Micro and Nano Engineering最新文献

Enhanced detection of PSA by nanoscale plasmonic devices and Raman spectroscopy 利用纳米等离子体器件和拉曼光谱增强PSA检测

IF 3.1

Micro and Nano Engineering Pub Date : 2025-09-21 DOI: 10.1016/j.mne.2025.100322

C. Laurini , E. La Civita , E. Battista , V. Mollo , B. Della Ventura , R. Velotta , D. Terracciano , M.L. Coluccio , F. Gentile

{"title":"Enhanced detection of PSA by nanoscale plasmonic devices and Raman spectroscopy","authors":"C. Laurini , E. La Civita , E. Battista , V. Mollo , B. Della Ventura , R. Velotta , D. Terracciano , M.L. Coluccio , F. Gentile","doi":"10.1016/j.mne.2025.100322","DOIUrl":"10.1016/j.mne.2025.100322","url":null,"abstract":"<div><div>Prostate-specific antigen (PSA) is a crucial biomarker for the early detection and monitoring of prostate cancer (PC). In this study, we present a biosensing approach that integrates plasmonic nanostructures with surface-enhanced Raman spectroscopy (SERS) for the ultrasensitive detection of PSA in diluted solution. Our sensor device consists of ordered arrays of densely packed gold nanoparticles (Au NPs), fabricated using a combination of optical-lithography and electroless deposition techniques. The plasmonic properties of the Au NPs enhance the Raman scattering effect, significantly improving sensitivity and detection limits. We demonstrate the device's capability to detect PSA at vanishingly low concentrations – as low as <span><math><mn>38</mn><mspace></mspace><mi>pg</mi><mo>/</mo><mi>mL</mi></math></span> - well below the 4 ng/mL threshold used in clinical practice. Data analysis of Raman spectra illustrate that the response of the sensor device to PSA exhibits two distinct, <em>approximately linear</em> regimes. In the first regime (I), the Raman intensity increases with PSA concentration. In the second regime (II), the intensity decreases as concentration continues to rise. The transition between these regimes occurs at around <span><math><mn>3</mn><mspace></mspace><mi>ng</mi><mo>/</mo><mi>mL</mi></math></span>. The existence of these regimes is explained by the peculiar behavior of surface enhanced Raman substrates, where the signal intensity non-linearly depends on the distance from the active metal nano-surface. At higher PSA concentrations, the biomarker may accumulate on the Au NPs, hampering the efficiency of sensing. These findings suggest that this plasmonic-SERS platform could provide a highly effective, non-invasive tool for PSA detection, potentially improving PC diagnostics.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"29 ","pages":"Article 100322"},"PeriodicalIF":3.1,"publicationDate":"2025-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145120575","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Resistless photomask fabrication using electrolithography 利用电光刻技术制造无电阻光掩膜

IF 3.1

Micro and Nano Engineering Pub Date : 2025-09-12 DOI: 10.1016/j.mne.2025.100320

S.N. Ghosh, S. Talukder

{"title":"Resistless photomask fabrication using electrolithography","authors":"S.N. Ghosh, S. Talukder","doi":"10.1016/j.mne.2025.100320","DOIUrl":"10.1016/j.mne.2025.100320","url":null,"abstract":"<div><div>Photolithography is the most widely used lithography technique for commercial fabrication of micro-devices as well as for research and development purposes. However, to perform photolithography, we need a photomask containing the desired pattern. Conventional methods of photomask fabrication involve either photolithography using a direct laser writer or electron-beam lithography. Interestingly, the rise of sequential write scanning probe lithography (SPL) techniques has given rise to various novel methods of direct photomask writing. In this study, we focus on photomask fabrication using a SPL technique, known as ‘Electrolithography’ (ELG), with which multi-scale features can be easily patterned. This is a subtractive lithography technique that involves direct patterning on chromium (Cr) thin films. Being an electrical and direct-write process, ELG bypasses the need for high-power UV laser, electron gun, and polymer resist layers thereby making the process cost-effective and carbon-efficient. We propose a resistless, reliable and novel photomask fabrication process, using the ELG technique, based on a bimetallic architecture. Using the proposed method, we were able to obtain lines having a width of <2 μm, in the best case, and lines with a width < 10 μm repeatedly. We were also able to transfer the fabricated patterns reliably and repeatedly onto a material of choice.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"29 ","pages":"Article 100320"},"PeriodicalIF":3.1,"publicationDate":"2025-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145108312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Self-mixing interferometry system for in-vitro flow mapping of retinal arteriolar network 视网膜小动脉网络体外血流定位的自混合干涉测量系统

IF 3.1

Micro and Nano Engineering Pub Date : 2025-09-12 DOI: 10.1016/j.mne.2025.100318

Sebastián Sierra-Alarcón , Evelio E. Ramírez-Miquet , Julien Perchoux , Laureline Julien , Benoit Charlot , Adam Quotb

{"title":"Self-mixing interferometry system for in-vitro flow mapping of retinal arteriolar network","authors":"Sebastián Sierra-Alarcón , Evelio E. Ramírez-Miquet , Julien Perchoux , Laureline Julien , Benoit Charlot , Adam Quotb","doi":"10.1016/j.mne.2025.100318","DOIUrl":"10.1016/j.mne.2025.100318","url":null,"abstract":"<div><div>Self-Mixing Interferometry (SMI) is an optical sensing technique that enables the creation of compact, all-in-one optical sensors for high-resolution measurements, making it an attractive tool for flowmetry applications, such as velocity mapping in microfluidic systems. Most research in this area has focused on artificial rectangular or circular channels, which do not fully replicate in vivo-like structures. This study demonstrates the application of SMI for velocity mapping in microchannels designed to mimic the retinal arteriolar network. These microchannels were fabricated using backside lithography, a novel technique that produces semi-rounded geometries closely resembling in vivo conditions. A high-resolution SMI system was developed, achieving accurate velocity measurements with a spatial resolution of 1 <span><math><mi>μ</mi></math></span>m for detailed flow profiles, as well as faster scans at lower resolutions for global flow patterns. The system’s ability to reconstruct velocity maps and track flow variations within an artificial vascular network highlights the potential of SMI sensors for use in more complex, in vivo-like applications.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"29 ","pages":"Article 100318"},"PeriodicalIF":3.1,"publicationDate":"2025-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145108227","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Water droplet alignment film fabricated by patterning hydrophilic and hydrophobic regions using a moth-eye structure 利用蛾眼结构对亲水和疏水区域进行图图化制备的水滴排列膜

IF 3.1

Micro and Nano Engineering Pub Date : 2025-09-05 DOI: 10.1016/j.mne.2025.100317

Takuto Wakasa, Jun Taniguchi

{"title":"Water droplet alignment film fabricated by patterning hydrophilic and hydrophobic regions using a moth-eye structure","authors":"Takuto Wakasa, Jun Taniguchi","doi":"10.1016/j.mne.2025.100317","DOIUrl":"10.1016/j.mne.2025.100317","url":null,"abstract":"<div><div>Organisms naturally develop various physiological properties over time. For example, rose petals exhibit spherical repellence to water droplets, preventing them from falling even when inverted. In our previous study, we reproduced this adhesive hydrophobicity by creating microholes in a hydrophobic nanostructured film. However, this microstructure caused light scattering, which reduced the transmittance of the film. To address this, we focused our attention on an insect called the tenebrionid beetle, which collects water from fog using a two-region structure consisting of hydrophilic regions on a hydrophobic surface background. In a previous study, we combined this structure with a moth-eye structure to fabricate an adhesive hydrophobic surface with high permeability. We hypothesized that by reducing the size of the hydrophilic region within the two-region structure, it would be possible to align the water droplets within the hydrophilic regions. In future study, we aim to use these films as pipettes by transferring water droplets aligned on the hydrophilic regions onto a substrate. The optical transmittance of the film is important because it adjusts from the back of the film where the water droplets are being transferred. In this experiment, we fabricated hydrophilic regions using photolithography on a moth-eye mold, applying a hydrophilic photoresist. Subsequently, UV nanoimprint lithography was employed, utilizing a hydrophobic resist to form a two-region moth-eye-structured surface. When the hydrophilic regions had diameters ranging from 100 μm to 750 μm, water droplets preferentially aligned on the hydrophilic regions upon mist exposure using a humidifier. Notably, even when the film is inverted, the water droplets remain adhered, and due to the transmittance of the film of ∼90 %, they are visible from the reverse side. In addition, a 7 μL water droplet placed on the film demonstrated a contact angle of 148.4 degrees, confirming strong adhesive hydrophobicity.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"29 ","pages":"Article 100317"},"PeriodicalIF":3.1,"publicationDate":"2025-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145159603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures with low surface roughness 针对低表面粗糙度的三维结构优化基于十字线的高通量i线灰度投影光刻技术

IF 3.1

Micro and Nano Engineering Pub Date : 2025-09-01 DOI: 10.1016/j.mne.2025.100319

S. Schermer , J. Bieling , S. DeMoor , A. Zanzal , P. Reynolds , C. Helke , J. Bonitz , A. Voigt , D. Reuter

{"title":"Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures with low surface roughness","authors":"S. Schermer , J. Bieling , S. DeMoor , A. Zanzal , P. Reynolds , C. Helke , J. Bonitz , A. Voigt , D. Reuter","doi":"10.1016/j.mne.2025.100319","DOIUrl":"10.1016/j.mne.2025.100319","url":null,"abstract":"<div><div>In this work a reticle based i-line projection grayscale stepper lithography is applied, the patterning results are analyzed and the lithographic process is optimized to obtain low surface roughness grayscale pattern. Here the low contrast resist ma-P 1211G, one type of the ma-P 1200G grayscale resist series, from micro resist technology and tailored grayscale reticles from benchmark technologies are used. The spin curve, contrast curve and layer homogeneity of the resist were measured. A low surface roughness of the generated grayscale structures is important, because the roughness will be transferred during subsequent etching steps as pattern transfer. The impact of the pixel size (within the reticle) on the resist roughness and structure fidelity after resist development was investigated. Therefore, to measure the roughness of exposed and developed structures by AFM, dedicated roughness pads were integrated into the reticle design. After evaluation of the resist roughness a DOE study for different annealing steps in order to smoothen the resist surface after development was conducted. The ideal annealing or smoothening temperature was determined to reduce the resist roughness and preserve/ retain the structure fidelity at the same time.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100319"},"PeriodicalIF":3.1,"publicationDate":"2025-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145004270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

PowderMEMS® magnets as enabler for miniaturized NV based quantum sensors and quantum processor architectures PowderMEMS®磁体是小型化基于NV的量子传感器和量子处理器架构的推动者

IF 3.1

Micro and Nano Engineering Pub Date : 2025-08-23 DOI: 10.1016/j.mne.2025.100316

Mario Bähr , Björn Gojdka , Thomas Lisec , Niels Clausen , Mani Teja Bodduluri , Aya Zino , Indira Käpplinger , Dominik Karolewski , Jan Meijer , Thomas Ortlepp

引用次数: 0

Measurement of thickness of thin coatings on rough substrates via computational analysis of SEM images 通过扫描电镜图像的计算分析来测量粗糙基底上薄涂层的厚度

IF 3.1

Micro and Nano Engineering Pub Date : 2025-08-11 DOI: 10.1016/j.mne.2025.100315

A. Kondi , E.-M. Papia , V. Constantoudis , D. Nioras , I. Syngelakis , C. Aivalioti , E. Aperathitis , E. Gogolides

{"title":"Measurement of thickness of thin coatings on rough substrates via computational analysis of SEM images","authors":"A. Kondi , E.-M. Papia , V. Constantoudis , D. Nioras , I. Syngelakis , C. Aivalioti , E. Aperathitis , E. Gogolides","doi":"10.1016/j.mne.2025.100315","DOIUrl":"10.1016/j.mne.2025.100315","url":null,"abstract":"<div><div>This work introduces a computational method to quantify the thickness of thin films deposited on highly rough substrates analyzing top-down Scanning Electron Microscope (SEM) images. The method entails measuring the bright areas of top-down SEM images of the rough surface obtained before and after deposition, allowing for the prediction of film thickness through the ratio of bright area enhancement caused by deposition to the average perimeter of these areas before and after deposition. Validation of this technique was conducted via synthetic SEM images with predefined film thicknesses, incorporating simple and complex substrate morphologies generated through Diffusion-Limited Aggregation (DLA) simulations for added realism. Experimental applications were explored through the analysis of SEM images of plasma-etched polymer (PMMA) surfaces coated with carbyne and of nanorods of TiO<sub>2</sub> coated with NiO, demonstrating the method's efficacy across varying surface roughness and morphologies. This work lays the foundation for future advancements, including the implementation of a neural network trained on synthetic datasets to enhance the measurement accuracy of coating thickness on rough substrates as well as the reconstruction of true surface morphologies prior to metal layer sputtering via SEM image analysis.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100315"},"PeriodicalIF":3.1,"publicationDate":"2025-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144830655","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Nanofabrication of superhydrophobic fluidic concentrators coupled with metallic plasmonic nano-antennas for SERS analysis in the sub-femtomolar range 超疏水流体浓缩器与金属等离子体纳米天线耦合的亚飞摩尔SERS分析的纳米制造

IF 3.1

Micro and Nano Engineering Pub Date : 2025-08-10 DOI: 10.1016/j.mne.2025.100314

Sofien Ramos , Victor Fabre , Mathieu Arribat , Aurélie Lecestre , Adrian Laborde , Frank Carcenac , Philippe Louarn , Emmanuelle Trevisiol , Christophe Vieu

{"title":"Nanofabrication of superhydrophobic fluidic concentrators coupled with metallic plasmonic nano-antennas for SERS analysis in the sub-femtomolar range","authors":"Sofien Ramos , Victor Fabre , Mathieu Arribat , Aurélie Lecestre , Adrian Laborde , Frank Carcenac , Philippe Louarn , Emmanuelle Trevisiol , Christophe Vieu","doi":"10.1016/j.mne.2025.100314","DOIUrl":"10.1016/j.mne.2025.100314","url":null,"abstract":"<div><div>Self-assembled silicon nanopillars decorated with metallic nanoparticles have emerged as efficient Surface Enhanced Raman Spectroscopy (SERS) substrates. In this study, we combine black Silicon Reactive Ion Etching-Inductively Coupled Plasma (RIE-ICP) and thin film deposition of Silver (Ag) to produce this type of surface equipped with plasmonic nano-antennas. The paper describes a quantitative methodology for optimizing the fabrication process of such silicon SERS supports and specifically the determination of the nominal thickness of the Ag thin film, that upon fragmentation at the surface of the black‑silicon nanopillars, forms Ag nanoparticles capable of enhancing the local electromagnetic field. This parameter is crucial for tuning the surface density of generated hot spots on the surface and their electromagnetic enhancement factors. We propose a methodology based on the generation of hierarchical superhydrophobic fluidic concentrators and the development of a home-made algorithm for analyzing SERS spectra of Rhodamine B (RhB) solution at sub-femtomolar concentrations. The developed hierarchical clustering algorithm automatically selects from all the spectra acquired on the region of interest, the surface enhanced spectra containing at least three vibrational Raman signatures of RhB. The objective criterion for optimizing the fabrication process or for evaluating the performance of any SERS substrate is then simply the total number of RhB spectra finally retained by the algorithm. We detail the fabrication processes, the algorithmic method and through its experimental implementation we show how to tune the parameters of the algorithm for selecting the optimal Ag thin-film thickness.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100314"},"PeriodicalIF":3.1,"publicationDate":"2025-08-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144879763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

AI-initialized level-set inversion for lithographic mask reconstruction 用于光刻掩模重建的ai初始化水平集反演

IF 3.1

Micro and Nano Engineering Pub Date : 2025-08-06 DOI: 10.1016/j.mne.2025.100312

Feng-Lin Tsao , Tzu-Yu Lin , Chen Shuai , Tzu-Chun Lo , Yu-Heng Hung , Chun-Hung Lin

{"title":"AI-initialized level-set inversion for lithographic mask reconstruction","authors":"Feng-Lin Tsao , Tzu-Yu Lin , Chen Shuai , Tzu-Chun Lo , Yu-Heng Hung , Chun-Hung Lin","doi":"10.1016/j.mne.2025.100312","DOIUrl":"10.1016/j.mne.2025.100312","url":null,"abstract":"<div><div>As feature sizes in semiconductor manufacturing continue to shrink, accurate mask inspection and wafer-level prediction have become increasingly challenging. This paper presents a lithography-driven mask reconstruction framework that infers physically meaningful mask patterns from aerial images captured by mask reviewers. The proposed approach is grounded in an image formation model based on stacked pupil shift matrices and ensures physical interpretability and alignment with real lithography processes. The framework integrates a level-set-based inverse modeling approach with adaptive time-step optimization methods, including Barzilai–Borwein method and Golden Section Search, to ensure convergence efficiency and stability. To address the sensitivity of level-set methods to initialization, a deep learning-based model trained on lithography-aware data is introduced to generate accurate initial level-set functions. Additionally, an upsampling technique is employed to overcome pixel resolution limitations and to refine mask edge smoothness without increasing runtime. Experimental results demonstrate that the reconstructed masks generate aerial images that closely match those from mask reviewers. Compared with the sidelobe search, our AI-initialized method substantially improves reconstruction accuracy and convergence, especially in cases involving subresolution assist features. Furthermore, wafer-level evaluations exhibit strong alignment between simulated and actual CD variations, and matching slopes are consistently above 0.8. The proposed framework effectively bridges the gap between aerial image analysis and wafer behavior prediction, and offers a robust, scalable solution for advanced mask review and verification workflows.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100312"},"PeriodicalIF":3.1,"publicationDate":"2025-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144810657","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane SiNx膜双层超表面双面图像化电子束光刻中的透射电子曝光

IF 3.1

Micro and Nano Engineering Pub Date : 2025-08-06 DOI: 10.1016/j.mne.2025.100313

Jinyu Guo , Yifei Wang , Hao Quan , Shuoqiu Tian , Qiucheng Chen , Wentao Yuan , Qingxin Wu , Kangping Liu , Yifang Chen , Qiong He , Lei Zhou

{"title":"Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane","authors":"Jinyu Guo , Yifei Wang , Hao Quan , Shuoqiu Tian , Qiucheng Chen , Wentao Yuan , Qingxin Wu , Kangping Liu , Yifang Chen , Qiong He , Lei Zhou","doi":"10.1016/j.mne.2025.100313","DOIUrl":"10.1016/j.mne.2025.100313","url":null,"abstract":"<div><div>Metasheets, composed of two identical metasurfaces closely aligned to each other within a mode-coupling distance on the two opposite sides of a SiN<sub>x</sub> membrane, are of unique functionalities for effective modulation of electromagnetic waves by nanoscale metallic structures. Although the physical image is readily clear, nanofabrication of such a two-sided devices with identical patterns still remains a big challenge because of the e-beam spreading caused by forward scattering in both resists and membranes. In this work, an innovative transmitted electron beam lithography (TEBL) was developed for metasheets. Three different resist stacks were tried and compared to eliminate the pattern deviation between them. A simulation study of TEBL was systematically carried out to figure out a reliable process window for replicating identical Au-gratings on the two opposite sides. The principle behind the success of replicating two identical metasurfaces on opposite sides is analyzed. The developed TEBL in this work extends the application of electron beam lithography to double-sided patterning for novel optical devices such as metasheets.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100313"},"PeriodicalIF":3.1,"publicationDate":"2025-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144830654","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0