集成多模干扰装置与电吸收调制器作为简单开关

S. Lee, H. Yang, Y.C. Li, T. Mei
{"title":"集成多模干扰装置与电吸收调制器作为简单开关","authors":"S. Lee, H. Yang, Y.C. Li, T. Mei","doi":"10.1109/AOM.2010.5713521","DOIUrl":null,"url":null,"abstract":"A 1×2 multimode interference device is monolithically integrated to two electroabsorption modulator based switches at the output ports by means of quantum-well intermixing. At the wavelength range of 1550–1570nm, both arms act as separate DC switches which can be modulated with the extinction ratios of up to 10dB. Monolithic integration of active and passive photonic components is attractive due to its miniaturized size which can simultaneously satisfy multifunctional purposes. The potential of compacted optical circuits along with low-cost batch fabrications and high stability ensures the viability of such endeavours. The integration of an MMI device (passive device) with EAMs (active devices) enables it to be used as a compact multiplexer or optical transmitter. The prototype made is of a relatively larger size (∼2000µm) but its size can be potentially reduced to around 500µm or less. The material structure employed is the InGaAlAs/InGaAlAs MQW with dual depletion structure (DDR) and large optical cavity (LOC) structure design. The LOC material structure was designed for the realization of lower insertion loss. The QWI technology utilized here is the impurity-free vacancy diffusion (IFVD) method and it resulted in a 56nm blue-shift in the bandgap structure. The etching process executed here was the dry etching process using inductively coupled plasma (ICP) etching based on a CH4/Cl2/H2 gas combination. The MMI length is 1150µm whereas the modulators are both 500µm long.","PeriodicalId":222199,"journal":{"name":"Advances in Optoelectronics and Micro/nano-optics","volume":"105 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Integration of multimode interference device with electroabsorption modulators as simple switches\",\"authors\":\"S. Lee, H. Yang, Y.C. Li, T. Mei\",\"doi\":\"10.1109/AOM.2010.5713521\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 1×2 multimode interference device is monolithically integrated to two electroabsorption modulator based switches at the output ports by means of quantum-well intermixing. At the wavelength range of 1550–1570nm, both arms act as separate DC switches which can be modulated with the extinction ratios of up to 10dB. Monolithic integration of active and passive photonic components is attractive due to its miniaturized size which can simultaneously satisfy multifunctional purposes. The potential of compacted optical circuits along with low-cost batch fabrications and high stability ensures the viability of such endeavours. The integration of an MMI device (passive device) with EAMs (active devices) enables it to be used as a compact multiplexer or optical transmitter. The prototype made is of a relatively larger size (∼2000µm) but its size can be potentially reduced to around 500µm or less. The material structure employed is the InGaAlAs/InGaAlAs MQW with dual depletion structure (DDR) and large optical cavity (LOC) structure design. The LOC material structure was designed for the realization of lower insertion loss. The QWI technology utilized here is the impurity-free vacancy diffusion (IFVD) method and it resulted in a 56nm blue-shift in the bandgap structure. The etching process executed here was the dry etching process using inductively coupled plasma (ICP) etching based on a CH4/Cl2/H2 gas combination. The MMI length is 1150µm whereas the modulators are both 500µm long.\",\"PeriodicalId\":222199,\"journal\":{\"name\":\"Advances in Optoelectronics and Micro/nano-optics\",\"volume\":\"105 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advances in Optoelectronics and Micro/nano-optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AOM.2010.5713521\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Optoelectronics and Micro/nano-optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AOM.2010.5713521","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

通过量子阱混合,将1×2多模干涉器件单片集成到输出端口的两个基于电吸收调制器的开关上。在1550-1570nm的波长范围内,两个臂作为单独的直流开关,可以以高达10dB的消光比进行调制。主动式和无源光子元件的单片集成以其小型化的尺寸同时满足多种用途而备受关注。紧凑光学电路的潜力以及低成本批量制造和高稳定性确保了此类努力的可行性。MMI器件(无源器件)与eam器件(有源器件)的集成使其能够用作紧凑型多路复用器或光发射机。制作的原型尺寸相对较大(~ 2000微米),但其尺寸可能缩小到500微米左右或更小。采用的材料结构为InGaAlAs/InGaAlAs MQW,采用双损耗结构(DDR)和大光腔(LOC)结构设计。为实现较低的插入损耗,设计了LOC材料结构。本文使用的QWI技术是无杂质空位扩散(IFVD)方法,该方法在带隙结构中产生了56nm的蓝移。本文采用基于CH4/Cl2/H2气体组合的电感耦合等离子体(ICP)干法蚀刻工艺。MMI长度为1150 μ m,而调制器长度均为500 μ m。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Integration of multimode interference device with electroabsorption modulators as simple switches
A 1×2 multimode interference device is monolithically integrated to two electroabsorption modulator based switches at the output ports by means of quantum-well intermixing. At the wavelength range of 1550–1570nm, both arms act as separate DC switches which can be modulated with the extinction ratios of up to 10dB. Monolithic integration of active and passive photonic components is attractive due to its miniaturized size which can simultaneously satisfy multifunctional purposes. The potential of compacted optical circuits along with low-cost batch fabrications and high stability ensures the viability of such endeavours. The integration of an MMI device (passive device) with EAMs (active devices) enables it to be used as a compact multiplexer or optical transmitter. The prototype made is of a relatively larger size (∼2000µm) but its size can be potentially reduced to around 500µm or less. The material structure employed is the InGaAlAs/InGaAlAs MQW with dual depletion structure (DDR) and large optical cavity (LOC) structure design. The LOC material structure was designed for the realization of lower insertion loss. The QWI technology utilized here is the impurity-free vacancy diffusion (IFVD) method and it resulted in a 56nm blue-shift in the bandgap structure. The etching process executed here was the dry etching process using inductively coupled plasma (ICP) etching based on a CH4/Cl2/H2 gas combination. The MMI length is 1150µm whereas the modulators are both 500µm long.
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