On-Chip Lumped-Distributed Filters With Bandstop Stubs Based on Spoof Surface Plasmon Polaritons

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Bukun Xu;Yazi Cao;Shichang Chen;Bo Yuan;Gaofeng Wang
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引用次数: 0

Abstract

One on-chip low-pass filter (LPF) and two on-chip bandpass filters (BPFs) with bandstop stubs are presented by virtue of spoof surface plasmon polaritons (SSPPs). Three differently patterned SSPPs are realized by reusing multiple stubs in lumped-distributed structures. In addition, bandstop stubs are loaded on the outside open stubs of the lumped-distributed structures to enhance high-band rejections. To elucidate the filtering characteristics of the proposed filters, the dispersive properties of different SSPP unit cells are investigated and discussed. To verify the feasibility of the proposed designs, three on-chip filters, all with a small area of only 2.56 mm2, are fabricated and measured using glass-based integrated passive device (IPD) technology. The experimental results show that all three proposed on-chip filters have wide upper stopbands of $15.3~f_{c}$ , $8.2~f_{0}$ , and $4.4~f_{0}$ , respectively, which are very attractive in integrated systems.
基于欺骗表面等离子激元极化的带阻存根片上集总分布滤波器
利用欺骗表面等离子激元(SSPPs),提出了一个片上低通滤波器(LPF)和两个带带阻存根的片上带通滤波器(bpf)。通过重用集中分布结构中的多个存根,实现了三种不同模式的sspp。此外,带阻存根被加载在集总分布结构的外部开放存根上,以增强高频带抑制。为了阐明所提出的滤波器的滤波特性,研究和讨论了不同SSPP单元电池的色散特性。为了验证所提出设计的可行性,使用基于玻璃的集成无源器件(IPD)技术制造和测量了三个片上滤波器,它们的面积都只有2.56 mm2。实验结果表明,这三种片上滤波器的上阻带分别为$15.3~f_{c}$、$8.2~f_{0}$和$4.4~f_{0}$,在集成系统中非常有吸引力。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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