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2013 International Conference on Indium Phosphide and Related Materials (IPRM)最新文献

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Monolithically integrated optical link using photonic crystal laser and photodetector 使用光子晶体激光器和光电探测器的单片集成光链路
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-07-18 DOI: 10.1109/ICIPRM.2013.6562618
S. Matsuo
{"title":"Monolithically integrated optical link using photonic crystal laser and photodetector","authors":"S. Matsuo","doi":"10.1109/ICIPRM.2013.6562618","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562618","url":null,"abstract":"We have demonstrated monolithic integration of photonic crystal (PhC) laser and photodetector. By employing an embedded active region structure, PhC laser exhibits ultra-low threshold current. Integrated optical link exhibits ultra-low operating energy of 28.5 fJ/bit.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"161 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126816392","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High transconductance surface channel In0.53Ga0.47As MOSFETs using MBE source-drain regrowth and surface digital etching 高跨导表面通道In0.53Ga0.47As mosfet的MBE源极漏极再生和表面数字蚀刻
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562630
Sanghoon Lee, Cheng-Ying Huang, A. Carter, J. Law, D. Elias, V. Chobpattana, B. Thibeault, W. Mitchell, S. Stemmer, A. Gossard, M. Rodwell
{"title":"High transconductance surface channel In0.53Ga0.47As MOSFETs using MBE source-drain regrowth and surface digital etching","authors":"Sanghoon Lee, Cheng-Ying Huang, A. Carter, J. Law, D. Elias, V. Chobpattana, B. Thibeault, W. Mitchell, S. Stemmer, A. Gossard, M. Rodwell","doi":"10.1109/ICIPRM.2013.6562630","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562630","url":null,"abstract":"We demonstrate In<sub>0.53</sub>Ga<sub>0.47</sub>As surface channel MOSFETs using a gate-last process and MBE source/drain (S/D) regrowth. The structure uses a sacrificial N+ InGaAs channel cap layer between the regrown S/D contact layer and the channel, which is removed in the channel region by a “digital” etch process incorporating UV ozone oxidation and surface stripping in dilute HCl. A device with 65 nm-L<sub>g</sub> and 1.2 nm EOT shows 1.6 mS/μm peak transconductance at V<sub>ds</sub> = 0.5 V and 120 mV/dec SS at V<sub>ds</sub> = 0.05 V, while 535 nm-L<sub>g</sub> devices show 95 mV/dec SS at at V<sub>ds</sub> = 0.1 V.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"133 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116037694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
120nm AlSb/InAs HEMT without gate recess: 290GHz fT and 335GHz fmax 120nm无栅极凹槽的AlSb/InAs HEMT: 290GHz fT和335GHz fmax
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562604
C. Gardès, S. Bagumako, L. Desplanque, N. Wichmann, S. Bollaert, F. Danneville, X. Wallart, Y. Roelens
{"title":"120nm AlSb/InAs HEMT without gate recess: 290GHz fT and 335GHz fmax","authors":"C. Gardès, S. Bagumako, L. Desplanque, N. Wichmann, S. Bollaert, F. Danneville, X. Wallart, Y. Roelens","doi":"10.1109/ICIPRM.2013.6562604","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562604","url":null,"abstract":"In this paper, we report on high frequency performances of AlSb/InAs high electron mobility transistor (HEMT) with 120nm gate length at room temperature. The excellent combined cut-off frequencies fT/fmax of 290/335 GHz simultaneously obtained at drain bias of 0.36V is another demonstration of the ability of AlSb/InAs HEMT for high frequency operation with low-power consumption. Small-signal equivalent circuit parameters have been extracted.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122439694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Advances in III–V semiconductor photonics: Nanostructures and integrated chips 半导体光子学进展:纳米结构和集成芯片
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562561
O. Wada
{"title":"Advances in III–V semiconductor photonics: Nanostructures and integrated chips","authors":"O. Wada","doi":"10.1109/ICIPRM.2013.6562561","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562561","url":null,"abstract":"This paper reviews the progress of III-V semiconductor technology for the application to photonic telecommunications and signal processing systems by focusing nanostructure materials and devices as well as monolithic/hybrid integration technologies for improving performance and functions. Also the role of combined use of nanostructure devices and integration technology is discussed for the development of future energy efficient photonic systems.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122125888","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Suppression of multi-photon emission in 1.5-µm quantum-dot single-photon source 1.5µm量子点单光子源中多光子发射的抑制
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562564
T. Miyazawa, K. Takemoto, Y. Sakuma, Hai-Xi Song, M. Takatsu, Tsuyoshi Yamamoto, Y. Arakawa
{"title":"Suppression of multi-photon emission in 1.5-µm quantum-dot single-photon source","authors":"T. Miyazawa, K. Takemoto, Y. Sakuma, Hai-Xi Song, M. Takatsu, Tsuyoshi Yamamoto, Y. Arakawa","doi":"10.1109/ICIPRM.2013.6562564","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562564","url":null,"abstract":"Photon-correlation function g<sup>(2)</sup>(τ) of a single `doublecapped' InAs/InP quantum dot (QD) was obtained with high accuracy using a superconducting single-photon detector (SSPD). By using resonant excitation to the e<sub>1</sub>h<sub>0</sub> state in the single InAs/InP QD, g<sup>(2)</sup>(0) was decreased to the detection limit. Rabi oscillation of the PL intensity of e<sub>0</sub>h<sub>0</sub> state is also observed under the resonant excitation into the e<sub>1</sub>h<sub>0</sub> state. These results suggest that the coherent exciton generation into e<sub>1</sub>h<sub>0</sub> state is effective to improve the purity of the single-photon emission.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"130 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124244699","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
MOCVD growth and device characterization of InP/GaAsSb/InP DHBTs with a GaAs spacer 带有GaAs间隔层的InP/GaAsSb/InP dhbt的MOCVD生长和器件表征
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562610
T. Hoshi, H. Sugiyama, H. Yokoyama, N. Kashio, K. Kurishima, M. Ida, H. Matsuzaki
{"title":"MOCVD growth and device characterization of InP/GaAsSb/InP DHBTs with a GaAs spacer","authors":"T. Hoshi, H. Sugiyama, H. Yokoyama, N. Kashio, K. Kurishima, M. Ida, H. Matsuzaki","doi":"10.1109/ICIPRM.2013.6562610","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562610","url":null,"abstract":"This paper describes the impact of a GaAs spacer inserted between the InP emitter and GaAsSb base of InP/GaAsSb/InP double-heterojunction bipolar transistors (DHBTs) grown by metalorganic chemical vapor deposition. The GaAs spacer suppresses the incorporation of excess Sb atoms from the GaAsSb base into the InP emitter, which reduces the recombination current at the junction. The fabricated DHBTs with a 0.5-μm-wide emitter show dc current gain of over 90 at current density (J<sub>C</sub>) of 10 mA/μm<sup>2</sup>. The 0.25-μm-emitter DHBTs yield current-gain cut-off frequency (f<sub>t</sub>) of 384 GHz and maximum oscillation frequency (f<sub>max</sub>) of 264 GHz at JC of 14 mA/μm<sup>2</sup>.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"105 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114843932","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High performacne InAs/AlSb HEMT with refractory iridium Schottky gate metal 含难熔铱肖特基栅金属的高性能InAs/AlSb HEMT
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562601
Wen-Yu Lin, Chao-Hung Chen, H. Chiu, F. Huang, W. Hsueh, Y. Hsin, J. Chyi
{"title":"High performacne InAs/AlSb HEMT with refractory iridium Schottky gate metal","authors":"Wen-Yu Lin, Chao-Hung Chen, H. Chiu, F. Huang, W. Hsueh, Y. Hsin, J. Chyi","doi":"10.1109/ICIPRM.2013.6562601","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562601","url":null,"abstract":"In the work, a novel approach in fabricating high-performance of InAs/AlSb high electron mobility transistors using iridium (Ir) gate technology was proposed and investigated. The Ir-gate exhibited a superior metal work function which was beneficial for increasing Schottky barrier height (ØB) of InAs/AlSb heterostructure from 0.54 to 0.58 eV. The Ir-gate InAs/AlSb HEMT exhibited a Vth of -0.9 V, a maximum drain current of 270 mA/mm, and a peak transconductance of 420 mS/mm. In contrast, the Vth of Ti-gate InAs/AlSb HEMT was - 1.5 V, a maximum drain current of 257mA/mm, and a peak transconductance of 280mS /mm, respectively. It was suggested that Ir interface presented a high potential for high power transistor applications.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129384107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Butt-joint built-in (BJB) structure for membrane photonic integration 薄膜光子集成的对接内置(BJB)结构
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562623
D. Inoue, Jieun Lee, T. Shindo, M. Futami, K. Doi, T. Amemiya, N. Nishiyama, S. Arai
{"title":"Butt-joint built-in (BJB) structure for membrane photonic integration","authors":"D. Inoue, Jieun Lee, T. Shindo, M. Futami, K. Doi, T. Amemiya, N. Nishiyama, S. Arai","doi":"10.1109/ICIPRM.2013.6562623","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562623","url":null,"abstract":"On-chip optical interconnections have potential for replace global copper wires on LSI chips. I n this work, as an integration method, an OMVPE butt-joint regrowth of 175-nm thick GaInAsP/InP was conducted toward an integration of active and passive components. In the numerical calculation, a coupling efficiency and residual reflection of designed butt-joint coupling were estimated to be 98% and -40 dB, respectively. In the experimental method, we investigated the dependence of butt-joint interface morphology and regrown surface flatness on the side etch depth and the mesa angle. As a result, a flat regrown surface without degradation in crystalline quality was obtained.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132909041","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Bandgap wavelength shift in quantum well intermixing using different SiO2 masks for photonic integration 利用不同SiO2掩模进行光子集成的量子阱混合中的带隙波长位移
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562591
Jieun Lee, Y. Yamahara, M. Futami, T. Shindo, T. Amemiya, N. Nishiyama, S. Arai
{"title":"Bandgap wavelength shift in quantum well intermixing using different SiO2 masks for photonic integration","authors":"Jieun Lee, Y. Yamahara, M. Futami, T. Shindo, T. Amemiya, N. Nishiyama, S. Arai","doi":"10.1109/ICIPRM.2013.6562591","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562591","url":null,"abstract":"As a photonic integration method of semiconductor membrane structure, quantum-well-intermixing (QWI) process using O<sub>2</sub>-sputtered SiO<sub>2</sub> mask was investigated by comparing the photoluminescence peak wavelength shift between two sections with/without the SiO<sub>2</sub> mask. As the result, a large bandgap wavelength difference of 80 nm (47 meV) was obtained while quite large transient region (90 μm) was observed. Since this fact was considered to be attributed to the temperature gradient along the masked and window regions during the rapid thermal annealing (RTA) process, we deposited CVD SiO<sub>2</sub> (which has smaller vacancies than O<sub>2</sub>-sputtered SiO<sub>2</sub> hence the bandgap wavelength shift is smaller) on the entire surface after forming O<sub>2</sub>-sputtered SiO<sub>2</sub> mask pattern and successfully reduced the transient region length to less than 5 μm.","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115359047","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
35 nm mHEMT Technology for THz and ultra low noise applications 35nm mHEMT技术，适用于太赫兹和超低噪声应用
2013 International Conference on Indium Phosphide and Related Materials (IPRM) Pub Date : 2013-05-19 DOI: 10.1109/ICIPRM.2013.6562647
A. Leuther, A. Tessmann, M. Dammann, H. Massler, M. Schlechtweg, O. Ambacher
{"title":"35 nm mHEMT Technology for THz and ultra low noise applications","authors":"A. Leuther, A. Tessmann, M. Dammann, H. Massler, M. Schlechtweg, O. Ambacher","doi":"10.1109/ICIPRM.2013.6562647","DOIUrl":"https://doi.org/10.1109/ICIPRM.2013.6562647","url":null,"abstract":"In this paper we present a very compact 0.28 × 0.55 mm2 six-stage terahertz monolithic integrated circuit (TMIC) using 35 nm gate length metamorphic high electron mobility transistors (mHEMTs). A linear gain of 20.3 dB at 610 GHz and more than 18 dB over the bandwidth from 557 to 616 GHz was achieved for a drain voltage Vd of only 0.6 V. The noise performance of the 35 nm mHEMT was investigated on the basis of a packaged H-band amplifier which achieved a small-signal gain of more than 20 dB between 220 and 300 GHz. The averaged measured noise figure was 6.1 dB which is to our knowledge the lowest published value of any MMIC technology in this frequency range. To determine the transistor reliability accelerated lifetime tests in air were done. Based on a 20 % gm_max degradation failure criterion a median time to failure of 1.8 × 105 h at a channel temperature of 75°C and VDS = 0.8 V was extrapolated","PeriodicalId":120297,"journal":{"name":"2013 International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124433559","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 57
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