Advances in Optoelectronics and Micro/nano-optics最新文献

筛选
英文 中文
Scene-based bad pixel dynamic correction and evaluation for IRFPA device 基于场景的红外焦平面成像器件坏像动态校正与评价
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713516
Yang Cao, Weiqi Jin, Chongliang Liu, Xiu Liu
{"title":"Scene-based bad pixel dynamic correction and evaluation for IRFPA device","authors":"Yang Cao, Weiqi Jin, Chongliang Liu, Xiu Liu","doi":"10.1109/AOM.2010.5713516","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713516","url":null,"abstract":"Infrared focal plane array IRFPA bad pixel correction in complex applications and rich details conditions is a common problem. Therefore, a scene-based bad pixel dynamic correction (SBBPDC) technique was investigated. Based on the adaptive median filtering bad pixel detection algorithm, using the key frame technique according to the scene change, the interframe statistics are applied to judging bad pixels for higher detection accuracy. Using the improved Nagao filtering bad pixel compensation algorithm with some stronger directivity filtering sub-windows which have the same pixel amount, the image boundary pixels didn't reappear as flicking dot during the quick scene changes, and the rich scene details were preserved. Three new objective evaluation parameters were proposed: detection missed factor, detection false factor and bad pixel reappearing factor to evaluate the validity and over-correction to details of algorithm. The correction experiment of actual IR images from a cooled medium wave IRFPA proved SBBPDC algorithm effective to solve the details missing and bad pixels reappearing problems existing in traditional bad pixel correction algorithms.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129019533","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Study on resonant cavity enhanced photodetector using subwavelength grating 亚波长光栅谐振腔增强光电探测器的研究
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713565
Yufeng Shang, Yongqing Huang, X. Duan, X. Ye, Hui Huang, Shiwei Cai, Qi Wang, X. Ren
{"title":"Study on resonant cavity enhanced photodetector using subwavelength grating","authors":"Yufeng Shang, Yongqing Huang, X. Duan, X. Ye, Hui Huang, Shiwei Cai, Qi Wang, X. Ren","doi":"10.1109/AOM.2010.5713565","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713565","url":null,"abstract":"Sub-wavelength gratings are used in the new photodetector in this paper. The detectivity is enhanced by excitation of surface plasma waves (SPW) using a Metal Aperture Arrays grating. Sub-wavelength dielectric grating is used to replace the top Bottom Distributed Bragg Reflectors(DBR).","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"46 4","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134290565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thermal resistance analysis of high power light emitting diodes 大功率发光二极管的热阻分析
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713511
W. Guo, Tianping Ding, B. Cui, Fei Yin, Desheng Cui, Weiwei Yan
{"title":"Thermal resistance analysis of high power light emitting diodes","authors":"W. Guo, Tianping Ding, B. Cui, Fei Yin, Desheng Cui, Weiwei Yan","doi":"10.1109/AOM.2010.5713511","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713511","url":null,"abstract":"Thermal characteristic of light emitting diodes is one of primary reliability parameters. In this paper, the thermal resistances of different kinds of blue and white high power LEDs are measured by the forward voltage based method. The relationships between thermal resistance and heat time at measurement currents 1mA, 5mA and 10mA are obtained respectively. The results show that there is optimum heat balance time of 300∼1200s to measure the thermal resistances at room temperature. The influence of current crowding, the phosphor and heat sink to the thermal resistance has been demonstrated.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132472193","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of optical photonic crystals by holographic lithography 全息光刻技术制备光学光子晶体
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713587
Lv Hao, W. Xia, W. Tam
{"title":"Fabrication of optical photonic crystals by holographic lithography","authors":"Lv Hao, W. Xia, W. Tam","doi":"10.1109/AOM.2010.5713587","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713587","url":null,"abstract":"As a method of combining holography and photoinduced polymerization techniques, holographic lithography (HL) has been extensively applied in fabricating mesoscale structures such as photonic crystals recently because of the advantages of flexibility, convenience and high efficiency over some other conventional techniques‥ In this contribution, we demonstrate the fabrication of visible photonic band gap structures using SU8 resin or dichromate gelatin (DCG) holographic materials. The optical spectrum shows that the structures exhibit colorful photonic band-gap characteristics in the whole visible range. Due to the sharp photonic band gap in optical spectrum, the optical structures will shed light to study photon localization phenomenon and the spontaneous emission of dye atoms in these kinds of optical photonic crystals.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133790839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fiber length and chromatic dispersion measurement technology using a novel optical frequency domain reflectometry 光纤长度和色散测量技术采用了一种新型的光频域反射法
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713515
Binhao Wang, G. Yan, Chunsheng Yan
{"title":"Fiber length and chromatic dispersion measurement technology using a novel optical frequency domain reflectometry","authors":"Binhao Wang, G. Yan, Chunsheng Yan","doi":"10.1109/AOM.2010.5713515","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713515","url":null,"abstract":"We have proposed and demonstrated a novel optical frequency domain reflectometry (OFDR) incorporating an electron-optic modulator (EOM) for fiber length and chromatic dispersion measurement. The fiber length and chromatic information can be obtained by analyzing the phase difference of two interference beams in frequency domain. Two reflection points with a distance of 7 m at the end of the fiber under test (FUT) 60 km away was well distinguished and the chromatic dispersion is successfully measured at C-band.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116349048","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Piezoelectric acoustic resonant mass sensors 压电声谐振质量传感器
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713583
Hongyuan Zhao, W. Pang, Hao F. Zhang
{"title":"Piezoelectric acoustic resonant mass sensors","authors":"Hongyuan Zhao, W. Pang, Hao F. Zhang","doi":"10.1109/AOM.2010.5713583","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713583","url":null,"abstract":"Piezoelectric acoustic resonant sensors enable selective and label-free detection of biological events in real time. They are featured with self-actuating and self-detecting ability, and have been extensively explored in chemical and biological sensing applications. In this paper, four types of piezoelectric acoustic sensors operating at different resonant modes (i.e., thickness extensional mode, thickness shear mode, lateral extensional mode and flexural mode) are reviewed and discussed, with particular focus on the fundamental mechanisms and the recent biological sensing applications.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"159 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116428092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Characteristics of coupled microcircular lasers confined by insulator SiO2 and metal layer with an output waveguide 具有输出波导的绝缘体SiO2和金属层耦合微圆激光器的特性
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713544
Jian-Dong Lin, Yongzhen Huang, Q. Yao, X. Lv, Yuede Yang, J. Xiao, Yun Du
{"title":"Characteristics of coupled microcircular lasers confined by insulator SiO2 and metal layer with an output waveguide","authors":"Jian-Dong Lin, Yongzhen Huang, Q. Yao, X. Lv, Yuede Yang, J. Xiao, Yun Du","doi":"10.1109/AOM.2010.5713544","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713544","url":null,"abstract":"Coupled microcircular lasers with an output waveguide laterally confined by insulator SiO2 and p-electrode metal are fabricated by conventional photolithography and inductively coupled-plasma etching technique. Mode characteristics are numerically investigated by FDTD technique.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114956827","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Integration of multimode interference device with electroabsorption modulators as simple switches 集成多模干扰装置与电吸收调制器作为简单开关
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713521
S. Lee, H. Yang, Y.C. Li, T. Mei
{"title":"Integration of multimode interference device with electroabsorption modulators as simple switches","authors":"S. Lee, H. Yang, Y.C. Li, T. Mei","doi":"10.1109/AOM.2010.5713521","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713521","url":null,"abstract":"A 1×2 multimode interference device is monolithically integrated to two electroabsorption modulator based switches at the output ports by means of quantum-well intermixing. At the wavelength range of 1550–1570nm, both arms act as separate DC switches which can be modulated with the extinction ratios of up to 10dB. Monolithic integration of active and passive photonic components is attractive due to its miniaturized size which can simultaneously satisfy multifunctional purposes. The potential of compacted optical circuits along with low-cost batch fabrications and high stability ensures the viability of such endeavours. The integration of an MMI device (passive device) with EAMs (active devices) enables it to be used as a compact multiplexer or optical transmitter. The prototype made is of a relatively larger size (∼2000µm) but its size can be potentially reduced to around 500µm or less. The material structure employed is the InGaAlAs/InGaAlAs MQW with dual depletion structure (DDR) and large optical cavity (LOC) structure design. The LOC material structure was designed for the realization of lower insertion loss. The QWI technology utilized here is the impurity-free vacancy diffusion (IFVD) method and it resulted in a 56nm blue-shift in the bandgap structure. The etching process executed here was the dry etching process using inductively coupled plasma (ICP) etching based on a CH4/Cl2/H2 gas combination. The MMI length is 1150µm whereas the modulators are both 500µm long.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"105 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124758275","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Comparison between radiation forces upon nanoparticles in continuous laser tweezers and in pulsed laser tweezers 连续激光镊子与脉冲激光镊子中纳米粒子辐射力的比较
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713591
Xiaoyu Liu, Feng Wang
{"title":"Comparison between radiation forces upon nanoparticles in continuous laser tweezers and in pulsed laser tweezers","authors":"Xiaoyu Liu, Feng Wang","doi":"10.1109/AOM.2010.5713591","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713591","url":null,"abstract":"It is easier to obtain high energy in very short period through pulse laser than through continuous laser. And in the field of biology, especially in researching the active cells by optical tweezers, the traditional continuous laser employed in the tweezers are inclined to hurt even kill the cells. So, substituting the traditional continuous laser by pulsed laser is one probable trend for optical tweezers. This paper theoretically analyzes the radiation forces on the nanoparticles in continuous optical tweezers and in pulsed optical tweezers, respectively, compares the forces in those two cases, and obtains the simulation curves for the forces.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125703253","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
First-principle study of GaN polar and nonpolar surfaces 氮化镓极性和非极性表面的第一性原理研究
Advances in Optoelectronics and Micro/nano-optics Pub Date : 2010-12-01 DOI: 10.1109/AOM.2010.5713530
Hongpeng Zhao, Zhiyou Guo, Huaxiong Zhao, Yu-Fei Zhang
{"title":"First-principle study of GaN polar and nonpolar surfaces","authors":"Hongpeng Zhao, Zhiyou Guo, Huaxiong Zhao, Yu-Fei Zhang","doi":"10.1109/AOM.2010.5713530","DOIUrl":"https://doi.org/10.1109/AOM.2010.5713530","url":null,"abstract":"The polarity of GaN surface may have a substantial influence on its electronic structure, So the (0001) and (112̄0) surfaces and their electronic structures are studied based on density-functional theory using the local-density approximation (LDA) as well as the hybrid functional approach were studied by First-principles study. It presents the change of surface atoms position and analyses the surface electronic structure. Also the obvious relaxation appears which effects the electric field polarization direction a lot, that is the reason why our chip grown along (112̄0) surface has better property. The band gap of GaN (0001) surface is obviously narrower than that of GaN (112̄0), leading to the luminescence spectra shift red also.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134483096","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信