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Chemical Vapor Deposition最新文献

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Uniform Coating of Microparticles using CVD Polymerization† 用CVD聚合法制备微粒均匀涂层
Chemical Vapor Deposition Pub Date : 2015-11-23 DOI: 10.1002/cvde.201507197
Yu Liang, Jacob H. Jordahl, Hao Ding, Xiaopei Deng, Joerg Lahann
{"title":"Uniform Coating of Microparticles using CVD Polymerization†","authors":"Yu Liang,&nbsp;Jacob H. Jordahl,&nbsp;Hao Ding,&nbsp;Xiaopei Deng,&nbsp;Joerg Lahann","doi":"10.1002/cvde.201507197","DOIUrl":"10.1002/cvde.201507197","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>A modified fluidized bed reactor is developed to homogenously coat micrometer-sized particles with reactive polymer films using CVD. This technique is found to be rapid (∼30 min per batch) and scalable (up to 1 g particles), and can create homogenous coatings on microparticles down to 10 μm in diameter. By tuning critical variables, such as working pressure and the carrier gas flow rate, full coverage of a reactive polymer film can be realized. Janus particles are synthesized and can be visualized via fluorescence microscopy.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"288-293"},"PeriodicalIF":0.0,"publicationDate":"2015-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507197","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD† 液滴汽化在液体脉冲CVD设计和运行中的数值模拟
Chemical Vapor Deposition Pub Date : 2015-11-19 DOI: 10.1002/cvde.201507191
Raphaël Boichot, Susan Krumdieck
{"title":"Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD†","authors":"Raphaël Boichot,&nbsp;Susan Krumdieck","doi":"10.1002/cvde.201507191","DOIUrl":"10.1002/cvde.201507191","url":null,"abstract":"<div>\u0000 \u0000 \u0000 <section>\u0000 \u0000 <p>This article presents an approach for modeling the vaporization of droplets of solvent and precursor mixture under vacuum in the pulsed-pressure (pp) CVD process. The pulsed, direct liquid injection apparatus with ultrasonic atomizer is demonstrated as a controllable and reliable alternative to the bubbler and carrier gas system. The numerical modeling solves mass, heat, and momentum continuity equations on liquid droplets, and is intended to evaluate the relative roles of the physical chemistry properties and reactor parameters in the fast vaporization of droplets. The sensitivity analysis proposed here shows that the vaporization time into the pulsed-liquid CVD system is mainly dependent on the heating available in the flash evaporation zone, then on the thermodynamic properties of the liquid solution.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"375-384"},"PeriodicalIF":0.0,"publicationDate":"2015-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507191","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323621","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates† 用三氨基酸钇制备Y2O3薄膜的金属有机气相沉积
Chemical Vapor Deposition Pub Date : 2015-11-19 DOI: 10.1002/cvde.201507189
Sarah Karle, Van-Son Dang, Marina Prenzel, Detlef Rogalla, Hans-Werner Becker, Anjana Devi
{"title":"Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates†","authors":"Sarah Karle,&nbsp;Van-Son Dang,&nbsp;Marina Prenzel,&nbsp;Detlef Rogalla,&nbsp;Hans-Werner Becker,&nbsp;Anjana Devi","doi":"10.1002/cvde.201507189","DOIUrl":"10.1002/cvde.201507189","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Thin films of Y<sub>2</sub>O<sub>3</sub> are deposited on Si(100) and Al<sub>2</sub>O<sub>3</sub> (0001) substrates via metal-organic (MO)CVD for the first time using two closely related yttrium <i>tris</i>-amidinate compounds as precursors in the presence of oxygen in the temperature range 400–700 °C. The structural, morphological, and compositional features of the films are investigated in detail. At deposition temperatures of 500 °C and higher both the precursors yield polycrystalline Y<sub>2</sub>O<sub>3</sub> thin films in the cubic phase. The compositional analysis revealed the formation of nearly stoichiometric Y<sub>2</sub>O<sub>3</sub>. The optical band gaps are estimated using UV-Vis spectroscopy. Preliminary electrical measurements are performed in the form of a metal oxide semiconductor (MOS) structure of Al/Y<sub>2</sub>O<sub>3</sub>/p-Si/Ag. Leakage currents and dielectric constants are also determined.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"335-342"},"PeriodicalIF":0.0,"publicationDate":"2015-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507189","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323568","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Possible High Efficiency Platform for Biosensors Based on Optimum Physical Chemistry of Carbon Nanotubes† 基于碳纳米管最佳物理化学的高效生物传感器平台
Chemical Vapor Deposition Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507184
Amin Termeh Yousefi, Hirofumi Tanaka, Samira Bagheri, Nahrizul Adib Kadri, Shoichiro Ikeda, Mohamad Rusop Mahmood, Mikio Miyake
{"title":"Possible High Efficiency Platform for Biosensors Based on Optimum Physical Chemistry of Carbon Nanotubes†","authors":"Amin Termeh Yousefi,&nbsp;Hirofumi Tanaka,&nbsp;Samira Bagheri,&nbsp;Nahrizul Adib Kadri,&nbsp;Shoichiro Ikeda,&nbsp;Mohamad Rusop Mahmood,&nbsp;Mikio Miyake","doi":"10.1002/cvde.201507184","DOIUrl":"10.1002/cvde.201507184","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Carbon nanotube (CNT)-based electrochemical biosensors are used to determine the concentration of analytes by measuring mass, heat, or oxygen. CNTs, as an immobilizing platform of biomaterials, play an important role in enhancing the electron transfer mechanism of a biosensor. The large surface area and optimum aspect ratio (length to thickness) of CNTs maximize the amount of immobilized biomaterials on the surface. In this study, various aspect ratios of CNTs are reported, based on the alteration of growth mechanisms using CVD. The growth-dependent and -independent parameters of the CNT arrays are studied as functions of the synthesis method.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"263-266"},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507184","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323322","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
OMCVD Gold Nanoparticles Covalently Attached to Polystyrene for Biosensing Applications† 共价附着于聚苯乙烯的OMCVD金纳米颗粒生物传感应用
Chemical Vapor Deposition Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507177
Sivayini Kandeepan, Joseph A. Paquette, Joe B. Gilroy, Silvia Mittler
{"title":"OMCVD Gold Nanoparticles Covalently Attached to Polystyrene for Biosensing Applications†","authors":"Sivayini Kandeepan,&nbsp;Joseph A. Paquette,&nbsp;Joe B. Gilroy,&nbsp;Silvia Mittler","doi":"10.1002/cvde.201507177","DOIUrl":"10.1002/cvde.201507177","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Remarkable developments and successes are witnessed in the fabrication and implementation of optical sensors based on localized surface plasmon resonance (LSPR) for the investigation of chemical and biological material quantities. We report on the reproducible fabrication of chemically stable surface immobilized AuNPs grown via organometallic chemical vapor deposition (OMCVD) on a polymer substrate, namely polystyrene (PS). Oxygen plasma-treated and UV ozone-treated PS samples depict enhanced amounts of polar -OH groups allowing for nucleation and growth of AuNPs. The optimum plasma treatment conditions, the largest shifts in the LSPR curves, and the bulk sensitivity of the OMCVD-grown AuNPs are discussed.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"275-280"},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507177","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323505","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties† 使用四甲基二硅氧烷前驱体的远程微波氢等离子体CVD制备碳化硅氧薄膜:生长动力学，结构，表面形貌和性能
Chemical Vapor Deposition Pub Date : 2015-11-17 DOI: 10.1002/cvde.201507185
Aleksander M. Wrobel, Pawel Uznanski, Agnieszka Walkiewicz-Pietrzykowska
{"title":"Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties†","authors":"Aleksander M. Wrobel,&nbsp;Pawel Uznanski,&nbsp;Agnieszka Walkiewicz-Pietrzykowska","doi":"10.1002/cvde.201507185","DOIUrl":"10.1002/cvde.201507185","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Amorphous hydrogenated silicon oxycarbide (a-SiCO:H) thin films are produced by remote microwave hydrogen plasma CVD using 1,1,3,3-tetramethyldisiloxane precursor. The effect of substrate temperature (<i>T</i><b><sub>S</sub></b>) on the chemical structure and some properties of resulting a-SiCO:H films is reported. The examination performed by infrared spectroscopy revealed that the increase in <i>T</i><b><sub>S</sub></b> involves the elimination of organic moieties from the film and its transformation from polymer-like to ceramic-like high-crosslink-density material. Due to their small surface roughness, high density, and good optical transparency, the a-SiCO:H films seem to be useful coatings for optical and electronic devices.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"307-318"},"PeriodicalIF":0.0,"publicationDate":"2015-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507185","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
PECVD of Hematite Nanoblades and Nanocolumns: Synthesis, Characterization, and Growth Model† 赤铁矿纳米叶片和纳米柱的PECVD:合成，表征和生长模型†
Chemical Vapor Deposition Pub Date : 2015-11-16 DOI: 10.1002/cvde.201507182
Giorgio Carraro, Alberto Gasparotto, Chiara Maccato, Elza Bontempi, Davide Barreca
{"title":"PECVD of Hematite Nanoblades and Nanocolumns: Synthesis, Characterization, and Growth Model†","authors":"Giorgio Carraro,&nbsp;Alberto Gasparotto,&nbsp;Chiara Maccato,&nbsp;Elza Bontempi,&nbsp;Davide Barreca","doi":"10.1002/cvde.201507182","DOIUrl":"10.1002/cvde.201507182","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Fe<sub>2</sub>O<sub>3</sub> nanostructures are fabricated on Si(100) and SiO<sub>2</sub> by plasma enhanced (PE)CVD from a Fe<sup>III</sup> <i>β</i>-diketonate precursor. Depositions are carried out in Ar-O<sub>2</sub> plasmas, devoting particular attention to the influence of growth temperature (from 60 to 400 °C) on material chemico-physical properties. Remarkably, high purity, single-phase <i>α</i>-Fe<sub>2</sub>O<sub>3</sub> nanostructures are obtained at temperatures as low as 60 °C. Furthermore, the deposit nano-organization can be tuned from &lt;110&gt;-oriented 2D nanoblade arrays to denser nanocolumns upon increasing the deposition temperature. A possible growth model is proposed to account for the observed structural/morphological features and light absorption properties of the target materials.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"294-299"},"PeriodicalIF":0.0,"publicationDate":"2015-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507182","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
Quantitative Measurement of Fiber Pull-out by Laser Scanning Confocal Microscopy† 激光扫描共聚焦显微法定量测量光纤拔出度
Chemical Vapor Deposition Pub Date : 2015-11-16 DOI: 10.1002/cvde.201504334
Andreas Pfrang, Thomas Schimmel
{"title":"Quantitative Measurement of Fiber Pull-out by Laser Scanning Confocal Microscopy†","authors":"Andreas Pfrang,&nbsp;Thomas Schimmel","doi":"10.1002/cvde.201504334","DOIUrl":"10.1002/cvde.201504334","url":null,"abstract":"<p>Laser scanning confocal microscopy is demonstrated as a new method to quantitatively determine fiber pull-out length. Fracture surfaces of carbon/carbon composites – polyacrylonitrile (PAN)-based carbon fibers infiltrated with pyrolytic carbon – are investigated to measure the three-dimensional surface topography and thereby the distribution of fiber pull-out length of carbon fibers.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"260-262"},"PeriodicalIF":0.0,"publicationDate":"2015-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201504334","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322616","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
CVD Growth of MoS2-based Two-dimensional Materials 二硫化钼基二维材料的CVD生长
Chemical Vapor Deposition Pub Date : 2015-11-13 DOI: 10.1002/cvde.201500060
H. F. Liu, S. L. Wong, D. Z. Chi
{"title":"CVD Growth of MoS2-based Two-dimensional Materials","authors":"H. F. Liu,&nbsp;S. L. Wong,&nbsp;D. Z. Chi","doi":"10.1002/cvde.201500060","DOIUrl":"10.1002/cvde.201500060","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>The ‘<i>self-limiting</i>’ character of graphene growth on the surface of metals such as Ni and Cu makes CVD the natural choice for growing large-area and continuous graphene films. Beyond graphene, absence of the self-limiting property results in a challenge to achieving large-area, high-quality two-dimensional (2D) crystals by CVD. Recent studies of structural, optical, and electrical properties of MoS<sub>2</sub>-based atomic layers grown by CVD are reviewed, concluding that thermal vapor deposition will outperform thermal vapor sulfurization in producing the required materials. Whether gaseous sources will replace the now dominant solid sources in direct deposition methods is an open issue. The latest progression in various CVD techniques used in MoS<sub>2</sub> growth and their resultant products are discussed and compared.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"241-259"},"PeriodicalIF":0.0,"publicationDate":"2015-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201500060","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51322186","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 143
Electric-Field Aerosol-Assisted CVD: Synthesis, Characterization, and Properties of Tin Oxide Microballs Prepared from a Single Source Precursor† 电场气溶胶辅助CVD:单源前驱体制备的氧化锡微球的合成、表征和性能
Chemical Vapor Deposition Pub Date : 2015-11-12 DOI: 10.1002/cvde.201507178
Rabia Naeem, Sohail Ahmed, Kong Mun Lo, Wan Jefrey Basirun, Rosiyah Yahya, Misni Misran, T. A. Nirmal Peiris, Jagdeep S. Sagu, K. G. Upul Wijayantha, Arjun K. Thapa, Gamini U. Sumanasekera, Muhammad Mazhar
{"title":"Electric-Field Aerosol-Assisted CVD: Synthesis, Characterization, and Properties of Tin Oxide Microballs Prepared from a Single Source Precursor†","authors":"Rabia Naeem,&nbsp;Sohail Ahmed,&nbsp;Kong Mun Lo,&nbsp;Wan Jefrey Basirun,&nbsp;Rosiyah Yahya,&nbsp;Misni Misran,&nbsp;T. A. Nirmal Peiris,&nbsp;Jagdeep S. Sagu,&nbsp;K. G. Upul Wijayantha,&nbsp;Arjun K. Thapa,&nbsp;Gamini U. Sumanasekera,&nbsp;Muhammad Mazhar","doi":"10.1002/cvde.201507178","DOIUrl":"10.1002/cvde.201507178","url":null,"abstract":"<div>\u0000 \u0000 <section>\u0000 \u0000 <p>Mesoporous nanostructures of tin(IV) oxide microballs are synthesized, using a single source precursor [Sn (OAc)(dmae)]<sub>2</sub> (where OAc = Acetato and dmae = dimethylaminoethanolato). The as-prepared microballs are characterized using X-ray diffraction, field emission scanning electron microscopy (FESEM), Fourier transform infrared and UV-vis spectroscopy, X-ray photoelectron spectroscopy and impedance spectroscopy. The focused ion beam (FIB) images of the exterior and interior surfaces of the microballs disclosed the presence of porous structures with mesopore of sizes ranging from 56-66 nm and 8.0 to 160 nm, respectively. The microballs exhibit high BET and Langmuir surface areas of 136 and 191.6 m<sup>2</sup> g<sup>−1</sup>, respectively, and show capacities &gt;600 mAhg<sup>−1</sup> over 60 cycles, as compared with unmodified tin oxide-based nanomaterials which show capacity &lt; 500 mAh g<sup>−1</sup> after 50 cycles.</p>\u0000 </section>\u0000 </div>","PeriodicalId":10093,"journal":{"name":"Chemical Vapor Deposition","volume":"21 10-11-12","pages":"360-368"},"PeriodicalIF":0.0,"publicationDate":"2015-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1002/cvde.201507178","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"51323092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
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