New challenges associated with hard X‐ray photoelectron spectroscopy (report on the 2023 ASTM E42‐ASSD AVS workshop)

IF 1.6 4区化学 Q4 CHEMISTRY, PHYSICAL

Surface and Interface Analysis Pub Date : 2024-06-29 DOI:10.1002/sia.7340

Alberto Herrera‐Gomez, David J. H. Cant, Thierry Conard, Olivier Renault, Matthew R. Linford, Joshua W. Pinder, Jeff Fenton, Donald R. Baer

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Abstract

In contrast to traditional X‐ray photoelectron spectroscopy (XPS), hard X‐ray photoelectron spectroscopy (HAXPES) can provide information from deeper within a sample while maintaining chemical resolution. However, working with higher energy X‐rays introduces a series of new or different issues ranging from energy calibration to factors associated with quantitative analysis. As part of the efforts to identify and increase community awareness about these issues, a workshop was held to review HAXPES metrology challenges with the perspective of converting it into a quantitative technique. A summary is hereby given of this workshop, which was entitled “What New Challenges Come with the Capabilities of HAXPES?” It was held in Portland, OR, USA, on November 7, 2023, and was primarily sponsored by the ASTM E42 Committee and the Applied Surface Science Division of the American Vacuum Society. This report contains summaries of the presentations and discussions at this workshop regarding the current open problems in HAXPES metrology. There were 20 participants at the workshop.

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与硬 X 射线光电子能谱相关的新挑战（关于 2023 年 ASTM E42-ASSD AVS 研讨会的报告）

与传统的 X 射线光电子能谱（XPS）相比，硬 X 射线光电子能谱（HAXPES）可以在保持化学分辨率的同时提供样品内部更深层的信息。然而，使用能量更高的 X 射线会带来一系列新的或不同的问题，从能量校准到定量分析的相关因素。为了查明这些问题并提高社会对这些问题的认识，举办了一次研讨会，从将 HAXPES 转化为定量技术的角度，审查 HAXPES 计量方面的挑战。该研讨会的主题是 "HAXPES 的能力带来了哪些新挑战？"，特此摘要介绍。研讨会于 2023 年 11 月 7 日在美国俄勒冈州波特兰市举行，主要由 ASTM E42 委员会和美国真空学会应用表面科学部主办。本报告包含研讨会上关于 HAXPES 计量学当前未决问题的发言和讨论摘要。共有 20 人参加了此次研讨会。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Surface and Interface Analysis 化学-物理化学

CiteScore

3.30

自引率

5.90%

发文量

130

审稿时长

4.4 months

期刊介绍： Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).