Jonh Yago Erikson Santos, Iago Lemos Dias, Ronaldo Lima Rezende, Givanilson Brito de Oliveira, Pedro Cardoso da Silva Neto, Fabiana Magalhães Teixeira Mendes, Roberto Hübler, Eduardo Kirinus Tentardini
{"title":"Influence of aluminum addition on structure, hardness, and oxidation resistance of Ta1−xAlxN thin films","authors":"Jonh Yago Erikson Santos, Iago Lemos Dias, Ronaldo Lima Rezende, Givanilson Brito de Oliveira, Pedro Cardoso da Silva Neto, Fabiana Magalhães Teixeira Mendes, Roberto Hübler, Eduardo Kirinus Tentardini","doi":"10.1002/sia.7343","DOIUrl":"https://doi.org/10.1002/sia.7343","url":null,"abstract":"Ta<jats:sub>1−x</jats:sub>Al<jats:sub>x</jats:sub>N thin films with 5, 15, and 40 at.% Al addition were co‐deposited by reactive magnetron sputtering and characterized by Rutherford backscattering spectroscopy (RBS), grazing angle X‐ray diffraction (GAXRD), X‐ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), nanohardness, and oxidation tests. GAXRD and XPS analyses showed, regardless of the % Al added, the non‐existence of ternary nitride Ta<jats:sub>1−x</jats:sub>Al<jats:sub>x</jats:sub>N, but always as individual binary nitrides, TaN and AlN. Sample TaAlN_15 obtained the highest hardness and H<jats:sup>3</jats:sup>/E<jats:sup>2</jats:sup> values, possibly due to the AlN grains presence, which were efficient in distorting the TaN lattice. All samples failed oxidation tests at 873 K, showing that the Al addition was not efficient in improving this property for tantalum aluminum nitride thin films.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-07-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141717867","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Bo‐Kyeong Choi, J. Oh, Dae-Hyun Kim, Dong Wook Lee, Dae-Shik Seo
{"title":"Nano/microgroove zirconium‐doped lanthanum oxide film with self‐aligned molecules for liquid crystal device application","authors":"Bo‐Kyeong Choi, J. Oh, Dae-Hyun Kim, Dong Wook Lee, Dae-Shik Seo","doi":"10.1002/sia.7344","DOIUrl":"https://doi.org/10.1002/sia.7344","url":null,"abstract":"Herein, we propose a brush‐coated zirconium‐doped lanthanum oxide (ZrLaO) film as a liquid crystal (LC) alignment layer. The film‐curing temperature was adjusted to 70, 150, and 230°C. Polarized optical microscopy and pre‐tilt angle analysis confirmed that there was uniform and homogeneous LC alignment on the 230°C cured ZrLaO film. Atomic force microscopy revealed that the surface had a nano/microgroove structure, which was caused by the shear stress generated by the brush‐coating process. This structure induced the uniform LC alignment. X‐ray photoelectron spectroscopy verified that the ZrLaO film was well‐formed on a glass substrate. The ZrLaO film displayed hydrophilic characteristics, and its surface energy increased as the film‐curing temperature increased. The ZrLaO alignment layer displayed suitable optical transmittance for LC device applications. The ZrLaO layer‐based twisted‐nematic LC cell exhibited more stable switching properties and better threshold voltage characteristics than conventional polyimide layers. Therefore, we expect that this brush‐coated ZrLaO layer will be a suitable LC alignment layer for LC device applications.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.6,"publicationDate":"2024-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141647329","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Depth profile study of LaAl1‐xCrxO3/SrTiO3 (x = 0, 0.2, 0.6, and 1) using time of flight secondary ion mass spectrometry (TOF‐SIMS)","authors":"Manas Kumar Dalai, Gupteswar Samal, Trupti R. Das, Pramod Kumar, Geetanjali Sehgal, Anjana Dogra","doi":"10.1002/sia.7341","DOIUrl":"https://doi.org/10.1002/sia.7341","url":null,"abstract":"The conducting two‐dimensional electron gas (2DEG) behavior in LaAlO<jats:sub>3</jats:sub> (LAO)/SrTiO<jats:sub>3</jats:sub> (STO) and their associated mechanisms from various aspects have brought tremendous attention in the concerned area of research. To correlate the 2DEG behavior with their compositions, we have performed time of flight secondary ion mass spectrometry (TOF‐SIMS) depth profile analysis of thin films of Cr‐doped LAO/STO system as LaAl<jats:sub>1‐x</jats:sub>Cr<jats:sub>x</jats:sub>O<jats:sub>3</jats:sub> (<jats:italic>x</jats:italic> = 0, 0.2, 0.6 and 1) deposited over TiO<jats:sub>2</jats:sub> terminated STO substrate, which includes two parent compounds LAO/STO (metallic) and LCO/STO (insulating). The uniform decrease of La and Al concentration at the interface of LAO/STO (metallic) system and in the contrary the nonuniformity of La and Cr concentration in LCO/STO (insulating) system have been highlighted. The uniform variation of ionic concentration at the interface of LAO/STO may increase the career concentrations to make the system metallic. The upward and downward diffusion at the interfaces of intermediate compositions varies differently from their parent ones due to the mixing of Al and Cr. Our results may help to understand the conducting nature of LAO/STO system for future developments and applications in such system.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141571263","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Alberto Herrera‐Gomez, David J. H. Cant, Thierry Conard, Olivier Renault, Matthew R. Linford, Joshua W. Pinder, Jeff Fenton, Donald R. Baer
{"title":"New challenges associated with hard X‐ray photoelectron spectroscopy (report on the 2023 ASTM E42‐ASSD AVS workshop)","authors":"Alberto Herrera‐Gomez, David J. H. Cant, Thierry Conard, Olivier Renault, Matthew R. Linford, Joshua W. Pinder, Jeff Fenton, Donald R. Baer","doi":"10.1002/sia.7340","DOIUrl":"https://doi.org/10.1002/sia.7340","url":null,"abstract":"In contrast to traditional X‐ray photoelectron spectroscopy (XPS), hard X‐ray photoelectron spectroscopy (HAXPES) can provide information from deeper within a sample while maintaining chemical resolution. However, working with higher energy X‐rays introduces a series of new or different issues ranging from energy calibration to factors associated with quantitative analysis. As part of the efforts to identify and increase community awareness about these issues, a workshop was held to review HAXPES metrology challenges with the perspective of converting it into a quantitative technique. A summary is hereby given of this workshop, which was entitled “What New Challenges Come with the Capabilities of HAXPES?” It was held in Portland, OR, USA, on November 7, 2023, and was primarily sponsored by the ASTM E42 Committee and the Applied Surface Science Division of the American Vacuum Society. This report contains summaries of the presentations and discussions at this workshop regarding the current open problems in HAXPES metrology. There were 20 participants at the workshop.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141528834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The effect of CNT grafting on the mechanical properties of the UHMWPE fiber/HDPE composite","authors":"Li Jian, Xu Gaofeng","doi":"10.1002/sia.7339","DOIUrl":"https://doi.org/10.1002/sia.7339","url":null,"abstract":"In order to improve the mechanical properties of the ultra‐high molecular weight polyethylene (UHMWPE) fiber‐reinforced high‐density polyethylene (HDPE) composite, carbon nanotube (CNT) was grafted on the UHMWPE fiber. The UHMWPE fiber/HDPE composite was prepared by injection molding process, and the effects of CNT contents on the mechanical properties of composite materials were studied. The results show that the mass fraction of CNT will significantly affect the mechanical properties of the composite. When the CNT content is 4 wt%, the tensile strength, tensile modulus, flexural strength, flexural modulus, and impact strength of the UHMWPE fiber/treated CNT/HDPE composite increased compared to the UHMWPE fiber/CNT/HDPE composite and UHMWPE fiber/HDPE composite. When the CNT content is 4 wt%, the above‐mentioned performance is the best. Pull‐out and fracture, bridging effect, and crack deflection effect are the main mechanisms of CNTs in UHMWPE fiber/HDPE composites. This study provides new insights into the interface design of UHMWPE fiber/HDPE composites and paves the way for their further development.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141501709","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Ünal, M. Karaman, Gülçin Çelik, Okay Tüzel, Ö. Balbaşı, Ayşe Merve Genç, Raşit Turan
{"title":"Surface and interface chemistry of bromine–methanol‐etched Cd0.9Zn0.1Te crystals","authors":"M. Ünal, M. Karaman, Gülçin Çelik, Okay Tüzel, Ö. Balbaşı, Ayşe Merve Genç, Raşit Turan","doi":"10.1002/sia.7338","DOIUrl":"https://doi.org/10.1002/sia.7338","url":null,"abstract":"Chemical polishing or chemo‐mechanical polishing is crucial as a last step of surface preparation to remove the damaged layer and contaminants from the surface of CdZnTe crystals. The bromine–methanol solution is widely used for this purpose. However, bromine–methanol solution enriches the surface with Te and results in poor performance of CdZnTe crystals. In this study, the effect of the chemical polishing with 5% bromine–methanol solution on the surface and at the interface is investigated and it is demonstrated that etching duration strongly influences surface stoichiometry and interface contaminants. The evolution of the surface topography with etching and chemical changes are presented. It is shown that after 90 s etching/polishing, subsurface damage is removed and Te enrichment is minimum. Moreover, interface layer thickness is the smallest for 90 s etching duration. It is presented that further increase in the etching duration disturbs the surface stoichiometry and interface depth. It also calculated that 90 s of etching shows low interface barrier and symmetrical current–voltage curve.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141265968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Vincent Fernandez, Neal Fairley, David Morgan, Pascal Bargiela, Jonas Baltrusaitis
{"title":"Surface science insight note: Imaging X‐ray photoelectron spectroscopy","authors":"Vincent Fernandez, Neal Fairley, David Morgan, Pascal Bargiela, Jonas Baltrusaitis","doi":"10.1002/sia.7337","DOIUrl":"https://doi.org/10.1002/sia.7337","url":null,"abstract":"Quantification of X‐ray photoelectron spectroscopy (XPS) data is often limited by the heterogeneous nature of the material surface. However, it is often the case that heterogeneous material contains areas within the analyzed area that are effectively homogeneous. In this <jats:italic>Insight</jats:italic> note, concepts, and methods used to analyze both XPS data are presented to extract both spatial and spectral information from heterogeneous surfaces. These concepts and methods are applied to a specific material surface that contains three chemical compounds separated spatially. The analysis entails converting XPS image data to spectral data and is designed to highlight the potential of XPS imaging in revealing compositional information correlation with spatial information. Properties of algorithms used to evaluate XPS images and spectra are described to outline their application to image data. A case study of an imaging XPS data set is presented that demonstrates how poor signal‐to‐noise images, where the signal is recorded for 4 s per image, are still open to analysis yielding useful information. Ultimately, the methods presented here will aid in interpreting complex XPS data obtained from spatially complex materials often obtained during extensive cycling, such as conventional or electrocatalysts.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141198508","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Studying quantum effects of fine scaling on the buckling behavior of CNTs under torsional loading using the density functional theory and molecular mechanics approach","authors":"Mahdi Mirnezhad, Reza Ansari, Seyed Reza Falahatgar, Peyman Aghdasi","doi":"10.1002/sia.7336","DOIUrl":"https://doi.org/10.1002/sia.7336","url":null,"abstract":"In this study, we introduce a comprehensive investigation into the buckling behavior of carbon nanotubes (CNTs) using a combined approach of quantum mechanics and molecular mechanics methods. A novel aspect of our research lies in the exploration of the quantum effects of fine scaling on the buckling behavior of finite‐length nanotubes across various dimensions and chiralities. Specifically, we analyze the critical buckling strain variations in CNTs with distinct lengths, diameters, and chiralities, revealing pronounced differences influenced by atomic arrangement and the type of structure used in nanotube construction. Our findings elucidate that at smaller dimensions, nanotubes exhibit a higher critical buckling strain than other chiralities, while zigzag atomic arrangements demonstrate greater resistance to torsional loading at larger diameters. Additionally, we compare the buckling behavior of nanotubes obtained by wrapping armchair and zigzag nanosheets, highlighting differential resistance trends. This research not only underscores the critical role of quantum effects in determining nanotube buckling but also provides valuable insights into the nuanced influences of atomic arrangement and nanosheet type on the mechanical properties of CNTs. Thus, our work contributes a novel perspective to the field, bridging the gap between quantum mechanics and the mechanical behavior of nanostructures, which has significant implications for the design and application of nanoscale materials","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141195493","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Humic acid as eco‐friendly corrosion inhibitor for EH40 ship plate steel","authors":"Sizhu Wang, Zhipeng Liang, Yiyong Wang, Hui Jin, Shengli Li, Rui Guan","doi":"10.1002/sia.7335","DOIUrl":"https://doi.org/10.1002/sia.7335","url":null,"abstract":"In this study, a new type of green corrosion inhibitor, namely, sodium humate (SH), was extracted from humus soil, which is a natural humus plant, by dissolution‐neutralization, and then used for corrosion inhibition of low carbon steel in seawater. The corrosion inhibition performance of SH on low carbon steel EH40 in seawater was tested by weight loss method and electrochemical technology. The surface and corrosion products of low carbon steel were observed and analyzed by scanning electron microscope (SEM), atomic force microscope (AFM), contact angle and X‐ray photoelectron spectroscopy (XPS). The results show that SH is a mixed corrosion inhibitor, and the optimum concentration is 2 g L<jats:sup>−1</jats:sup>. At this concentration, the inhibition rate can reach 93.6%. It mainly affects the semi‐reaction of cathodic corrosion. By forming a corrosion protection layer with uniform adsorption on the surface of EH40 steel, EH40 steel becomes more resistant to seawater corrosion.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141147289","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Rafael Emil Klumpp, Sajjad Akbarzadeh, João Victor de Sousa Araujo, Maurice François Gonon, Fabienne Delaunois, Isolda Costa, Marie‐Georges Olivier
{"title":"Correlating corrosion modes with the microstructure of the 2XXX series alloys: A comparative approach","authors":"Rafael Emil Klumpp, Sajjad Akbarzadeh, João Victor de Sousa Araujo, Maurice François Gonon, Fabienne Delaunois, Isolda Costa, Marie‐Georges Olivier","doi":"10.1002/sia.7321","DOIUrl":"https://doi.org/10.1002/sia.7321","url":null,"abstract":"In this study, the localized corrosion susceptibility of AA2050‐T84, AA2198‐T851, and AA2024‐T3 alloys was compared by immersion in three test solutions, specifically sodium chloride solution (3.5% NaCl), EXCO solution, according to ASTM G34‐18, and a solution for intergranular corrosion (IGC) test recommended by ASTM G110‐15 and via scanning vibrating electrode technique (SVET). The results showed higher susceptibility of AA2050‐T84 alloy to all types of corrosion tested compared to the other studied 2XXX series alloys. Corrosion penetration was deeper in the AA2050‐T84 due to its microstructural characteristics as a difference in the micrometric Cu‐Rich intermetallic particle distribution on the surface and related to the distribution of the T1 (Al2CuLi) phase.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":null,"pages":null},"PeriodicalIF":1.7,"publicationDate":"2024-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141105306","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}