Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD†

Raphaël Boichot, Susan Krumdieck
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引用次数: 4

Abstract

This article presents an approach for modeling the vaporization of droplets of solvent and precursor mixture under vacuum in the pulsed-pressure (pp) CVD process. The pulsed, direct liquid injection apparatus with ultrasonic atomizer is demonstrated as a controllable and reliable alternative to the bubbler and carrier gas system. The numerical modeling solves mass, heat, and momentum continuity equations on liquid droplets, and is intended to evaluate the relative roles of the physical chemistry properties and reactor parameters in the fast vaporization of droplets. The sensitivity analysis proposed here shows that the vaporization time into the pulsed-liquid CVD system is mainly dependent on the heating available in the flash evaporation zone, then on the thermodynamic properties of the liquid solution.

Abstract Image

液滴汽化在液体脉冲CVD设计和运行中的数值模拟
本文提出了一种模拟脉冲压力(pp) CVD工艺中溶剂和前驱体混合物液滴在真空条件下汽化的方法。采用超声雾化器的脉冲式直接注液装置是起泡器和载气系统的一种可控、可靠的替代方案。数值模拟解决了液滴的质量、热量和动量连续性方程,旨在评估物理化学性质和反应器参数在液滴快速汽化中的相对作用。本文提出的灵敏度分析表明,进入脉冲-液体CVD系统的蒸发时间主要取决于闪蒸区可用的加热,其次取决于液体溶液的热力学性质。
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来源期刊
Chemical Vapor Deposition
Chemical Vapor Deposition 工程技术-材料科学:膜
自引率
0.00%
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0
审稿时长
>12 weeks
期刊介绍: Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
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