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IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2025-01-24 DOI:10.1007/s11090-025-10540-9

N. J. Milardovich, B. Santamaría, B. L. Fina, J. C. Chamorro, G. Fischfeld, L. Prevosto

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引用次数: 0

摘要

本报告对用于批量降解水性有机污染物的降膜等离子体反应器进行了实验和数值表征。潮湿空气中的脉冲电晕放电是由电容存储电源和高压气体火花隙产生的短电压脉冲（< 100 ns）激发的。靛蓝胭脂红被选为参考污染物。在反应器平均功率为 33 W 的情况下，20 L 初始浓度为 20 mg/L 的靛蓝胭脂红溶液在经过 11 分钟的处理后完全脱色。计算得出的每阶电能效率和该过程的能量产量分别为 0.25 kWh/m3 和 101 g/kWh。还对液相和气相中反应物的生成进行了评估。结果发现，NO2- 和 NO3-离子的浓度非常低，实际上不会造成水的酸化。电晕放电产生的主要气态物质是 O3 和 HO2- 自由基。此外，还提出了反应器的动力学模型，并与测量数据进行了比较。数值结果表明，气液界面旁停滞液膜中的反应对于解释测量的去除率至关重要。液膜的快速动力学机制极大地加快了 HO2-（快速转化为 O2--）和 O3 的吸收率，其吸收率远远超过了无反应液膜的传质系数所预测的吸收率。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Experimental and Numerical Characterization of a Falling Film Plasma Reactor for the Degradation of Organic Pollutants in Water

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Experimental and Numerical Characterization of a Falling Film Plasma Reactor for the Degradation of Organic Pollutants in Water

An experimental and numerical characterization of a falling film plasma reactor for the degradation of aqueous organic pollutants in batch operation mode is reported. A pulsed corona discharge in humid air is excited by short voltage pulses (< 100 ns) generated by a capacitive-storage power source and a high-pressure gas spark-gap. Indigo carmine is chosen as the reference pollutant. A volume of 20 L of indigo carmine solution with an initial concentration of 20 mg/L are completely decolored after 11 min treatment for a reactor mean power of 33 W. The electrical-energy efficiency per order and the energy yield of the process are calculated to be 0.25 kWh/m³ and 101 g/kWh, respectively. The generation of reactive species is also assessed in both the liquid and gas phases. Very low concentrations of NO₂^– and NO₃^– ions are found, practically not causing water acidification. The main gaseous species produced by the corona discharge are O₃ and HO₂· radicals. In addition, a kinetic model of the reactor is presented and compared with measured data. The numerical results indicate that reactions in the stagnant liquid film next to the gas-liquid interface are essential to explain the measured removal rates. The rapid kinetic regime of the liquid film strongly accelerates the uptake rates of HO₂· (rapidly converted to O₂^–·) and O₃, which far exceed the uptake rates predicted by the mass transfer coefficient for a reactionless film.

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.