Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on最新文献_第8页

Capacity increase for existing Varian EHP220 and EHP500 implanters 现有瓦里安EHP220和EHP500种植机的容量增加

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258052

K. Ali

引用次数: 0

Beam angle control on the VIISta 80 ion implanter VIISta 80离子注入器的光束角度控制

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1257971

C. Campbell, J. Cummings, R. Lindberg, J. Olson, S. Radovanov, D. Smatlak

引用次数: 5

Investigation of phosphorus contamination in 49BF2+ implants 49BF2+种植体中磷污染的调查

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258006

Frederic Sahores, D. Lenoble, F. Labrado, B. Baylac

引用次数: 0

SIMS depth profiling and SRIM simulation to lower energy antimony implantation into silicon 低能量锑注入硅的SIMS深度剖面和SRIM模拟

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258083

Yupu Li Yupu Li, J. Shyue, J. Hunter, B. McComb, M. Chun, R. Doherty, M. Foad

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引用次数: 1

Doping challenges in exploratory devices for high performance logic 高性能逻辑探索装置中的掺杂挑战

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1257924

E. Jones

引用次数: 1

Cluster ion beam processing - METI/NEDO projects and recent progress $ 集群离子束处理- METI/NEDO项目及最新进展[j]

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258092

I. Yamada, J. Matsuo, N. Toyoda

引用次数: 1

Cleaning procedure for indium implantation 铟植入的清洗程序

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258039

T. Yamashita, N. Miyamoto, K. Miyabayashi, T. Nagayama

引用次数: 1

Crystal fracture induced by decorating of postimplantation defects: Silicon layer delamination 由植入后缺陷的修饰引起的晶体断裂:硅层分层

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258087

A. Usenko, W. Carr, B. B. Bo Chen

引用次数: 0

Ultra-shallow junction formation by Point Defect Engineering 点缺陷工程形成超浅结

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1257935

Wei-Kan Chu Wei-Kan Chu, Lin Shao Lin Shao, J. Liu, P. Thompson, X. Wang, H. Chen

引用次数: 0

A compact model for the simulation of ion implantation 离子注入模拟的紧凑模型

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI: 10.1109/IIT.2002.1258067

K. Andreas

引用次数: 0