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Journal of Vacuum Science & Technology B最新文献

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Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching 沟槽双扩散金属氧化物半导体多晶硅凹槽刻蚀尖锐缺陷的机理及解决方法
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001395
Wenwen Zhang, Yongzhi Fang, Renrui Huang, Wenming Zhu
{"title":"Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching","authors":"Wenwen Zhang, Yongzhi Fang, Renrui Huang, Wenming Zhu","doi":"10.1116/6.0001395","DOIUrl":"https://doi.org/10.1116/6.0001395","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"7 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75908117","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser 衍射光栅分束器，干涉光刻纳米图形与多纵模二极管激光器
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001377
Vineeth Sasidharan, A. Neumann, S. Brueck
{"title":"Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser","authors":"Vineeth Sasidharan, A. Neumann, S. Brueck","doi":"10.1116/6.0001377","DOIUrl":"https://doi.org/10.1116/6.0001377","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"63 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84112770","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding 利用微转移模塑技术研究Norland光学胶81在纳米沟槽上的图案转移保真度
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001333
Rahman Sabahi-Kaviani, R. Luttge
{"title":"Investigating the pattern transfer fidelity of Norland Optical Adhesive 81\u0000 for nanogrooves by microtransfer molding","authors":"Rahman Sabahi-Kaviani, R. Luttge","doi":"10.1116/6.0001333","DOIUrl":"https://doi.org/10.1116/6.0001333","url":null,"abstract":"We demonstrated the microtransfer molding of Norland Optical Adhesive 81 (NOA81) thin films. NOA81 nanogrooves and flat thin films were transferred from a flexible polydimethylsiloxane (PDMS) working mold. In the case of nanogrooves, the mold’s feature area of 15 × 15mm contains a variety of pattern dimensions in a set of smaller nanogroove fields of a few mm each. We demonstrated that at least six microtransfers can be performed from the same PDMS working mold. Within the restriction of our atomic force microscopy measurement technique, nanogroove height varies with 82 ± 11 nm depending on the pattern dimensions of the measured fields. Respective micrographs of two of these fields, i.e., one field designated with narrower grooves (D1000L780, case 1) and the other designated with wider grooves (D1000L230, case 2) but with the same periodicity values, demonstrate faithful transfer of the patterns. The designated pattern dimensions refer to the periodicity (D) and the ridge width (L) in the original design process of the master mold (dimensional units are nm). In addition, neither NOA81 itself (flat films) nor NOA81 nanogroove thin films with a thickness of 1.6 μm deteriorate the imaging quality in optical cell microscopy. © 2021 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). https://doi.org/10.1116/6.0001333","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"94 12 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76489220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing 离子束后处理对微铣削和激光蚀刻铝表面润湿的影响
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001282
K. Misiiuk, S. Lowrey, R. Blaikie, Josselin Juras, A. Sommers, J. Leveneur
{"title":"Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing","authors":"K. Misiiuk, S. Lowrey, R. Blaikie, Josselin Juras, A. Sommers, J. Leveneur","doi":"10.1116/6.0001282","DOIUrl":"https://doi.org/10.1116/6.0001282","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"5 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73143461","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Synthesis of NiS2 nanomaterial as wide range pressure sensor NiS2纳米材料宽量程压力传感器的合成
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001344
Zehui Peng, Jing Zhang, Zhong Ma, Shuai Lou, Yumeng Xue, Shancheng Yan
{"title":"Synthesis of NiS2 nanomaterial as wide range pressure sensor","authors":"Zehui Peng, Jing Zhang, Zhong Ma, Shuai Lou, Yumeng Xue, Shancheng Yan","doi":"10.1116/6.0001344","DOIUrl":"https://doi.org/10.1116/6.0001344","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"7 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82211060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of Cd-free ZnCuInS/ZnS based inverted quantum dot light-emitting diode: Considering substrate temperature effect on sputtered ZnO layer 无镉ZnCuInS/ZnS基反向量子点发光二极管的制备:考虑衬底温度对溅射ZnO层的影响
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001365
M. M. R. Biswas, Md. Faruk Hossain, M. Morimoto, S. Naka, H. Okada
{"title":"Fabrication of Cd-free ZnCuInS/ZnS based inverted quantum dot light-emitting diode: Considering substrate temperature effect on sputtered ZnO layer","authors":"M. M. R. Biswas, Md. Faruk Hossain, M. Morimoto, S. Naka, H. Okada","doi":"10.1116/6.0001365","DOIUrl":"https://doi.org/10.1116/6.0001365","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"17 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75495714","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabry–Perot-cavity-based refractometry without influence of mirror penetration depth 不影响反射镜穿透深度的法布里-珀罗腔折光法
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001501
C. Forssén, I. Silander, J. Zakrisson, M. Zelan, O. Axner
{"title":"Fabry–Perot-cavity-based refractometry without influence of mirror penetration depth","authors":"C. Forssén, I. Silander, J. Zakrisson, M. Zelan, O. Axner","doi":"10.1116/6.0001501","DOIUrl":"https://doi.org/10.1116/6.0001501","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"675 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76863077","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Lithographically patterned stretchable metallic microwiring on electrospun nanofiber mats 静电纺纳米纤维垫上的光刻图案可拉伸金属微布线
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001279
Yutika Badhe, P. E. Rocha-Flores, W. Voit, David Remer, Lauren Costella, A. Joshi-Imre
{"title":"Lithographically patterned stretchable metallic microwiring on electrospun nanofiber mats","authors":"Yutika Badhe, P. E. Rocha-Flores, W. Voit, David Remer, Lauren Costella, A. Joshi-Imre","doi":"10.1116/6.0001279","DOIUrl":"https://doi.org/10.1116/6.0001279","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"12 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84257841","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
100 keV vacuum sealed field emission gun for high resolution electron microscopy 用于高分辨率电子显微镜的100kev真空密封场发射枪
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001275
M. El-Gomati, T. Wells, X. Zha, R. Sykes, C. Russo, R. Henderson, G. McMullan
{"title":"100 keV vacuum sealed field emission gun for high resolution electron microscopy","authors":"M. El-Gomati, T. Wells, X. Zha, R. Sykes, C. Russo, R. Henderson, G. McMullan","doi":"10.1116/6.0001275","DOIUrl":"https://doi.org/10.1116/6.0001275","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"63 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84673142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Comparative study of thermal desorption and pumping performance for TiZrV-, Pd-, or Pd/TiZrV-coated copper tubes TiZrV-， Pd-或Pd/TiZrV-涂层铜管热解吸和泵送性能的比较研究
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001475
X. Jin, T. Uchiyama, Y. Tanimoto, T. Honda
{"title":"Comparative study of thermal desorption and pumping performance for TiZrV-, Pd-, or Pd/TiZrV-coated copper tubes","authors":"X. Jin, T. Uchiyama, Y. Tanimoto, T. Honda","doi":"10.1116/6.0001475","DOIUrl":"https://doi.org/10.1116/6.0001475","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"25 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81858868","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
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