Surface and Interface Analysis最新文献_第2页

Design and optimization of hexagonal tungsten ring metasurface perfect absorbers with circuit model 利用电路模型设计和优化六边形钨环元表面完美吸收器

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-08-05 DOI: 10.1002/sia.7346

Ali Reza Sarikhani, Mohammad Reza Salehi, Seyedeh Leila Mortazavifar, Mojtaba Shahraki, Ebrahim Abiri

{"title":"Design and optimization of hexagonal tungsten ring metasurface perfect absorbers with circuit model","authors":"Ali Reza Sarikhani, Mohammad Reza Salehi, Seyedeh Leila Mortazavifar, Mojtaba Shahraki, Ebrahim Abiri","doi":"10.1002/sia.7346","DOIUrl":"https://doi.org/10.1002/sia.7346","url":null,"abstract":"In this paper, a perfect absorber (PA) based on tungsten is proposed to include hexagonal‐shaped metasurface absorbers with varying hole sizes ranging from quadrangular to circular, allowing them to cover a wide wavelength spectrum. The study investigates the effects of various parameters, including the number of sides of the inner hole, on the absorber's performance and identifies the most suitable absorber by introducing an equivalent circuit. The outcomes of full‐wave numerical simulations primarily based on the finite element method (FEM) highly correspond to the final results of the circuit model. Additionally, the circuit model significantly reduces computation time and requires less storage compared with full‐wave simulations. The results show that the hexagonal‐square metasurface absorber achieves exceptional absorption rates, with an average of 99.9% in the 431 to 532 nm wavelength range and over 90% in the 300 to 915 nm range. The hexagonal‐hexagonal metasurface absorber also exhibits high absorption rates, with an average of over 99% in the 431 to 518 nm and 700 to 780 nm ranges, and over 90% in the 300 to 940 nm range. The absorption performance of the proposed hexagonal‐circle metasurface absorber is also remarkable, with an absorption value of over 99% in the 670 to 771 nm range and above 90% in the 365 to 991 nm range. These models can be utilized to design and simulate other subwavelength absorbers in a broad frequency range, including terahertz and visible light, making them suitable for various applications.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"28 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141969366","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Influence of the base pressure in deposition of a‐SiCx interlayers for adhesion of Diamond‐Like Carbon on metallic alloy 基底压力对在金属合金上沉积 a-SiCx 夹层以粘附类金刚石碳的影响

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-07-26 DOI: 10.1002/sia.7345

Jennifer Stefani Weber, Michael Cristian Goldbeck, Vanessa Piroli, Carla Daniela Boeira, Bruna Louise Perotti, Newton Kiyoshi Fukumasu, Fernando Alvarez, Alexandre Fassini Michels, Carlos Alejandro Figueroa

{"title":"Influence of the base pressure in deposition of a‐SiCx interlayers for adhesion of Diamond‐Like Carbon on metallic alloy","authors":"Jennifer Stefani Weber, Michael Cristian Goldbeck, Vanessa Piroli, Carla Daniela Boeira, Bruna Louise Perotti, Newton Kiyoshi Fukumasu, Fernando Alvarez, Alexandre Fassini Michels, Carlos Alejandro Figueroa","doi":"10.1002/sia.7345","DOIUrl":"https://doi.org/10.1002/sia.7345","url":null,"abstract":"Diamond‐like carbon (DLC) is an amorphous material widely used in industrial applications due to its chemical, mechanical, and tribological properties and, also, for decorative purposes. However, its low adhesion to ferrous alloys reduces its effectiveness in certain applications, necessitating the use of adhesion interlayers to reduce stresses at the interfaces and enhance the density of strong bonds. In this context, the factors that promote good adhesion in this system and specify the parameters must be understood in detail. Thus, the present study aims to assess the influence of the base pressure on the deposition of an amorphous silicon carbide adhesion interlayer between DLC coating and a ferrous alloy substrate. Microstructural, physicochemical, morphological, and mechanotribological analyses were conducted to understand the adhesion behavior in terms of structural and chemical aspects. In addition to the influence of the interlayer thickness, the elemental Si/C ratios and the relative oxygen content have an impact on the maximum load supported by the coatings, as well as the different delamination mechanisms generated in adhesion tests.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"71 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141784866","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

X‐ray standing wave assisted XANES for depth dependent chemical state analysis of Cr in Cr2O3/Cr bilayer structure 利用 X 射线驻波辅助 XANES 对 Cr2O3/Cr 双层结构中的 Cr 进行深度依赖性化学态分析

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-07-18 DOI: 10.1002/sia.7342

Ayushi Trivedi, Md. Akhlak Alam, Ajay Khooha, Rajnish Dhawan, Rajendra Kumar Sharma, Shilpa Tripathi, Manoj Kumar Tiwari

{"title":"X‐ray standing wave assisted XANES for depth dependent chemical state analysis of Cr in Cr2O3/Cr bilayer structure","authors":"Ayushi Trivedi, Md. Akhlak Alam, Ajay Khooha, Rajnish Dhawan, Rajendra Kumar Sharma, Shilpa Tripathi, Manoj Kumar Tiwari","doi":"10.1002/sia.7342","DOIUrl":"https://doi.org/10.1002/sia.7342","url":null,"abstract":"We report the detailed depth‐dependent structural and chemical analysis of the Cr2O3/Cr bilayer structure deposited on Si ˂100˃ substrate. The non‐destructive simultaneous X‐ray reflectivity and grazing incidence X‐ray fluorescence measurements were used for this purpose. Corresponding variation in the chemical state of Cr atoms as a function of depth has been studied using X‐ray standing wave (XSW) assisted X‐ray absorption near edge structure (XANES) measurements. Various oxidation states of Cr atoms present in the Cr2O3/Cr bilayer structure were determined using X‐ray photoelectron spectroscopy (XPS). Depth‐resolved XANES measurements confirmed the presence of chromium oxide (Cr2O3) and hydroxide (Cr (OH)3) at the top surface of the Cr2O3/Cr bilayer structure. The results also reveal the presence of metallic Cr along with its compounds Cr2O3 and Cr (OH)3 at the interface medium, showing significant mixing between the Cr2O3 and Cr layers. Our results clearly demonstrate that the XSW assisted XANES technique is extremely efficient for determining the variation of chemical states at the surface, interface, and different depths of a thin film structure. Such types of analysis are particularly useful for differentiating the presence of a metal from its own oxides, even at higher depths inside a thin film medium.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"15 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141745559","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Influence of aluminum addition on structure, hardness, and oxidation resistance of Ta1−xAlxN thin films 加铝对 Ta1-xAlxN 薄膜结构、硬度和抗氧化性的影响

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-07-17 DOI: 10.1002/sia.7343

Jonh Yago Erikson Santos, Iago Lemos Dias, Ronaldo Lima Rezende, Givanilson Brito de Oliveira, Pedro Cardoso da Silva Neto, Fabiana Magalhães Teixeira Mendes, Roberto Hübler, Eduardo Kirinus Tentardini

引用次数: 0

Depth profile study of LaAl1‐xCrxO3/SrTiO3 (x = 0, 0.2, 0.6, and 1) using time of flight secondary ion mass spectrometry (TOF‐SIMS) 利用飞行时间二次离子质谱 (TOF-SIMS) 对 LaAl1-xCrxO3/SrTiO3 （x = 0、0.2、0.6 和 1）进行深度剖面研究

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-07-08 DOI: 10.1002/sia.7341

Manas Kumar Dalai, Gupteswar Samal, Trupti R. Das, Pramod Kumar, Geetanjali Sehgal, Anjana Dogra

{"title":"Depth profile study of LaAl1‐xCrxO3/SrTiO3 (x = 0, 0.2, 0.6, and 1) using time of flight secondary ion mass spectrometry (TOF‐SIMS)","authors":"Manas Kumar Dalai, Gupteswar Samal, Trupti R. Das, Pramod Kumar, Geetanjali Sehgal, Anjana Dogra","doi":"10.1002/sia.7341","DOIUrl":"https://doi.org/10.1002/sia.7341","url":null,"abstract":"The conducting two‐dimensional electron gas (2DEG) behavior in LaAlO3 (LAO)/SrTiO3 (STO) and their associated mechanisms from various aspects have brought tremendous attention in the concerned area of research. To correlate the 2DEG behavior with their compositions, we have performed time of flight secondary ion mass spectrometry (TOF‐SIMS) depth profile analysis of thin films of Cr‐doped LAO/STO system as LaAl1‐xCrxO3 (x = 0, 0.2, 0.6 and 1) deposited over TiO2 terminated STO substrate, which includes two parent compounds LAO/STO (metallic) and LCO/STO (insulating). The uniform decrease of La and Al concentration at the interface of LAO/STO (metallic) system and in the contrary the nonuniformity of La and Cr concentration in LCO/STO (insulating) system have been highlighted. The uniform variation of ionic concentration at the interface of LAO/STO may increase the career concentrations to make the system metallic. The upward and downward diffusion at the interfaces of intermediate compositions varies differently from their parent ones due to the mixing of Al and Cr. Our results may help to understand the conducting nature of LAO/STO system for future developments and applications in such system.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"135 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141571263","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

New challenges associated with hard X‐ray photoelectron spectroscopy (report on the 2023 ASTM E42‐ASSD AVS workshop) 与硬 X 射线光电子能谱相关的新挑战（关于 2023 年 ASTM E42-ASSD AVS 研讨会的报告）

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-06-29 DOI: 10.1002/sia.7340

Alberto Herrera‐Gomez, David J. H. Cant, Thierry Conard, Olivier Renault, Matthew R. Linford, Joshua W. Pinder, Jeff Fenton, Donald R. Baer

{"title":"New challenges associated with hard X‐ray photoelectron spectroscopy (report on the 2023 ASTM E42‐ASSD AVS workshop)","authors":"Alberto Herrera‐Gomez, David J. H. Cant, Thierry Conard, Olivier Renault, Matthew R. Linford, Joshua W. Pinder, Jeff Fenton, Donald R. Baer","doi":"10.1002/sia.7340","DOIUrl":"https://doi.org/10.1002/sia.7340","url":null,"abstract":"In contrast to traditional X‐ray photoelectron spectroscopy (XPS), hard X‐ray photoelectron spectroscopy (HAXPES) can provide information from deeper within a sample while maintaining chemical resolution. However, working with higher energy X‐rays introduces a series of new or different issues ranging from energy calibration to factors associated with quantitative analysis. As part of the efforts to identify and increase community awareness about these issues, a workshop was held to review HAXPES metrology challenges with the perspective of converting it into a quantitative technique. A summary is hereby given of this workshop, which was entitled “What New Challenges Come with the Capabilities of HAXPES?” It was held in Portland, OR, USA, on November 7, 2023, and was primarily sponsored by the ASTM E42 Committee and the Applied Surface Science Division of the American Vacuum Society. This report contains summaries of the presentations and discussions at this workshop regarding the current open problems in HAXPES metrology. There were 20 participants at the workshop.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"75 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141528834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

The effect of CNT grafting on the mechanical properties of the UHMWPE fiber/HDPE composite CNT 接枝对超高分子量聚乙烯纤维/高密度聚乙烯复合材料机械性能的影响

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-06-22 DOI: 10.1002/sia.7339

Li Jian, Xu Gaofeng

引用次数: 0

Surface science insight note: Imaging X‐ray photoelectron spectroscopy 表面科学启示录：成像 X 射线光电子能谱学

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-05-29 DOI: 10.1002/sia.7337

Vincent Fernandez, Neal Fairley, David Morgan, Pascal Bargiela, Jonas Baltrusaitis

{"title":"Surface science insight note: Imaging X‐ray photoelectron spectroscopy","authors":"Vincent Fernandez, Neal Fairley, David Morgan, Pascal Bargiela, Jonas Baltrusaitis","doi":"10.1002/sia.7337","DOIUrl":"https://doi.org/10.1002/sia.7337","url":null,"abstract":"Quantification of X‐ray photoelectron spectroscopy (XPS) data is often limited by the heterogeneous nature of the material surface. However, it is often the case that heterogeneous material contains areas within the analyzed area that are effectively homogeneous. In this Insight note, concepts, and methods used to analyze both XPS data are presented to extract both spatial and spectral information from heterogeneous surfaces. These concepts and methods are applied to a specific material surface that contains three chemical compounds separated spatially. The analysis entails converting XPS image data to spectral data and is designed to highlight the potential of XPS imaging in revealing compositional information correlation with spatial information. Properties of algorithms used to evaluate XPS images and spectra are described to outline their application to image data. A case study of an imaging XPS data set is presented that demonstrates how poor signal‐to‐noise images, where the signal is recorded for 4 s per image, are still open to analysis yielding useful information. Ultimately, the methods presented here will aid in interpreting complex XPS data obtained from spatially complex materials often obtained during extensive cycling, such as conventional or electrocatalysts.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"43 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141198508","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Studying quantum effects of fine scaling on the buckling behavior of CNTs under torsional loading using the density functional theory and molecular mechanics approach 利用密度泛函理论和分子力学方法研究细微缩放对扭转载荷下 CNT 弯曲行为的量子效应

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-05-29 DOI: 10.1002/sia.7336

Mahdi Mirnezhad, Reza Ansari, Seyed Reza Falahatgar, Peyman Aghdasi

{"title":"Studying quantum effects of fine scaling on the buckling behavior of CNTs under torsional loading using the density functional theory and molecular mechanics approach","authors":"Mahdi Mirnezhad, Reza Ansari, Seyed Reza Falahatgar, Peyman Aghdasi","doi":"10.1002/sia.7336","DOIUrl":"https://doi.org/10.1002/sia.7336","url":null,"abstract":"In this study, we introduce a comprehensive investigation into the buckling behavior of carbon nanotubes (CNTs) using a combined approach of quantum mechanics and molecular mechanics methods. A novel aspect of our research lies in the exploration of the quantum effects of fine scaling on the buckling behavior of finite‐length nanotubes across various dimensions and chiralities. Specifically, we analyze the critical buckling strain variations in CNTs with distinct lengths, diameters, and chiralities, revealing pronounced differences influenced by atomic arrangement and the type of structure used in nanotube construction. Our findings elucidate that at smaller dimensions, nanotubes exhibit a higher critical buckling strain than other chiralities, while zigzag atomic arrangements demonstrate greater resistance to torsional loading at larger diameters. Additionally, we compare the buckling behavior of nanotubes obtained by wrapping armchair and zigzag nanosheets, highlighting differential resistance trends. This research not only underscores the critical role of quantum effects in determining nanotube buckling but also provides valuable insights into the nuanced influences of atomic arrangement and nanosheet type on the mechanical properties of CNTs. Thus, our work contributes a novel perspective to the field, bridging the gap between quantum mechanics and the mechanical behavior of nanostructures, which has significant implications for the design and application of nanoscale materials","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"41 1","pages":""},"PeriodicalIF":1.7,"publicationDate":"2024-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141195493","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Humic acid as eco‐friendly corrosion inhibitor for EH40 ship plate steel 腐植酸作为 EH40 船板钢的环保型缓蚀剂

IF 1.7 4区化学

Surface and Interface Analysis Pub Date : 2024-05-25 DOI: 10.1002/sia.7335

Sizhu Wang, Zhipeng Liang, Yiyong Wang, Hui Jin, Shengli Li, Rui Guan

引用次数: 0