IEEE Transactions on Plasma Science最新文献_第2页

Study on the Drawn Vacuum Arc Characteristics of the 126 kV Axial Magnetic Field Contacts 126kv轴向磁场触点抽真空电弧特性研究

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3568440

Jiaxi Shi;Yongpeng Mo;Haibo Su;Siyuan Ju;Tao Tan;Rongzhao Jia;Yisheng Li;Yiming Ding;Zongqian Shi;Shenli Jia

{"title":"Study on the Drawn Vacuum Arc Characteristics of the 126 kV Axial Magnetic Field Contacts","authors":"Jiaxi Shi;Yongpeng Mo;Haibo Su;Siyuan Ju;Tao Tan;Rongzhao Jia;Yisheng Li;Yiming Ding;Zongqian Shi;Shenli Jia","doi":"10.1109/TPS.2025.3568440","DOIUrl":"https://doi.org/10.1109/TPS.2025.3568440","url":null,"abstract":"During the current interruption process, the vacuum arc evolution characteristics are crucial in determining whether a vacuum circuit breaker can interrupt the current successfully. In order to analyze the expansion characteristics of cathode spots (CSs) on the 126 kV axial magnetic field (AMF) contacts, the drawn vacuum arc experiments were conducted. To observe more characteristics of the drawn vacuum arc, two high-speed cameras were used simultaneously to capture the dynamics of both the vacuum arc and CSs. The experimental results indicated that the vacuum arc column could not expand sufficiently to cover the entire contact surface. Additionally, multiple types of vacuum arc column modes occurred in the experiments, and the number of ignition positions also affected both the appearance of vacuum arc and the diffusion process of CSs. Moreover, the magnetic field distribution under different vacuum arc column modes was simulated. In the contact surface near the contact edge, the AMF components are smaller than the transverse magnetic field (TMF) components and these lead a rapid radial expansion of CSs. Furthermore, significant deflection occurs for CSs located in central area on both cup-type AMF contact and coil-type contacts. However, the CSs of these two types of contacts show different deflection directions. When the total arc area remains constant but the number of arc columns increases, the TMF components decreases and radial velocity of CSs also decrease. The simulation results also indicated that the variation in the number of arc columns has a relatively small impact on the distribution of the AMF component.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1592-1603"},"PeriodicalIF":1.3,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144624014","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhancing Seedling Vigor and Stress Tolerance Through ROS-Depleted Capacitively Coupled Plasma (RDCCP) Irradiation 利用耗尽活性氧的电容耦合等离子体（RDCCP）辐照提高幼苗活力和抗逆性

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3573082

Rajib Kar;Manish Pandey;Ashish Kumar Srivastava;Vanita Sekar;R. L. Bhardwaj

{"title":"Enhancing Seedling Vigor and Stress Tolerance Through ROS-Depleted Capacitively Coupled Plasma (RDCCP) Irradiation","authors":"Rajib Kar;Manish Pandey;Ashish Kumar Srivastava;Vanita Sekar;R. L. Bhardwaj","doi":"10.1109/TPS.2025.3573082","DOIUrl":"https://doi.org/10.1109/TPS.2025.3573082","url":null,"abstract":"Seedling establishment and vigor are crucial for crop productivity. Irradiating rice seeds with 13.56-MHz RF capacitively coupled Ar cold plasma, particularly at −400-V self-bias for 20 s, significantly enhanced these traits. This study assessed plant performance through biomass accumulation and various biochemical parameters, including enzymatic [superoxide dismutase (SOD), catalase (CAT), and glutathione reductase (GR)] and nonenzymatic (ascorbate (ASA) and glutathione) antioxidants. Unlike conventional plasma treatments reliant on reactive oxygen and nitrogen species reactive oxygen species (ROS)/reactive nitrogen species (RNS), our ROS-depleted capacitively coupled plasma (RDCCP) showed efficacy in improving seedling vigor independently of ROS/RNS. Enhanced water uptake via micropores facilitated early seedling establishment. Testing RDCCP on mung bean demonstrated its broad applicability and effectiveness against NaCl, PEG-6000, and arsenic stresses. The ion bombardment through the plasma sheath increased seed surface permeability, activating the plant’s innate defense system, thus improving performance under both control and stress conditions.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1482-1489"},"PeriodicalIF":1.3,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144624039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Compact Battery-Powered 400-kV High-Voltage Pulse Generator for UWB EMP Generation 紧凑型电池供电的400千伏高压脉冲发生器，用于UWB电磁脉冲产生

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3574920

Woo-Cheol Jeong;Hong-Je Ryoo

{"title":"Compact Battery-Powered 400-kV High-Voltage Pulse Generator for UWB EMP Generation","authors":"Woo-Cheol Jeong;Hong-Je Ryoo","doi":"10.1109/TPS.2025.3574920","DOIUrl":"https://doi.org/10.1109/TPS.2025.3574920","url":null,"abstract":"This article presents the implementation of a high-voltage pulse generator for portable ultrawideband (UWB) electromagnetic pulse (EMP) generation. The generator is designed to meet the portability requirements and generate high-voltage pulses with a short rise time and high repetition rate. To achieve a high step-up ratio efficiently, an inductive isolation-based Marx generator is employed, driven by a high-voltage capacitor charger (HVCC). The HVCC is designed with a Cockcroft-Walton voltage multiplier (CWVM)-based bipolar hybrid symmetrical voltage multiplier (BHSVM) to increase the low battery voltage (24 V) to over 60 kV, ensuring effective high-voltage boosting and insulation. Additionally, an equivalent modeling technique is proposed for the BHSVM circuit, and based on this, an LCC resonant converter was implemented without additional magnetic components. The parameters of the LCC resonant converter were designed to enable soft switching across the entire output voltage range, considering the repeated charging and discharging involved in the application. Moreover, the design incorporates a high-voltage transformer with insulation of >10 kV and a charging cable instead of the conventional charging resistor, ensuring both insulation and charging resistance. Simulations validated the accuracy of the BHSVM equivalent model and the high-efficiency operation of the LCC resonant converter across the full voltage range. Experimental results demonstrated that the compact, high-density high-voltage pulse generator can deliver high-voltage pulse at the repetition rate of 120 Hz to the antenna and UWB EMP with an amplitude of 421 kV and a rise time of 0.5 ns.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1543-1551"},"PeriodicalIF":1.3,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144623960","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

A Nanosecond Pulsed Atmospheric Pressure Plasma Jet Driven by a Solid-State Multiwinding Inductive Voltage Adder 由固态多绕组电感电压加法器驱动的纳秒脉冲大气压等离子体射流

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3577811

Hanze Wei;Qun Wang;Junfeng Rao;Jinsong Guo;Fukun Shi;Jie Zhuang

{"title":"A Nanosecond Pulsed Atmospheric Pressure Plasma Jet Driven by a Solid-State Multiwinding Inductive Voltage Adder","authors":"Hanze Wei;Qun Wang;Junfeng Rao;Jinsong Guo;Fukun Shi;Jie Zhuang","doi":"10.1109/TPS.2025.3577811","DOIUrl":"https://doi.org/10.1109/TPS.2025.3577811","url":null,"abstract":"Atmospheric pressure plasma jet (APPJ) driven by nanosecond pulsed electric fields (nsPEFs) have been investigated and employed in plasma medicine applications, owing to nonthermal characteristics and abundant reactive oxygen and nitrogen species (RONS). Compared with conventional nanosecond pulse generators for ns-APPJ, the inductive voltage adder (IVA) is capable of achieving high-voltage step-up ratios through electromagnetic coupling while simultaneously reducing insulation requirements. In this study, a solid-state nanosecond IVA with variable winding is proposed. The apparatus consists of ten stages coupled with nanocrystalline cores, producing 10-kHz repetitive pulses on capacitive loads. The output voltage is up to 24 kV with a step-up ratio of 53.3 and a turn ratio of 1:3 with a load capacitor of 400 pF. The minimum full-width at half-maximum (FWHM) on capacitive loads is 100 ns with a narrow falling edge owing to a designed magnetic switch. The influence of parasitic parameters on pulse performance is analyzed, and pulse specifications and circuit parameters are discussed. Furthermore, the generator is used to drive an argon plasma jet using a coaxial pin-ring electrode. The APPJ is diagnosed by optical emission spectroscopy (OES). This study provides a feasible design for nsPEF-driven plasmas.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1763-1771"},"PeriodicalIF":1.3,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144624052","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Design and Analysis of Double-Sided Excited Permanent Magnet Arc Motor Having Parallel Complementary Effect 具有并联互补效应的双面励磁永磁电弧电机的设计与分析

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3576759

Zhenbao Pan;Jinhao Cai;Jiwen Zhao;Kaiwei Wei

引用次数: 0

Design of an RF Electron Gun Featuring a Spoof Localized Surface Plasmon Grid 具有欺骗局部表面等离子体栅格的射频电子枪的设计

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3575622

Shilong Zhu;Yulu Hu;Luanfeng Gao;Haiying Yuan;Zheng Tan;Xiaofang Zhu;Quan Hu;Xiaobin Wang;Bin Li

引用次数: 0

A 2-D Scanning Spoof Surface Plasmon Polariton Diplexing Leaky-Wave Antenna for Sensing Applications 用于传感的二维扫描欺骗表面等离子体激元双工漏波天线

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3577728

Zihao Xu;Dingfei Ma;Jiachen Du;Ross Murch;Qingfeng Zhang

引用次数: 0

Submillimeter Radiation Production Using Two Unidentical Lasers in Hot Collisional Plasma 在热碰撞等离子体中使用两个不相同的激光器产生亚毫米辐射

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3570463

Rohit Kumar;Divya Singh;Krishna Gopal;A. P. Singh;Sukhmander Singh

引用次数: 0

Stepwise Expansion Pattern of Surface Streamer Propagation in C4F7N/CO2 Mixture Under Impulse Voltage 冲击电压下C4F7N/CO2混合物中表面流光传播的逐级扩展模式

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3578671

Junhong Chen;Junbo Deng;Peng Sun;Wei Yin;Jianben Liu;Yan Liu

{"title":"Stepwise Expansion Pattern of Surface Streamer Propagation in C4F7N/CO2 Mixture Under Impulse Voltage","authors":"Junhong Chen;Junbo Deng;Peng Sun;Wei Yin;Jianben Liu;Yan Liu","doi":"10.1109/TPS.2025.3578671","DOIUrl":"https://doi.org/10.1109/TPS.2025.3578671","url":null,"abstract":"C4F7N/CO2 mixture is one of the most promising environmentally friendly alternatives to SF6 gas. However, the research on the development characteristics of surface discharge for C4F7N/CO2 mixture is still insufficient. In this study, the surface streamer propagation pattern in 0.1 MPa 10%C4F7N/90%CO2 mixture under impulse voltage with a needle-plate electrode configuration is investigated. From the discharge morphology, it can be observed that surface discharge exhibits a distinct stepwise expansion pattern. The first-step streamer develops outward from the needle tip and appears in a circular shape. Subsequent streamers grow out from the head of the previous streamer and extend outward in a fan-shaped pattern. Compared to positive polarity, surface streamers are more difficult to develop under negative polarity voltage. This is due to the more significant corona stabilization effect observed in negative polarity streamer discharges. Each stepwise expansion of surface streamers corresponds to a streamer-to-leader transition. The surface streamers transition to leaders through the precursor mechanism. Only when the electric field at the head of the streamer reaches the critical electric field, the streamer-to-leader transition can be triggered, resulting in the stepwise expansion pattern. In this study, the threshold potential at the head of the streamer for the transition from primary streamer to primary leader is approximately +5.44 kV for positive polarity and −7.78 kV for negative polarity. Due to the lack of relevant parameters, it is not possible to calculate the critical electric field at the head of the primary streamer in this study.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 7","pages":"1604-1610"},"PeriodicalIF":1.3,"publicationDate":"2025-06-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144624056","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

A Tribute to Steven J. Gitomer (1942–2025) 致敬史蒂文·j·吉托默（1942-2025）

IF 1.3 4区物理与天体物理

IEEE Transactions on Plasma Science Pub Date : 2025-06-17 DOI: 10.1109/TPS.2025.3570335

Paul Dressendorfer;Edl Schamiloglu

引用次数: 0