International Conference on Micro- and Nano-Electronics最新文献

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Bifurcations and catastrophes at the boundaries separating the phases of quantum correlations 在分离量子相关相的边界处的分岔和突变
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2622367
M. Yurischev
{"title":"Bifurcations and catastrophes at the boundaries separating the phases of quantum correlations","authors":"M. Yurischev","doi":"10.1117/12.2622367","DOIUrl":"https://doi.org/10.1117/12.2622367","url":null,"abstract":"The spin-1/2 XXZ chain in a uniform magnetic field at thermal equilibrium is considered. For this model, we give phase diagrams for the one-way quantum work deficit (thermal discord). The diagrams can contain regions with both stationary and variable (state-dependent) angles of optimal measurement. We also established a relationship between the behavior of optimal measurement angles near the boundaries separated different regions and Landau’s theory of phase transitions of the second and first kind. Namely, when crossing the boundary from a region with a stationary optimal measurement angle (0 or π/2) to the region with a variable angle of optimal measurement (0 < ϑ < π/2), quantum discord and one-way quantum work deficit experience a sudden change (“catastrophe”) in their behavior. The sudden change is accompanied by a splitting of the minimum characterizing stationary point of quantum correlation into two minima (i.e., bifurcation of the initial single minimum occurs). Such phenomena are analogous to phase transitions described within the Landau theory, or, more generally, by the mathematical formalism of catastrophe theory.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123214935","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
MEMS devices based on self-organizing semiconductors structures 基于自组织半导体结构的MEMS器件
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624592
M. Denisenko, A. Isaeva, I. Lysenko, A. Tkachenko
{"title":"MEMS devices based on self-organizing semiconductors structures","authors":"M. Denisenko, A. Isaeva, I. Lysenko, A. Tkachenko","doi":"10.1117/12.2624592","DOIUrl":"https://doi.org/10.1117/12.2624592","url":null,"abstract":"In this paper, we consider a method for constructing MEMS structures using a self-assembly operation based on controlled self-organization of mechanically stressed semiconductor layers. This work describes the design of highly sensitive tunneling linear acceleration sensors, as well as a nanoelectromechanical switch with two tunnel contacts. Accelerometers of this type have important advantages: hypersensitivity due to the tunnel effect, small dimensions compared to capacitive accelerometers, design flexibility due to wide construction variations depending on requirements, potential possibility of manufacturing structures with three axes of sensitivity in a single technological production cycle, high manufacturability. Tunneling nanoelectromechanical switches also have several advantages: such as low leakage current, energy efficiency, stability, good dynamic characteristics, and can be used in ultra-low-power electronics.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128781339","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Induced bistable behavior in elements of the thermal reactor at silicon wafer heating in bistability mode 硅片在双稳模式下加热时热堆元件的诱导双稳行为
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2623814
V. V. Ovcharov, V. P. Prigara
{"title":"Induced bistable behavior in elements of the thermal reactor at silicon wafer heating in bistability mode","authors":"V. V. Ovcharov, V. P. Prigara","doi":"10.1117/12.2623814","DOIUrl":"https://doi.org/10.1117/12.2623814","url":null,"abstract":"The work studies the induced bistability phenomenon in a thermal reactor elements involved in radiation heat exchange with the silicon wafer exhibiting bistable behavior. The heat balance equations for a silicon wafer and elements of a thermal reactor: a heater, a quartz window, and an absorber are derived. The control parameters in such a system were the heater temperature and the effective heat transfer coefficients, which characterize the heat removal from the quartz window and the radiation absorber by external agents. The effective heat transfer coefficient, which is responsible for the conductive component of the heat flux from the silicon wafer to the absorber, was also used. Simplified models of the thermal reactor are considered: first, with the quartz window and the absorber with its constant temperature, and second, without the quartz window and with the absorber varying its temperature. It is shown that in the quartz window and absorber there is the effect of induced bistability within the scope of both models. The evolution of a shape of a hysteresis loop is explained at the varying values of the heat exchange coefficients. It is found that temperature jumps of absorber in the instability points of bistable curve for the tungsten heater increases of two orders of value in compared with the heater whose optical properties are that of a blackbody. The explanation of the effect is suggested.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124740470","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Picosecond infrared laser crystallization of Ge layers in Ge/Si multi-nanolayers for optoelectronic applications 光电应用中锗/硅多纳米层中锗层的皮秒红外激光结晶
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2622731
V. Volodin, G. Krivyakin, A. Bulgakov, Y. Levy, J. Beranek, S. Nagisetty, Z. Bryknar, N. Bulgakova, P. Geydt, A. Popov
{"title":"Picosecond infrared laser crystallization of Ge layers in Ge/Si multi-nanolayers for optoelectronic applications","authors":"V. Volodin, G. Krivyakin, A. Bulgakov, Y. Levy, J. Beranek, S. Nagisetty, Z. Bryknar, N. Bulgakova, P. Geydt, A. Popov","doi":"10.1117/12.2622731","DOIUrl":"https://doi.org/10.1117/12.2622731","url":null,"abstract":"The processes involved in picosecond infrared pulsed laser annealing of multylayer structures consisting of alternating thin films of amorphous silicon and germanium were investigated. The films were fabricated by plasma-chemical deposition on Si(001) and glass substrates. An analysis of structural transformation of Ge/Si multi-nanolayers was performed using Raman spectroscopy. Regimes of annealing were found when the Ge layers are partially crystallized while the Si layers remain amorphous without noticeable intermixing of Ge and Si. The developed approach can be used for creation of GeSi solid alloys (which can be used in memristors on not refractive substrates) and also for creation of Si based p-i-n structures on non-refractory substrates with Ge nanoclusters in i-layer, that can enhance the efficiency of thin film solar cells.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121672693","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Quantum drift-diffusion models for dual-gate field-effect transistors based on mono- and bilayer graphene 基于单层和双层石墨烯的双栅场效应晶体管的量子漂移-扩散模型
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2622451
I. I. Abramov, V. Labunov, Natallia V. Kalameitsava, I. A. Romanova, I. Y. Shcherbakova
{"title":"Quantum drift-diffusion models for dual-gate field-effect transistors based on mono- and bilayer graphene","authors":"I. I. Abramov, V. Labunov, Natallia V. Kalameitsava, I. A. Romanova, I. Y. Shcherbakova","doi":"10.1117/12.2622451","DOIUrl":"https://doi.org/10.1117/12.2622451","url":null,"abstract":"At present, a great deal of interest is observed in devices based on two-dimentional (2D) materials, especially graphene, in the field of micro- and nanoelectronics. Graphene has robust hoheycomb lattice structure and unique properties such as ambipolarity, high carrier mobility, high conductivity. Nevertheless the properties of mono- and bilayer graphene are different. A significant difference in electrical characteristics of field-effect transistors (FETs) based on mono- and bilayer graphene was shown in few experimental works [1-3]. Note, that FET on bilayer graphene has demonstrated improved characteristics in comparison to FET on monolayer graphene [1,4,5]. Therefore a necessity to create models specifically for FETs on bilayer graphene appears. A tunable band gap is observed in the FET, when a perpendicular electrical field is applied to the bilayer graphene channel [6]. In the paper a quantum drift-diffusion model of FETs based on bilayer graphene is proposed. The model is a combination of electrical and physical models [7]. The mechanism of carrier transport along the bilayer graphene channel is considered. The electrostatic potential of the transistor channel is defined according to the band gap. Simulation of graphene dual-gate FET with channel length 4 µm is performed using the proposed model. Calculation of electrostatic potential of the investigated device structure was carried out. A good agreement with experimental data has been obtained for output characteristics of FETs based on monolayer graphene [8] using the developed model for this case. Different design parameters of FETs such as channel length, channel width, thickness of top- and back-gate dielectrics are used in the models. The proposed models of different FETs were included in the nanoelectronic devices simulation system NANODEV [9] developed at the BSUIR since 1995.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"204 ","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131549420","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Research method of the field transistors high frequency parameters using network analyzer 利用网络分析仪研究场晶体管高频参数的方法
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2623146
T. Krupkina, V. Losev, A. Khlybov, D. Rodionov, E. Kotlyarov, P. Timoshenkov
{"title":"Research method of the field transistors high frequency parameters using network analyzer","authors":"T. Krupkina, V. Losev, A. Khlybov, D. Rodionov, E. Kotlyarov, P. Timoshenkov","doi":"10.1117/12.2623146","DOIUrl":"https://doi.org/10.1117/12.2623146","url":null,"abstract":"The necessity of using a vector network analyzer (VNA) for RF/MW device characterization is shown. Field transistor equivalent circuit has been analyzed for dynamic parameters research. Authors have got analytical expressions and provided method for high-frequency field transistors parameters determination based on s-parameters measurements using a VNA. The recommendations for test transistors' optimal parameters are presented. The device under test in this paper is GaAs HEMT double gate transistor with w=150 um. The research of transistors parameters was done in operating point: Vds=1.4 V, Vgs=-0.6 V. This paper contains method for HEMT transistor capacitance (Cin, Cgd, Cgs) determination using time-domain reflectometry (TDR). Authors have got theoretical and experimental values for fMAX that show good coincidence.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133753202","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sensors based on graphene nanoribbons and polyaniline nanochannels with graphene-graphene oxide contacts formed by ion etching 基于石墨烯纳米带和聚苯胺纳米通道的传感器,通过离子蚀刻形成石墨烯-氧化石墨烯接触
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624365
A. Lashkov, N. Yakunina, A. Romashkin, N. Struchkov, K. Tsarik
{"title":"Sensors based on graphene nanoribbons and polyaniline nanochannels with graphene-graphene oxide contacts formed by ion etching","authors":"A. Lashkov, N. Yakunina, A. Romashkin, N. Struchkov, K. Tsarik","doi":"10.1117/12.2624365","DOIUrl":"https://doi.org/10.1117/12.2624365","url":null,"abstract":"One of the ways to create highly sensitive gas sensors based on graphene is to modify graphene by forming nanometer-sized channels in it. In this work, ion beam etching was used for these purposes. The necessary doses of Ga+ focused ion beam (FIB) were found to etch graphene. Several different structures based on modified graphene have been manufactured and investigated. A method for manufacturing graphene structures with a width of less than 10 nm by Ga+ FIB has been found. Also, high conductivity for structures of nanogap with polyaniline (PANi) was found, which can be used as selective gas sensing structures. The paper presents the responses of structures with nano-channel of PANi between modified graphene electrodes to different concentrations of ammonia and water.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117037508","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Influence of the kind of metal on memristor effect in MIS structures MIS结构中金属种类对忆阻效应的影响
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624084
O. Orlov, A. Popov, A. Stepanov, P. Sattarov
{"title":"Influence of the kind of metal on memristor effect in MIS structures","authors":"O. Orlov, A. Popov, A. Stepanov, P. Sattarov","doi":"10.1117/12.2624084","DOIUrl":"https://doi.org/10.1117/12.2624084","url":null,"abstract":"In this study we investigated the influence of kind of metal on memristor effect in metal-insulator-semiconductor (MIS) structure. First, different metals have different work functions. This parameter can affect the flow of current through the MIS structure. Secondly, different metals have different binding energies of atoms. In this case, the bond energy consists of the energy of the metallic bond and the energy of the covalent bond. If we consider the model of the conductivity switching effect, in which a metal filament appears, this can affect the probability of its appearance. Thirdly, different metals and different methods of their deposition have different technological compatibility and ease of use. Two types of dielectrics were used for the experiments - silicon oxide and silicon nitride. Thin dielectric films were deposited on ptype monocrystalline silicon wafers. It was found that the best results among the tested metals were obtained using nickel deposited by electron beam evaporation. Copper proved to be poorly compatible with silicon oxide, since it easily diffuses into it and silicon. The other metals demonstrated the possibility of the appearance of the memristor effect. However, the yield was generally less than when nickel was used.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124086732","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
On methods of calculation of π on quantum computers 论量子计算机上π的计算方法
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624562
G. Bochkin
{"title":"On methods of calculation of π on quantum computers","authors":"G. Bochkin","doi":"10.1117/12.2624562","DOIUrl":"https://doi.org/10.1117/12.2624562","url":null,"abstract":"A simple one-qubit algorithm to compute π is considered and compared to another algorithm proposed by Noto with respect to the precision offered and its quantum computation requirements. We find that π = 3:157±0:017 with our algorithm on a real quantum computer and that Noto's algorithm offers accuracy comparable to that, but only on a simulator; heavy use of two-qubit gates would cause Noto's proposed algorithm for calculation of π to perform much worse on quantum computers currently publicly available.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"130 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128595939","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of GaAs MBE growth on FIB-modified Si(100) fib修饰Si(100)上GaAs MBE生长的研究
International Conference on Micro- and Nano-Electronics Pub Date : 2022-01-30 DOI: 10.1117/12.2624404
M. Eremenko, N. Shandyba, N. Chernenko, S. Balakirev, M. Solodovnik, O. Ageev
{"title":"Investigation of GaAs MBE growth on FIB-modified Si(100)","authors":"M. Eremenko, N. Shandyba, N. Chernenko, S. Balakirev, M. Solodovnik, O. Ageev","doi":"10.1117/12.2624404","DOIUrl":"https://doi.org/10.1117/12.2624404","url":null,"abstract":"In this work, we investigated the influence of the focused ion beams modification modes of the Si substrate local areas on the subsequent growth of GaAs layers by the molecular beam epitaxy. It was found that the crystallization of Ga droplets upon annealing in an arsenic flow does not lead to a significant change in the surface morphology. It was also found the growth of GaAs on substrates with areas modified at an accelerating voltage of 30 kV and subjected to subsequent annealing at a temperature of 800°C results in the formation of nanowires.","PeriodicalId":388511,"journal":{"name":"International Conference on Micro- and Nano-Electronics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128600038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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