{"title":"Microfilled via: an enabling technology for high density high performance high volume BGA substrates","authors":"S. Chiang, J. Lan, B. Shepherd, P.Y.F. Wu","doi":"10.1109/IEMT.1996.559683","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559683","url":null,"abstract":"Microfilled Via (MfVia) is an enabling technology on which a superior and economical BGA substrate manufacturing is based. The main technology feature is a new method of creating a micro via by substituting the traditional costly drilling and plating process with a mass photoimageable via hole creation and stencil hole filling process. Via holes are later covered by copper through a foil lamination process to create a flat surface. Besides a dramatic reduction in the manufacturing cost, the new process also provides the following advantages: (1) True pad on via, (2) Superior Cu to photoimageable dielectric adhesion due to the lamination process, (3) High density outer layer process as the extra Cu plating on the outer layer is eliminated, (4) Low cost blind and buried via due to the sequential layer buildup and photo imaged vias. This high density via technology allows easy implementation of high pin-count substrates, even with the current generation line and spacing rule, such as 0.004\"/0.004\". This paper discusses the manufacturing, characterization and reliability of a BGA package manufactured using the microfilled via technology.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126507021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Delétage, A. Fenech, L. Béchou, Y. Ousten, Y. Danto, M. Salagoity, C. Faure, S. Rao
{"title":"Thermomechanical behavior of ceramic ball grid array based on experiments and FEM simulations","authors":"J. Delétage, A. Fenech, L. Béchou, Y. Ousten, Y. Danto, M. Salagoity, C. Faure, S. Rao","doi":"10.1109/IEMT.1996.559692","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559692","url":null,"abstract":"In this paper, we have performed 2D finite element simulations on CBGA components assembled on FR4 card in order to evaluate the highest stressed regions of the solder joint. The maximum cumulative strain energy has been calculated as a function of the thermal cycling characteristics and of the package size to evaluate the fatigue of the solder joints. Accelerated ageing tests (0/spl deg/C to 100/spl deg/C) have been performed on CBGA samples to validate such a global approach. The analysis of the degradation have been performed using direct observation with SEM and also a specific procedure of acoustic imaging allowing the detection of defects located on the inner balls. From the previous FEM simulation results and the experimental data under thermal cycling, we propose a global interpretation, based on general mechanical laws, of the thermomechanical behavior of the CBGA solder joints under thermal cycling. Conclusions about the evolution of the CBGA assemblies criticity with both package size and ball number increase are deduced from this study.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131047218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Materials mechanics issues of smart card manufacturing","authors":"A. Schubert, B. Michel, H. Reichl","doi":"10.1109/IEMT.1996.559723","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559723","url":null,"abstract":"Smart cards offer some advantages, e.g., for replacement of cash, storage of personal data of any kind, electronic identification, access control, data encryption, and electronic signature. Application areas are banking, telecommunication, high security, and social service. Permissible mechanical and thermal loads to smart cards call for respective high quality packaging technologies. Furthermore, the prediction of smart card performance during manufacturing and service requires the description of stress and temperature of the dependent processes involved. A complete solution of the described problems needs a direct coupling between simulation tools and advanced physical experiments. Finite Element simulations together with appropriate failure and fatigue models allow to predict the life time of these configurations and to improve the same by material or geometry variation. Because of the high degree of component and material complexity in such configurations, an experimental verification of simulation results for particular cases is strongly indicated. Capabilities of modern measurement and testing techniques, as for example micro deformation analysis, scanning acoustic microscopy and the measurement of residual stresses by X-ray diffraction, are demonstrated and discussed in the following paper.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127951391","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Measuring customer satisfaction for an R&D organization","authors":"B. H. Fetz","doi":"10.1109/IEMT.1996.559752","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559752","url":null,"abstract":"Quality may be defined as the extent to which a product or service meets (or exceeds) the customers expectations. Thus, the measurement and use of customer satisfaction data is at the heart of any quality program. But how does the concept of customer satisfaction apply to internal organizations (such as R&D) within a corporation? This paper presents the experiences and the lessons learned from managing a customer satisfaction program for a large R&D organization within AT&T.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131909928","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A self-tuning EWMA controller utilizing artificial neural network function approximation techniques","authors":"T. Smith, D. Boning","doi":"10.1109/IEMT.1996.559755","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559755","url":null,"abstract":"Recent works have shown that an exponentially weighted moving average (EWMA) controller can be used on semiconductor processes to maintain process targets over extended periods for improved product quality and decreased machine downtime. Proper choice of controller parameters (EWMA weights) is critical to the performance of this system. This work examines how different process factors affect the optimal controller parameters. We show that a function mapping from the disturbance state (magnitude of linear drift and random noise) of a given process to the corresponding optimal EWMA weights can be generated, and an artificial neural network (ANN) trained to learn the mapping. A self-tuning EWMA controller is proposed which dynamically updates its controller parameters by estimating the disturbance state and using the ANN function mapping to provide updates to the controller parameters. The result is an adaptive controller which eliminates the need for an experienced engineer to tune the controller, thereby allowing it to be more easily applied to semiconductor processes.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"90 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124615191","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A multiple model approach to process control in electronics manufacturing","authors":"A. Krauss, E. Kamen","doi":"10.1109/IEMT.1996.559787","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559787","url":null,"abstract":"In the first part of the paper, simulations are given of process control methods based on EWMA and single Kalman filter techniques which have already been applied to microelectronics manufacturing. Then a new approach to process control is proposed which is based on interactive multiple model (IMM) Kalman filtering. The application of this new approach to polymer deposition is discussed and simulations are given based on an approximation of process behavior. The results indicate that basing process control on multiple-model estimation can reduce the output variance when the process parameters are varying within the realm of a small number of known modes.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124623093","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Dinan, J. Benson, A. Cornfeld, M. Martinka, J.N. Johnson, J. Bratton, P. Taylor, B. Johs, P. He, S. Pittal, J. Woollam
{"title":"The NVESD microfactory: a new approach to infrared focal plane array manufacturing [HgCdTe]","authors":"J. Dinan, J. Benson, A. Cornfeld, M. Martinka, J.N. Johnson, J. Bratton, P. Taylor, B. Johs, P. He, S. Pittal, J. Woollam","doi":"10.1109/IEMT.1996.559731","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559731","url":null,"abstract":"A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army night vision and electronics sensors directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"215 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121938577","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Determining safety stock for semiconductor manufacturing","authors":"Yi-Feng Hung","doi":"10.1109/IEMT.1996.559749","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559749","url":null,"abstract":"Semiconductor manufacturing requires many process steps performed by highly unreliable equipment. Such unreliability causes the means and variances of its cycle times to be generally larger than those of other industries. In addition, it makes the yields uncertain. While making the order quotation and calculating production plan, the safety stock must be used to guard against the uncertainty of the manufacturing processes to increase the on-time-delivery ratio and to provide better customer services. The randomness of cycle times and yields are the two major sources of the output uncertainty. Formerly, Hung [1991] proposed a method capable of obtaining the output lot distribution at a particular time on the planning horizon. The distribution could be obtained by using the production rate and the cycle time distribution which are readily available from the manufacturing database. However, the method does not adequately consider the yield uncertainty. While extending that method, this paper employs a simple variance calculation formula to incorporate the yield uncertainty when computing the variance of total good die output. After calculating this variance for a particular product at a particular time, the necessary safety stock for that die type at that time can be obtained.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"244 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127640524","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Life-cycle assessment of electronics manufacturing processes","authors":"T. Graedel","doi":"10.1109/IEMT.1996.559740","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559740","url":null,"abstract":"The growing willingness of manufacturers to accept responsibility for the environmental stewardship of their products has not yet been widely matched by an effort to make manufacturing processes more environmentally responsible across their life cycle, with the exception of a few \"pollution prevention\" activities. However, the environmental assessment of processes across their entire life span is particularly important, since processes often remain in place for decades once they are developed. This paper presents a formalism for evaluating the environmental implications of products and discusses topics at each life stage that are suitable for review by researchers, developers, and manufacturers in the electronics industry.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127402060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Nagasawa, S. Tanagawa, N. Yoshio, K. Igarashi, H. Yada
{"title":"Inner lead bonding for a resin molded chip size package","authors":"M. Nagasawa, S. Tanagawa, N. Yoshio, K. Igarashi, H. Yada","doi":"10.1109/IEMT.1996.559770","DOIUrl":"https://doi.org/10.1109/IEMT.1996.559770","url":null,"abstract":"The present study investigated methods for bonding between semiconductor bonding pads and the metal bumps of a film carrier developed for use in chip-size packages (CSP). The structure of the film carrier is that of a copper circuit bearing a layer of insulating polyimide (PI) on both sides and connecting on one side with the exposed bumps, which in turn connect with the bonding pads. The bumps either have a copper core with a gold surface, or are all gold. In the first stage of the experiment, in which basic data were gathered, the ability of the bumps to bond via gang-bonding with the aluminum of the silicon chip was tested, using bumps with gold-plating of different thicknesses to give exposed heights of 10, 30 and 50 /spl mu/m. Bump height is a decisive factor in the peeling strength of the bonding site; satisfactory results were not achieved with low bumps of 10 /spl mu/m height. In the second stage, a method was sought which would help minimize production cost by ensuring successful bonding even with bumps of only 10 /spl mu/m height. The three following methods were tested and found effective: (1) inserting a convex frame immediately beneath the film carrier on the side opposite the bumps; (2) using a film carrier containing a layer of thermoplastic material immediately beneath the bumps; and (3) undertaking scrubbing during the initial bonding phase.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"417 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126702570","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}