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Beam power absolute measurements using the calorimetric method 用量热法对光束功率进行绝对测量
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624099
V. Kudrya
{"title":"Beam power absolute measurements using the calorimetric method","authors":"V. Kudrya","doi":"10.1117/12.2624099","DOIUrl":"https://doi.org/10.1117/12.2624099","url":null,"abstract":"Mathematical models for three types of beam power calorimeters that do not require calibration are considered. These types are: adiabatic, with a calibrated heat sink, and based on water-flow cooling. For the adiabatic type a transient solution of the corresponding heat transfer equation is presented and its features are considered. Two definitions of the response time are proposed. The question of determining its sensitivity is considered. Based on these definitions, a solution to the problem of the receiving plate material optimal choice in terms of the ratio of sensitivity and response time is proposed. For the type with a calibrated heat sink a simple lumped parameters model is considered. Based of this model estimations of the calorimeter sensitivity and response time were made. For the water-flow type some analytical results following from equations describing its operation within the framework of a quasi-one-dimensional thermal model are presented. A consistent simplification of these equations is considered, which made it possible to obtain simple relationships for assessing the sensitivity, response time, and heating temperature of the receiving plate. A thermal energy balance equation for the stationary mode of operation is obtained. Within the framework of the proposed approach, a rough estimate of the lower boundary of the response time of the water-flow calorimeter was obtained. Wherever possible, comparisons have been made with published experimental and theoretical results. The results obtained can be used for development and design of calorimetric diagnostics systems of fast neutral particle beams.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116813016","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Quantum hashing on the high-dimensional states 高维态上的量子哈希
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624628
F. Ablayev, Alexander Vasiliev
{"title":"Quantum hashing on the high-dimensional states","authors":"F. Ablayev, Alexander Vasiliev","doi":"10.1117/12.2624628","DOIUrl":"https://doi.org/10.1117/12.2624628","url":null,"abstract":"In the paper, we consider using high-dimensional quantum states (so-called qudits) for the implementation of the quantum hashing technique. The importance of qudits for quantum procedures that implement quantum hashing and protocols based on it follows from two considerations. First of all, d-dimensional qudit describes a d-level quantum system, which can be in a superposition of its d basis states without the need of using highly entangled qubit states. The second consideration is that the d-dimensional qudit can be represented by a single particle. These two properties of qudits are considered in this paper to generalize the notion of quantum hashing. The latter is used to present a variant of a quantum protocol for secret key verification.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133128171","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Investigations of multiple quantum NMR dynamics of spin dimer on quantum computer 自旋二聚体在量子计算机上的多量子NMR动力学研究
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624088
A. Belova, A. Fedorova, E. Kuznetsova
{"title":"Investigations of multiple quantum NMR dynamics of spin dimer on quantum computer","authors":"A. Belova, A. Fedorova, E. Kuznetsova","doi":"10.1117/12.2624088","DOIUrl":"https://doi.org/10.1117/12.2624088","url":null,"abstract":"We propose the algorithm for the quantum computer on the IBM Q platform. By this algorithm one can obtain the multiple-quantum NMR dynamics of the dimer with spins 1/2. Our algorithm includes preparation of thermodynamic equilibrium state as initial conditions for dimer and circuit for evolution under the Hamiltonian of multiple-quantum NMR experiment. Multiple-quantum coherences arise in multiple-quantum NMR experiment. Ones are connected with solid body structure and get a lot of research consequently. Intensities of these coherences are measured at end of experiment. In our algorithm the intensities of multiple-quantum coherences are evaluated by tomography of diagonal elements of final density matrix for dimer.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"446 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123628981","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Elements of satellite quantum network 卫星量子网络的要素
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624443
V. Kurochkin, A. Khmelev, V. Mayboroda, R. M. Bakhshaliev, A. V. Duplinsky, Y. Kurochkin
{"title":"Elements of satellite quantum network","authors":"V. Kurochkin, A. Khmelev, V. Mayboroda, R. M. Bakhshaliev, A. V. Duplinsky, Y. Kurochkin","doi":"10.1117/12.2624443","DOIUrl":"https://doi.org/10.1117/12.2624443","url":null,"abstract":"Long-distance quantum key distribution (QKD) is a critical component of a quantum network. When network users are within a city, they often use existing telecommunication fiber-optic networks. This method is problematic for QKD on a large scale between cities and countries. Direct connecting of distant consumers with quantum single-photon lines is not possible, because optical fiber involves attenuation. This problem is addressed by constructing a large number of trusted intermediate nodes, but there are concerns with the reliability of each node. To increase the quantum network's dependability, a method of building a satellite quantum network is actively developing. The only one trusted satellite node is required for satellite QKD between any two points on the Earth's surface. Furthermore, a satellite quantum link can also be utilized to add another communication channel in the existing fiber-optic networks that are thousands of kilometers apart. We describe the creation of ground infrastructure elements for receiving single photons in various polarization quantum states from satellites. Ground-based receiving nodes are based on two telescopes with an aperture of 1.2 m and 0.6 m located in remote cities.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"90 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126114372","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A universal approach to FET compact modeling: case study for MESFETs and OFETs 场效应管紧凑建模的通用方法:mesfet和ofet的案例研究
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624179
D. S. Malich, G. Zebrev
{"title":"A universal approach to FET compact modeling: case study for MESFETs and OFETs","authors":"D. S. Malich, G. Zebrev","doi":"10.1117/12.2624179","DOIUrl":"https://doi.org/10.1117/12.2624179","url":null,"abstract":"We demonstrate in this paper some applications of a general approach for constructing field-effect transistor compact models based on decomposing of FET modeling into two independent parts: device electrostatics and continuity equation. While the latter part has a universal form for any field-effect devices, the electrostatics is specific for different types of transistors which is expressed in different dependencies of the channel charge density upon gate voltage. We discuss here two applications of this approach using the examples of Schottky barrier MESFETs and organic field-effect transistors.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130386012","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Formation of nanocrystalline BaTiO3 thin films by pulsed laser deposition 脉冲激光沉积纳米晶BaTiO3薄膜
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624410
Z. Vakulov, Kseniia Korzun, R. Tominov, V. Smirnov, O. Ageev
{"title":"Formation of nanocrystalline BaTiO3 thin films by pulsed laser deposition","authors":"Z. Vakulov, Kseniia Korzun, R. Tominov, V. Smirnov, O. Ageev","doi":"10.1117/12.2624410","DOIUrl":"https://doi.org/10.1117/12.2624410","url":null,"abstract":"The paper shows the experimental results of the substrate temperature effect on the morphological and electro-physical parameters of nanocrystalline BaTiO3 films fabricated by pulsed laser deposition. It was found increasing in the substrate temperature from 300 °C to 600 °C results in decreasing in surface roughness from (6.1±0.6) nm to (0.8±0.1) nm and increasing in the films grain size from (39.1±3.1) nm to (212.1± 17.2) nm. Increasing in the substrate temperature leads to a change in electro-physical parameters: the concentration of charge carriers increases from (1.85±0.16)×1013 cm-3 to (2.77±0.25)×1013 cm-3, the mobility of charge carriers decreases from (10.1±0.9) cm2/(V·s) to (7.2±0.6) cm2/(V·s), and the resistivity of the films changes insignificantly from (3.4±0.2)×103 Ω·cm to (3.1±0.2)×103 Ω·cm under increase in the temperature from 300 °C to 600 °C. The obtained results make it possible to get BaTiO3 films with target parameters, which can be used to develop promising lead-free energy harvesters for alternative energy devices.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128496403","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Re-orientation of graphoepitaxial fluorite films towards small-index crystallographic planes 石墨外延萤石薄膜向小折射率晶体平面的重新取向
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2623743
P. Mozhaev, I. Bdikin, J. Bindslev Hansen, C. S. Jacobsen
{"title":"Re-orientation of graphoepitaxial fluorite films towards small-index crystallographic planes","authors":"P. Mozhaev, I. Bdikin, J. Bindslev Hansen, C. S. Jacobsen","doi":"10.1117/12.2623743","DOIUrl":"https://doi.org/10.1117/12.2623743","url":null,"abstract":"Graphoepitaxial CeO2 and Y:ZrO2 (YSZ) thin films showed re-orientation towards (012), (013) small-index crystallographic planes (SIPCs) due to surface energy minimization effects, with deviation from the expected tilt angles up to 4.5º. Re-orientation of the CeO2 films towards the (012) plane was obtained for the intermediate range of deposition rate and oxygen partial pressure, providing high plasticity of the lattice of the film due to formation of oxygen vacancies, and the relatively low bonding strength of the film-substrate interface. The realization of re-orientation of the YSZ graphoepitaxial films demanded intentional suppression of the epitaxial bonding between the film and the substrate. The effect was observed both for (012) and (013) SICPs. The re-orientation is obtained easier when the film experiences additional tilting towards the substrate plane, reaching inclination angles of 2.5-4.5º. The re-orientation from the substrate plane is also possible, but such films are usually re-oriented partially, and the observed inclination angle is limited to ~0.3º. The re-oriented films show a lower spread of orientations of domains, observed as a decrease of the width of the rocking curve. The reason is the co-orienting effect of the substrate surface during growth, opposite to the mis-orienting effect of dislocations generation for ordinary graphoepitaxial films. The lattice constant normal to the epiplane experiences distortion near the surface of the film, contractive for a decrease of the final tilt angle and tensile for re-orientation from the substrate surface.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131075308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Features of the formation of highly sensitive nanoscale films SnO2 doped with platinum for sensing applications 用于传感应用的高灵敏度SnO2掺杂铂纳米薄膜的形成特征
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624651
K. Tsarik, V. Petukhov, N. S. Struchkov
{"title":"Features of the formation of highly sensitive nanoscale films SnO2 doped with platinum for sensing applications","authors":"K. Tsarik, V. Petukhov, N. S. Struchkov","doi":"10.1117/12.2624651","DOIUrl":"https://doi.org/10.1117/12.2624651","url":null,"abstract":"In this work, we consider the formation of a sensor layer 100 nm thick based on platinum-doped tin oxide. We investigated the method of forming an oxide film using magnetron sputtering Sn and Pt in Ar+O2 plasma. Using X-ray diffraction, it was found that the film consists of nanoscale particles with a metal core. The average size of the nanoparticles forming the film was from 47 to 74 nm The characteristics of the film were measured during additional oxidation in the temperature range from 300 to 700 °C. Thanks to annealing, the resistance of the sensor layer can be varied from 10 kΩ to 100 MΩ at a detection temperature of 300 °C The optimized film has been tested to detect ethanol, acetone, and ammonia at streams of 50, 100, 150 ppm.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114365794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Techniques for analyzing digital elevation models of surface topography of microelectronics objects 微电子物体表面形貌数字高程模型分析技术
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2623908
A. Dedkova, I. Florinsky, N. A. Djuzhev
{"title":"Techniques for analyzing digital elevation models of surface topography of microelectronics objects","authors":"A. Dedkova, I. Florinsky, N. A. Djuzhev","doi":"10.1117/12.2623908","DOIUrl":"https://doi.org/10.1117/12.2623908","url":null,"abstract":"We discuss techniques for analyzing digital elevation models (DEMs) of surface topography of microelectronics objects exemplified by silicon wafers and wafer-based structures, such as SiO2/Si wafers, silicon–glass assemblies, thin film membranes formed by the Bosch process, and Ni–W films on Bi2Te3 substrate. We describe approaches to calculate and analyze wafer curvature using (1) data of curvature of DEM profiles, (2) second partial derivatives computed from DEMs, as well as (3) geomorphometric methods (e.g., analysis of digital models and maps of Gaussian, mean, and principal curvatures as well as other morphometric variables derived from DEMs). We show possibilities of using digital models and maps of catchment area derived from DEMs to analyze location of microcrests of wafer surface. We demonstrate capabilities of these techniques for analyzing volumetric defects. We also present specific recommendations for handling experimental data, such as DEM smoothing by approximation and processing DEMs with voids.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133342825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Quantum memory on multi atom-resonator system 多原子谐振系统的量子存储器
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2625226
S. Moiseev, N. Perminov, A. Zheltikov
{"title":"Quantum memory on multi atom-resonator system","authors":"S. Moiseev, N. Perminov, A. Zheltikov","doi":"10.1117/12.2625226","DOIUrl":"https://doi.org/10.1117/12.2625226","url":null,"abstract":"We propose a composite frequency-scalable quantum memory (QM) scheme based on a system of coupled resonators with single atoms capable of efficient storage of the quantum states of broadband single-photon fields having an arbitrary time form. The analyzed QM consists of 8 high-Q miniresonators coupled to a common resonator that is connected to the external waveguide, where each miniresonator contains a single atom. Based on the methods of optimization of the transfer function, we found the optimal parameters of the QM scheme at which an efficient transfer of a photon wave packet from an external waveguide to the atoms is possible for efficient long-term storage in long-lived atomic states. Various functional modes of using the memory circuit are described and ways to increase efficiency for its use in quantum processing are discussed.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"64 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122991574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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