Surface science insight note: Imaging X‐ray photoelectron spectroscopy

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL
Vincent Fernandez, Neal Fairley, David Morgan, Pascal Bargiela, Jonas Baltrusaitis
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引用次数: 0

Abstract

Quantification of X‐ray photoelectron spectroscopy (XPS) data is often limited by the heterogeneous nature of the material surface. However, it is often the case that heterogeneous material contains areas within the analyzed area that are effectively homogeneous. In this Insight note, concepts, and methods used to analyze both XPS data are presented to extract both spatial and spectral information from heterogeneous surfaces. These concepts and methods are applied to a specific material surface that contains three chemical compounds separated spatially. The analysis entails converting XPS image data to spectral data and is designed to highlight the potential of XPS imaging in revealing compositional information correlation with spatial information. Properties of algorithms used to evaluate XPS images and spectra are described to outline their application to image data. A case study of an imaging XPS data set is presented that demonstrates how poor signal‐to‐noise images, where the signal is recorded for 4 s per image, are still open to analysis yielding useful information. Ultimately, the methods presented here will aid in interpreting complex XPS data obtained from spatially complex materials often obtained during extensive cycling, such as conventional or electrocatalysts.
表面科学启示录:成像 X 射线光电子能谱学
X 射线光电子能谱 (XPS) 数据的定量通常受到材料表面异质性质的限制。然而,通常情况下,异质材料在分析区域内包含的区域实际上是均质的。本 Insight 说明介绍了用于分析 XPS 数据的概念和方法,以便从异质表面提取空间和光谱信息。这些概念和方法适用于包含三种空间上分离的化合物的特定材料表面。分析需要将 XPS 图像数据转换为光谱数据,旨在突出 XPS 成像在揭示成分信息与空间信息相关性方面的潜力。描述了用于评估 XPS 图像和光谱的算法特性,以概述其在图像数据中的应用。还介绍了一个 XPS 成像数据集案例研究,该案例展示了信噪比较差的图像(每幅图像记录 4 秒钟的信号)是如何通过分析获得有用信息的。最终,本文介绍的方法将有助于解释从空间复杂材料(如传统材料或电催化剂)中获得的复杂 XPS 数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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