Microscopy (Oxford, England)最新文献_第7页

Surface potential distribution of resist exposed by electron beam and the non-charging exposure conditions. 电子束和非充电曝光条件下光刻胶的表面电位分布。

Microscopy (Oxford, England) Pub Date : 2025-01-30 DOI: 10.1093/jmicro/dfae044

Masatoshi Kotera, Yoshinobu Kono

{"title":"Surface potential distribution of resist exposed by electron beam and the non-charging exposure conditions.","authors":"Masatoshi Kotera, Yoshinobu Kono","doi":"10.1093/jmicro/dfae044","DOIUrl":"10.1093/jmicro/dfae044","url":null,"abstract":"In this study, we experimentally analyzed the charging phenomenon when an insulating resist film on a conductive layer formed on bulk glass is irradiated by electron beams (EBs). To quantify the charging potential induced, an electrostatic force microscope device was installed in the scanning electron microscope sample chamber, and potential distributions formed under various exposure conditions were obtained. Based on the results obtained, a model for charge accumulation within the sample, explaining positive and negative charging and their transitions, was developed. At an EB acceleration voltage of 30 kV, the following observations were made: 'global charging' could be avoided by applying -5 V to the sample. Regarding 'local charging' near the exposure area of the EB, at low exposure doses, emission of secondary electrons from the sample surface induced positive charging, while the accumulation of incident electrons within the sample induced negative charging. At exposure doses where the effects of both are balanced, the sample exhibited zero potential, revealing the appearance of the 'first zero-cross exposure dose'. At higher exposure doses, the sample transitions from negative to positive as the exposure dose increases due to the electron-beam-induced conduction, resulting in the so-called second zero-cross exposure dose. The exposure dose dependence of the charging potential distribution at various acceleration voltages was obtained. In particular, we found that at an acceleration voltage of 0.6 kV, the sample surface is not charged even when exposed to small to very large doses of EBs.","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"35-47"},"PeriodicalIF":0.0,"publicationDate":"2025-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142302783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Precise positional alignment of atom-resolved HAADF images of heteroepitaxial interface with low signal-to-noise ratio. 低信噪比异质外延界面原子分辨 HAADF 图像的精确定位。

Microscopy (Oxford, England) Pub Date : 2025-01-30 DOI: 10.1093/jmicro/dfae038

Kohei Aso, Yoshifumi Oshima

引用次数: 0

Development of a localized surface plasmon-enhanced electron beam-pumped nanoscale light source for electron beam excitation-assisted optical microscopy. 开发用于电子束激发辅助光学显微镜的局部表面等离子体增强电子束泵浦纳米级光源。

Microscopy (Oxford, England) Pub Date : 2025-01-30 DOI: 10.1093/jmicro/dfae043

Atsushi Nakamura, Shunpei Shiba, Kei Hosomi, Atsushi Ono, Yoshimasa Kawata, Wataru Inami

引用次数: 0

Noise reduction of low-dose electron holograms using the wavelet hidden Markov model. 小波隐马尔可夫模型在低剂量电子全息图降噪中的应用。

Microscopy (Oxford, England) Pub Date : 2025-01-22 DOI: 10.1093/jmicro/dfaf007

Yuto Tomita, Yoshihiro Midoh, Takehiro Tamaoka, Yasukazu Murakami

{"title":"Noise reduction of low-dose electron holograms using the wavelet hidden Markov model.","authors":"Yuto Tomita, Yoshihiro Midoh, Takehiro Tamaoka, Yasukazu Murakami","doi":"10.1093/jmicro/dfaf007","DOIUrl":"https://doi.org/10.1093/jmicro/dfaf007","url":null,"abstract":"The precision in electron holography studies on electrostatic and magnetic fields depends on the image quality of an electron hologram. Enhancing the image quality of electron holograms is essential for the comprehensive analysis of weak electromagnetic fields; however, extended electron beam irradiation can lead to undesirable radiation damage and contamination. Recent studies have demonstrated that noise reduction using the wavelet hidden Markov model (WHMM) can improve the precision of phase analysis for limited thin-foiled crystals. In this study, we examine the effects of WHMM-based denoising on the electron holography data of weakly charged nanoparticles collected under low-electron-dose conditions. The results indicate that effective noise reduction with the WHMM allows for a reduction in the magnitude of the electron dose by approximately half relative to data collection without WHMM denoising, while maintaining the same level of the charge determination precision: less than one elementary charge. Notably, at a low electron dose of 0.40 e-/pixel, WHMM denoising enables the clear visualization of a weak stray electric field outside a charged latex sphere. This method offers significant advantages for electron holography studies of electron-beam-sensitive materials requiring minimal time for electron exposure.","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2025-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143026142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Momentum-resolved EELS and CL study on 1D-plasmonic crystal prepared by FIB method. 用 FIB 方法制备的一维等离子晶体的动量分辨 EELS 和 CL 研究。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae022

Akira Yasuhara, Masateru Shibata, Wakaba Yamamoto, Izzah Machfuudzoh, Sotatsu Yanagimoto, Takumi Sannomiya

引用次数: 0

Role of lipids in the organization of tight junction. 脂质在紧密连接组织中的作用。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae039

Junichi Ikenouchi, Kenta Shigetomi

引用次数: 0

Visualization of Bacillus subtilis spore structure and germination using quick-freeze deep-etch electron microscopy. 利用速冻深描电子显微镜观察枯草芽孢杆菌孢子的结构和萌发。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae023

Kiran Jalil, Yuhei O Tahara, Makoto Miyata

引用次数: 0

Correction to: Observation and quantitative analysis of dislocations in steel using electron channeling contrast imaging method with precise control of electron beam incident direction. 更正为利用精确控制电子束入射方向的电子通道对比成像方法观测和定量分析钢中的位错。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae037

引用次数: 0

Bayesian inference of atomic column positions in scanning transmission electron microscopy images. 扫描透射电子显微镜图像中原子柱位置的贝叶斯推断。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae025

Yuki Nomura, Satoshi Anada, Shunsuke Kobayashi

{"title":"Bayesian inference of atomic column positions in scanning transmission electron microscopy images.","authors":"Yuki Nomura, Satoshi Anada, Shunsuke Kobayashi","doi":"10.1093/jmicro/dfae025","DOIUrl":"10.1093/jmicro/dfae025","url":null,"abstract":"Atomic-resolution scanning transmission electron microscopy combined with two-dimensional Gaussian fitting enables the accurate and precise identification of atomic column positions within a few picometers. The measurement performance significantly depends on the signal-to-noise ratio of the atomic columns. In areas with low signal-to-noise ratios, such as near surfaces, the measurement performance was lower than that of the bulk. However, previous studies evaluated the accuracy and precision only in bulk areas, underscoring the need for a method that quantitatively evaluates the accuracy and precision of each atomic column position with various signal-to-noise ratios. This study introduced Bayesian inference to assess the accuracy and precision of determining individual atomic column positions under various signals. We applied this method to simulated and experimental images and demonstrated its effectiveness in identifying statistically significant displacements, particularly near surfaces with signal degradation. The use of vector maps and kernel density estimate plots obtained from Bayesian inference provided a probabilistic understanding of the atom displacement. Therefore, this study highlighted the potential benefits of Bayesian inference in high-resolution imaging to reveal material properties.","PeriodicalId":74193,"journal":{"name":"Microscopy (Oxford, England)","volume":" ","pages":"481-487"},"PeriodicalIF":0.0,"publicationDate":"2024-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140900800","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Development of silicon-on-insulator direct electron detector with analog memories in pixels for sub-microsecond imaging. 开发用于亚微秒成像的带像素模拟存储器的硅绝缘体直接电子探测器。

Microscopy (Oxford, England) Pub Date : 2024-12-05 DOI: 10.1093/jmicro/dfae029

Takafumi Ishida, Kosei Sugie, Toshinobu Miyoshi, Yuichi Ishida, Koh Saitoh, Yasuo Arai, Makoto Kuwahara

引用次数: 0