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Creeping Discharge Evolution at the Oil/Pressboard Interface Using Multi-Sensor Technology Under AC Voltage
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-16 DOI: 10.1109/TPS.2025.3555291
Jia Tao;Xiongying Duan;Yongzeng Ji;Yi Liu;Lifeng Cheng;Peng Yu;Minfu Liao
{"title":"Creeping Discharge Evolution at the Oil/Pressboard Interface Using Multi-Sensor Technology Under AC Voltage","authors":"Jia Tao;Xiongying Duan;Yongzeng Ji;Yi Liu;Lifeng Cheng;Peng Yu;Minfu Liao","doi":"10.1109/TPS.2025.3555291","DOIUrl":"https://doi.org/10.1109/TPS.2025.3555291","url":null,"abstract":"In response to the limitations of single sensors in engineering applications, this article systematically investigates the evolution process and mechanism characteristics of creeping discharge at the oil/pressboard interface under ac voltage, based on multi-sensor technology. First, a relationship between the measured amplitude and fault development time was established using multi-sensor measurement technology, revealing the variation pattern of multi-parameter signals during the creeping discharge process. Second, the mechanism characteristics of creeping discharge development process were revealed in conjunction with experimental phenomena. Finally, based on multi-parameter signals and mechanism characteristics, the discharge process is divided into three stages: slow development, rapid development, and pre-breakdown. The discharge mechanism characteristics at each stage show a significant correlation with the measured amplitude. This study provides important references for the in-depth understanding of the creeping discharge process and the synchronized detection of multi-parameter sensors.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"871-879"},"PeriodicalIF":1.3,"publicationDate":"2025-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943854","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Guest Editorial IEEE Transactions on Plasma Science Special Issue on Plenary, Invited, and Minicourse Papers From ICOPS/APCOPTS 2024 IEEE等离子体科学学报特刊：ICOPS/APCOPTS 2024全体会议、特邀会议和迷你课程论文
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-15 DOI: 10.1109/TPS.2025.3550764
Cheng Zhang;Peng Zhang;Yangmei Li
{"title":"Guest Editorial IEEE Transactions on Plasma Science Special Issue on Plenary, Invited, and Minicourse Papers From ICOPS/APCOPTS 2024","authors":"Cheng Zhang;Peng Zhang;Yangmei Li","doi":"10.1109/TPS.2025.3550764","DOIUrl":"https://doi.org/10.1109/TPS.2025.3550764","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"477-477"},"PeriodicalIF":1.3,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964534","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143835383","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Impedance Measurement of the Planar Multiring Antenna in the Linear Experimental Advanced Device
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-15 DOI: 10.1109/TPS.2025.3554760
Zhi Li;Lingfeng Lu;Chenggonghang Zhou;Chao Wang;Hao Liu;Lei Chang;Dan Du;Huaiqing Zhang
{"title":"Impedance Measurement of the Planar Multiring Antenna in the Linear Experimental Advanced Device","authors":"Zhi Li;Lingfeng Lu;Chenggonghang Zhou;Chao Wang;Hao Liu;Lei Chang;Dan Du;Huaiqing Zhang","doi":"10.1109/TPS.2025.3554760","DOIUrl":"https://doi.org/10.1109/TPS.2025.3554760","url":null,"abstract":"The linear experimental advanced device (LEAD) was built at the Southwestern Institute of Physics, aiming to study fundamental plasma physics and serve as a testbed for radio frequency (RF) diagnostics. LEAD equips a helicon plasma source, which adopts a specially designed planar multiring antenna. In order to monitor in real time the antenna impedance, a voltage-current (<italic>V</i>–<italic>I</i>) probe was developed. First, the results of the antenna impedance measurement by the homemade <italic>V</i>–<italic>I</i> probe are given. The variations of the antenna impedance with respect to the RF power, magnetic field, and gas flow rate are explored. The antenna impedances measured by the homemade <italic>V</i>–<italic>I</i> probe are further compared with the commercial <italic>V</i>–<italic>I</i> suit. These measurements of the antenna impedance could provide essential information to the helicon wave coupling studies in LEAD.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"965-969"},"PeriodicalIF":1.3,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943812","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Research on Pulse Power Supply Based on High-Gain Boost Circuit
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-15 DOI: 10.1109/TPS.2025.3555657
Ming Chen;Song Jiang;Yonggang Wang;Qian Qu;Zhonghang Wu
{"title":"Research on Pulse Power Supply Based on High-Gain Boost Circuit","authors":"Ming Chen;Song Jiang;Yonggang Wang;Qian Qu;Zhonghang Wu","doi":"10.1109/TPS.2025.3555657","DOIUrl":"https://doi.org/10.1109/TPS.2025.3555657","url":null,"abstract":"With the continuous development of pulse power technology in fields such as biomedicine, there is an increasing demand for miniaturization of pulse power supplies. This article proposes a portable pulse power supply based on a high-gain boost circuit powered by lithium batteries. It significantly provides the gain of the boost circuit through the combination of inductance and capacitance, while reducing the turn ratio of the pulse transformer, minimizing the leakage inductance and volume of the transformer. The prototype built in this article can achieve a voltage output of 05 kV, and its frequency and pulsewidth can be continuously adjusted. The size of the main circuit is only <inline-formula> <tex-math>$16times 10times 8$ </tex-math></inline-formula> cm. It can work normally and stably under both resistive loads and dielectric barrier discharge (DBD) loads. Compared with the pulse generator of a traditional boost circuit, the efficiency is improved by about 10%. The results show that compared with traditional pulse power supplies, the pulse generator based on the high-gain boost proposed in this article has significant advantages in portability and efficiency.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"988-995"},"PeriodicalIF":1.3,"publicationDate":"2025-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943851","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-14 DOI: 10.1109/TPS.2025.3556605
{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2025.3556605","DOIUrl":"https://doi.org/10.1109/TPS.2025.3556605","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964504","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830551","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Member ad suite 会员广告套件
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-14 DOI: 10.1109/TPS.2025.3558387
{"title":"Member ad suite","authors":"","doi":"10.1109/TPS.2025.3558387","DOIUrl":"https://doi.org/10.1109/TPS.2025.3558387","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"587-587"},"PeriodicalIF":1.3,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964509","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830578","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Announcing the Twentieth Special Issue of IEEE Transactions on Plasma Science on High-Power Microwave Generation, June 2026 宣布第二十届IEEE高能微波产生等离子体科学特刊，2026年6月
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-14 DOI: 10.1109/TPS.2025.3559396
{"title":"Announcing the Twentieth Special Issue of IEEE Transactions on Plasma Science on High-Power Microwave Generation, June 2026","authors":"","doi":"10.1109/TPS.2025.3559396","DOIUrl":"https://doi.org/10.1109/TPS.2025.3559396","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"588-588"},"PeriodicalIF":1.3,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964505","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830579","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-14 DOI: 10.1109/TPS.2025.3557724
{"title":"Blank Page","authors":"","doi":"10.1109/TPS.2025.3557724","DOIUrl":"https://doi.org/10.1109/TPS.2025.3557724","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"C4-C4"},"PeriodicalIF":1.3,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964533","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830447","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Announcing the Twentieth Special Issue of IEEE Transactions on Plasma Science on High-Power Microwave Generation, June 2026 宣布出版《电气和电子工程师学会等离子体科学杂志》2026 年 6 月关于高功率微波发生的第二十期特刊
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-14 DOI: 10.1109/TPS.2025.3556321
{"title":"Announcing the Twentieth Special Issue of IEEE Transactions on Plasma Science on High-Power Microwave Generation, June 2026","authors":"","doi":"10.1109/TPS.2025.3556321","DOIUrl":"https://doi.org/10.1109/TPS.2025.3556321","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 4","pages":"848-848"},"PeriodicalIF":1.3,"publicationDate":"2025-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10964503","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143830521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Compact Microwave Plasma Electrodeless UV Lamps With Low Breakdown Power and High Energy Efficiency
IF 1.3 4区 物理与天体物理
IEEE Transactions on Plasma Science Pub Date : 2025-04-11 DOI: 10.1109/TPS.2025.3554359
Huacheng Zhu;Yuqing Huang;Guanqun Zhang;Fusheng Hu;Qiulin Wang;Yang Yang;Wencong Zhang
{"title":"Compact Microwave Plasma Electrodeless UV Lamps With Low Breakdown Power and High Energy Efficiency","authors":"Huacheng Zhu;Yuqing Huang;Guanqun Zhang;Fusheng Hu;Qiulin Wang;Yang Yang;Wencong Zhang","doi":"10.1109/TPS.2025.3554359","DOIUrl":"https://doi.org/10.1109/TPS.2025.3554359","url":null,"abstract":"Microwave electrodeless ultraviolet (UV) lamps are employed in a multitude of fields, including healthcare, air sterilization, sewage treatment, resin curing, and others, owing to their long lifespan, robust input power, and high luminous intensity. However, the existing feeder structures are bulky and heavy, restricting handheld use in a narrow and small space. This article presents a new type of compact microwave plasma electrodeless UV lamps based on a coaxial structure that helps cut overall weight remarkably compared to rectangular waveguide and microwave oven lamps. Besides the simple structure design, the proposed microwave plasma UV lamps have significant advantages in breakdown power and microwave energy efficiency. With an ignitor linked to the inner conductor, argon discharge can be easily trigged at an input microwave power of 60 W (4 torr), and the breakdown power can further drop to 50 W with mercury. For the energy efficiency of power coupling from the incident microwave to the discharge, a pure argon lamp has over 90% energy efficiency below 80 W, while an argon-mercury lamp achieves this above 120 W. These lamps thus hold great promise for resin curing, bacteria inactivation, pollutant degradation, and wastewater treatment.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"53 5","pages":"914-921"},"PeriodicalIF":1.3,"publicationDate":"2025-04-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143943839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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