IEEE Transactions on Plasma Science最新文献

{"title":"Development of High-Performance Simulation Core Components for the Plasma Control Simulation Verification Platform","authors":"Gongcai Shi;Qiping Yuan;Heru Guo;Gen Xu;Bingjia Xiao","doi":"10.1109/TPS.2025.3552076","DOIUrl":"https://doi.org/10.1109/TPS.2025.3552076","url":null,"abstract":"Accurate predictions of plasma behavior and reliable, precise plasma control can significantly reduce the operating costs and risks of the device. The plasma control simulation verification platform (PCSVP), developed using the Python open-source environment, has been preliminarily applied to the control simulation of the experimental advanced superconducting tokamak (EAST) device, assisting in the development and testing of the plasma control system (PCS). Although PCSVP achieves the functionality of visual modeling and simulation calculations comparable to commercial software such as Simulink, its simulation speed remains a limitation. By adhering to object-oriented design principles in C++, the redesign and refactoring of the simulation engine and system libraries are achieved, along with optimizations to the algorithms and data structures of the simulation system. These improvements reduce computational complexity and improve the simulation speed of PCSVP. Experimental results show that the C++-based PCSVP improved the simulation speed by 17 times in the poloidal field (PF) control based on vacuum model and by six times in the RZIp closed-loop control simulation model, significantly reducing computation time and making the development and testing of PCSs more efficient.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"1058-1069"},"PeriodicalIF":1.3,"publicationDate":"2025-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143949161","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Explosive Pulsed Power to Drive a Vacuum Tube","authors":"A. Gurinovich","doi":"10.1109/TPS.2025.3553744","DOIUrl":"https://doi.org/10.1109/TPS.2025.3553744","url":null,"abstract":"Development of high-power pulsed radiation sources in any frequency range requires both generation of high power to drive the source and increasing the efficiency of supplied power to radiated electromagnetic field conversion. The former implies the generation of high power (that is equal to high voltage and high current) pulses. The latter means the use of an electron beam moving in a vacuum to produce the intense radiation: high-electron beam current or high-current density combined with a large cross section of interaction area are required. Explosive pulsed power could contribute to both of the above being capable to store and deliver much higher specific energy as compared with either dielectrics or magnetics and providing high flexibility for matching with a load by the use of a pulse-forming network. Piecemeal matching of explosively driven power supply with the high-power microwave (HPM) producing load (vacuum tube) is described.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"579-585"},"PeriodicalIF":1.3,"publicationDate":"2025-04-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830576","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Review of Nonthermal Plasma-Based Water Treatment: Prerequisites, Procedures, and Potency","authors":"Sushma Balanagu;Srikanth Allamsetty;Ambrish Devanshu;Ashish Paramane","doi":"10.1109/TPS.2025.3553552","DOIUrl":"https://doi.org/10.1109/TPS.2025.3553552","url":null,"abstract":"The advanced water treatment technologies that help reuse wastewater are gaining attention worldwide. The nonthermal plasma-based water treatment (NTPWT) approach possesses many advantages over conventional technologies. This process allows either complex organic molecules to be fully mineralized into carbon dioxide and water or reduced to simpler and less toxic chemicals. However, NTPWT reactors face various technical challenges in their successful implementation as experiments need to be conducted with variations in diverse operating parameters to understand the treatment capability. Researchers from different backgrounds, physics, chemistry, electrical, and chemical engineering, have been working to understand various aspects of water treatment with different objectives. This review analyzes studies on the NTPWT. Key experimental studies have been reviewed to explore requisites for NTPWT, such as high-voltage (HV) sources, different discharge procedures, and their efficiencies based on the result analysis. This review is expected to be helpful to budding researchers in this area.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"1096-1111"},"PeriodicalIF":1.3,"publicationDate":"2025-04-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143949165","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Classification of Partial Discharge Sources in Oil-Pressboard Insulation Through a Statistical Approach Based on Detrended Fluctuation Analysis","authors":"Lavanya Pradeep;Nasirul Haque;P. Preetha","doi":"10.1109/TPS.2025.3552077","DOIUrl":"https://doi.org/10.1109/TPS.2025.3552077","url":null,"abstract":"This article introduces a novel approach to characterize the partial discharge (PD) sources present in the oil-pressboard insulation depending on the origin and type of PD sources. Three different types of PD sources, including internal void, corona, and surface discharges, were created using oil-pressboard insulation samples and appropriate electrode setups in the laboratory. PD measurements were performed using a high-frequency current transformer (HFCT) and an oscilloscope with different combinations of the aforementioned defects kept in parallel. PD pulses were extracted from the measured data, and a well-known signal processing algorithm, detrended fluctuation analysis (DFA), was implemented on these pulses. Two statistical features associated with the DFA processed signals, median and skewness, were calculated, and it was found that the PD pulses coming from different sources formed well-defined clusters in the 2-D scatter plot of median versus skewness. The clustering was performed using a clustering algorithm called density-based spatial clustering application with noise (DBSCAN). Later, PD sources were identified by comparing the phase-resolved PD (PRPD) patterns corresponding to each cluster with those obtained under single-defect cases. The developed methodology is easy to implement, does not require complex optimization techniques, and classified PD signals with an accuracy in the range of 93%–97%.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"1037-1045"},"PeriodicalIF":1.3,"publicationDate":"2025-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943882","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Wideband In-Line H-Plane Transition From Microstrip Line to Air-Filled Rectangular Waveguide","authors":"Shuning Wei;Yajuan Liang;Haohan Xie;Jun Dong;Yuyu Zhao;Kai-Da Xu","doi":"10.1109/TPS.2025.3551944","DOIUrl":"https://doi.org/10.1109/TPS.2025.3551944","url":null,"abstract":"An in-line <italic>H</i>-plane transition from microstrip line (MSL) to air-filled rectangular waveguide operating in millimeter- waveband is proposed. In the transition, a radiator, i.e., a rectangular patch with a semicircular slot structure, is placed above a wedge-shaped cavity. The metal posts A and B are connected to the broad wall of the rectangular waveguide, where those two posts function as a <inline-formula> <tex-math>$pi $ </tex-math></inline-formula>-shaped matching-network to expand the bandwidth of the transition. A back-to-back transition prototype in Ka-band is designed, fabricated, and measured to verify the method. Measurement results show that the maximum insertion loss of 1 dB and return loss of better than 15 dB are obtained over the entire Ka-band (26.5–40 GHz). The proposed transition exhibits wideband performance while maintaining a compact structure. In addition, the proposed transition structure is also verified in W-band (75–110 GHz) through simulation, with a bandwidth covering the entire W-band (<italic>S</i><inline-formula> <tex-math>$_{11} le -15$ </tex-math></inline-formula> dB) and an insertion loss of less than 0.78 dB.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"1090-1095"},"PeriodicalIF":1.3,"publicationDate":"2025-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143949164","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Design of Broadband Slow Wave Structure and RF Window for Ka-Band Helix TWT","authors":"Mukesh Kumar Alaria;Sanjay Kumar Ghosh","doi":"10.1109/TPS.2025.3547048","DOIUrl":"https://doi.org/10.1109/TPS.2025.3547048","url":null,"abstract":"In this article, the design and simulation of helix slow wave structure (SWS) with dielectric support rods for Ka-band Helix-traveling wave tube (TWT) have been described. The beam-wave interaction analysis and simulation of a small helix structure have been carried out to obtain the wide bandwidth, high gain, and high power of Ka-band TWT. The dispersion and interaction impedance characteristics of helix SWS have been determined using computer simulation tool (CST)-microwave studio and experimentally measured. The design and simulation predict that helix SWS can produce >100 W output power, 55.0 dB saturated gain, 8.0 GHz bandwidth, and 30% efficiency at a 27.5–35.5 GHz frequency range. A new type of waveguide pillbox wideband output RF window has been fabricated and experimented. The stability analysis of the helix SWS also demonstrates that the loss design is a major effective for suppressing the backward oscillations in the helix TWT.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"893-898"},"PeriodicalIF":1.3,"publicationDate":"2025-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943840","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"The Design of Voltage-Stacked Low Ripple Current-Driven EDM Pulse Power Supply","authors":"Wenguang Chen;Li Peng;Cheng Yang;Pengcheng Zhang","doi":"10.1109/TPS.2025.3550165","DOIUrl":"https://doi.org/10.1109/TPS.2025.3550165","url":null,"abstract":"In aerospace, medical, and other high-end manufacturing fields, precision machining or surface treatment of materials is required frequently. Electrical discharge machining (EDM) technology is widely used in machining special materials and complex structures due to its high precision, quality, and efficiency. Pulse power supply is the core device for regulating EDM energy, and its ability to control discharge energy determines the machining quality and efficiency. A voltage-stacked low ripple current-driven EDM pulse power supply is proposed, combining the characteristics of rectifier circuits and multiphase interleaved buck circuits to generate high-voltage and current compound pulses. These pulses break through the gap between the electrode tool and the workpiece, forming a plasma machining channel and machining the workpiece. This article concludes with a discussion of the influence of the output waveform on the surface quality of the workpiece. It provides thoughts for parameter design to optimize voltage and current outputs, ensuring that they meet the design specifications of EDM.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"980-987"},"PeriodicalIF":1.3,"publicationDate":"2025-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943903","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Numerical Simulation of Coalescence Growth of Charged Droplet Population Based on PIC Method","authors":"Yong Yang;Huan Chen;Chuan Li;Kexun Yu","doi":"10.1109/TPS.2025.3546763","DOIUrl":"https://doi.org/10.1109/TPS.2025.3546763","url":null,"abstract":"Accelerating the collision and coalescence process between cloud droplets is essential in promoting the catalytic rainfall, which has the potential to solve the shortage of water resources. The charged droplet seeding rainfall can accelerate droplet collision and coalescence due to the attraction of electricity. Meanwhile, the charged droplet seeding rainfall has a more complex collision and coalescence behavior than traditional rainfall using catalysts. In this article, 2-D particle-in-cell (PIC) simulation is used to study the effect of droplet population (10 000 droplets) charging characteristics (including charge amount, charged ratio, and different charge polarities) and external electric field on the growth law of droplet population coalescence. The results show that at 120 s, the effective diameters of droplet populations with charging 0%, 5%, and 10% <inline-formula> <tex-math>${q} _{max }$ </tex-math></inline-formula> increased by 10.2%, 191.1%, and 476.8% compared with the initial value at 0 s, respectively. A suitable proportion of bipolar droplet populations, such as 75% negatively charged droplets and 25% positively charged droplets, has a better effect on promoting droplet coalescence in the early stages compared with the unipolar droplet population with 100% negatively charged droplets. The proportion of large droplets (diameter <inline-formula> <tex-math>$ge 25~mu $ </tex-math></inline-formula>m) increases with the charge amount, charged ratios, and external electric field strength. The research results of PIC-simulated droplet coalescence provide theoretical guidance for understanding the temporal evolution of droplet size in droplet population collision and the efficient promotion of large droplets to some extent.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"936-944"},"PeriodicalIF":1.3,"publicationDate":"2025-03-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Controlled Reduction of Graphene Oxide (GO) Film Using Low-Density Glow Discharge Hydrogen Plasma","authors":"Tonmoi Hazarika;Rajesh Ghosh;Gaurav Saikia;Bharat Kakati;Tapan Rajbongshi;Mausumi Das;S. Kundu;Subir Biswas;Hemen Kalita","doi":"10.1109/TPS.2025.3549139","DOIUrl":"https://doi.org/10.1109/TPS.2025.3549139","url":null,"abstract":"In the present work, reduced graphene oxide (rGO) is produced through hydrogen plasma treatment of chemically prepared graphene oxide (GO) film. The SEM top surface images show the wrinkled and layered flake structures for GO whereas a more etched surface with thinner sheets and a wrinkled, paper-like structure for rGO. From cross-sectional images of the GO and rGO films, it is found that the film thickness is reduced prominently after plasma treatment. The EDX analysis of GO and rGO confirms the successful reduction of graphene sheets. The XRD pattern shows a wide diffraction peak at <inline-formula> <tex-math>$2theta = 11.21^{circ }$ </tex-math></inline-formula> corresponding to an interlayer spacing of 7.9Å and lattice plane (001) for GO. In contrast, the peak is prominently decreased and shifted to <inline-formula> <tex-math>$2theta = 11.82^{circ }$ </tex-math></inline-formula> corresponding to an interlayer spacing of 7.5Å after the plasma treatment. The atomic force microscopy (AFM) analysis shows that the increase in surface roughness of rGO in comparison with untreated GO. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy analysis confirm the reduction of different oxygen functionalities for rGO in comparison with pristine GO. The Raman spectrum of GO displays two prominent peaks designated as the D band at <inline-formula> <tex-math>$approx! 1353.07$ </tex-math></inline-formula> cm⁻¹ and the G band at <inline-formula> <tex-math>$approx! 1586.82$ </tex-math></inline-formula> cm⁻¹, whereas, for rGO, the peaks for D and G bands are observed at <inline-formula> <tex-math>$approx! 1354.88$ </tex-math></inline-formula> and 1593.96 cm⁻¹, respectively. The <inline-formula> <tex-math>${I} _{D}$ </tex-math></inline-formula>/<inline-formula> <tex-math>${I} _{G}$ </tex-math></inline-formula> ratio increased for rGO (~9%) after the hydrogen plasma treatment implies that a limited amount of damage has occurred which causes the relative disorder. There is also a prominent improvement in the electrical properties of the rGO as compared with GO, which suggests that the plasma reduction approach is a very efficient technique for rGO preparation with higher conductivity.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"1025-1036"},"PeriodicalIF":1.3,"publicationDate":"2025-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943856","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effective Conductivity Model for the Time-Domain Simulation of Active Microwave Pulse Compressors","authors":"Zisis C. Ioannidis;Konstantinos E. Orfanidis;Stylianos P. Savaidis","doi":"10.1109/TPS.2025.3549155","DOIUrl":"https://doi.org/10.1109/TPS.2025.3549155","url":null,"abstract":"Active microwave pulse compressors (MPCs) have been under study during the last decades. Various methods are presented in the literature for the steady-state design of MPCs. On the contrary, studies on the optimization of active MPCs in time are very limited because it is rather cumbersome to simulate the time-dependent operation of the gas discharge tube (GDT). In this work, we propose a methodology to derive a time-dependent conductivity model for GDT by comparing simulation data with compressed pulses from experiments. The derived GDT model is used to demonstrate the effect of the MPC geometry on the compressed pulse shape and to show that the optimal steady-state design does not produce the highest amplitude pulse.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"899-906"},"PeriodicalIF":1.3,"publicationDate":"2025-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}