Micro and Nano Engineering最新文献

Rapid prototyping of 3D microstructures: A simplified grayscale lithography encoding method using blender

IF 2.8

Micro and Nano Engineering Pub Date : 2024-12-27 DOI: 10.1016/j.mne.2024.100294

Fabrício Frizera Borghi , Mohammed Bendimerad , Marie-Ly Chapon , Tatiana Petithory , Laurent Vonna , Laurent Pieuchot

引用次数: 0

Pattern distortion in nanoimprint lithography using UV-curable polymer stamps

IF 2.8

Micro and Nano Engineering Pub Date : 2024-12-01 DOI: 10.1016/j.mne.2024.100293

Fangfang Li , Marina Fetisova , Mervi Koskinen , Jukka Viheriälä , Tapio Niemi , Petri Karvinen , Markku Kuittinen

{"title":"Pattern distortion in nanoimprint lithography using UV-curable polymer stamps","authors":"Fangfang Li , Marina Fetisova , Mervi Koskinen , Jukka Viheriälä , Tapio Niemi , Petri Karvinen , Markku Kuittinen","doi":"10.1016/j.mne.2024.100293","DOIUrl":"10.1016/j.mne.2024.100293","url":null,"abstract":"<div><div>Quantification of pattern distortion in nanoimprint lithography (NIL) is required when applying it to specific applications, especially those with tight tolerances. We present a systematic study on full wafer NIL distortion using soft stamps made of different carrier foils and UV-curable polymer structure layers. These errors are evaluated by overlay patterning using NIL and optical lithography on 4-in. wafers over a distance of 80 mm. Potential causes for pattern distortion and possible correction methods are discussed in terms of stamp composition and environmental impact. Pattern distortion along axes causing dimensional change is stamp dependent, and stiffer stamps show less pattern dimensional change than the softer ones. In the best case, the minimum variation is 4 parts per million (ppm), and in the worst case, 252 ppm with a softer stamp. Stamp flatness and uniform contact during imprinting are important in reducing high-order pattern distortion. A maximum dimensional variation of 32 ppm in a batch run demonstrates good pattern repeatability. Long-term dimensional stability can be affected by relative humidity, with variations on the order of 100 ppm.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"25 ","pages":"Article 100293"},"PeriodicalIF":2.8,"publicationDate":"2024-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143166054","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

In situ measurements of thermal and pressure dependent stress in SOG films by phase shifting interferometry 用相移干涉法原位测量SOG薄膜中的热和压力相关应力

IF 2.8

Micro and Nano Engineering Pub Date : 2024-12-01 DOI: 10.1016/j.mne.2024.100292

T.M. van den Berg, A. Bosseboeuf, P. Coste, L. Vincent

{"title":"In situ measurements of thermal and pressure dependent stress in SOG films by phase shifting interferometry","authors":"T.M. van den Berg, A. Bosseboeuf, P. Coste, L. Vincent","doi":"10.1016/j.mne.2024.100292","DOIUrl":"10.1016/j.mne.2024.100292","url":null,"abstract":"<div><div>Hydrogen silsesquioxane (HSQ) and Medusa are spin-on-glasses used for several applications and more specifically for electron-beam lithography. To characterize the thermal densification of these resists on silicon, the mean resist film stress was measured in situ as function of temperature up to 600 °C in a vacuum chamber by the curvature method. The curvature was evaluated from 3D profiles of uncoated and coated dies measured by full field phase shifting interferometry. Three resists were investigated: FOx-15, FOx-25 and Medusa-82. The initial resist stress at room temperature after spin coating and baking is slightly tensile and becomes highly tensile above a certain temperature dependent on the resist. This variation is mainly attributed to resists densification. FOx-15 and FOx-25 start densifying at 500 °C, and FOx-25 densifies more than FOx-15. Medusa-82 is densifying around 300 °C and has the highest tensile stress but the film relaxes beyond 405 °C. In the case of FOx-15, it was found that vacuum annealing prevents densification. Finally, we evaluated the in-plane average coefficient of thermal expansion of the resists from stress measurements during cooling to room temperature. For FOx-15, a CTE equal to 1.5 ppm/K is found, while it is close to 0.0±0.2 ppm/K for FOx-25 and 1.3 ppm/K for Medusa-82.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"25 ","pages":"Article 100292"},"PeriodicalIF":2.8,"publicationDate":"2024-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142747231","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Laser-engraved holograms as entropy source for random number generators 激光雕刻全息图作为随机数生成器的熵源

IF 2.8

Micro and Nano Engineering Pub Date : 2024-11-04 DOI: 10.1016/j.mne.2024.100290

Christos Tselios , Anastasios Tsakas , Simone Mazzucato , Christina Politi (Tanya) , Panagiotis Rizomiliotis , Dimitris Alexandropoulos

引用次数: 0

Release of hydrogen gas from PECVD silicon nitride thin films in cavities of MEMS sensors PECVD 氮化硅薄膜在 MEMS 传感器空腔中释放氢气

IF 2.8

Micro and Nano Engineering Pub Date : 2024-11-03 DOI: 10.1016/j.mne.2024.100291

P. Dani , M. Tuchen , B.E. Meli , J. Franz , J. Knoch

引用次数: 0

Developments in the design and microfabrication of photovoltaic retinal implants 光电视网膜植入物的设计和微加工进展

IF 2.8

Micro and Nano Engineering Pub Date : 2024-10-29 DOI: 10.1016/j.mne.2024.100289

Pratik Kusumanchi , Stephan Sylvest Keller , Rasmus Schmidt Davidsen

{"title":"Developments in the design and microfabrication of photovoltaic retinal implants","authors":"Pratik Kusumanchi , Stephan Sylvest Keller , Rasmus Schmidt Davidsen","doi":"10.1016/j.mne.2024.100289","DOIUrl":"10.1016/j.mne.2024.100289","url":null,"abstract":"<div><div>Photovoltaic retinal implants are emerging as a promising technological solution for restoring vision for patients suffering from retinal degenerative diseases such as retinitis pigmentosa and age-related macular degeneration. These prostheses contain arrays of miniaturized solar cells converting light into electrical output signals, which subsequently are employed for local activation of the intact neuroretina via microelectrodes. Leveraging cutting-edge microfabrication techniques, photovoltaic retinal implants are compact and provide a high density of solar cell pixels. This potentially increases the resolution of the artificial vision and the field of view and lowers the threshold for stimulation of retinal neurons. The introduction of flexible substrates and the integration of 3D electrodes has greatly improved the connection with retinal neurons, optimizing the spatial resolution and potentially lowering the stimulation threshold. This review explores the latest developments in photovoltaic retinal prostheses, highlighting key aspects of their design, fabrication and performance. This field of research is still in its early stage and particular emphasis is laid on promising future research directions including miniaturization of pixels, incorporation of organic flexible semiconductors and first studies considering 3D stimulating electrode structures. Despite the significant progress made, there are still substantial challenges to overcome, such as ensuring long-term biocompatibility and validation of the novel concepts in clinical trials. Ongoing interdisciplinary research and development are essential for moving these promising technologies from the lab to real-world clinical applications, ultimately enhancing vision restoration. This review aims to provide a comprehensive overview of the current state of photovoltaic retinal implants and pinpoints critical areas for future research to further advance this transformative technology.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"25 ","pages":"Article 100289"},"PeriodicalIF":2.8,"publicationDate":"2024-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573319","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhanced plasma etching using nonlinear parameter evolution 利用非线性参数演化增强等离子体蚀刻能力

IF 2.8

Micro and Nano Engineering Pub Date : 2024-10-18 DOI: 10.1016/j.mne.2024.100288

Arjun Moothedath, Zhong Ren

{"title":"Enhanced plasma etching using nonlinear parameter evolution","authors":"Arjun Moothedath, Zhong Ren","doi":"10.1016/j.mne.2024.100288","DOIUrl":"10.1016/j.mne.2024.100288","url":null,"abstract":"<div><div>This study explores the development and characterization of plasma etching for sub-micron features using a nonlinear evolution of parameter in a three-step cyclic Bosch process. Comparing this nonlinear approach with traditional linear parameter evolution, we aimed to address issues such as bowing at the top of the features and narrowing at the bottom. Constant parameter etching produced tapered profiles, undercutting, and non-uniform scallops due to particle deflection. Linear parameter evolution partially mitigated these problems by balancing etch and deposition cycles and gradually increasing radio frequency power, achieving high selectivity to the photoresist. One nonlinear exponential evolution method resulted in a higher etch rate but caused slight damage to the top-side wall, while the etch depth was reduced. The other nonlinear method balanced the etch and deposition steps more effectively, achieving a comparable etch rate and selectivity to the linear method. Further optimization of this second method led to improved vertical profiles and controlled scallops, achieving greater depth, smoother sidewalls, and higher etch rates. This optimized technique successfully fabricated high aspect ratio periodic sub-micron structures with excellent uniformity across the wafer, demonstrating its potential for achieving even higher aspect ratios with thicker masks.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"25 ","pages":"Article 100288"},"PeriodicalIF":2.8,"publicationDate":"2024-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573318","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Low-frequency electromagnetic harvester for wind turbine vibrations 用于风力涡轮机振动的低频电磁采集器

IF 2.8

Micro and Nano Engineering Pub Date : 2024-09-13 DOI: 10.1016/j.mne.2024.100287

Carlos Castellano-Aldave , Aitor Plaza , Xabier Iriarte , Alfonso Carlosena

引用次数: 0

From ghost to state-of-the-art process corrections – PEC enabled e-beam nanofabrication 从 "幽灵 "到最先进的工艺修正--PEC 电子束纳米制造技术

IF 2.8

Micro and Nano Engineering Pub Date : 2024-09-11 DOI: 10.1016/j.mne.2024.100286

Ulrich Hofmann, Nezih Ünal, Jan Klikovits

引用次数: 0

Single cell separation in microplates through micro patterning of “clickable” hydrogels 通过 "可点击 "水凝胶的微图案化实现微孔板中的单细胞分离

IF 2.8

Micro and Nano Engineering Pub Date : 2024-09-03 DOI: 10.1016/j.mne.2024.100285

Alexander J. Straub , Frank D. Scherag , Mark-Steven Steiner , Thomas Brandstetter , Jürgen Rühe

{"title":"Single cell separation in microplates through micro patterning of “clickable” hydrogels","authors":"Alexander J. Straub , Frank D. Scherag , Mark-Steven Steiner , Thomas Brandstetter , Jürgen Rühe","doi":"10.1016/j.mne.2024.100285","DOIUrl":"10.1016/j.mne.2024.100285","url":null,"abstract":"<div><p>In this study, we report a novel approach for separating microspheres or cells on microstructured surfaces. These structures consist of μ-structured hydrogel coatings fabricated by photolithography on the bottoms of standard plastic microplate wells. The process is based on the deposition and subsequent irradiation of copolymers containing a hydrophilic main component and benzophenone moieties that can react with C, H groups during UV exposure through a photomask, a process known as “C,H insertion crosslinking” (CHic). The photolithographic process is used to generate an egg-box-like topography of the coating. Gravity, Brownian motion, and physical surface interactions drive particles or cells pipetted onto the surfaces to distinct locations on this topography so that after a short time these locations contain only one single particles or cells. We show that the presented technique enables the separation of thousands of objects as different as polymer microparticles or biological cells by simply adding a suspension to the coated wells of the microplate and wait for a short time (a few minutes). This strategy is quite general and not specific to a certain type of cell or microparticle and thus allow effortless separation of particles or cells.</p></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"25 ","pages":"Article 100285"},"PeriodicalIF":2.8,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2590007224000480/pdfft?md5=82c83607116a2e2bcbb15cedee173954&pid=1-s2.0-S2590007224000480-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142163459","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0