Micro and Nano Engineering最新文献

{"title":"Nanofabrication of sharp conductive diamond tip probe chips and their application in reverse tip sample scanning probe microscopy","authors":"L. Wouters ,&nbsp;J. Cho ,&nbsp;S. Gim ,&nbsp;J. Yang ,&nbsp;A. Kanniainen ,&nbsp;K. Lee ,&nbsp;P. Lagrain ,&nbsp;N. Peric ,&nbsp;T. Hantschel","doi":"10.1016/j.mne.2025.100307","DOIUrl":"10.1016/j.mne.2025.100307","url":null,"abstract":"<div><div>Recently, a new scanning probe microscopy (SPM) concept called reverse tip sample scanning probe microscopy (RTS SPM) was introduced. Here, a sample is mounted at the end of a cantilever beam and scans over a tip that is integrated into an array of hundreds of SPM tips, overcoming one of the major limitations of the SPM technique, namely, the time-consuming and experiment-interrupting manual tip exchange step. However, to fully exploit this novel approach, a chip with an array of densely packed, nanometer-sharp, and durable SPM tips is essential. Therefore, we have developed a fabrication process to integrate such an array of sharp, high aspect ratio, doped diamond tips – referred to as hedgehog full diamond tip (HFDT) – into so-called probe chips, facilitating high-resolution SPM measurements and enabling rapid and seamless sample movement from one tip to another within the RTS SPM framework. An array of pyramidally shaped, doped diamond tips is fabricated through consecutive molding and diamond deposition steps. A supporting membrane is formed by metal deposition and electroplating, followed by selective underetching of the silicon substrate to release the tip array membrane and enable probe chip assembly. Finally, a self-patterned dry etching step is employed to generate multiple nanoscopic sharp tips on top of the base diamond pyramids. In this work, we present our developed and optimized probe chip technology and demonstrate its high electrical conductivity, robustness under high tip load force, and excellent spatial resolution, rendering it highly suitable for diverse electrical SPM measurement modes.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100307"},"PeriodicalIF":2.8,"publicationDate":"2025-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144534496","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Silicon selective etching by gold implantation: Feasibility and nanofabrication capabilities","authors":"E. Scattolo ,&nbsp;A. Cian ,&nbsp;J. Llobet ,&nbsp;X. Borrise Nogue ,&nbsp;S. Mondal ,&nbsp;M. Barozzi ,&nbsp;A. Bagolini ,&nbsp;M. Crivellari ,&nbsp;F. Pérez-Murano ,&nbsp;D. Giubertoni","doi":"10.1016/j.mne.2025.100308","DOIUrl":"10.1016/j.mne.2025.100308","url":null,"abstract":"<div><div>Silicon nanofabrication plays a crucial role in the development of advanced electronic, photonic, and quantum devices. Focused ion beam (FIB) milling is widely used for direct patterning at the nanoscale, but it requires high ion fluences, leading to long processing times, material redeposition, and increased contamination. In this work, we demonstrate an alternative FIB-based approach that relies on gold ion implantation at significantly lower fluences, enabling selective silicon etching while minimizing these drawbacks.</div><div>Gold ions (Au⁺) were implanted into silicon substrates with a kinetic energy of 35 keV, followed by wet etching in tetramethylammonium hydroxide (TMAH). We identified the process window of Au fluences between 1 × 10¹⁵ and 1 × 10¹⁷ ions/cm², with secondary ion mass spectrometry (SIMS) confirming an Au concentration threshold of 3.5 × 10²⁰ atoms/cm³ necessary to sustain etching resistance, value predicted also by Monte Carlo simulations (TRIDYN). This approach enables the fabrication of suspended silicon nanowires with a minimum width of 36 nm, a thickness of 20 nm, and lengths up to 8 μm, achieving aspect ratios exceeding 400, as well as more complex suspended structures likes nets which can be targeted for applications in nanoelectromechanical systems (NEMS) reaching nanowire width over pitch down to 2 %.</div><div>The proposed method presents a promising alternative to conventional silicon patterning, significantly reducing processing complexity while enhancing nanostructure resolution. The results provide new insights into ion-implantation-assisted etching mechanisms and expand the possibilities for silicon nanostructure fabrication.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100308"},"PeriodicalIF":2.8,"publicationDate":"2025-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144549877","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Enhancing electrical discharge machining performance through nano H₂/O₂ bubble integration: A sustainable and optimized approach","authors":"Chia-Lung Kuo ,&nbsp;Chin-Ta Chen ,&nbsp;Chao-Ching Ho","doi":"10.1016/j.mne.2025.100306","DOIUrl":"10.1016/j.mne.2025.100306","url":null,"abstract":"<div><div>This study explores the integration of nano H₂/O₂ bubble liquid into Electrical Discharge Machining (EDM) and its impact on machining efficiency, precision, and sustainability. Experimental results demonstrate that the use of nano H₂/O₂ bubbles significantly enhances discharge dispersion, improves fluid flow for chip removal, and increases overall machining energy. For SUS316, machining time was reduced by up to 25 %, and for Ti6Al4V, by up to 31 %, when using a ϕ0.3 mm electrode. Additionally, electrode consumption decreased by up to 36 %, leading to improved cost-efficiency and reduced wear. The findings highlight the potential of nano H₂/O₂ bubble liquid in boosting EDM performance, offering a practical and environmentally sustainable solution for industrial applications by optimizing machining time, electrode consumption, and overall energy efficiency.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100306"},"PeriodicalIF":2.8,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144489361","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Anisotropic reactive ion etching of 2.5 micrometer thick alpha phase tantalum films for surface micromachining","authors":"Md Shariful Islam,&nbsp;Longchang Ni,&nbsp;Maarten P. de Boer","doi":"10.1016/j.mne.2025.100305","DOIUrl":"10.1016/j.mne.2025.100305","url":null,"abstract":"<div><div>An etch parameter study is conducted with the objective of achieving high anisotropy for tantalum (Ta) thin films of more than 1 μm in thickness. The gases explored are Argon (Ar), carbon tetrafluoride (CF₄) and oxygen. The effects of composition, flow, pressure, and power are investigated. Optical emission spectroscopy is used to interpret the etch results. While the addition of oxygen adversely affects anisotropy, it is improved with lower pressure. An Ar:CF₄ ratio of 5:1 is found to enable good etch rate and sidewall passivation. As power increases, the etch rate increases but there is no observable enhancement in anisotropy. Using a common parallel-plate RIE configuration with common low toxicity gases, a vertical sidewall is achieved for 2.5 μm thick <span><math><mo>α</mo></math></span>-Ta films with an optimum Ar to CF₄ ratio, power and pressure.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100305"},"PeriodicalIF":2.8,"publicationDate":"2025-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144549878","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Ni-P metallization of nylon 6,6 yarns with varying twist numbers by supercritical CO2 catalyzation toward weavable devices","authors":"Kazuhiro Shibata ,&nbsp;Tomoyuki Kurioka ,&nbsp;Hikaru Kondo ,&nbsp;Nao Yoshida ,&nbsp;Wan-Ting Chiu ,&nbsp;Chun-Yi Chen ,&nbsp;Tso-Fu Mark Chang ,&nbsp;Hiromichi Kurosu ,&nbsp;Masato Sone","doi":"10.1016/j.mne.2025.100304","DOIUrl":"10.1016/j.mne.2025.100304","url":null,"abstract":"<div><div>Weavable devices are innovative fabric-based electronics created by weaving yarns with various functions into a single cloth, enabling multifunctionality beyond traditional wearable devices. Electrically conductive yarns are essential for this integration, and in practical applications, yarns are prepared with varying twist numbers. This study investigates the metallization of nylon 6,6 yarns using a supercritical CO₂-assisted Ni<img>P electroless plating method and examines the influence of twist numbers on metallization characteristics. The results show that increasing the twist number significantly decreases the electrical resistance of Ni-P/nylon 6,6 composite yarns, underscoring the critical role of yarn structure in electrical conductivity. Energy-dispersive X-ray spectroscopy (EDS) analysis indicates that higher twist numbers (0 T/m to 865 T/m) improve the distribution of Pd catalysts on scCO₂-catalyzed nylon 6,6 yarns. Additionally, scanning electron microscope (SEM) observations and EDS analysis show that increasing the twist number leads to thicker and more uniform Ni<img>P coatings, thereby improving the electrical performance. Overall, this study demonstrates that optimizing twist number is key to improving the metallization quality and electrical properties of nylon 6,6 yarns for advanced weavable electronic applications.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100304"},"PeriodicalIF":2.8,"publicationDate":"2025-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144322776","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Real time analysis of cancer ovarian cell growth and migration on soft surfaces","authors":"Maria Laura Coluccio ,&nbsp;Luigi Bruno ,&nbsp;Cristina Laurini ,&nbsp;Francesca Gualtieri ,&nbsp;Valentina Rocca ,&nbsp;Tahreem Arshad Butt ,&nbsp;Annamaria Cerantonio ,&nbsp;Anna Martina Battaglia ,&nbsp;Giuseppe Viglietto ,&nbsp;Carmela De Marco ,&nbsp;Francesco Gentile","doi":"10.1016/j.mne.2025.100303","DOIUrl":"10.1016/j.mne.2025.100303","url":null,"abstract":"<div><div>It is well established that the nano-geometry and mechanical properties of a material's interface can significantly influence - and potentially enhance - cell adhesion, growth, proliferation, and migration, collectively referred to as cell behavior. At the same time, these behavioral responses are inherently dependent on the cell's own biological characteristics, including its type, age, cell cycle phase, and whether it is normal or cancerous - as well as, in the latter case, the stage of cancer. In this context, we hypothesize that these material and cellular factors may act synergistically, such that carefully engineered materials can modulate and amplify cellular responses. Specifically, such materials may function as amplifiers, accentuating the behavioral differences between distinct cell lines and thereby improving our ability to distinguish between them. Here, we used this concept to segregate OVCAR-429 ovarian cancer cells silenced for the EXT1 gene (shEXT1) from a control (SCR): i.e. cells infected with an empty lentivirus. EXT1 encodes a glycosyltransferase implicated in the synthesis of heparan sulfate proteoglycans and may play a role in cancer cell invasion and metastasis. We produced polydimethylsiloxane (PDMS) substrates with low values of Young's modulus in the MPa range, and moderate values of roughness of about <span><math><mn>20</mn><mspace></mspace><mi>nm</mi></math></span>. Then, we monitored cell-behavior over time on PDMS substrates and on standard rigid microplates for comparison. Analysis of cell trajectories revealed that shEXT1 cells exhibited significantly reduced motility on PDMS surfaces compared control cells, with cell velocity and diffusivity reduced by more than twofold, whereas no significant differences were observed on standard surfaces. Our results thus indicate the potential of soft biomaterials to reveal biological differences in disease models.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100303"},"PeriodicalIF":2.8,"publicationDate":"2025-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144312573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Influence of DMSO/DMF ratio on the crystal growth and optical properties of Sn-based perovskite films","authors":"Hideto Tokizawa ,&nbsp;Xinwei Zhao ,&nbsp;Mariko Murayama","doi":"10.1016/j.mne.2025.100302","DOIUrl":"10.1016/j.mne.2025.100302","url":null,"abstract":"<div><div>Perovskite solar cells (PSCs) are promising candidates for next-generation photovoltaic technology because of their high power conversion efficiency (PCE) and low production cost. However, the presence of lead in most PSCs raises concerns about their environmental impact. Tin (Sn)-based PSCs offer a less toxic alternative, but their performance still lags behind lead (Pb)-based counterparts. This study investigates the impact of solvent composition and annealing temperature on the crystal growth and optoelectronic properties of Sn-based perovskite (MA_0.2FA_0.8SnI₃) thin films. By varying the ratio of dimethyl sulfoxide (DMSO) and <em>N</em>,<em>N</em>-dimethylformamide (DMF) in the precursor solution, we systematically controlled the crystallization process, guided by the LaMer model. X-ray diffraction (XRD) and microscopy analyses revealed that solvent ratio and annealing temperature significantly influence the crystallinity and morphology of the films. High DMSO ratios promoted larger crystal formation, while high DMF ratios induced smaller crystals. Optical characterization revealed a correlation between film morphology and band gap, with deviations from the theoretical value attributed to voids and incomplete surface coverage. Our findings demonstrate the critical role of solvent engineering in optimizing the quality of tin-based perovskite films for enhanced solar cell performance.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100302"},"PeriodicalIF":2.8,"publicationDate":"2025-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144272353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Energy dissipation in silicon nitride microbeam resonators with a 3D-printed polymer layer","authors":"Lucia Crocetto ,&nbsp;Tomás Manzaneque ,&nbsp;Murali Krishna Ghatkesar","doi":"10.1016/j.mne.2025.100300","DOIUrl":"10.1016/j.mne.2025.100300","url":null,"abstract":"<div><div>We present an analysis of the main mechanisms of dissipation of resonant multilayer double-clamped microbeams in the frequency range 200 to 500 kHz. The devices consist of <span><math><mn>2</mn><mspace></mspace><mi>μm</mi></math></span> thick silicon nitride (E <span><math><mo>≈</mo></math></span> 160 GPa) beams covered with a polymer IP-Dip (E <span><math><mo>≈</mo></math></span> 4 GPa) layer fabricated by two-photon polymerization. A laser-Doppler vibrometer was used to measure the resonant vibrations and energy dissipation of the devices in high vacuum (&lt; 0.05 Pa) at room temperature. The experimental findings were compared with theoretical and finite element method (FEM) results. The quality factor, dominated by the intrinsic dissipation in the IP-Dip layer, has proven to have a strong dependence on polymer thickness. On this basis, a viscous model for intrinsic dissipation in a polymer layer was formulated.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"28 ","pages":"Article 100300"},"PeriodicalIF":2.8,"publicationDate":"2025-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144262766","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Stereolithography 3D printing method for multi-material hydrogel 2D photo-patterning in a microfluidic chip","authors":"S. Assie-Souleille,&nbsp;L. Seguier,&nbsp;D. Gauchard,&nbsp;I. Drobecq,&nbsp;B. Franc,&nbsp;L. Malaquin,&nbsp;J. Foncy","doi":"10.1016/j.mne.2025.100301","DOIUrl":"10.1016/j.mne.2025.100301","url":null,"abstract":"<div><div>We present a novel and straightforward method using a standard stereolithography (SLA) 3D printer for high-resolution (20 μm x-y resolution), multi-material 2D hydrogel photo-patterning directly within a microfluidic chip. The process involves sequential injections of photosensitive hydrogel into a transparent microfluidic chip coupled with sequential direct laser writing by the printer through point-by-point photopolymerization. Our approach integrates a custom miniaturized syringe pump system into the SLA printer, thereby enabling fluid management and sequential injection of different photosensitive hydrogels directly into the microfluidic environment between each laser writing sequence. This technique enables the fabrication of intricate, multi-material hydrogel patterns (e.g., PEGDA and HAMA) with high spatial resolution over areas spanning several square millimeters. Future developments will focus on expanding the range of biomaterials and incorporating cell-laden hydrogels to facilitate the creation of biologically relevant microenvironments on chip.</div><div>This study opens new possibilities for high-resolution, multi-material hydrogel patterning in microfluidics and offers a valuable platform for advancing research in microsystems engineering.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"27 ","pages":"Article 100301"},"PeriodicalIF":2.8,"publicationDate":"2025-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144204270","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Assessing ultrasonic and optical flow velocimetry in a millifluidic device using oil-in-water emulsions as blood mimicking fluid","authors":"Estelle Lu ,&nbsp;Williams Flores Cisternas ,&nbsp;Héloïse Uhl ,&nbsp;Alexandre Chargueraud ,&nbsp;Quentin Grimal ,&nbsp;Guillaume Renaud ,&nbsp;Jean-Gabriel Minonzio ,&nbsp;Jacques Fattaccioli","doi":"10.1016/j.mne.2025.100298","DOIUrl":"10.1016/j.mne.2025.100298","url":null,"abstract":"<div><div>Blood-mimicking fluids (BMFs) play a critical role in ultrasonic imaging and Doppler flow studies by replicating the physical and acoustic properties of blood. This study introduces a novel soybean oil-in-water emulsion as a BMF with particle size akin to red blood cells. Using a millifluidic device, we cross-validated flow profiles through both Doppler velocimetry and optical particle tracking, demonstrating compatibility with theoretical Poiseuille flow models. The millifluidic chip, fabricated via stereolithography, provided an optimized platform for dual optical and ultrasonic assessments. Results showed strong agreement between the two methods across a range of flow rates, affirming the suitability of the emulsion for velocimetry applications. Furthermore, the acoustic properties of soybean oil droplets support their potential as an echogenic and stable alternative to conventional BMFs.</div></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"27 ","pages":"Article 100298"},"PeriodicalIF":2.8,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143942364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}