利用微转移模塑技术研究Norland光学胶81在纳米沟槽上的图案转移保真度

IF 1.4 4区 工程技术
Rahman Sabahi-Kaviani, R. Luttge
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引用次数: 1

摘要

我们展示了NOA81薄膜的微转移成型。从柔性聚二甲基硅氧烷(PDMS)工作模上转移NOA81纳米沟槽和平面薄膜。在纳米沟槽的情况下,模具的15 × 15mm的特征区域在一组较小的纳米沟槽域中包含各种图案尺寸,每个纳米沟槽只有几毫米。我们证明了至少可以从相同的PDMS工作模中进行六次微转移。在我们的原子力显微镜测量技术的限制下,纳米沟槽的高度根据被测场的模式尺寸变化为82±11 nm。其中两个视场的各自显微照片,即一个视场指定为较窄的凹槽(D1000L780,案例1),另一个视场指定为较宽的凹槽(D1000L230,案例2),但具有相同的周期性值,显示了图案的忠实传递。指定的图案尺寸是指主模原设计过程中的周期(D)和脊宽(L)(尺寸单位为nm)。此外,NOA81本身(平面膜)和厚度为1.6 μm的NOA81纳米槽薄膜都不会影响光学细胞显微镜成像质量。©2021作者。除另有说明外,所有文章内容均遵循知识共享署名(CC BY)许可协议(http://creativecommons.org/licenses/by/4.0/)。https://doi.org/10.1116/6.0001333
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding
We demonstrated the microtransfer molding of Norland Optical Adhesive 81 (NOA81) thin films. NOA81 nanogrooves and flat thin films were transferred from a flexible polydimethylsiloxane (PDMS) working mold. In the case of nanogrooves, the mold’s feature area of 15 × 15mm contains a variety of pattern dimensions in a set of smaller nanogroove fields of a few mm each. We demonstrated that at least six microtransfers can be performed from the same PDMS working mold. Within the restriction of our atomic force microscopy measurement technique, nanogroove height varies with 82 ± 11 nm depending on the pattern dimensions of the measured fields. Respective micrographs of two of these fields, i.e., one field designated with narrower grooves (D1000L780, case 1) and the other designated with wider grooves (D1000L230, case 2) but with the same periodicity values, demonstrate faithful transfer of the patterns. The designated pattern dimensions refer to the periodicity (D) and the ridge width (L) in the original design process of the master mold (dimensional units are nm). In addition, neither NOA81 itself (flat films) nor NOA81 nanogroove thin films with a thickness of 1.6 μm deteriorate the imaging quality in optical cell microscopy. © 2021 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). https://doi.org/10.1116/6.0001333
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来源期刊
Journal of Vacuum Science & Technology B
Journal of Vacuum Science & Technology B 工程技术-工程:电子与电气
自引率
14.30%
发文量
0
审稿时长
2.5 months
期刊介绍: Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.
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