2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)最新文献

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Stepped Gate Profiles over DRE TFET: A Proposal to Improve Off-State Breakdown Voltage DRE场效应管上的阶梯栅型:一种提高断态击穿电压的方法
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179878
Upasana, M. Saxena, Mridula Gupta
{"title":"Stepped Gate Profiles over DRE TFET: A Proposal to Improve Off-State Breakdown Voltage","authors":"Upasana, M. Saxena, Mridula Gupta","doi":"10.1109/VLSIDCS47293.2020.9179878","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179878","url":null,"abstract":"The prime focus of this work is towards improving the device off-state breakdown voltage without hampering the on-state resistance value. For this, Drain Region Extended (DRE) TFET architecture has been introduced with stepped gate profiles. The stepped gate profile implementation has been done in two ways. Firstly, the impact of one such previously reported three stepped gate profile has been tested on TFET architecture. Thereafter, a more feasible and cost effective two stepped gate profile has been proposed which helps in improving the device breakdown voltage without hampering other characteristics such as device on-state resistance, on-state current and threshold voltage value. The modified configuration successfully delivers improved breakdown voltage and reduced on-state resistance value and can be used for better functioning in System on Chip (SoC) applications.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127485892","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of All-Optical XNOR Gate in SOA Based Tree-Net Architecture 基于SOA树状网架构的全光XNOR门分析
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179744
A. Raja, K. Mukherjee, J. N. Roy
{"title":"Analysis of All-Optical XNOR Gate in SOA Based Tree-Net Architecture","authors":"A. Raja, K. Mukherjee, J. N. Roy","doi":"10.1109/VLSIDCS47293.2020.9179744","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179744","url":null,"abstract":"In this communication, we are going to design a new all-optical SOA based XNOR gate using tree architecture implementing the cross-polarization modulation (XPolM) effect in semiconductor optical amplifier (SOA). We get some good values related to quality factor (Q~62 dB) and some other performance-related parameters associated with a very high speed (~100Gbit/s) of operation.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125096782","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
First-Principle Study of Spin Transport in GaAs-Adenine-GaAs Semi-Conductor Tunnel Junction gaas -腺嘌呤- gaas半导体隧道结自旋输运的第一性原理研究
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179864
D. Dey, Pradipta Roy, Debashis De Smieee
{"title":"First-Principle Study of Spin Transport in GaAs-Adenine-GaAs Semi-Conductor Tunnel Junction","authors":"D. Dey, Pradipta Roy, Debashis De Smieee","doi":"10.1109/VLSIDCS47293.2020.9179864","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179864","url":null,"abstract":"The spin transport phenomenon in Adenine based semi-conducting tunnel junction using GaAs semiconductor nano ribbon electrodes has been reported using Density Functional Theory (DFT) and Non Equilibrium Green’s Function (NEGF) based formalisms. First principle approach has been used to simulate and investigate the effects of semiconductor contact tunnelling resistance at low bias voltage. This experiment has been carried out at room temperature. It is observed that Tunnelling Contact Resistance remains high (~100 %) at higher bias voltage. The quantum-ballistic transmission obtained for parallel configuration is large enough comparing with anti parallel configuration of this analytical model representation of the nano structured device. The current-voltage characteristics reflect that the investigated spin current is significantly larger for parallel configuration when compared with the spin current which is acquired for anti-parallel configuration. Perfect quantum-ballistic spintransportation effect is obtained for this GaAsAdenine-GaAs semi-conductor tunnel junction structure.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123741492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
15W Hybrid GaN Power Amplifier through Microstrip Radial Stub 4W GaN MMIC for X-band Radar Applications 通过微带径向短段的15W混合GaN功率放大器,用于x波段雷达应用
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179860
SriHarsha Vardhan G, Deepali Pathak, Manish Mendhe, A. Dutta
{"title":"15W Hybrid GaN Power Amplifier through Microstrip Radial Stub 4W GaN MMIC for X-band Radar Applications","authors":"SriHarsha Vardhan G, Deepali Pathak, Manish Mendhe, A. Dutta","doi":"10.1109/VLSIDCS47293.2020.9179860","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179860","url":null,"abstract":"Radar Front-Ends crave diverse power amplifiers, which must be small-scaled, productive and economical. Our approach elaborate optimized Design of high power GaN power amplifier adopting microstirp radial stub in pair input and output matching network for an X-band Radar applications that overlay 8.5 GHz to 9.5 GHz.To develop 15W power amplifier utilizing a compact design of 4way power divider with proposed design was accomplished in microstrip technology adopting radial stub for the superior matching. The system achieves a 15W (43 dBm) output power from a 23 dBm input drive with a 42% Power Added Efficiency (PAE) and a 20 dB gain in CW−mode operation with a 28V drain voltage. The 4W MMIC design was completed on the 0.25µm gate length GaN on SiC process of UMS (GH25) using Keysight ADS 2017 with die size of 1.8 x 2.4 mm2. The proposed 15W power amplifier through a design of 4W MMIC in GaN GH25 and power divider/combiner mounted on printed circuit board consumes an area of 55 x 24 mm2.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129745246","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Estimation of Power and Delay of CMOS Phase Detector and Phase-Frequency Detector Using Nano Dimensional MOS Transistor 基于纳米尺寸MOS晶体管的CMOS鉴相器和鉴相器的功率和时延估计
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179921
Aman Kumar Shaw Halwai, Ratul Adhikary, M. Chakraborty, Rahul Shaw, Abhijit Sadhu, D. De, Surajit Bari
{"title":"Estimation of Power and Delay of CMOS Phase Detector and Phase-Frequency Detector Using Nano Dimensional MOS Transistor","authors":"Aman Kumar Shaw Halwai, Ratul Adhikary, M. Chakraborty, Rahul Shaw, Abhijit Sadhu, D. De, Surajit Bari","doi":"10.1109/VLSIDCS47293.2020.9179921","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179921","url":null,"abstract":"In this paper the design of phase detector circuit using nano dimensional transistor has been presented .The conventional circuit of phase-frequency detection has been realized and presented. The circuit schematics are simulated with the help of Tanner SPICE software. The power dissipation, transistor delay, product of power and delay of the phase detector circuit has been estimated at 16 nm and 22 nm gate length of transistor. Power and speed performance analysis is carried out varying the value of VDD in the range 0.5 V - 1.2 V and aspect ratio of PMOS to NMOS from 1 to 5 . Moreover, the power, gate delay and PDP of the phase-frequency detector has been stated at 150 nm channel length .The results are pleasing context to the design of Very Large Scale Integrated (VLSI) circuit having high speed and low power dissipation.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128555728","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Automated System Design for the Identification of Sleep Disorder: Cross-correlation and SVM Based Approach 睡眠障碍识别的自动化系统设计:互相关与支持向量机方法
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179872
Anadi Biswas, S. Chatterjee, S. Munshi
{"title":"Automated System Design for the Identification of Sleep Disorder: Cross-correlation and SVM Based Approach","authors":"Anadi Biswas, S. Chatterjee, S. Munshi","doi":"10.1109/VLSIDCS47293.2020.9179872","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179872","url":null,"abstract":"In this research work, an automated system is developed for the identification of sleep disorder by analyzing Electroencephalograph (EEG) signals. The EEG signals considered in this study are taken from the Physionet database. The signals have been recorded during the sleeping time of various healthy and unhealthy patients, having sleep disorder. The paper introduces a protocol of feature extraction, involving cross-correlation. The cross-correlation operation automatically eliminates the noises contaminating the electroencephalograph (EEG) signals. The features extracted from the cross-correlograms, besides containing some traditional and not so common parameters, also includes the Higuchi’s Fractal Dimension (HFD). The extracted features from Cross-correlation are processed using Support Vector Machine (SVM), which gives an acceptable accuracy as compare to other research works in bio-signal processing field. The Proposed methodology has achieved 96.65% sensitivity, 100% specificity and 96.67% accuracy. Thus the proposed scheme may be a strong candidate for embedded system applications, where it can be implemented using microcontrollers.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132249874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fuzzy PID Controlled DSTATCOM for Delivering Quality Power 模糊PID控制DSTATCOM提供优质电能
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179920
Epsita Das, Swaraj Basak, S. Sarkar, Biswarup Ganguly, A. Banerji, S. Biswas
{"title":"Fuzzy PID Controlled DSTATCOM for Delivering Quality Power","authors":"Epsita Das, Swaraj Basak, S. Sarkar, Biswarup Ganguly, A. Banerji, S. Biswas","doi":"10.1109/VLSIDCS47293.2020.9179920","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179920","url":null,"abstract":"DSTATCOM is a shunt compensation device connected at Point of Common Coupling (PCC) of Distribution System to deliver quality power. The proportional & integral controller (PI) of DSTATCOM needs tuning at the time of installation as well as due to change of network parameters and working conditions, can provide a slower response. To ensure plug and play feature to the device with faster response Proportional Integral Derivative (PID) action with fuzzy interference system (FIS) is implemented in this paper. With respect to SRF theory based simple PI controller a better response is obtained with fuzzy PID controller in terms of dynamic voltage profile and Total Harmonic Distortion (THD).","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130108009","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
TCAD Analysis and Modelling of Gate-Stack Gate All Around Junctionless Silicon NWFET Based Bio-Sensor for Biomedical Application 基于NWFET的全无结硅栅极-堆叠栅极生物传感器的TCAD分析与建模
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179866
Mekonnen Getnet Yirak, R. Chaujar
{"title":"TCAD Analysis and Modelling of Gate-Stack Gate All Around Junctionless Silicon NWFET Based Bio-Sensor for Biomedical Application","authors":"Mekonnen Getnet Yirak, R. Chaujar","doi":"10.1109/VLSIDCS47293.2020.9179866","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179866","url":null,"abstract":"In the present day, metallic oxide semiconductor field-effect transistor-based bio-sensors have been frequently used for various purposes due to their low cost and other properties. In this work, high-k Gate-Stack gate-all-around junctionless Silicon Nanowire FET (SiNWFET) is proposed for neutral biomolecule species detection and enhanced the device performance by introduced gate stack and high metal gate work-function. In particular, neutral biomolecule species like Streptavidin, Uricase, APTES, Protein and ChOx are considered in our study. Subthreshold slope, drain induced barrier lowering (DIBL), leakage current, transconductance, and shifting threshold voltage were considered for study the bio-sensor response. Effect of cavity thickness, cavity length, High-k dielectric thickness, and its length on the detection of the device has also become examined. The results in gate stack junctionless gate all around SiNWFET shows better performance in terms of DIBL, transconductance, leakage current, ION/IOFF ratio and subthreshold slope. The high-k dielectric oxide (HfO2) has been identified for chemical compatibility and thermal stability properties on metal oxide semiconductor transistor as a gate oxide to mitigate the gate tunneling current and short channel effects.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130250603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Design of Area Optimized Arithmetic and Logical Unit for Microcontroller 单片机面积优化算法与逻辑单元的设计
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179942
A. Purohit, Mohammed Riyaz Ahmed, R. V. S. Reddy
{"title":"Design of Area Optimized Arithmetic and Logical Unit for Microcontroller","authors":"A. Purohit, Mohammed Riyaz Ahmed, R. V. S. Reddy","doi":"10.1109/VLSIDCS47293.2020.9179942","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179942","url":null,"abstract":"Arithmetic and Logic Unit (ALU) can be understood with basic knowledge of digital electronics. The advantage of knowing ALU in detail is two-folded: firstly, programming of the processing device can be efficient and secondly, can design a new ALU architecture as per the various constraints of the use cases. The miniaturization of digital circuits can be achieved by either reducing the size of transistor (Moore’s law) or by optimizing the gate count of the circuit. The first has been explored extensively while the latter has been ignored which deals with the application of Boolean rules and requires sound knowledge of logic design. The ultimate outcome is to have an area optimized architecture/approach that optimizes the circuit at gate level. Here in this work, we have attempted to design an ALU which is area efficient while being loaded with additional functionality necessary for microcontrollers. One novel approach in our work is that the concept of hard-wired architecture (for multiplier and divider) is borrowed from Digital Signal Processors. Another aspect worth mentioning is the implementation of barrel shifter which will considerably reduce the execution time during the execution of shift/ rotate operations. The structural modeling is used in the design of the ALU which contributes to the reduction in the usage of number of LUTs and slices. The hardware design is made via Xilinx 9.1 ISE and verified using ModelSim. The results are very encouraging, and it seems that a thorough understanding and proper implementation of ALU will allow us to put other units in their place.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132923350","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Gate Engineered GAA Silicon-Nanowire MOSFET for High Switching Performance 高开关性能的栅极工程GAA硅纳米线MOSFET
2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS) Pub Date : 2020-07-01 DOI: 10.1109/VLSIDCS47293.2020.9179932
N. Gupta, Ajay Kumar, R. Chaujar, Bhavya Kumar, M. M. Tripathi
{"title":"Gate Engineered GAA Silicon-Nanowire MOSFET for High Switching Performance","authors":"N. Gupta, Ajay Kumar, R. Chaujar, Bhavya Kumar, M. M. Tripathi","doi":"10.1109/VLSIDCS47293.2020.9179932","DOIUrl":"https://doi.org/10.1109/VLSIDCS47293.2020.9179932","url":null,"abstract":"In this paper, the bias-dependent parasitic capacitance of Gate Engineered GAA SiNW MOSFET is investigated in terms of gate capacitance which take into account both gate to source and gate to drain capacitance. Results depict substantial reduction in parasitic capacitance of gate engineered SiNW MOSFET in comparison to conventional SiNW. Further, RF Figure of Merits (FOMs) has also been observed and it is found that GEWE-SiNW exhibit 8.5%, 14% improvement in fT and TFP respectively compared to SiNW MOSFET, thus provide its efficacy for switching applications such as low power CMOS logic gates and wireless/mobile applications. In addition, the impact of metal workfunction engineering has also been observed to examine the detailed knowledge of device.","PeriodicalId":446218,"journal":{"name":"2020 IEEE VLSI DEVICE CIRCUIT AND SYSTEM (VLSI DCS)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129375782","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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