Qingxin Chen,Jinhao Zhang,Junming Zhang,Zhentao Yue,Jialin Meng,Qian Xin,Mingsheng Xu,Tianyu Wang
{"title":"Fully hafnium-based ferroelectric/antiferroelectric devices for hybrid SNN neuromorphic computing","authors":"Qingxin Chen,Jinhao Zhang,Junming Zhang,Zhentao Yue,Jialin Meng,Qian Xin,Mingsheng Xu,Tianyu Wang","doi":"10.1063/5.0321092","DOIUrl":"https://doi.org/10.1063/5.0321092","url":null,"abstract":"Neuromorphic computing based on ferroelectric devices has shown great potential in artificial intelligence tasks. However, the challenge of heterogeneous integration between synaptic and neuronal devices has imposed additional limitations on hybrid neural network hardware. In this work, ferroelectric and antiferroelectric devices based on element doping engineering of HfZrOx films are employed to emulate synaptic and neuron functionality for hybrid spiking neural network (SNN) neuromorphic computing. By constructing a functional circuit based on an Hf0.5Zr0.5O2 ferroelectric device, neural characteristics were emulated for SNN computing. Furthermore, the integrate-and-fire dynamics is implemented based on spontaneous depolarization characteristic of a full hafnium-based hybrid ferroelectric neural network, greatly simplifying conventional neuron circuits. The novel neural network architecture achieves a classification accuracy of 92.8% on the Dynamic Vision Sensor dataset, establishing a crucial foundation for the development of high-efficiency neuromorphic computing systems. This work demonstrates considerable promise for realizing hybrid neuromorphic hardware using CMOS-compatible full hafnium-based ferroelectric devices.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"3 1","pages":""},"PeriodicalIF":4.0,"publicationDate":"2026-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148894161","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Md Abdul Hamid,Nabasindhu Das,Advait Gilankar,Brad Lenzen,David J. Smith,Nidhin Kurian Kalarickal
{"title":"Temperature-dependent characteristics of quasi-vertical AlN Schottky diodes on bulk AlN substrate","authors":"Md Abdul Hamid,Nabasindhu Das,Advait Gilankar,Brad Lenzen,David J. Smith,Nidhin Kurian Kalarickal","doi":"10.1063/5.0351565","DOIUrl":"https://doi.org/10.1063/5.0351565","url":null,"abstract":"We report on the fabrication and temperature-dependent characterization of metalorganic chemical vapor deposition-grown quasi-vertical AlN Schottky barrier diodes (SBDs) on bulk AlN substrates. The SBDs exhibited high current densities exceeding 2 kA/cm2 at 10 V, with a turn-on voltage of ∼3.0 V. Cross-sectional TEM analysis revealed a thin (∼5 nm) AlNxOy interfacial layer formed between the AlN and the Ni contact. Stable rectifying operation was maintained up to 300 °C, and the temperature dependence of the Schottky barrier height and ideality factor was characterized. Capacitance voltage measurements showed strong temperature dependence, resulting in an apparent increase in the net donor concentration from ∼5 × 1017 cm−3 at 300 K to ∼1 × 1018 cm−3 at 373 K. Temperature-dependent reverse-bias characteristics were consistent with Poole–Frenkel emission, with a trap energy of ∼0.34 eV.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"356 1","pages":""},"PeriodicalIF":4.0,"publicationDate":"2026-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148895938","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Sato,D. Zhu,R. Margraf-O'Neal,K. Tamasaku,T. Osaka,H. Osawa,M. Yabashi
{"title":"Visualization of thermal and strain dynamics in x-ray optics by time-resolved rocking curve imaging","authors":"T. Sato,D. Zhu,R. Margraf-O'Neal,K. Tamasaku,T. Osaka,H. Osawa,M. Yabashi","doi":"10.1063/5.0304414","DOIUrl":"https://doi.org/10.1063/5.0304414","url":null,"abstract":"The absorption of intense x-ray pulses from free-electron lasers by x-ray crystal optics triggers rapid thermal and mechanical responses, including lattice compression, expansion, and strain-wave propagation, which dynamically modify diffraction conditions and wavefront properties. These effects pose significant challenges for next-generation high-repetition rate x-ray sources, particularly for crystal monochromators used in x-ray free-electron laser beamlines and self-seeding. Here, we demonstrate time-resolved rocking curve imaging of x-ray Bragg optics with high spatial resolution (6.4 μm) and sub-1μ rad angular resolution, enabling direct visualization of lattice dynamics from nanoseconds to microseconds. By combining a high-flux beamline at SPring-8, a scintillator-coupled scientific Complementary Metal–Oxide–Semiconductor (sCMOS) detector, and a synchronized femtosecond laser system, we capture lattice dynamics induced by transient laser heating with a strain sensitivity on the order of 10−6. Our results reveal transient lattice deformation and the propagation of laser-induced strain waves over millimeter-scale distances. This approach provides experimental benchmarks for understanding heat-load effects in high-repetition rate x-ray optics.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"42 1","pages":""},"PeriodicalIF":4.0,"publicationDate":"2026-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148894164","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Reynolds Dziobek-Garrett,Vina Faramarzi,Pawan Kumar,Vasco Tenner,Marko Kamp,A. Femius Koenderink,Jorik van de Groep,Roland Bliem
{"title":"Rapidly resolving bilayer stacking orientation in industrially compatible MOCVD-grown MoS2 films through second harmonic generation imaging","authors":"Reynolds Dziobek-Garrett,Vina Faramarzi,Pawan Kumar,Vasco Tenner,Marko Kamp,A. Femius Koenderink,Jorik van de Groep,Roland Bliem","doi":"10.1063/5.0334162","DOIUrl":"https://doi.org/10.1063/5.0334162","url":null,"abstract":"Atomically thin semiconductor films grown by metal organic chemical vapor deposition (MOCVD) will be crucial for the integration of two-dimensional (2D) materials into semiconductor devices produced at scale. However, the development of wafer-scale growth techniques has outpaced the development of corresponding metrology to assess film quality of 2D transition metal dichalcogenide (TMD) films. One particularly difficult issue is that the stacking sequence when overgrowing TMD films is not uniquely defined, with different possible orientations for the second layer. Determining this stacking order of individual grains when growing additional layers over a closed monolayer is an outstanding challenge for such films. Here, we use second harmonic generation (SHG) microscopy to assess the size, dispersion, and stacking orientation of bilayer grains in MOCVD-grown MoS2 films. We correlate several microscopy techniques—bright-field white-light microscopy imaging, atomic force microscopy, photoluminescence mapping, and SHG microscopy—to show that SHG can uniquely map the stacking orientation of bilayer nucleates in these films. We expect this to drive the development of further metrology based on SHG for semiconductor applications, especially in the development of 2D material specific tools.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"163 1","pages":""},"PeriodicalIF":4.0,"publicationDate":"2026-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148895924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Ru-mediated oxygen-vacancy redistribution in In-rich oxide thin-film transistors","authors":"Zefu Zhao,Xiaolin Jiang,Shenglin Pan,Kai-Jhih Gan,Shaohao Wang,Tiaoyang Li,Dun-Bao Ruan","doi":"10.1063/5.0346758","DOIUrl":"https://doi.org/10.1063/5.0346758","url":null,"abstract":"Indium-rich amorphous oxide semiconductors exhibit high electron mobility, but oxygen vacancy (Vo) related donors often cause a negative threshold voltage (Vt) and bias-stress instability. This work demonstrates a 2 nm InRuZnO (IRZO) interlayer into an InZnO (IZO) channel as an internal oxygen-affinitive layer, rather than as a conventional bulk dopant. The IZO/IRZO/IZO tri-layer thin-film transistor (TFT) exhibits a field-effect mobility of 31 cm2/V s, a Vt of 0.3 V, a forward–reverse hysteresis below 100 mV, and an ON/OFF current ratio of 4 × 108. X-ray photoelectron spectroscopy depth profiling of the O 1s reveals a Ru-modulated vertical distribution of Vo, with Vo concentrations of 32%, 20%, and 24% in the top IZO, IRZO, and bottom IZO regions, respectively. This depth dependence indicates that the Ru-containing interlayer locally stabilizes oxygen bonding and redistributes Vo across the In-rich channel. The tri-layer TFTs also reduce the ΔVt to −0.3 V after 1000 s of negative gate-bias stress at −2 MV/cm, demonstrating improved reliability. This work identifies Ru-mediated Vo modulation as a route for improving the mobility–stability balance of sputtered In-rich oxide TFTs.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"28 1","pages":""},"PeriodicalIF":4.0,"publicationDate":"2026-08-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148894023","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}