Belinger,&nbsp;Simon Dap,&nbsp;Sophie Nowak,&nbsp;Philippe Decorse,&nbsp;Souad Ammar,&nbsp;Fiorenza Fanelli,&nbsp;Nicolas Naudé","doi":"10.1007/s11090-026-10700-5","DOIUrl":"10.1007/s11090-026-10700-5","url":null,"abstract":"<div><p>This work reports on an atmospheric-pressure plasma process that enables the deposition of organic/inorganic nanocomposite thin films in a single step, without direct handling of nanoparticles (NPs). The deposition strategy involves combining a planar dielectric barrier discharge (DBD) in N₂ with an aerosol containing a gold salt (HAuCl₄·3H₂O) dissolved in a polymerizable solvent (isopropanol). For this process, a dual-frequency power supply is used: the high frequency (HF) promotes the gold salt reduction, isopropanol plasma polymerization and matrix growth, while the low frequency (LF) enables the transport and deposition of NPs onto the substrate surface. Our previous study demonstrated that the ratio of HF duration to the whole cycle duration (i.e., the cumulated LF and HF durations) directly influences thin-film uniformity. Another key parameter in this aerosol-based process is the concentration of gold salt in the precursor solution. The present study specifically investigates how variations in the nominal gold concentration in the injected solution (0.1–0.6 wt.-% Au) affect the properties of the synthesized films. UV–Visible absorption spectroscopy, X-ray photoelectron spectroscopy, Fourier-transform infrared spectroscopy, and scanning electron microscopy clearly show net differences in the optical, chemical, and morphological characteristics of the produced films, with those produced from lower gold concentrations exhibiting more uniform particle distribution and a less viscous nature.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148614567","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Durable Anti-Ultraviolet Polyethylene Terephthalate (PET) Fabrics Prepared by a Facet Plasma Process","authors":"Tarig T. A. Owad,&nbsp;Syed Rashedul Islam,&nbsp;Renad E. M. Salih,&nbsp;Jie Cui,&nbsp;Haozhe Wang,&nbsp;Yu Xu,&nbsp;Shi Peng,&nbsp;Jie Min,&nbsp;Jing Zhang","doi":"10.1007/s11090-026-10698-w","DOIUrl":"10.1007/s11090-026-10698-w","url":null,"abstract":"<p>PET/TiO₂ fabric shows durable UV protection across the UVA-UVC range with a low TiO₂ concentration.</p><p>Popular delustered PET/TiO₂ fabrics made using a simple and eco-friendly technique.</p><p>Plasma selective etching boosts roughness, exposing TiO₂ for low UV transmittance, high abrasion, and high UPF.</p><p>Exposed TiO₂ micro/nanoparticles stayed on the fiber surface after 50 washes.</p><p>This sparks research into novel, sustainable, and clean textile techniques.</p>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 5","pages":""},"PeriodicalIF":3.5,"publicationDate":"2026-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148614115","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}