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Journal of Vacuum Science & Technology B最新文献

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Pneumatic controlled nanosieve for efficient capture and release of nanoparticles 气动控制纳米筛有效捕获和释放纳米颗粒
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-12-01 DOI: 10.1116/6.0002107
Animesh Nanaware, Taylor Kranbuhl, Jesus Ching, Janice S. Chen, Xinye Chen, Qingsong Tu, Ke Du
{"title":"Pneumatic controlled nanosieve for efficient capture and release of nanoparticles","authors":"Animesh Nanaware, Taylor Kranbuhl, Jesus Ching, Janice S. Chen, Xinye Chen, Qingsong Tu, Ke Du","doi":"10.1116/6.0002107","DOIUrl":"https://doi.org/10.1116/6.0002107","url":null,"abstract":"A pneumatic controlled nanosieve device is demonstrated for the efficient capture and release of 15 nm quantum dots. This device consists of a 200 nm deep glass channel and a polydimethylsiloxane-based pneumatic pressure layer to enhance target capture. The fluid motion inside the nanosieve is studied by computational fluidic dynamics (CFD) and microfluidic experiments, enabling efficient target capture with a flow rate as high as 100 <i>μ</i>l/min. In addition, microgrooves are fabricated inside the nanosieve to create low flow rate regions, which further improves the target capture efficiency. A velocity contour plot is constructed with CFD, revealing that the flow rate is the lowest at the top and bottom of the microgrooves. This phenomenon is supported by the observed nanoparticle clusters surrounding the microgrooves. By changing the morphology and pneumatic pressure, this device will also facilitate rapid capture and release of various biomolecules.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"178 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138519589","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of ultrathin suspended membranes from atomic layer deposition films 原子层沉积膜制备超薄悬浮膜
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001309
Michael J. Elowson, R. Dhall, A. Schwartzberg, Stephanie Y. Chang, Vittoria Tommasini, S. B. Alam, E. Chan, S. Cabrini, S. Aloni
{"title":"Fabrication of ultrathin suspended membranes from atomic layer deposition films","authors":"Michael J. Elowson, R. Dhall, A. Schwartzberg, Stephanie Y. Chang, Vittoria Tommasini, S. B. Alam, E. Chan, S. Cabrini, S. Aloni","doi":"10.1116/6.0001309","DOIUrl":"https://doi.org/10.1116/6.0001309","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"27 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86696175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001671
Xinghua Sun, Y. Mignot, Christopher Cole, E. Liu, Daniel Santos, Angélique Raley, Jennifer Church, Luciana Meli, S. Sieg, P. Biolsi
{"title":"In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization","authors":"Xinghua Sun, Y. Mignot, Christopher Cole, E. Liu, Daniel Santos, Angélique Raley, Jennifer Church, Luciana Meli, S. Sieg, P. Biolsi","doi":"10.1116/6.0001671","DOIUrl":"https://doi.org/10.1116/6.0001671","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"9 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84197800","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma kinetics of c-C4F8 inductively coupled plasma revisited c-C4F8电感耦合等离子体动力学研究
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001631
D. Levko, Chandrasekhar Shukla, Kenta Suzuki, L. Raja
{"title":"Plasma kinetics of c-C4F8 inductively coupled plasma revisited","authors":"D. Levko, Chandrasekhar Shukla, Kenta Suzuki, L. Raja","doi":"10.1116/6.0001631","DOIUrl":"https://doi.org/10.1116/6.0001631","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"1 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87634110","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride 等离子体辅助钨的热循环原子层刻蚀及其对氮化钛的选择性控制
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001660
Kazunori Shinoda, Nobuya Miyoshi, H. Kobayashi, Y. Hanaoka, M. Izawa, K. Ishikawa, M. Hori
{"title":"Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride","authors":"Kazunori Shinoda, Nobuya Miyoshi, H. Kobayashi, Y. Hanaoka, M. Izawa, K. Ishikawa, M. Hori","doi":"10.1116/6.0001660","DOIUrl":"https://doi.org/10.1116/6.0001660","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"43 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84132706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nanofabricating neural networks: Strategies, advances, and challenges 纳米制造神经网络:策略、进展和挑战
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001649
R. Luttge
{"title":"Nanofabricating neural networks: Strategies, advances, and challenges","authors":"R. Luttge","doi":"10.1116/6.0001649","DOIUrl":"https://doi.org/10.1116/6.0001649","url":null,"abstract":"Nanofabrication can help us to emulate natural intelligence. Forward-engineering brain gained enormous momentum but still falls short in human neurodegenerative disease modeling. Here, organ-on-chip (OoC) implementation of tissue culture concepts in microfluidic formats already progressed with the identification of our knowledge gap in toxicology and drug metabolism studies. We believe that the self-organization of stem cells and chip technology is a key to advance such complex in vitro tissue models, including models of the human nervous system as envisaged in this review. However, current cultured networks of neurons show limited resemblance with the biological functions in the real nervous system or brain tissues. To take full advantage of scaling in the engineering domain of electron-, ion-, and photon beam technology and nanofabrication methods, more research is needed to meet the requirements of this specific field of chip technology applications. So far, surface topographies, microfluidics, and sensor and actuator integration concepts have all contributed to the patterning and control of neural network formation processes in vitro. However, when probing the state of the art for this type of miniaturized three-dimensional tissue models in PubMed, it was realized that there is very little systematic cross-disciplinary research with biomaterials originally formed for tissue engineering purposes translated to on-chip solutions for in vitro modeling. Therefore, this review contributes to the formulation of a sound design concept based on the understanding of the existing knowledge and the technical challenges toward finding better treatments and potential cures for devastating neurodegenerative diseases, like Parkinson's disease. Subsequently, an integration strategy based on a modular approach is proposed for nervous system-on-chip (NoC) models that can yield efficient and informative optical and electronic NoC readouts in validating and optimizing these conceptual choices in the innovative process of a fast growing and exciting new OoC industry.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"78 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72914646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Comparison of the effective parameters of single-tip tungsten emitter using Fowler–Nordheim and Murphy–Good plots 采用Fowler-Nordheim图和Murphy-Good图比较单尖钨极发射极的有效参数
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001645
E. O. Popov, Sergey Filippov, A. G. Kolosko, A. Knápek
{"title":"Comparison of the effective parameters of single-tip tungsten emitter using Fowler–Nordheim and Murphy–Good plots","authors":"E. O. Popov, Sergey Filippov, A. G. Kolosko, A. Knápek","doi":"10.1116/6.0001645","DOIUrl":"https://doi.org/10.1116/6.0001645","url":null,"abstract":"A study of single-tip tungsten emitters with the construction of current–voltage dependences in quadratic Fowler–Nordheim coordinates and modified coordinates (Murphy–Good plot that depend on the value of the work function) in real-time has been carried out. The statistical data on the value of the emission area and the field enhancement factor were accumulated. The statistical data on the voltage power in the pre-exponential factor were obtained by plotting the dependence of the notional emission area on the dimensionless field at the tip apex in the coordinates ln( Im/ Jk) versus ln( f). An empirical formula is proposed that uses a correction for the power of voltage, taking into account the shape of the tip.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"647 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85360240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques 三极管冷阴极电子束的栅极偏移和发射体设计对x射线成像技术焦点光斑尺寸的影响
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001588
Y. Yu, K. Park
{"title":"Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques","authors":"Y. Yu, K. Park","doi":"10.1116/6.0001588","DOIUrl":"https://doi.org/10.1116/6.0001588","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"47 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85533710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Negative differential resistance in photoassisted field emission from Si nanowires 硅纳米线光辅助场发射的负差分电阻
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001650
M. Choueib, A. Derouet, P. Vincent, A. Ayari, S. Perisanu, P. Poncharal, Costel Sorin Cojocaru, R. Martel, S. Purcell
{"title":"Negative differential resistance in photoassisted field emission from Si nanowires","authors":"M. Choueib, A. Derouet, P. Vincent, A. Ayari, S. Perisanu, P. Poncharal, Costel Sorin Cojocaru, R. Martel, S. Purcell","doi":"10.1116/6.0001650","DOIUrl":"https://doi.org/10.1116/6.0001650","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"414 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75785810","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thermal-field emission from cones and wires 锥和导线的热场发射
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2022-03-01 DOI: 10.1116/6.0001656
K. Jensen, M. McDonald, Mia K. Dhillon, Daniel Finkenstadt, A. Shabaev, M. Osofsky
{"title":"Thermal-field emission from cones and wires","authors":"K. Jensen, M. McDonald, Mia K. Dhillon, Daniel Finkenstadt, A. Shabaev, M. Osofsky","doi":"10.1116/6.0001656","DOIUrl":"https://doi.org/10.1116/6.0001656","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"33 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81571865","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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