The NVESD microfactory: a new approach to infrared focal plane array manufacturing [HgCdTe]

Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium Pub Date : 1996-10-14 DOI:10.1109/IEMT.1996.559731

J. Dinan, J. Benson, A. Cornfeld, M. Martinka, J.N. Johnson, J. Bratton, P. Taylor, B. Johs, P. He, S. Pittal, J. Woollam

引用次数: 3

Abstract

A novel approach to Infrared Focal Plane Array fabrication is being investigated at the US Army night vision and electronics sensors directorate. The goal is a demonstration of the feasibility of carrying out all epitaxial growth and device processing steps without removing a wafer from the protective environment of a multi-chamber vacuum system.

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NVESD微工厂:红外焦平面阵列制造的新方法[HgCdTe]

美国陆军夜视和电子传感器理事会正在研究一种制造红外焦平面阵列的新方法。目标是演示在不从多室真空系统的保护环境中移除晶圆的情况下进行所有外延生长和器件加工步骤的可行性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium

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