Capacity increase for existing Varian EHP220 and EHP500 implanters

K. Ali
{"title":"Capacity increase for existing Varian EHP220 and EHP500 implanters","authors":"K. Ali","doi":"10.1109/IIT.2002.1258052","DOIUrl":null,"url":null,"abstract":"Wafer throughput is of great importance to the semiconductor production facility. The problems of financial and spatial considerations magnified by aging fabs and industry downturns are directing focus to improving existing capacity and away from purchasing new tools. Wafer handler hardware upgrades, software upgrades, and improved operation procedures were implemented on three Varian EHP-220 implanters and one EHP-500 implanter to achieve higher capacity. This was accomplished without adversely affecting implant process parameters, tool uptime, or product uniformity. This paper presents two stages of improvements along with the data for corresponding increase in tool capacity and retention of tool and process reliability.","PeriodicalId":305062,"journal":{"name":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2002.1258052","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Wafer throughput is of great importance to the semiconductor production facility. The problems of financial and spatial considerations magnified by aging fabs and industry downturns are directing focus to improving existing capacity and away from purchasing new tools. Wafer handler hardware upgrades, software upgrades, and improved operation procedures were implemented on three Varian EHP-220 implanters and one EHP-500 implanter to achieve higher capacity. This was accomplished without adversely affecting implant process parameters, tool uptime, or product uniformity. This paper presents two stages of improvements along with the data for corresponding increase in tool capacity and retention of tool and process reliability.
现有瓦里安EHP220和EHP500种植机的容量增加
晶圆吞吐量对半导体生产设施至关重要。老旧的晶圆厂和行业低迷加剧了财务和空间方面的考虑问题,这些问题正将重点转向提高现有产能,而不是购买新工具。在3台瓦里安EHP-220种植机和1台EHP-500种植机上对晶圆处理机进行了硬件升级、软件升级和操作流程改进,以实现更高的产能。这在不影响植入工艺参数、工具正常运行时间或产品均匀性的情况下完成。本文根据数据提出了相应提高刀具容量和保持刀具和工艺可靠性的两个改进阶段。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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