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Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma 等离子体增强氨基酸锰和氨等离子体原子层沉积氮化锰薄膜
3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2023-05-23 DOI: 10.1116/6.0002484
Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu
{"title":"Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma","authors":"Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu","doi":"10.1116/6.0002484","DOIUrl":"https://doi.org/10.1116/6.0002484","url":null,"abstract":"Manganese nitride films have been successfully fabricated by the technique of plasma enhanced atomic layer deposition (PEALD). The process employed bis(N,N'-di-tert-butylacetamidinate)manganese [Mn(amd)2] as manganese precursor and ammonia plasma as a coreactant. With a typical PEALD process cycle of 5 s Mn(amd)2 pulse, 10 s Ar purge pulse, 10 s NH3 plasma exposure, 10 s Ar purge pulse, 80 °C deposition temperature, and 60 W input power, the deposited film is continuous and smooth with a growth rate is 0.037 nm/cycle. Based on x-ray diffraction measurement, the film is determined to be η-Mn3N2 crystal structure. The primary deposition mechanism has been investigated by in situ optical emission spectroscopy and quartz crystal microbalance. The deposited manganese nitride film shows an excellent barrier performance against copper diffusion at insulator/copper interface.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135183577","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)] 校正:“中红外波段氮化铝薄膜厚度相关光学特性”[J]。真空吸尘器。科学。抛光工艺。A 39, 043408 (2021)]
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001574
L. Beliaev, E. Shkondin, A. Lavrinenko, O. Takayama
{"title":"Erratum: “Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” [J. Vac. Sci. Technol. A 39, 043408 (2021)]","authors":"L. Beliaev, E. Shkondin, A. Lavrinenko, O. Takayama","doi":"10.1116/6.0001574","DOIUrl":"https://doi.org/10.1116/6.0001574","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"11 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86612597","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene 改性3d打印结构:氧化铝涂层对丙烯腈-丁二烯-苯乙烯的影响
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001595
A. Varga, S. Barry
{"title":"Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene","authors":"A. Varga, S. Barry","doi":"10.1116/6.0001595","DOIUrl":"https://doi.org/10.1116/6.0001595","url":null,"abstract":"3D-printed acrylonitrile butadiene styrene (ABS) polymer structures were coated with alumina (Al2O3) using the trimethylaluminum(III) and water atomic layer deposition (ALD) process at 80 °C, which resulted in a 203 nm thin film with a 1.35 Å growth per cycle. This thin film was a well-adhered protective overcoating on ABS to prevent reaction with acetone vapors in a solvent resistance experiment. Scratch tests were not able to remove the overcoating from the polymer surface, which provided a 50% and 32% increase in acetone vapor resistance before initial deformation and complete structure collapse, respectively. A more aggressive tape test caused delamination of the protective coating. This proof-of-concept experiment demonstrates how 3D printing combined with ALD overcoating can alter the chemical characteristics of complex polymer architectures.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"57 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73118998","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition 中性束增强原子层沉积法生长室温高品质HfO2/SiO2栅极堆叠薄膜
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001607
B. Ge, D. Ohori, Yi-Ho Chen, T. Ozaki, K. Endo, Yiming Li, J. Tarng, S. Samukawa
{"title":"Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition","authors":"B. Ge, D. Ohori, Yi-Ho Chen, T. Ozaki, K. Endo, Yiming Li, J. Tarng, S. Samukawa","doi":"10.1116/6.0001607","DOIUrl":"https://doi.org/10.1116/6.0001607","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"1 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81927228","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lithium batteries 镁与离子液体1-丁基-1-甲基吡啶双(三氟甲基磺酰基)亚胺的相互作用——后锂电池电极-电解质界面的实验与计算模型研究
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001658
F. Buchner, Katrin Forster-Tonigold, Tim Bolter, Alexander Rampf, Jens Klein, A. Gross, R. Behm
{"title":"Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lithium batteries","authors":"F. Buchner, Katrin Forster-Tonigold, Tim Bolter, Alexander Rampf, Jens Klein, A. Gross, R. Behm","doi":"10.1116/6.0001658","DOIUrl":"https://doi.org/10.1116/6.0001658","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"90 6 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83652521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Sulfur-enhanced dynamics of coinage metal(111) surfaces: Step edges versus terraces as locations for metal-sulfur complex formation 硫增强的铸币金属(111)表面动力学:台阶边缘与阶地作为金属-硫复合体形成的位置
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001408
Da‐Jiang Liu, J. Evans
{"title":"Sulfur-enhanced dynamics of coinage metal(111) surfaces: Step edges versus terraces as locations for metal-sulfur complex formation","authors":"Da‐Jiang Liu, J. Evans","doi":"10.1116/6.0001408","DOIUrl":"https://doi.org/10.1116/6.0001408","url":null,"abstract":"The propensity of trace amounts of sulfur adsorbed on coinage metal(111) surfaces to dramatically enhance surface dynamics has been demonstrated by STM observations of accelerated 2D island decay for Cu and Ag. It is generally accepted that this enhancement is due to the formation of adsorbed metal-sulfur complexes which facilitate surface mass transport of the metal. These complexes were originally proposed to form on terraces following extraction of metal atoms from step edges and subsequent combination with sulfur on the terraces. However, even when Th is is the au tho r’s pe er re vie we d, ac ce pte d m an us cri pt. H ow ev er , th e o nli ne ve rsi on of re co rd w ill be di ffe re nt fro m thi s v er sio n o nc e i t h as be en co py ed ite d a nd ty pe se t. PL EA SE C IT E TH IS A RT IC LE A S DO I: 10 .11 16 /6. 00 01 40 8","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"42 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82042200","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Magnetic transition behavior in epitaxial Fe47Rh47Pd6 films 外延Fe47Rh47Pd6薄膜的磁跃迁行为
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001573
H. Sato, N. Pachauri, S. Keshavarz, Chhatra R. Joshi, Hwachol Lee, G. Mankey, P. Leclair
{"title":"Magnetic transition behavior in epitaxial Fe47Rh47Pd6 films","authors":"H. Sato, N. Pachauri, S. Keshavarz, Chhatra R. Joshi, Hwachol Lee, G. Mankey, P. Leclair","doi":"10.1116/6.0001573","DOIUrl":"https://doi.org/10.1116/6.0001573","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"61 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76955831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors 透明氧化物半导体ASnO3 (A = Ba, Sr，和Ca)外延薄膜和薄膜晶体管的光电性能
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001474
A. Sanchela, M. Wei, H. Cho, H. Ohta
{"title":"Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors","authors":"A. Sanchela, M. Wei, H. Cho, H. Ohta","doi":"10.1116/6.0001474","DOIUrl":"https://doi.org/10.1116/6.0001474","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"38 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79251259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Preparation of Nd1.85Ce0.15CuO4 superconducting thin film by pulsed laser deposition 脉冲激光沉积制备Nd1.85Ce0.15CuO4超导薄膜
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001540
Jiqiang Jia, Chen Liu, Mengjiao Guo, L. Lei
{"title":"Preparation of Nd1.85Ce0.15CuO4 superconducting thin film by pulsed laser deposition","authors":"Jiqiang Jia, Chen Liu, Mengjiao Guo, L. Lei","doi":"10.1116/6.0001540","DOIUrl":"https://doi.org/10.1116/6.0001540","url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"115 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81234976","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces 重构变化驱动表面扩散，决定氧化表面的平整度
IF 2.9 3区 材料科学
Journal of Vacuum Science & Technology A Pub Date : 2022-03-01 DOI: 10.1116/6.0001704
Giada Franceschi, M. Schmid, U. Diebold, M. Riva
{"title":"Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces","authors":"Giada Franceschi, M. Schmid, U. Diebold, M. Riva","doi":"10.1116/6.0001704","DOIUrl":"https://doi.org/10.1116/6.0001704","url":null,"abstract":"Surface diffusion on metal oxides is key in many areas of materials technology, yet it has been scarcely explored at the atomic scale. This work provides phenomenological insights from scanning tunneling microscopy on the link between surface diffusion, surface atomic structure, and oxygen chemical potential based on three model oxide surfaces: Fe2O3[Formula: see text], La1− xSr xMnO3(110), and In2O3(111). In all instances, changing the oxygen chemical potential used for annealing stabilizes reconstructions of different compositions while promoting the flattening of the surface morphology—a sign of enhanced surface diffusion. It is argued that thermodynamics, rather than kinetics, rules surface diffusion under these conditions: the composition change of the surface reconstructions formed at differently oxidizing conditions drives mass transport across the surface.","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"15 1","pages":""},"PeriodicalIF":2.9,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80909835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
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