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Journal of Vacuum Science & Technology B最新文献

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Distribution of trace impurities in microvolumes and analysis of concentration using laser sputtered neutral mass spectrometry 微量杂质微体积分布及激光溅射中性质谱法浓度分析
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001244
H. Akutsu, Reiko Saito, J. Asakawa, K. Kiyokawa, M. Morita, T. Sakamoto, M. Fujii
{"title":"Distribution of trace impurities in microvolumes and analysis of concentration using laser sputtered neutral mass spectrometry","authors":"H. Akutsu, Reiko Saito, J. Asakawa, K. Kiyokawa, M. Morita, T. Sakamoto, M. Fujii","doi":"10.1116/6.0001244","DOIUrl":"https://doi.org/10.1116/6.0001244","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"31 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75984027","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Leakage rate detection of ConFlat seals in aluminum and stainless steel flanges under mechanical loads for quantum optical experiments in space 空间量子光学实验机械载荷下铝和不锈钢法兰ConFlat密封件泄漏率检测
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001525
Michael Elsen, Thi Thu Hien Dao, C. Braxmaier, J. Grosse
{"title":"Leakage rate detection of ConFlat seals in aluminum and stainless steel flanges under mechanical loads for quantum optical experiments in space","authors":"Michael Elsen, Thi Thu Hien Dao, C. Braxmaier, J. Grosse","doi":"10.1116/6.0001525","DOIUrl":"https://doi.org/10.1116/6.0001525","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"52 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86686956","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms 基于多目标遗传算法的静电电子透镜多准则优化
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001274
N. Hesam Mahmoudi Nezhad, M. Ghaffarian Niasar, A. Mohammadi Gheidari, P. Kruit, C. W. Hagen
{"title":"Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms","authors":"N. Hesam Mahmoudi Nezhad, M. Ghaffarian Niasar, A. Mohammadi Gheidari, P. Kruit, C. W. Hagen","doi":"10.1116/6.0001274","DOIUrl":"https://doi.org/10.1116/6.0001274","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"26 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83862526","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Modeling the effect of stochastic heating and surface chemistry in a pure CF4 inductively coupled plasma 模拟了纯CF4电感耦合等离子体中随机加热和表面化学的影响
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001293
D. Levko, Chandrasekhar Shukla, L. Raja
{"title":"Modeling the effect of stochastic heating and surface chemistry in a pure CF4 inductively coupled plasma","authors":"D. Levko, Chandrasekhar Shukla, L. Raja","doi":"10.1116/6.0001293","DOIUrl":"https://doi.org/10.1116/6.0001293","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"33 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80991197","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Intermetallic compound formation inhibiting electromigration-based micro/nanowire growth 金属间化合物形成抑制电迁移微/纳米线生长
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001271
Y. Kimura, Y. Ju
{"title":"Intermetallic compound formation inhibiting electromigration-based micro/nanowire growth","authors":"Y. Kimura, Y. Ju","doi":"10.1116/6.0001271","DOIUrl":"https://doi.org/10.1116/6.0001271","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"101 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85812772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhancement of thermionic emission and conversion characteristics using polarization- and band-engineered n-type AlGaN/GaN cathodes 利用极化和带工程的n型AlGaN/GaN阴极增强热离子发射和转换特性
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001357
S. Kimura, H. Yoshida, H. Miyazaki, Takuya Fujimoto, A. Ogino
{"title":"Enhancement of thermionic emission and conversion characteristics using polarization- and band-engineered n-type AlGaN/GaN cathodes","authors":"S. Kimura, H. Yoshida, H. Miyazaki, Takuya Fujimoto, A. Ogino","doi":"10.1116/6.0001357","DOIUrl":"https://doi.org/10.1116/6.0001357","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"97 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77653781","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features 基于统计和动态启发光谱特征的反应离子蚀刻虚拟计量建模
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001277
Kun-Chieh Chien, Chih‐Hao Chang, D. Djurdjanović
{"title":"Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features","authors":"Kun-Chieh Chien, Chih‐Hao Chang, D. Djurdjanović","doi":"10.1116/6.0001277","DOIUrl":"https://doi.org/10.1116/6.0001277","url":null,"abstract":"Due to increasing demand on the fabrication yield and throughput in micro/nanoscale manufacturing, virtual metrology (VM) has emerged as an effective data-based approach for real-time process monitoring. In this work, a novel automated methodology, without the need for domain knowledge and experience, for extracting useful features from raw optical emission spectroscopy (OES) data is presented. Newly proposed OES features are combined with other types of data, which include tool settings, sensor readings, physical measurements, non-numerical data, and process control parameters. Using partial least squares and support vector regression, VM models for predicting the critical dimension after reactive ion etching are built. The results from the VM model indicate that the coefficient of determination of up to 0.65 and the root mean square Error of 0.08 can be achieved. Compared to the traditional features obtained by the current solution in industry, the performances of VM models via the proposed methodology can enhance the coefficient of determination by 62.5% and reduce the root mean square error by 23.1%. Published under an exclusive license by the AVS. https://doi.org/10.1116/6.0001277","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"2013 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87735346","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Multiple electron beam generation from InGaN photocathode InGaN光电阴极产生多重电子束
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001272
Daiki Sato, H. Shikano, A. Koizumi, T. Nishitani, Y. Honda, H. Amano
{"title":"Multiple electron beam generation from InGaN photocathode","authors":"Daiki Sato, H. Shikano, A. Koizumi, T. Nishitani, Y. Honda, H. Amano","doi":"10.1116/6.0001272","DOIUrl":"https://doi.org/10.1116/6.0001272","url":null,"abstract":"A p-type InGaN grown on a double-side polished sapphire substrate was used for the photocathode. The surface of p-InGaN was cleaned by heating in the vacuum chamber with a base pressure of 5×10-9 Pa. Cs and O2 were alternately supplied on the surface for activation of the photocathode(3). The quantum efficiency immediately after the activation process was 14%. The electron gun test system was composed of a cathode electrode, an anode electrode, an electrostatic lens, and a fluorescent screen. The voltages applied to the cathode electrode and the electrostatic lens were -15 and -8.6 kV, respectively. A Gaussian-distributed laser with a wavelength of 405 nm was diffracted by liquid crystal on silicon, divided into 25 laser beams, and irradiated on the InGaN photocathode from its backside. Each laser beam had Gaussian distribution with a diameter of 30 μm and an interval of 310 μm (Figure 1(a)). The generated multiple electron-beam was observed by the fluorescent screen. Deviations in the diameter of each electron beam was evaluated.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"83 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90089713","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Diffusion of zirconium on the surface of Schottky electron sources 锆在肖特基电子源表面的扩散
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001381
Soichiro Matsunaga, A. Takei, Souichi Katagiri, Yusuke Sakai, Takashi Doi
{"title":"Diffusion of zirconium on the surface of Schottky electron sources","authors":"Soichiro Matsunaga, A. Takei, Souichi Katagiri, Yusuke Sakai, Takashi Doi","doi":"10.1116/6.0001381","DOIUrl":"https://doi.org/10.1116/6.0001381","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"83 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82048427","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Miniature touch mode capacitance vacuum gauge with circular diaphragm 带圆形膜片的微型触摸式电容真空计
IF 1.4 4区 工程技术
Journal of Vacuum Science & Technology B Pub Date : 2021-12-01 DOI: 10.1116/6.0001332
Xiao-dong Han, Gang Li, Mahui Xu, Huangping Yan, Yongjian Feng, Detian Li
{"title":"Miniature touch mode capacitance vacuum gauge with circular diaphragm","authors":"Xiao-dong Han, Gang Li, Mahui Xu, Huangping Yan, Yongjian Feng, Detian Li","doi":"10.1116/6.0001332","DOIUrl":"https://doi.org/10.1116/6.0001332","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"48 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76552573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
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