Advanced Electronic Materials最新文献

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Side-Chain Branching Dictates the σ–S Coupling in Conjugated Polymer Thermoelectrics 侧链分支决定了共轭聚合物热电体中的σ-S耦合
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-28 DOI: 10.1002/aelm.202500888
Yingyao Zhang, So-Huei Kang, Po Chen, Huadeng Xie, Qinfang Zhang, Seoyoung Kim, Donghoo Won, Zilong Zhang, Chi Li, Liang Liu, Qi Zhu, Feiyan Wu, Lie Chen, Reza Keshavarzia, Changduk Yang, Peng Gao
{"title":"Side-Chain Branching Dictates the σ–S Coupling in Conjugated Polymer Thermoelectrics","authors":"Yingyao Zhang, So-Huei Kang, Po Chen, Huadeng Xie, Qinfang Zhang, Seoyoung Kim, Donghoo Won, Zilong Zhang, Chi Li, Liang Liu, Qi Zhu, Feiyan Wu, Lie Chen, Reza Keshavarzia, Changduk Yang, Peng Gao","doi":"10.1002/aelm.202500888","DOIUrl":"https://doi.org/10.1002/aelm.202500888","url":null,"abstract":"Understanding the intrinsic coupling between electrical conductivity (σ) and the Seebeck coefficient (S) remains a central challenge in organic thermoelectrics, where energetic disorder and charge transport are highly sensitive to molecular design. Here, we show that precise control over the <i>side-chain branching position</i> provides an effective structural lever to tune the σ–S relationship in conjugated polymers. Two DPP–selenophene copolymers with identical backbones but branched at distinct positions exhibit markedly different molecular packing, charge-carrier delocalization, and density-of-states (DOS) widths. Polymers with more distant branching points form tighter π–π stacks, yielding enhanced carrier mobility and a narrower DOS that collectively boost σ to 129.3 S cm<sup>−</sup><sup>1</sup>. In contrast, closer branching induces greater energetic disorder and broader DOS distributions, resulting in a substantially higher S of 160 µV K<sup>−</sup><sup>1</sup>. Despite their contrasting transport characteristics, both polymers deliver similar peak power factors owing to complementary changes in σ and S. These results identify side-chain branching as a previously underappreciated design parameter that mechanistically governs the coupling between conductivity and Seebeck coefficient in organic thermoelectric materials.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"29 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147753473","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ion-Gating Reservoir Computing for Preprocessing-Free Speech Recognition from Throat Vibrations 基于喉部振动的无预处理语音识别的离子门控库计算
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-26 DOI: 10.1002/aelm.202600006
Daiki Nishioka, Akito Tateyama, Hina Kitano, Takashi Nakanishi, Kazuya Terabe, Takashi Tsuchiya
{"title":"Ion-Gating Reservoir Computing for Preprocessing-Free Speech Recognition from Throat Vibrations","authors":"Daiki Nishioka, Akito Tateyama, Hina Kitano, Takashi Nakanishi, Kazuya Terabe, Takashi Tsuchiya","doi":"10.1002/aelm.202600006","DOIUrl":"https://doi.org/10.1002/aelm.202600006","url":null,"abstract":"Physical reservoir computing offers a promising route to efficient edge-AI, yet most reservoir-based speech-recognition demonstrations still rely on microphones and digital preprocessing. Here, we report a real-time spoken-digit recognition system that directly processes throat vibrations by integrating a π–gel-electret mechano-electric generator (MEG) sensor with a multi-channel ion-gel/graphene ion-gating reservoir (IGR). The MEG, a free-deformable electret-based vibration sensor, converts articulation-induced throat-surface vibrations into voltage signals, which are then transformed into pulse sequences and applied directly to the IGR gate without any spectral or handcrafted feature extraction. Channel-dependent Dirac-point shifts, nonlinear electric-double-layer dynamics, and distinct relaxation behaviors in the IGR expand the one-dimensional MEG output into high-dimensional reservoir states, which are decoded using a simple linear classifier. This hybrid MEG–IGR system achieves an impressive real-time spoken-digit recognition accuracy of 96.8%, demonstrating that ion-gating reservoirs can efficiently extract discriminative spatiotemporal features from raw biomechanical signals. By eliminating frequency-domain preprocessing and enabling compact, low-power front-end computation, the approach provides a viable pathway for on-device speech interfaces. Beyond speech recognition, direct throat-vibration sensing opens opportunities for robust human–machine interfaces, assistive communication technologies, and secure authentication systems based on spoof-resistant biomechanical signatures.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"1 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147751662","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Oxygen Vacancies Driven Photoconductivity in Layered Cobaltite Epitaxial Films 层状钴酸盐外延薄膜中氧空位驱动的光电导率
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-24 DOI: 10.1002/aelm.202500566
Yanbin Chen, Yiqun Liu, Xing Xu, Jing Ma, Ce-wen Nan, Chonglin Chen
{"title":"Oxygen Vacancies Driven Photoconductivity in Layered Cobaltite Epitaxial Films","authors":"Yanbin Chen, Yiqun Liu, Xing Xu, Jing Ma, Ce-wen Nan, Chonglin Chen","doi":"10.1002/aelm.202500566","DOIUrl":"https://doi.org/10.1002/aelm.202500566","url":null,"abstract":"Understanding photoinduced phenomena in complex oxides is crucial for developing next-generation optoelectronic devices. Here, we report pronounced ultraviolet (UV) light-induced photoconductivity in epitaxial PrBa<sub>1-x</sub>Ca<sub>x</sub>Co<sub>2</sub>O<sub>5+δ</sub> (x = 0.5) thin films grown on (001) LSAT substrates via pulsed laser deposition. Following controlled post-annealing to induce oxygen deficiency, the oxygen-deficient films exhibit a 1.35-fold enhancement in photoresponse compared to oxygen-rich counterparts under 365 nm illumination with a power density of 60 mW cm<sup>−2</sup>. This enhanced photoresponse originates from increased carrier density due to the trapping of photoexcited electrons at oxygen vacancies, and the photoresponse behavior is highly tunable by both pulse width and light density. Notably, the oxygen-deficient films demonstrate paired-pulse facilitation (PPF) behavior under 1 s excitation pulse, and the photoresponse remains almost constant even when the readout voltage is reduced by two orders of magnitude down to 1 mV. These findings highlight the potential of cobaltite oxides as promising platforms for low-power, light-tunable oxide electronics and UV photonic sensors.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"19 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147735830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Extrinsic and Intrinsic Charge Transfer at Interfaces of Membrane-Based Oxide Heterostructures 膜基氧化物异质结构界面上的外在和内在电荷转移
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-24 DOI: 10.1002/aelm.202500890
Kapil Nayak, Marcus A. Wohlgemuth, Anton Kaus, Lisa Heymann, Alexandros Sarantopoulos, Lee-Kang Huang, Christoph Baeumer, Regina Dittmann, Felix Gunkel
{"title":"Extrinsic and Intrinsic Charge Transfer at Interfaces of Membrane-Based Oxide Heterostructures","authors":"Kapil Nayak, Marcus A. Wohlgemuth, Anton Kaus, Lisa Heymann, Alexandros Sarantopoulos, Lee-Kang Huang, Christoph Baeumer, Regina Dittmann, Felix Gunkel","doi":"10.1002/aelm.202500890","DOIUrl":"https://doi.org/10.1002/aelm.202500890","url":null,"abstract":"Engineering complex oxide heterostructures and their interfaces has revealed a plethora of emergent electronic and magnetic properties. To achieve these functionalities beyond conventional epitaxy, building heterogeneous integrated electronic architectures have been possible from the advances in free-standing oxides and their integration with semiconductors. However, to harness the physical phenomena of oxides in such co-integrated environments, it is necessary to achieve atomically defined membrane-based oxide heterostructures and subsequent control of charge-transfer. Here, we report on the direct growth-control of the surface termination of SrTiO<sub>3</sub> membranes, eliminating any B-HF requirements, and subsequent transfer of TiO<sub>2</sub>-terminated SrTiO<sub>3</sub> membranes onto silicon (Si) via a sacrificial layer route. This approach yields atomically defined step-terraced membrane-based substrates on silicon support. By systematic growth control of LaAlO<sub>3</sub> on these templates, we demonstrate distinct signatures of oxygen-vacancy-induced (ionic) and intrinsic (electronic) charge transfer mechanisms. A systematic crossover between these processes is observed, based on near-ambient pressure XPS, probing reversible and irreversible contributions of interfacial charge transfer during redox-cycling. These results indicates that TiO<sub>2</sub>-termination in the oxide membrane may have been achieved, which is a prerequisite for tailoring and fine-tuning membrane-based oxide heterointerfaces for electronic and ionic phenomena in confined systems beyond conventional epitaxy.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"4 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147739594","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimizing Metal-Perovskite Interfaces: Electronic and Transport Properties of Au-Bromide Perovskites Contacts 优化金属-钙钛矿界面:au -溴化钙钛矿接触的电子和输运性质
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-23 DOI: 10.1002/aelm.202500269
Xinbiao Wang, Qi Zhang, Jing Li, Ji-Sang Park, Yiming Yang, Letian Dou, Euyheon Hwang
{"title":"Optimizing Metal-Perovskite Interfaces: Electronic and Transport Properties of Au-Bromide Perovskites Contacts","authors":"Xinbiao Wang, Qi Zhang, Jing Li, Ji-Sang Park, Yiming Yang, Letian Dou, Euyheon Hwang","doi":"10.1002/aelm.202500269","DOIUrl":"https://doi.org/10.1002/aelm.202500269","url":null,"abstract":"Minimizing contact resistance between metal electrodes and perovskites remains a critical challenge in developing perovskite-based electronic and optoelectronic devices. Despite extensive experimental and theoretical efforts to minimize the contact resistance, atomic-level insights into metal-perovskite interfaces remain insufficiently understood. In this paper, we investigate the electronic and transport properties of 2D hybrid organic–inorganic perovskites, specifically (BA)<sub>2</sub>PbBr<sub>4</sub> and (PEA)<sub>2</sub>PbBr<sub>4</sub>, which consist of monolayer bromide perovskite layers with different organic spacer molecules: n-butylammonium (BA) and phenylethylammonium (PEA) cations. We provide a comprehensive analysis of the Au/perovskites interface, considering two contact configurations, i.e., top-contact and edge-contact. We perform first-principles calculations and use the nonequilibrium Green's function formalism to calculate the transport characteristics. We find that a Schottky barrier forms in the top-contact configuration, but the edge-contact configuration shows ohmic behavior for both Au/(BA)<sub>2</sub>PbBr<sub>4</sub> and Au/(PEA)<sub>2</sub>PbBr<sub>4</sub>. The edge-contact configuration also enables highly efficient charge injection with a negligible interfacial tunneling barrier due to Au-induced midgap states. For the top contact configuration, Au/(PEA)<sub>2</sub>PbBr<sub>4</sub> shows better transport behavior compared to (BA)<sub>2</sub>PbBr<sub>4</sub>, which is attributed to its lower tunneling barrier and higher density of metal-induced midgap states. This work provides theoretical guidelines for designing low-resistance metal-2D hybrid perovskite contacts.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"2 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147735831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Exploiting Temperature Effects for Robust Control and Reference Circuits Using Thin-Film Contact-Controlled Transistors 利用薄膜接触控制晶体管的鲁棒控制和参考电路的温度效应
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-23 DOI: 10.1002/aelm.70401
Eva Bestelink, Jean-Charles Fustec, Olivier de Sagazan, Rogier Fransen, George Bairaktatis, Emmanuel Jacques, Radu A. Sporea
{"title":"Exploiting Temperature Effects for Robust Control and Reference Circuits Using Thin-Film Contact-Controlled Transistors","authors":"Eva Bestelink, Jean-Charles Fustec, Olivier de Sagazan, Rogier Fransen, George Bairaktatis, Emmanuel Jacques, Radu A. Sporea","doi":"10.1002/aelm.70401","DOIUrl":"https://doi.org/10.1002/aelm.70401","url":null,"abstract":"The ability to sense and control temperature reliably in low-cost, flexible systems is a key enabler for advances in health monitoring, energy storage, and bioengineering. Here, we show that contact-controlled thin-film transistors, including source-gated and multimodal devices, provide a powerful platform for circuit design. By exploiting the intrinsic sensitivity of charge injection at the source contact, we realize compact circuits that function either as highly sensitive temperature sensors or as temperature-stabilized current references. These behaviors are achieved through simple changes in device geometry and topology, demonstrated experimentally on flexible microcrystalline silicon and supported by simulations. The circuits operate directly from common battery supplies without regulators, offering a manufacturable solution, compatible with a wide range of electronic materials and processes. A compact mathematical framework and a demonstrative application highlight the generality of this approach. This work establishes contact-controlled transistors as versatile building blocks for robust, adaptive circuits in distributed electronics, with implications from wearable health technologies to chemical battery management and lab-on-a-chip platforms.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"33 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147739595","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multifunctional TiO2-Graphene Hybrid Interfaces for Printable High-Energy-Density Polymer Thin Film Capacitor 用于可打印高能量密度聚合物薄膜电容器的多功能tio2 -石墨烯混合界面
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-23 DOI: 10.1002/aelm.202500854
Yujia Fan, Yujia Li, Ruixiang Li, Shaoliang Guan, Mengyan Nie, Shahab Akhavan, Buddha Deka Boruah, Mingqing Wang
{"title":"Multifunctional TiO2-Graphene Hybrid Interfaces for Printable High-Energy-Density Polymer Thin Film Capacitor","authors":"Yujia Fan, Yujia Li, Ruixiang Li, Shaoliang Guan, Mengyan Nie, Shahab Akhavan, Buddha Deka Boruah, Mingqing Wang","doi":"10.1002/aelm.202500854","DOIUrl":"https://doi.org/10.1002/aelm.202500854","url":null,"abstract":"The rapid advancement of flexible and wearable electronics demands printable thin-film capacitors that combine high dielectric performance with scalable fabrication. However, achieving this balance in polymer dielectrics remains challenging, as enhancements in dielectric constant typically come at the expense of increased loss and reduced breakdown strength. Here, we report an interface-engineered TiO<sub>2</sub>-decorated reduced graphene oxide (rGO-TiO<sub>2</sub>) hybrid filler for high-performance poly(vinylidene fluoride) (PVDF) dielectric nanocomposites. In this architecture, TiO<sub>2</sub> nanoparticles serve as insulating barriers that prevent rGO restacking while also providing heterogeneous nucleation sites that promote crystallization. The optimized composite achieves a high dielectric constant of ∼2,620 at 1 kHz, a low loss tangent of 0.027, and a robust breakdown strength of 370 kV mm<sup>−</sup><sup>1</sup> at only 0.8 wt.% filler loading. Structural and thermal analyses reveal that the hybrid filler promotes electroactive β-phase formation, contributing to the enhanced dielectric response. Leveraging its good printability and dispersion stability, the nanocomposite is formulated as a dielectric ink for Sonoplotter-printed micro-capacitors, delivering a volumetric capacitance of 583.7 mF cm<sup>−</sup><sup>3</sup> and an energy density of 1.82 J cm<sup>−</sup><sup>3</sup> at 16.67 kV mm<sup>−</sup><sup>1</sup>, demonstrating proof-of-concept device feasibility. This hybrid interface-engineering strategy offers a promising route toward printable, high-performance polymer dielectrics for integrated flexible electronics.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"22 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147735832","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CsPbBr3–Nanodiamonds Hybrid Wafers for Mechanically Robust, High-Performance X-Ray Detection 用于机械坚固、高性能x射线探测的cspbbr3 -纳米金刚石杂化晶圆
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-23 DOI: 10.1002/aelm.70406
Yanan Gong, Zhuangjie Xu, Weidong Zhu, Xiaoxuan Zhang, Zihao Wang, Zeyang Ren, Yanshuang Ba, He Xi, Zhimin Li, Chunfu Zhang, Jincheng Zhang, Yue Hao
{"title":"CsPbBr3–Nanodiamonds Hybrid Wafers for Mechanically Robust, High-Performance X-Ray Detection","authors":"Yanan Gong, Zhuangjie Xu, Weidong Zhu, Xiaoxuan Zhang, Zihao Wang, Zeyang Ren, Yanshuang Ba, He Xi, Zhimin Li, Chunfu Zhang, Jincheng Zhang, Yue Hao","doi":"10.1002/aelm.70406","DOIUrl":"https://doi.org/10.1002/aelm.70406","url":null,"abstract":"CsPbBr<sub>3</sub>–nanodiamonds (NDs) hybrid wafers are developed through a scalable solid-state grinding and cold‑pressing approach for high‑performance X‑ray detection. Incorporation of trace NDs modulates the mechanochemical reaction environment, accelerates CsPbBr<sub>3</sub> formation, and suppresses CsPb<sub>2</sub>Br<sub>5</sub> impurities. Structural, chemical, and optical analyses reveal that NDs promote heterogeneous nucleation, enhance crystallinity, bridge grain boundaries, and passivate interfacial defects via coordination between ND surface groups and undercoordinated Pb<sup>2</sup><sup>+</sup>. The optimized hybrid wafer (CsPbBr<sub>3</sub>:NDs = 10:0.5) exhibits improved packing density, reduced reflectivity, enhanced charge transport, and significantly lower dark current. Consequently, the device achieves high sensitivity (2796.68 µC Gy<sub>air</sub><sup>−1</sup> cm<sup>−2</sup>), stable switching behavior, and an improved detection limit of 11.33 µGy s<sup>−1</sup>. Thermal imaging measurements further confirm that NDs enhance heat dissipation, contributing to stable operation under continuous X‑ray exposure. This work demonstrates a robust design strategy for perovskite–diamond hybrid wafers and provides a practical route toward durable, low‑cost, and high‑sensitivity solid‑state X‑ray detectors.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"31 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147735833","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Lateral Profile of Doping Concentration Extracted From the C‐V Characteristics in Self‐Aligned Top‐Gate Coplanar InGaZnO Thin‐Film Transistors 从自对准顶栅共面InGaZnO薄膜晶体管的C - V特性提取掺杂浓度的横向分布
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-22 DOI: 10.1002/aelm.202500841
Seung Joo Myoung, Chang Il Ryoo, Jingyu Park, Dong Hyeop Shin, Su Han Noh, Sae Him Jung, Soohong Eo, Wonjung Kim, Sung Jun Yun, Jae Moon Soh, Yoo Seok Park, Changwook Kim, Dong Myong Kim, Sung‐Jin Choi, Yoon Jung Lee, Ickhyun Song, Dae Hwan Kim
{"title":"Lateral Profile of Doping Concentration Extracted From the C‐V Characteristics in Self‐Aligned Top‐Gate Coplanar InGaZnO Thin‐Film Transistors","authors":"Seung Joo Myoung, Chang Il Ryoo, Jingyu Park, Dong Hyeop Shin, Su Han Noh, Sae Him Jung, Soohong Eo, Wonjung Kim, Sung Jun Yun, Jae Moon Soh, Yoo Seok Park, Changwook Kim, Dong Myong Kim, Sung‐Jin Choi, Yoon Jung Lee, Ickhyun Song, Dae Hwan Kim","doi":"10.1002/aelm.202500841","DOIUrl":"https://doi.org/10.1002/aelm.202500841","url":null,"abstract":"Self‐aligned top‐gate (SATG) amorphous InGaZnO (a‐IGZO) thin‐film transistors (TFTs) are strong candidates for low‐power display backplanes and back‐end‐of‐line (BEOL)‐integrated circuits. Their scaling, however, is limited by short‐channel effects (SCEs), such as threshold‐voltage (V <jats:sub>T</jats:sub> ) roll‐off and drain‐induced barrier lowering (DIBL), which are strongly influenced by the lateral effective doping profile, N <jats:sub>D</jats:sub> (y), formed by oxygen‐vacancy/hydrogen‐related donor diffusion from the source/drain (S/D) extensions. Conventional transfer length method (TLM) approaches provide only indirect, lumped estimates and often lose accuracy in low‐doping regions. Here, we propose a capacitance–voltage (C–V)‐based extraction technique that directly reconstructs N <jats:sub>D</jats:sub> (y) and key profile parameters—including overlap length (L <jats:sub>OV</jats:sub> ), gradient length (L <jats:sub>Grad</jats:sub> ), and base doping concentration (N <jats:sub>D,Base</jats:sub> )—from measured gate capacitances (C <jats:sub>GG</jats:sub> /C <jats:sub>GS</jats:sub> /C <jats:sub>GD</jats:sub> ). Using L‐split SATG a‐IGZO TFTs with channel lengths ranging from 4.5 to 40 µm, we validate the extracted profiles by directly comparing them with those obtained from a TLM‐based extraction and demonstrate the quantitative prediction of V <jats:sub>T</jats:sub> (V <jats:sub>ON</jats:sub> ) roll‐off across different channel lengths. The results reveal that S/D dopant overlap increases the channel‐center doping N <jats:sub>D,ch</jats:sub> in short channels, thereby accelerating V <jats:sub>T</jats:sub> roll‐off and enhancing DIBL. This C–V‐based lateral profiling framework provides practical diagnostics and design guidelines for suppressing SCEs in future low‐power, high‐reliability oxide electronics.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"6 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147733523","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Materials Design Principles for Large Memory Windows: Coercive Voltage Engineering in Ferroelectric– Dielectric Heterostructures (Adv. Electron. Mater. 8/2026) 大记忆窗材料设计原则:铁电-介电异质结构的矫顽性电压工程。板牙。8/2026)
IF 6.2 2区 材料科学
Advanced Electronic Materials Pub Date : 2026-04-22 DOI: 10.1002/aelm.70365
Prasanna Venkatesan, Hari Jayasankar, Salma Soliman, Priyankka Ravikumar, Lance Fernandes, Chinsung Park, Amrit Garlapati, Chengyang Zhang, Sanghyun Kang, Shimeng Yu, Suman Datta, Asif Khan, Mengkun Tian, Zheng Wang, Kijoon Kim, Kwangyou Seo, Kwangsoo Kim, Wanki Kim, Daewon Ha, Luca Larcher, Gaurav Thareja, Andrea Padovani
{"title":"Materials Design Principles for Large Memory Windows: Coercive Voltage Engineering in Ferroelectric– Dielectric Heterostructures (Adv. Electron. Mater. 8/2026)","authors":"Prasanna Venkatesan, Hari Jayasankar, Salma Soliman, Priyankka Ravikumar, Lance Fernandes, Chinsung Park, Amrit Garlapati, Chengyang Zhang, Sanghyun Kang, Shimeng Yu, Suman Datta, Asif Khan, Mengkun Tian, Zheng Wang, Kijoon Kim, Kwangyou Seo, Kwangsoo Kim, Wanki Kim, Daewon Ha, Luca Larcher, Gaurav Thareja, Andrea Padovani","doi":"10.1002/aelm.70365","DOIUrl":"https://doi.org/10.1002/aelm.70365","url":null,"abstract":"","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"246 1","pages":""},"PeriodicalIF":6.2,"publicationDate":"2026-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147733477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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